Abstract: There is provided an exposure apparatus capable of forming a desirable device pattern by removing unnecessary liquid when performing exposure by projecting a pattern onto the substrate via a projection optical system and the liquid. The exposure device projects an image of the pattern onto the substrate P via the projection optical system and the liquid so as to expose the substrate P. The exposure device includes a liquid removing mechanism 40 which removes the liquid remaining on a part 7 arranged in the vicinity of the image plane of the projection optical system.

Abstract: A phosphate coating apparatus for depositing a phosphate coating on a metal material by electrolyzing the metal material in a predetermined electrolysis solution includes a positive electrode and a negative electrode, of which one electrode being disposed in contact with the metal material and the other electrode being disposed away from the metal material with a predetermined distance, and the other electrode being formed into a tubular shape so as to cover the entire length of the metal material.

Abstract: A method of manufacturing a catalytic converter includes the steps of: a detecting step for detecting a pressing force at a time when a catalyst (11) is press-fitted into an outer cylindrical housing (13); a calculating step for calculating a diameter reduction, by which a clearance value between the outer cylindrical housing (13) and the catalyst (11) is set to a desired target value, based on the pressing force detected by the detecting step; and a swaging step for reducing a diameter of the outer cylindrical housing (13) based on the diameter reduction calculated by the calculating step.

Abstract: A method of production of a rubbery polymer by adding a coagulating agent to a polymer latex to make the rubbery polymer ingredient coagulate, the method of production of a rubbery polymer having a step of using a crusher pump to make the rubbery polymer ingredient coagulate to obtain a crumb slurry, using as the crusher pump a pump having a head of 10 m or more. According to this invention, in a method of production of a rubbery polymer by adding a coagulating agent to a polymer latex to make the rubbery polymer ingredient coagulate, an improvement of the operation efficiency and a reduction of the production process and production equipment are made possible and a reduction of the equipment costs and a reduction of the production costs can be achieved.

Abstract: An exposure apparatus performs exposure for a substrate by filling a space between a projection optical system and the substrate with a liquid and projecting an image of a pattern onto the substrate through the liquid by using the projection optical system. The exposure apparatus includes a substrate stage for holding the substrate, a liquid supply unit for supplying the liquid to a side of an image plane of the projection optical system, and a focus/leveling-detecting system for detecting surface information about a surface of the substrate not through the liquid. The exposure apparatus performs liquid immersion exposure for the substrate while adjusting a positional relationship between the surface of the substrate and the image plane formed through the projection optical system and the liquid, on the basis of the surface information detected by the focus/leveling-detecting system. The liquid immersion exposure can be performed at a satisfactory pattern transfer accuracy.

Abstract: A lens cleaning module is provided for a lithography system having an exposure apparatus including an objective lens. The system includes a scanning stage for supporting a wafer beneath the objective lens. A cleaning module coupling with the lithography system is provided for cleaning the objective lens in a non-manual cleaning process.

Abstract: In the case of forming a scribe line by irradiating a laser in an ultraviolet range in one stroke, the glass bending strength after glass is cut is about 50 MPa or less, and the glass is likely to be subjected to crack damage during use as liquid crystal panel glass or the like. In a glass cutting method in which a portion to be cut of glass 4 is irradiated with a pulse laser 2 in one stroke of relative movement to form a scribe line 7, and then the glass is cut by applying a break force to the scribe line 7, a pulse laser of an ultraviolet range is used as the pulse laser 2, and the pulse laser 2 is irradiated while the pulse laser 2 is being relatively moved so that the total number of pulses at each irradiation portion is in a range of 2,667 to 8,000 pulses, whereby the scribe line 7 is formed to a depth of 1.8 to 6.3% of the thickness of the glass 4.

Abstract: There is provided an exposure apparatus capable of forming a desirable device pattern by removing unnecessary liquid when performing exposure by projecting a pattern onto the substrate via a projection optical system and the liquid. The exposure device projects an image of the pattern onto the substrate P via the projection optical system and the liquid so as to expose the substrate P. The exposure device includes a liquid removing mechanism 40 which removes the liquid remaining on a part 7 arranged in the vicinity of the image plane of the projection optical system.

Abstract: An exposure apparatus performs exposure for a substrate by filling a space between a projection optical system and the substrate with a liquid and projecting an image of a pattern onto the substrate through the liquid by using the projection optical system. The exposure apparatus includes a substrate stage for holding the substrate, a liquid supply unit for supplying the liquid to a side of an image plane of the projection optical system, and a focus/leveling-detecting system for detecting surface information about a surface of the substrate not through the liquid. The exposure apparatus performs liquid immersion exposure for the substrate while adjusting a positional relationship between the surface of the substrate and the image plane formed through the projection optical system and the liquid, on the basis of the surface information detected by the focus/leveling-detecting system. The liquid immersion exposure can be performed at a satisfactory pattern transfer accuracy.

Abstract: An exposure apparatus includes a projection optical system for projecting a pattern on a reticle onto an object to be exposed. The apparatus also includes a reference mark that serves as a reference for an alignment between the reticle and the object. The apparatus also includes a first fluid that has a refractive index of 1 or greater, and fills a space between at least part of said projection optical system and the object and a space between at least part of said projection optical system and the reference mark. In addition, an alignment mechanism aligns the object by using said projection optical system and the first fluid.

