Abstract: An exposure apparatus performs exposure for a substrate by filling a space between a projection optical system and the substrate with a liquid and projecting an image of a pattern onto the substrate through the liquid by using the projection optical system. The exposure apparatus includes a substrate stage for holding the substrate, a liquid supply unit for supplying the liquid to a side of an image plane of the projection optical system, and a focus/leveling-detecting system for detecting surface information about a surface of the substrate not through the liquid. The exposure apparatus performs liquid immersion exposure for the substrate while adjusting a positional relationship between the surface of the substrate and the image plane formed through the projection optical system and the liquid, on the basis of the surface information detected by the focus/leveling-detecting system. The liquid immersion exposure can be performed at a satisfactory pattern transfer accuracy.

Abstract: The exposure system of the present invention inhibits baseline shift by carrying out temperature control as required by each composite equipment. This exposure system has a first control system that that sets the temperature of a first liquid, and controls the temperature of an object by circulating the first liquid for which the temperature has been set through at least one object of a projection optics and a substrate stage, and a second control system that sets the temperature of a second liquid independent from the first control system, and controls the temperature of a reticle stage by circulating the second liquid for which the temperature has been set through the reticle stage. The first and second control systems have mutually different setting capacities with respect to the size of the temperature range when setting the temperatures of the liquids.

Abstract: A structure of an exhaust manifold branch collecting portion where a plurality of pipe members are joined integrally at their respective downstream ends, wherein a thickened portion is provided at the downstream end of at least one pipe member on a center side of the exhaust manifold branch collecting portion.

Abstract: A phosphate coating apparatus for depositing a phosphate coating on a metal material by electrolyzing the metal material in a predetermined electrolysis solution includes a positive electrode and a negative electrode, of which one electrode being disposed in contact with the metal material and the other electrode being disposed away from the metal material with a predetermined distance, and the other electrode being formed into a tubular shape so as to cover the entire length of the metal material.

Abstract: A compound having 3-oxo-3,4-dihydro-2H-1,4-thiazine 4-tetrahydropyrazine as a main skeleton.

Abstract: A compound which is a chymase inhibitor and which is represented by a formula [I] and salts thereof. In the formula [I], X is R6—(A2)n—N, R1 and R2 are H, alkyl, cycloalkyl or aryl, R3 and R4 are H, alkyl, cycloalkyl, aryl or aromatic heterocycle, R5 is H, alkyl, cycloalkyl, aryl or —A3—A4—R7, R6 is H, alkyl, cycloalkyl, OH, alkoxy, aryl, aryloxy or an aromatic heterocycle, R7 is H, alkyl, OH, alkoxy, aryl, aryloxy, amino, alkylamino, arylamino, an aromatic heterocycle or a nonaromatic heterocycle, A1 is alkylene, A2 is carbonyl or sulfonyl, A3 is alkylene, A4 is carbonyl or oxalyl and n is o or 1.

Abstract: A structure of an exhaust manifold branch collecting portion where a plurality of pipe members are joined integrally at their respective downstream ends, wherein a thickened portion is provided at the downstream end of at least one pipe member on a center side of the exhaust manifold branch collecting portion.

Abstract: Method and appartus suitable for forming promptly a phosphate film of excellent performance for cold drawing on the steel wires are disclosed. The steel wires are descaled by cathodic electrolysis in acid solution, and thereafter, phosphate film are formed by cathodic electrolysis on the steel wires. Contacting with the solution containing colloidal titanium are preferable to be carried out between cathodic descaling process and phosphate film forming process. Descaling of cathodic electrolysis may preferably be performed in acid solution at a temperature of lower than 90° C. and in 1˜100 A/dm2. Phosphate film forming may preferably be performed by using electrolyte containing Zn ion, phosphoric acid ion and nitric acid ion, at a temperature of lower than 90° C., in 1˜100 A/dm2 and for 1˜30 seconds.

Abstract: A phosphating solution that contains from 3 to 30 g/l of zinc ions, from 0.1 to 20 g/l of ferrous ions, from 5 to 60 g/l of phosphate ions, from 5 to 60 g/l of nitrate ions, and a source of hydroxylamine in a concentration corresponding stoichiometrically to from 0.5 to 4 g/l of hydroxylamine and in which there is a weight ratio of zinc to phosphate that is from 0.1:1 to 1:1 deposits on steel to be cold worked a phosphate conversion coating suitable as a lubricant carrier. This phosphating solution, which may optionally contain one or more of calcium, nickel, cobalt, and copper cations and simple and complex fluorine-containing anions, makes it possible to lower the temperature of the treatment solution, reduce the amount of sludge, improve the quality of the coating film, and allow single-liquid type replenishment to be used. Preferably the surface to be phosphated is immersed in the phosphating solution, maintained at a temperature of 35 to 80° C., for 2 to 20 minutes.

