Patents by Inventor Naoyuki Kobayashi

Naoyuki Kobayashi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20190165163
    Abstract: A vertical MOSFET having a trench gate structure includes an n?-type drift layer and a p-type base layer formed by epitaxial growth. In the n?-type drift layer, an n-type region, first p+-type regions, and a second p+-type region are provided. In a region opposing, in a depth direction, a gate electrode pad connected to a gate electrode, the first p+-type regions are provided with intervals therebetween along a width direction of the trench gate.
    Type: Application
    Filed: October 23, 2018
    Publication date: May 30, 2019
    Applicant: FUJI ELECTRIC CO., LTD.
    Inventors: Yusuke KOBAYASHI, Manabu TAKEI, Shinsuke HARADA, Naoyuki OHSE
  • Publication number: 20190121246
    Abstract: A liquid immersion exposure apparatus includes a movable stage configured to move below and relative to a projection system, a liquid supply inlet and a first liquid collection outlet, the movable stage having a second liquid collection outlet. A first measurement system is provided downstream of the first liquid collection outlet and measures an amount of liquid collected via the first liquid collection outlet. A second measurement system is provided downstream of the second liquid collection outlet and measures an amount of liquid collected via the second liquid collection outlet. A substrate held on the movable stage is exposed with an exposure beam from the projection system via liquid in a liquid immersion area which covers a portion of an upper surface of the substrate and which is formed while performing liquid supply via the liquid supply inlet and liquid collection via the first liquid collection outlet.
    Type: Application
    Filed: December 18, 2018
    Publication date: April 25, 2019
    Applicant: NIKON CORPORATION
    Inventors: Nobutaka MAGOME, Naoyuki KOBAYASHI
  • Patent number: 10185232
    Abstract: A liquid immersion exposure apparatus includes a projection system, a liquid supply inlet, a first liquid collection outlet, and a separator fluidically connected to the first liquid collection outlet, the separator separating one of liquid and gas, which have been collected via the first liquid collection outlet, from the other. A stage which holds a substrate has a second liquid collection outlet that collects a portion of the liquid supplied from the liquid supply inlet which comes from a gap between an upper surface of the substrate and an upper surface of the stage.
    Type: Grant
    Filed: August 29, 2017
    Date of Patent: January 22, 2019
    Assignee: NIKON CORPORATION
    Inventors: Nobutaka Magome, Naoyuki Kobayashi
  • Publication number: 20180348653
    Abstract: A liquid immersion exposure apparatus exposes a substrate by irradiating an exposure beam on the substrate through liquid. The apparatus has a substrate stage which is provided with a substrate holding portion on which the substrate is held and is provided with a stage member having an upper surface. The upper surface of the stage member is provided adjacent to the upper surface of the held substrate with a gap between the held substrate and the stage member. A temperature adjustment system, a part of which is provided under the upper surface of the stage member, performs temperature adjustment for the stage member.
    Type: Application
    Filed: August 2, 2018
    Publication date: December 6, 2018
    Applicant: NIKON CORPORATION
    Inventors: Naoyuki KOBAYASHI, Soichi OWA, Shigeru HIRUKAWA, Yasuhiro OMURA
  • Publication number: 20180315782
    Abstract: Provided is a method of manufacturing a display, a display, and a liquid crystal television that can improve productivity and make a grain size uniform. A method of manufacturing a display includes: (A) deriving, when a laser beam is applied to an aSi film 18 provided on a substrate 11 to thereby polycrystallize the aSi film 18 and form a pSi film 14, a relationship between energy density of the laser beam and a grain size of the pSi film 14; (B) selecting a predetermined range of the energy density in the derived relationship; and (C) irradiating a first area including the aSi film 18 with a laser beam at energy density in the selected range of the energy density to thereby polycrystallize the aSi film 18 and form the pSi film 14.
