Abstract: An image-forming device includes, in an envelope, an electron-emitting element for emitting an electron by applying a voltage between electrodes, an image-forming member for forming an image by irradiation with an electron beam emitted from the electron-emitting element, and a supporting member for supporting the envelope. The supporting member has an electroconductive film at an end portion and a side portion thereof, and is electrically connected through the electroconductive film to the electrode.

Abstract: A heat treatment device where intervals between substrates supported by a supporter is reduced so that the number of substrates to be treated can be increased. A heat treatment device has a reaction furnace for treating substrates and a supporter for supporting the substrates in plural stages in the reaction furnace. The supporter has supporting plates in contact with the substrates and supporting members for supporting the supporting plates. A supporting plate and a supporting member are superposed on each other at least a part in the thickness direction.

Abstract: Provided is a multicolor organic light emitting apparatus having a plurality of organic light emitting devices formed on a substrate, for emitting two or more types of luminescent colors. A thickness of a layer formed between a light emitting layer and a reflection surface of a cathode is the same as that of each of first and second organic light emitting devices, and an optical distance between a light emitting surface of each of the light emitting layers and the reflection surface of the cathode is adjusted such that each thickness of the light emitting layers is varied to enhance light emitted from the light emitting layers by optical interference.

Abstract: A thermal treatment apparatus, a method for manufacturing a semiconductor device, and a method for manufacturing a substrate, wherein the occurrence of slip dislocation in a substrate during heat treatment is reduced, and a high-quality semiconductor device can be manufactured, are intended to be provided. A substrate support 30 is formed from a main body portion 56 and a supporting portion 58. In the main body portion 56, a plurality of placing portions 66 extend parallel, and supporting portions 58 are provided on the placing portions 66. A substrate 68 is placed on the supporting portion 58. The supporting portion 58 has a smaller area than an area of a flat face of the substrate, and is formed from a silicon plate having a thickness larger than thickness of the substrate, so that deformation during heat treatment is reduced. The supporting portion 58 is made of silicon, and a layer coated with silicon carbide (SiC) is formed on a substrate-placing face of the supporting portion 58.

Abstract: An image-forming device having, in an envelope, an electron-emitting element, an image-forming member for forming an image by irradiation of an electron beam emitted from the electron-emitting element, and an electroconductive supporting member for supporting the envelope. The potential of the supporting member is controlled to not be higher than the maximum potential applied to the electron-emitting element. The electron-emitting element and the image-forming member can be placed in juxtaposition on the same substrate, an electro-conductive substrate can be additionally provided in opposition to the face of the substrate, and the supporting member can be connected electrically to one of the electrodes and also to the electro-conductive substrate.

Abstract: An engine ECU executes a program including the step of calculating an injection time Astart from the engine speed and load factor when arriving at the injection calculation timing of a cylinder located in the proximity of a knock sensor, the step of calculating an injection period TAU, the step of calculating an injection end time Aend, the step of shortening the injection time of an in-cylinder injector when the injection time Astart or injection end time Aend is within a KCS gate, and the step of calculating the port injection period so as to inject the insufficient injection quantity from an intake manifold injector when the required injection quantity will be insufficient as a result of shortening the injection period of the in-cylinder injector.

Abstract: An alignment mark for aligning a resist film and a silk film relative to a printed circuit board is used as a reference mark based on which a position of an electronic component on the printed circuit board is acquired when a component mounting machine mounts the electronic component on the printed circuit board. This makes it unnecessary to additionally provide a board recognition mark and an individual recognition mark, thereby making it possible to effectively use an area of the printed circuit board. In addition, since the number of marks to be recognized is decreased, a recognition processing is reduced. Accordingly, mounting time and a mounting program can be reduced, and a manufacturing cost of the printed circuit board can be reduced.

Abstract: An engine ECU executes a program including the steps of: calculating a fuel injection ratio of an in-cylinder injector; calculating an amount of spark advance using a first map employed when the in-cylinder injector has a fuel injection ratio of one, said first map providing a timing of ignition with a maximum amount of spark advance; calculating an amount of spark advance using a second map employed for a fuel injection ratio of zero, said second map providing a timing of ignition with a minimum amount of spark advance; and calculating an amount of spark advance using a third map employed for a fuel injection ratio larger than zero and smaller than one, said third map providing a timing of ignition with a larger amount of spark advance for a larger ratio.

Abstract: An engine ECU executes a program including the step of calculating an injection time Astart from the engine speed and load factor when arriving at the injection calculation timing of a cylinder located in the proximity of a knock sensor, the step of calculating an injection period TAU, the step of calculating an injection end time Aend, the step of shortening the injection time of an in-cylinder injector when the injection time Astart or injection end time Aend is within a KCS gate, and the step of calculating the port injection period so as to inject the insufficient injection quantity from an intake manifold injector when the required injection quantity will be insufficient as a result of shortening the injection period of the in-cylinder injector.

Abstract: An image-forming device having, in an envelope, an electron-emitting element, an image-forming member for forming an image by irradiation of an electron beam emitted from the electron-emitting element, and an electroconductive supporting member for supporting the envelope (internally), comprises a means for controlling the potential of the supporting member to be not higher than the maximum potential applied to the electron-emitting element. The electron-emitting element and the image-forming member can be placed in juxtaposition on the same substrate, an electroconductive substrate can be additionally provided in opposition to the face of the substrate, and the supporting member can be connected electrically to one of said electrodes and also to the electroconductive substrate.