Abstract: An aqueous zinc phosphate conversion coating that contains 5 to 50 g/L of phosphate ions, 0.2 to 10 g/L of zinc ions, and 0.5 to 4.0 g/L as hydroxylamine of a hydroxylamine source, and also: (1) contains 0.01 to 5.0 g/L polycarboxylic acid or salt thereof and/or starch phosphate; or (2) has a zinc ions/phosphate ions weight ratio below 0.27 and a zinc ions concentration of at least 2.0 g/L forms high quality zinc phosphating coatings on metal surfaces even if the surfaces have not been previously conditioned by contact with a dispersion of colloidal titanium.

Abstract: In an exposure apparatus and method utilizing a projection system, a surface state relating to an exposure area of the projection system is determined by illuminating the exposure area with light, receiving light from the exposure area, designating positions of a plurality of detection points in the exposure area in accordance with a size of the exposure area, and detecting, based on information of received light corresponding to the plurality of detection points, positions related to the plurality of detection points.

Abstract: Disclosed is an exposure apparatus for transferring a pattern formed on a mask to a substrate. The apparatus comprises: a support mechanism having three support legs, the three support legs being adapted to support the support mechanism at three points relative to an installation surface for the exposure apparatus. An illumination optical system is provided on the support mechanism to illuminate the mask having the pattern formed thereon. In the apparatus, as viewed in a vertical direction relative to the installation surface, the three support legs constitute three vertexes of a triangle and the illumination optical system is substantially symmetrical with respect to a straight line drawn from one vertex of the triangle toward the middle point in one side of the triangle opposite the one vertex.

Abstract: An exposure apparatus includes an exposure system which transfers a pattern of a mask onto a substrate; a chamber in which the exposure system is housed; an air-conditioner which is associated with the chamber and which air-conditions the chamber; and a noise eliminating device which is arranged between the exposure system and the air-conditioner and which eliminates at least a portion of the noise components near a resonant frequency of the exposure system from noise that is generated in the air-conditioner.

Abstract: A lens distortion measurement system has a first grating of a first pitch on a transparent support such as a quartz reticle. The reticle is disposed between an illumination source and the lens system whose distortion is to be measured. An image sensor is provided within the image projection field of the lens system. A second grating of a second (different) pitch is provided on another transparent support, disposed between the lens system and the image sensor. Optionally, a relay lens is disposed between the second support and the image sensor. Illumination propagates from the illumination source through the first support, through the lens system, through the second support and is incident on the image sensor. The illumination forms a Moire fringe having a pitch orders of magnitude greater than the pitches of the first and second gratings.

Abstract: A local air duct directs a temperature-controlled stream of air across two perpendicular sets of interferometer beams which are used to measure the two dimension (X-Y) position of a precision stage in e.g. an optical lithography stepper or step and scan system, or in any other precision coordinate measuring machine. By thereby providing an additional single air flow which is azimuthally directed across both the X and Y direction interferometer beams, the precision of the interferometric measurement is maximized. In addition, a second flow of air is directed downwards from the local air duct, thus providing sufficient air circulation onto the stage when the stage is directly beneath the local duct, even though in that location the stage is otherwise blocked from receiving the main air flow through the chamber.

Abstract: In an apparatus and method for surface position detection, a position of a detection surface is determined by illuminating the detection surface with detection light, receiving detection light from the detection surface, designating different parts of the detection surface in accordance with a structure within an illuminated area on the detection surface, and detecting, based on information of the received light and information of the designated parts of the detection surface, positions corresponding to the designated parts of the detection surface.

Abstract: A lens distortion measurement system has a first grating of a first pitch on a transparent support such as a quartz reticle. The reticle is disposed between an illumination source and the lens system whose distortion is to be measured. An image sensor is provided within the image projection field of the lens system. A second grating of a second (different) pitch is provided on another transparent support, disposed between the lens system and the image sensor. Optionally, a relay lens is disposed between the second support and the image sensor. Illumination propagates from the illumination source through the first support, through the lens system, through the second support and is incident on the image sensor. The illumination forms a Moire fringe having a pitch orders of magnitude greater than the pitches of the first and second gratings.

Abstract: A surface position detection apparatus includes a projection optical system for projecting pattern light having a predetermined pattern on a detection surface from an oblique direction to the detection surface, an imaging optical system for forming an image of the pattern light reflected by the detection surface, a light-receiving-side light-shield arranged at a position substantially conjugate with the detection surface in the imaging optical system, and having an opening portion with a predetermined shape, a scanner for scanning the pattern image formed by the imaging optical system relative to the light-receiving-side light-shield, and a detection device for the pattern light into a plurality of portions, and selectively detecting at least one such portion of the pattern light.

Abstract: A thermoplastic elastomer composition comprising 90 to 10 wt. % of a nitrile rubber, which contains at least 30 wt. % of a gel component insoluble in methyl ethyl ketone, and to to 90 wt. % of a vinylidene fluoride resin.