    Type: Application
    Filed: April 16, 2018
    Publication date: November 1, 2018
    Inventor: Naoyuki KOBAYASHI
  • Patent number: 10048602
    Abstract: An exposure apparatus exposes a substrate by irradiating exposure light on the substrate through liquid. The exposure apparatus has a substrate holder for holding the substrate, a substrate stage capable of moving the substrate held by the substrate holder, and a temperature adjusting system for adjusting the temperature of the substrate holder. The temperature of the substrate is controlled so that there is no difference in temperature between the substrate and the liquid, thereby preventing a reduction in exposure accuracy resulting from variation in temperature of the liquid.
    Type: Grant
    Filed: April 8, 2016
    Date of Patent: August 14, 2018
    Assignee: NIKON CORPORATION
    Inventors: Naoyuki Kobayashi, Soichi Owa, Shigeru Hirukawa, Yasuhiro Omura
  • Publication number: 20180196352
    Abstract: A liquid immersion exposure apparatus includes a stage having a holder that holds a substrate, and is movable below a projection system, supply ports via which immersion liquid is supplied, the supply ports facing an upper surface of the substrate held on the holder, recovery ports via which the immersion liquid is collected and arranged such that (i) the upper surface of the substrate held on the holder faces the recovery ports and (ii) the recovery ports encircle a path of exposure light. The recovery ports collect the immersion liquid from the upper surface of the substrate such that only a portion of the upper surface of the substrate is covered with the immersion liquid. The stage is movable below a gas supply opening that supplies a gas. The stage is movable to a position where the supplied gas is supplied to a surface of the stage.
    Type: Application
    Filed: March 9, 2018
    Publication date: July 12, 2018
    Applicant: NIKON CORPORATION
    Inventors: Naoyuki KOBAYASHI, Akikazu TANIMOTO
  • Patent number: 9939739
    Abstract: A liquid immersion exposure method exposes a substrate with exposure light through liquid, and uses a projection system, a stage system having a holder that holds the substrate, a supply port via which the liquid is supplied arranged such that an upper surface of the substrate faces the supply port and that is spaced a first distance from an optical axis of the projection system, and a recovery port via which the liquid is collected arranged such that the upper surface of the substrate faces the recovery port, which is spaced a second distance greater than the first distance from the optical axis of the projection system, and that encircles the supply port. In the method, the substrate held on the holder is positioned based on a detection result of an alignment system that detects an alignment mark of the substrate not through the liquid.
    Type: Grant
    Filed: February 29, 2016
    Date of Patent: April 10, 2018
    Assignee: NIKON CORPORATION
    Inventors: Naoyuki Kobayashi, Akikazu Tanimoto
  • Publication number: 20170363972
    Abstract: A liquid immersion exposure apparatus includes a projection system, a liquid supply inlet, a first liquid collection outlet, and a separator fluidically connected to the first liquid collection outlet, the separator separating one of liquid and gas, which have been collected via the first liquid collection outlet, from the other. A stage which holds a substrate has a second liquid collection outlet that collects a portion of the liquid supplied from the liquid supply inlet which comes from a gap between an upper surface of the substrate and an upper surface of the stage.
    Type: Application
    Filed: August 29, 2017
    Publication date: December 21, 2017
    Applicant: NIKON CORPORATION
    Inventors: Nobutaka MAGOME, Naoyuki KOBAYASHI
  • Patent number: 9760026
    Abstract: A liquid immersion exposure apparatus includes a projection system, a liquid supply inlet, a liquid collection outlet, a separator fluidically connected to the liquid collection outlet, the separator separating one of liquid and gas, which have been collected via the liquid collection outlet, from the other, a first flow-meter which measures an amount of the liquid collected via the liquid collection outlet, and a second flow-meter which measures an amount of liquid to be supplied via the liquid supply inlet.