Abstract: An electron source comprises a plurality of electron-emitting devices and a drive means for driving the devices. The drive means applies a voltage above a threshold level to selected ones of the plurality of electron-emitting devices according to an image signal to cause the selected devices to emit electrons. The drive means also applies a voltage pulse for bringing the plurality of electron-emitting devices into a high resistance state. The voltage pulse for bringing into a high resistance state has a polarity reverse to that of the voltage for causing electron emission and has a voltage rising rate of greater than 10 V/sec.

Abstract: An image-forming device having, in an envelope, an electron-emitting element, an image-forming member for forming an image by irradiation of an electron beam emitted from the electron-emitting element, and an electroconductive supporting member for supporting the envelope. The potential of the supporting member is controlled to not be higher than the maximum potential applied to the electron-emitting element. The electron-emitting element and the image-forming member can be placed in juxtaposition on the same substrate, an electro-conductive substrate can be additionally provided in opposition to the face of the substrate, and the supporting member can be connected electrically to one of the electrodes and also to the electro-conductive substrate.

Abstract: Pollution caused by chemical pollutants can be estimated automatically. A chemical pollutants detecting unit 60 installed in a duct 33 includes a supporting shaft 61, which is inserted into a sidewall 11a of a housing, for supporting the chemical pollutants detecting unit 60, a quartz crystal microbalance 62 for detecting organic matters in a clean air 53 passing through the duct 33, an oscillating circuit 63 for oscillating the quartz crystal microbalance 62, an oscillation frequency detecting block 64, a chemical pollutants calculating block 65, a controller 66, an output unit 67, a heater 68 for heating the quartz crystal microbalance 62, and a thermo-hygrometer 70. A chemical filter is examined automatically whether an ability of removing the chemical pollutants thereby is degraded or not. If the ability is found to have been degraded, efficiency in an IC manufacturing method can be prevented from being degraded by issuing an alarming signal beforehand.

Abstract: An electron-emitting device having an electron-emitting region between electrodes on a substrate where the electron-emitting region contains fine particles dispersed therein at an areal occupation ratio of the fine particles ranging from 20% to 75% of the electron-emitting region is disclosed. The other electron-emitting device where the electron-emitting region contains fine particles being arranged at gaps of from 5 Å to 100 Å and having average particle diameter of from 5 Å to 1000 Å is also disclosed. Electron beam-generating apparatus and image-forming apparatus comprise one of the electron-emitting regions and a modulation means for modulating the electron beams emitted from the electron-emitting devices in accordance with information signals.

Abstract: An electron source comprises a plurality of electron-emitting devices and a drive means for driving the devices. The drive means applies a voltage above a threshold level to selected ones of the plurality of electron-emitting devices according to an image signal to cause the selected devices to emit electrons. The drive means also applies a voltage pulse for bringing the plurality of electron-emitting devices into a high resistance state. The voltage pulse for bringing into a high resistance state has a polarity reverse to that of the voltage for causing electron emission and has a voltage rising rate of greater than 1OV/sec.

Abstract: Substrate processing apparatus and method, by which an outside air and a gas-phase backward flow are restrained from entering the inside of a reaction chamber during the inside of a reaction chamber is opened to the outside through a substrate carrying-in/carrying-out opening. This substrate processing apparatus, for example, a vertical CVD apparatus (200) has a gas supply system (240) and a bypass line (264). The gas supply system (240) supplies an inert gas to a space (3a) between an outer tube (1A) and an inner tube (2A) of a reaction furnace (211) in a boat loading term and a boat unloading term. The bypass line (264) exhausts an atmosphere from a reaction chamber (1a) by performing a slow exhaust operation in the boat loading term and the boat unloading term.

Abstract: This invention discloses an image forming apparatus having an electron source on which a plurality of electron-emitting devices are arranged, an image forming member on which an image is formed by electrons emitted by the electron-emitting devices, and a structure for maintaining an interval between the electron source and the image forming member, in which an interval between two electron-emitting devices adjacent to each other via the structure is larger than an interval between two electron-emitting devices adjacent to each other without the mediacy of the structure, and electrons emitted by the electron-emitting devices are deflected toward the structure.

Abstract: An electron source comprises a plurality of electron-emitting devices and a drive means for driving the devices. The drive means applies a voltage above a threshold level to selected ones of the plurality of electron-emitting devices according to an image signal to cause the selected devices to emit electrons. The drive means also applies a voltage pulse for bringing the plurality of electron-emitting devices into a high resistance state. The voltage pulse for bringing into a high resistance state has a polarity reverse to that of the voltage for causing electron emission and has a voltage rising rate of greater than 10V/sec.

Abstract: This invention discloses an image forming apparatus having an electron source on which a plurality of electron-emitting devices are arranged, an image forming member on which an image is formed by electrons emitted by the electron-emitting devices, and a structure for maintaining an interval between the electron source and the image forming member, in which

Abstract: An electron-emitting device having an electron-emitting region between electrodes on a substrate where the electron-emitting region contains fine particles dispersed therein at an areal occupation ratio of the fine particles ranging from 20% to 75% of the electron-emitting region is disclosed. The other electron-emitting device where the electron-emitting region contains fine particles being arranged at gaps of from 5 Å to 100 Å and having average particle diameter of from 5 Å to 1000 Å is also disclosed. Electron beam-generating apparatus and image-forming apparatus comprise one of the electron-emitting regions and a modulation means for modulating the electron beams emitted from the electron-emitting devices in accordance with information signals.