Abstract: An exposure apparatus exposes a substrate P by locally filling a side of an image plane of a projection optical system PL with a liquid 50 and projecting an image of a pattern onto the substrate P through the liquid 50 and the projection optical system PL. The exposure apparatus includes a recovery unit 20 which recovers the liquid 50 outflowed to the outside of the substrate P. When the exposure process is performed in accordance with the liquid immersion method, the pattern can be transferred accurately while suppressing any environmental change even when the liquid outflows to the outside of the substrate.

Abstract: According to the present invention, a first laser beam 2 and a second laser beam 3 composed of an ultraviolet laser are irradiated from a side of a second glass member 5b, allowing the first laser beam 2 to pass through the second glass member 5b so as to condense the first laser beam 2 on the first glass member 5a to form a first scribe line 14, condensing the second laser beam 3 on the second glass member 5b to form a second scribe line 15, and applying a break force to the first scribe line 14 and the second scribe line 15 to cut the glass.

Abstract: An exposure apparatus performs exposure for a substrate by filling a space between a projection optical system and the substrate with a liquid and projecting an image of a pattern onto the substrate through the liquid by using the projection optical system. The exposure apparatus includes a substrate stage for holding the substrate, a liquid supply unit for supplying the liquid to a side of an image plane of the projection optical system, and a focus/leveling-detecting system for detecting surface information about a surface of the substrate not through the liquid. The exposure apparatus performs liquid immersion exposure for the substrate while adjusting a positional relationship between the surface of the substrate and the image plane formed through the projection optical system and the liquid, on the basis of the surface information detected by the focus/leveling-detecting system. The liquid immersion exposure can be performed at a satisfactory pattern transfer accuracy.

Abstract: An exposure apparatus exposes a substrate by projecting an image of a pattern on the substrate via a projection optical system and a liquid. The exposure device has a liquid supply mechanism which supplies the liquid between the projection optical system and the substrate. The liquid feeding mechanism stops the supply of the liquid when abnormality is detected. This suppresses influence to devices and members in the periphery of the substrate caused by leakage of the liquid forming a liquid immersion area, thereby realizing satisfactory exposure processing.

Abstract: An exposure apparatus (EX) exposes a substrate (P) by projecting an image of a pattern on the substrate (P) via a projection optical system (PL) and a liquid (1). The exposure device (EX) has a liquid supply mechanism (10) which supplies the liquid (1) between the projection optical system (PL) and the substrate (P). The liquid feeding mechanism (10) stops the supply of the liquid (1) when abnormality is detected. This suppresses influence to devices and members in the periphery of the substrate caused by leakage of the liquid forming a liquid immersion area, thereby realizing satisfactory exposure processing.

Abstract: There is provided an exposure apparatus capable of forming a desirable device pattern by removing unnecessary liquid when performing exposure by projecting a pattern onto the substrate via a projection optical system and the liquid. The exposure device projects an image of the pattern onto the substrate P via the projection optical system and the liquid so as to expose the substrate P. The exposure device includes a liquid removing mechanism 40 which removes the liquid remaining on a part 7 arranged in the vicinity of the image plane of the projection optical system.

Abstract: An exhaust manifold (4), which is joined to a catalyst container (3) for accommodating a catalyst (2) with a tilt angle, includes: a plurality of branch pipes (6a, 6b, 6c, 6d) communicating with corresponding discharge ports (E1, E2, E3, E4) of an engine; an exhaust collecting portion (7) where the plurality of branch pipes are collected; and a partition plate (8) dividing the interior of the exhaust collecting portion (7). The partition plate (8) is cut away to provide a cut (9) at an end surface portion (8A) located toward the catalyst (2).

Abstract: The exposure system of the present invention inhibits baseline shift by carrying out temperature control as required by each composite equipment. This exposure system has a first control system that that sets the temperature of a first liquid, and controls the temperature of an object by circulating the first liquid for which the temperature has been set through at least one object of a projection optics and a substrate stage, and a second control system that sets the temperature of a second liquid independent from the first control system, and controls the temperature of a reticle stage by circulating the second liquid for which the temperature has been set through the reticle stage. The first and second control systems have mutually different setting capacities with respect to the size of the temperature range when setting the temperatures of the liquids.

Abstract: A compound having 3-oxo-3, 4-dihydro-2H-1, 4-thiazine 4-tetrahydropyrazine as a main skeleton. The compound is a chymase inhibitor and is represented by the following formula [I] and salts thereof: In the formula [I], X is S; R1 and R2 are H, alkyl, cycloalkyl or aryl; R3 and R4 are H, alkyl, cycloalkyl, aryl or an aromatic heterocycle; R5 is H, alkyl, cycloalkyl, aryl or -A3-A4-R7; R6 is H, alkyl, cycloalkyl, hydroxy, alkoxy, aryl, aryloxy or an aromatic heterocycle; R7 is H, alkyl, hydroxy, alkoxy, aryl, aryloxy, amino, alkylamino, arylamino, an aromatic heterocycle or a nonaromatic heterocycle; A1 is alkylene; A2 is carbonyl or sulfonyl; A3 is alkylene; A4 is carbonyl or oxalyl; and n is 0 or 1.

Abstract: An exposure apparatus exposes a substrate P by locally filling a side of an image plane of a projection optical system PL with a liquid 50 and projecting an image of a pattern onto the substrate P through the liquid 50 and the projection optical system PL. The exposure apparatus includes a recovery unit 20 which recovers the liquid 50 outflowed to the outside of the substrate P. When the exposure process is performed in accordance with the liquid immersion method, the pattern can be transferred accurately while suppressing any environmental change even when the liquid outflows to the outside of the substrate.