    Type: Grant
    Filed: October 24, 2016
    Date of Patent: September 12, 2017
    Assignee: NIKON CORPORATION
    Inventors: Nobutaka Magome, Naoyuki Kobayashi
  • Publication number: 20170221712
    Abstract: The present invention provides an efficient heat treatment such as activation treatment of impurities on a substrate such as a thick silicon wafer with large heat capacity by laser annealing. Provided is a laser annealing apparatus 1 for heat-treating a surface of a substrate 30 comprising: a pulse oscillation laser source 10 which generates a pulse laser with gentle rise time and long pulse width; a continuous wave laser source 20 which generates a near-infrared laser for assisting annealing; optical systems 12, 22 which shape and guide beams 15, 25 of the two types of lasers respectively so as to irradiate the surface of the substrate 30 therewith; and a moving device 3 which moves the substrate 30 relatively to the laser beams 15, 25 to allow scanning of the combined irradiation of the two types of laser beams.
    Type: Application
    Filed: March 31, 2017
    Publication date: August 3, 2017
    Applicant: THE JAPAN STEEL WORKS, LTD.
    Inventors: Toshio KUDO, Naoyuki KOBAYASHI, Kazuya SANO, Toshiaki SEINO, Mitsuhiro TOYODA
  • Publication number: 20170038694
    Abstract: A liquid immersion exposure apparatus includes a projection system, a liquid supply inlet, a liquid collection outlet, a separator fluidically connected to the liquid collection outlet, the separator separating one of liquid and gas, which have been collected via the liquid collection outlet, from the other, a first flow-meter which measures an amount of the liquid collected via the liquid collection outlet, and a second flow-meter which measures an amount of liquid to be supplied via the liquid supply inlet.
    Type: Application
    Filed: October 24, 2016
    Publication date: February 9, 2017
    Applicant: NIKON CORPORATION
    Inventors: Nobutaka MAGOME, Naoyuki KOBAYASHI
  • Patent number: 9494871
    Abstract: A liquid immersion exposure apparatus includes a projection system, a liquid supply inlet, a liquid collection outlet, a separator fluidically connected to the liquid collection outlet, the separator separating one of liquid and gas, which have been collected via the liquid collection outlet from the other, and a flow-meter configured to measure an amount of the liquid collected via the liquid collection outlet.
    Type: Grant
    Filed: April 29, 2014
    Date of Patent: November 15, 2016
    Assignee: NIKON CORPORATION
    Inventors: Nobutaka Magome, Naoyuki Kobayashi
  • Publication number: 20160252828
    Abstract: An exposure apparatus exposes a substrate by irradiating exposure light on the substrate through liquid. The exposure apparatus has a substrate holder for holding the substrate, a substrate stage capable of moving the substrate held by the substrate holder, and a temperature adjusting system for adjusting the temperature of the substrate holder. The temperature of the substrate is controlled so that there is no difference in temperature between the substrate and the liquid, thereby preventing a reduction in exposure accuracy resulting from variation in temperature of the liquid.
    Type: Application
    Filed: April 8, 2016
    Publication date: September 1, 2016
    Applicant: NIKON CORPORATION
    Inventors: Naoyuki KOBAYASHI, Soichi OWA, Shigeru HIRUKAWA, Yasuhiro OMURA
  • Publication number: 20160216612
    Abstract: There is provided an exposure apparatus capable of forming a desirable device pattern by removing unnecessary liquid when performing exposure by projecting a pattern onto the substrate via a projection optical system and the liquid. The exposure device projects an image of the pattern onto the substrate via the projection optical system and the liquid so as to expose the substrate. The exposure device includes a liquid removing mechanism which removes the liquid remaining on a part arranged in the vicinity of the image plane of the projection optical system.
    Type: Application
    Filed: February 29, 2016
    Publication date: July 28, 2016
    Applicant: NIKON CORPORATION
    Inventors: Naoyuki KOBAYASHI, Akikazu TANIMOTO
  • Patent number: 9316921
    Abstract: An exposure apparatus exposes a substrate by irradiating exposure light on the substrate through liquid. The exposure apparatus has a substrate holder for holding the substrate, a substrate stage capable of moving the substrate held by the substrate holder, and a temperature adjusting system for adjusting the temperature of the substrate holder. The temperature of the substrate is controlled so that there is no difference in temperature between the substrate and the liquid, thereby preventing a reduction in exposure accuracy resulting from variation in temperature of the liquid.
