Abstract: The present invention provides an efficient heat treatment such as activation treatment of impurities on a substrate such as a thick silicon wafer with large heat capacity by laser annealing. Provided is a laser annealing apparatus 1 for heat-treating a surface of a substrate 30 comprising: a pulse oscillation laser source 10 which generates a pulse laser with gentle rise time and long pulse width; a continuous wave laser source 20 which generates a near-infrared laser for assisting annealing; optical systems 12, 22 which shape and guide beams 15, 25 of the two types of lasers respectively so as to irradiate the surface of the substrate 30 therewith; and a moving device 3 which moves the substrate 30 relatively to the laser beams 15, 25 to allow scanning of the combined irradiation of the two types of laser beams.

Abstract: A liquid immersion exposure apparatus includes a projection system, a liquid supply inlet, a liquid collection outlet, a separator fluidically connected to the liquid collection outlet, the separator separating one of liquid and gas, which have been collected via the liquid collection outlet, from the other, a first flow-meter which measures an amount of the liquid collected via the liquid collection outlet, and a second flow-meter which measures an amount of liquid to be supplied via the liquid supply inlet.

Abstract: A liquid immersion exposure apparatus includes a projection system, a liquid supply inlet, a liquid collection outlet, a separator fluidically connected to the liquid collection outlet, the separator separating one of liquid and gas, which have been collected via the liquid collection outlet from the other, and a flow-meter configured to measure an amount of the liquid collected via the liquid collection outlet.

Abstract: An exposure apparatus exposes a substrate by irradiating exposure light on the substrate through liquid. The exposure apparatus has a substrate holder for holding the substrate, a substrate stage capable of moving the substrate held by the substrate holder, and a temperature adjusting system for adjusting the temperature of the substrate holder. The temperature of the substrate is controlled so that there is no difference in temperature between the substrate and the liquid, thereby preventing a reduction in exposure accuracy resulting from variation in temperature of the liquid.

Abstract: There is provided an exposure apparatus capable of forming a desirable device pattern by removing unnecessary liquid when performing exposure by projecting a pattern onto the substrate via a projection optical system and the liquid. The exposure device projects an image of the pattern onto the substrate via the projection optical system and the liquid so as to expose the substrate. The exposure device includes a liquid removing mechanism which removes the liquid remaining on a part arranged in the vicinity of the image plane of the projection optical system.

Abstract: An exposure apparatus exposes a substrate by irradiating exposure light on the substrate through liquid. The exposure apparatus has a substrate holder for holding the substrate, a substrate stage capable of moving the substrate held by the substrate holder, and a temperature adjusting system for adjusting the temperature of the substrate holder. The temperature of the substrate is controlled so that there is no difference in temperature between the substrate and the liquid, thereby preventing a reduction in exposure accuracy resulting from variation in temperature of the liquid.

Abstract: A liquid immersion exposure apparatus comprising: a projection system, a stage system having a holder that holds a substrate, a supply port that is arranged such that an upper surface of the substrate faces the supply port, and a recovery port that is arranged to surround the supply port and collects an immersion liquid from the upper surface of the substrate such that only a portion of the upper surface of the substrate is covered with the immersion liquid. The apparatus also comprises an alignment system which detects an alignment mark of the substrate not through the immersion liquid. The substrate held on the holder is positioned based on a detection result of the alignment system to align the substrate with an exposure light projected through the immersion liquid by the projection system.

Abstract: The present invention provides an efficient heat treatment such as activation treatment of impurities on a substrate such as a thick silicon wafer with large heat capacity by laser annealing. Provided is a laser annealing apparatus 1 for heat-treating a surface of a substrate 30 comprising: a pulse oscillation laser source 10 which generates a pulse laser with gentle rise time and long pulse width; a continuous wave laser source 20 which generates a near-infrared laser for assisting annealing; optical systems 12, 22 which shape and guide beams 15, 25 of the two types of lasers respectively so as to irradiate the surface of the substrate 30 therewith; and a moving device 3 which moves the substrate 30 relatively to the laser beams 15, 25 to allow scanning of the combined irradiation of the two types of laser beams.

Abstract: It is an object to provide a non-contact charging module that prevents the magnet from negatively influencing particularly the inside portion of a coil and improves power transmission efficiency, even when a magnet is used for alignment. This non-contact charging module is a reception-side non-contact charging module, to which power is transmitted from a transmission-side non-contact charging module which is equipped with magnet, by electromagnetic induction, in which the non-contact charging module includes a planar coil portion around which spiral electric lines are wound, and a magnetic sheet disposed to face the surface of coil of the planar coil portion so that it faces the magnet of the transmission-side contact module, in which the inner diameter of the planar coil portion is larger than the magnet.

Abstract: There is provided an exposure apparatus capable of forming a desirable device pattern by removing unnecessary liquid when performing exposure by projecting a pattern onto the substrate via a projection optical system and the liquid. The exposure device projects an image of the pattern onto the substrate via the projection optical system and the liquid so as to expose the substrate. The exposure device includes a liquid removing mechanism which removes the liquid remaining on a part arranged in the vicinity of the image plane of the projection optical system.

Abstract: A liquid immersion exposure apparatus includes a projection system, a liquid supply inlet, a liquid collection outlet, a separator fluidically connected to the liquid collection outlet, the separator separating one of liquid and gas, which have been collected via the liquid collection outlet from the other, and a flow-meter configured to measure an amount of the liquid collected via the liquid collection outlet.