    Type: Grant
    Filed: November 1, 2013
    Date of Patent: April 19, 2016
    Assignee: NIKON CORPORATION
    Inventors: Naoyuki Kobayashi, Soichi Owa, Shigeru Hirukawa, Yasuhiro Omura
  • Patent number: 9304392
    Abstract: A liquid immersion exposure apparatus comprising: a projection system, a stage system having a holder that holds a substrate, a supply port that is arranged such that an upper surface of the substrate faces the supply port, and a recovery port that is arranged to surround the supply port and collects an immersion liquid from the upper surface of the substrate such that only a portion of the upper surface of the substrate is covered with the immersion liquid. The apparatus also comprises an alignment system which detects an alignment mark of the substrate not through the immersion liquid. The substrate held on the holder is positioned based on a detection result of the alignment system to align the substrate with an exposure light projected through the immersion liquid by the projection system.
    Type: Grant
    Filed: May 21, 2014
    Date of Patent: April 5, 2016
    Assignee: NIKON CORPORATION
    Inventors: Naoyuki Kobayashi, Akikazu Tanimoto
  • Publication number: 20150332923
    Abstract: The present invention provides an efficient heat treatment such as activation treatment of impurities on a substrate such as a thick silicon wafer with large heat capacity by laser annealing. Provided is a laser annealing apparatus 1 for heat-treating a surface of a substrate 30 comprising: a pulse oscillation laser source 10 which generates a pulse laser with gentle rise time and long pulse width; a continuous wave laser source 20 which generates a near-infrared laser for assisting annealing; optical systems 12, 22 which shape and guide beams 15, 25 of the two types of lasers respectively so as to irradiate the surface of the substrate 30 therewith; and a moving device 3 which moves the substrate 30 relatively to the laser beams 15, 25 to allow scanning of the combined irradiation of the two types of laser beams.
    Type: Application
    Filed: May 29, 2015
    Publication date: November 19, 2015
    Applicant: THE JAPAN STEEL WORKS, LTD.
    Inventors: Toshio KUDO, Naoyuki KOBAYASHI, Kazuya SANO, Toshiaki SEINO, Mitsuhiro TOYODA
  • Patent number: 8963490
    Abstract: It is an object to provide a non-contact charging module that prevents the magnet from negatively influencing particularly the inside portion of a coil and improves power transmission efficiency, even when a magnet is used for alignment. This non-contact charging module is a reception-side non-contact charging module, to which power is transmitted from a transmission-side non-contact charging module which is equipped with magnet, by electromagnetic induction, in which the non-contact charging module includes a planar coil portion around which spiral electric lines are wound, and a magnetic sheet disposed to face the surface of coil of the planar coil portion so that it faces the magnet of the transmission-side contact module, in which the inner diameter of the planar coil portion is larger than the magnet.
    Type: Grant
    Filed: August 28, 2013
    Date of Patent: February 24, 2015
    Assignee: Panasonic Intellectual Property Management Co., Ltd.
    Inventors: Kenichiro Tabata, Tokuji Nishino, Akio Hidaka, Naoyuki Kobayashi
  • Publication number: 20140293249
    Abstract: There is provided an exposure apparatus capable of forming a desirable device pattern by removing unnecessary liquid when performing exposure by projecting a pattern onto the substrate via a projection optical system and the liquid. The exposure device projects an image of the pattern onto the substrate via the projection optical system and the liquid so as to expose the substrate. The exposure device includes a liquid removing mechanism which removes the liquid remaining on a part arranged in the vicinity of the image plane of the projection optical system.
    Type: Application
    Filed: May 21, 2014
    Publication date: October 2, 2014
    Applicant: NIKON CORPORATION
    Inventors: Naoyuki KOBAYASHI, Akikazu TANIMOTO