Abstract: It is an object of the present invention to provide a method of producing a foaming alcoholic beverage such as beer, low-malt beer, and a beer-flavored foaming alcoholic beverage obtained by producing, without using any kind of barley (e.g., barley, wheat, malt), a pre-fermentation liquid using at least a syrup containing sources of carbon, sources of nitrogen, hops and water as raw materials and fermenting the pre-fermentation liquid with use of brewers' yeasts, wherein germinated grains are used; to thereby increase fermentability and attain superior flavor and improved foam quality. It is also an object of the present invention to provide an alcoholic beverage manufactured by the aforementioned method.

Abstract: An exposure apparatus includes an optical element via which a patterned beam is projected onto a substrate through exposure liquid filled in a space between the optical element and the substrate. The apparatus also includes a member having a flow passage in which exposure liquid flows, the flow passage being in fluidic communication with the space. The apparatus also includes a cleaning system which cleans the member.

Abstract: A cleaning of a liquid immersion exposure apparatus is performed at a different time than an exposure operation. A stage is placed under a liquid supply inlet during a cleaning operation. The cleaning operation is performed at the different time than the exposure operation in which an immersion liquid is supplied onto a substrate held on a holder of the stage. The immersion liquid is supplied from a liquid supply inlet during the cleaning operation. The immersion liquid is supplied to a portion of the stage different from a portion at which the substrate is held by the holder of the stage.

Abstract: A liquid immersion exposure apparatus includes a movable member having a substrate holder and a surface disposed adjacent to the substrate holder, the surface capable of positioning under a projection optical system. A liquid immersion system has a supply path and a recovery path. The liquid immersion system supplies the liquid to a space between the projection optical system and the surface via the supply path and recovers the supplied liquid of a liquid immersion area formed under the projection optical system via the recovery path. A controller stops a supply of the liquid to the space under the projection optical system by the liquid immersion system on receipt of a signal indicating the occurrence of an abnormality. The abnormality causes a possibility of leakage due to at least a part of the supplied liquid not being recovered via the recovery path and outflowing from the liquid immersion area.

Abstract: A non-contact charging module with which reduction in thickness can be achieved while reliable insulation is maintained between conducting wire and magnetic sheet. This non-contact charging module comprises: a planar coil section (2) constituted by coiling a conducting wire; a conductive magnetic sheet (3) having the planar coil section (2) arranged thereon, with an insulating sheet (4) therebetween; and a recess (33) or slit (34) provided in the conductive magnetic sheet (3) and extending to an edge of the conductive magnetic sheet (3) from the starting point of the winding of the planar coil section (2). The conducting wire of the planar coil section (2) is stored in the recess (33) or slit (34) by the insulating sheet (4) being pushed into the recess (33) or slit (34). The conducting wire of the planar coil section (2) is insulated from the conductive magnetic sheet (3) by the insulating sheet (4).

Abstract: It is an object to provide a non-contact charging module that prevents the magnet from negatively influencing particularly the inside portion of a coil and improves power transmission efficiency, even when a magnet is used for alignment. This non-contact charging module is a reception-side non-contact charging module, to which power is transmitted from a transmission-side non-contact charging module which is equipped with magnet, by electromagnetic induction, in which the non-contact charging module includes a planar coil portion around which spiral electric lines are wound, and a magnetic sheet disposed to face the surface of coil of the planar coil portion so that it faces the magnet of the transmission-side contact module, in which the inner diameter of the planar coil portion is larger than the magnet.

Abstract: An exposure apparatus exposes a substrate by irradiating exposure light on the substrate through liquid. The exposure apparatus has a substrate holder for holding the substrate, a substrate stage capable of moving the substrate held by the substrate holder, and a temperature adjusting system for adjusting the temperature of the substrate holder. The temperature of the substrate is controlled so that there is no difference in temperature between the substrate and the liquid, thereby preventing a reduction in exposure accuracy resulting from variation in temperature of the liquid.

Abstract: An exposure apparatus exposes a substrate by irradiating exposure light on the substrate through liquid. The exposure apparatus has a substrate holder for holding the substrate, a substrate stage capable of moving the substrate held by the substrate holder, and a temperature adjusting system for adjusting the temperature of the substrate holder. The temperature of the substrate is controlled so that there is no difference in temperature between the substrate and the liquid, thereby preventing a reduction in exposure accuracy resulting from variation in temperature of the liquid.

Abstract: A non-contact charging module with which reduction in thickness can be achieved while reliable insulation is maintained between conducting wire and magnetic sheet. This non-contact charging module comprises: a planar coil section (2) constituted by coiling a conducting wire; a conductive magnetic sheet (3) having the planar coil section (2) arranged thereon, with an insulating sheet (4) therebetween; and a recess (33) or slit (34) provided in the conductive magnetic sheet (3) and extending to an edge of the conductive magnetic sheet (3) from the starting point of the winding of the planar coil section (2). The conducting wire of the planar coil section (2) is stored in the recess (33) or slit (34) by the insulating sheet (4) being pushed into the recess (33) or slit (34). The conducting wire of the planar coil section (2) is insulated from the conductive magnetic sheet (3) by the insulating sheet (4).