Patents by Inventor Narendra Singh

Narendra Singh has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7453852
    Abstract: A mobile node includes a processor, a network interface, and a storage device having computer program code for execution by the processor. The computer program code includes a network layer for transmitting and receiving packets and an intermediate driver that transmits packets to the network layer and receives packets from the network layer using a virtual internet protocol (IP) address to identify the mobile node. The intermediate driver transmits packets to the network interface and receives packets from the network interface using a routable actual IP address to identify the mobile node. The intermediate driver permits the actual IP address to change when the mobile node moves from a first subnet to a second subnet without a corresponding change in the virtual IP address. A corresponding NAT associates the virtual IP address with a second actual IP address when the NAT is notified that the mobile node is in the second subnet.
    Type: Grant
    Filed: July 14, 2003
    Date of Patent: November 18, 2008
    Assignee: Lucent Technologies Inc.
    Inventors: Milind M. Buddhikot, Adiseshu Hari, Scott C. Miller, Kundan Narendra Singh
  • Publication number: 20080251864
    Abstract: A method for implementing a stacked gate, comprising forming a gate dielectric on a semiconductor body, forming a first layer of gate electrode material on the gate dielectric, forming a second layer of gate electrode material on the first layer of gate electrode material, wherein the grain size distribution of the first layer of gate electrode material is different than the grain size distribution of the second layer of gate electrode material, implanting the first and second gate electrode materials, patterning the first and the second gate electrodes and the gate dielectric, and forming source and drain regions.
    Type: Application
    Filed: April 11, 2007
    Publication date: October 16, 2008
    Inventors: Yuanning Chen, Stephanie W. Butler, Ajith Varghese, Narendra Singh Mehta
  • Publication number: 20080217703
    Abstract: A method for manufacturing an isolation structure is disclosed that protects the isolation structure during etching of a dichlorosilane (DCS) nitride layer. The method involves the formation of a bis-(t-butylamino)silane-based nitride liner layer within the isolation trench, which exhibits a five-fold greater resistance to nitride etching solutions as compared with DCS nitride, thereby allowing protection against damage from unintended over-etching. The bis-(t-butylamino)silane-based nitride layer also exerts a greater tensile strain on moat regions that results in heightened carrier mobility of active regions, thereby increasing the performance of NMOS transistors embedded therein.
    Type: Application
    Filed: December 27, 2007
    Publication date: September 11, 2008
    Inventors: Narendra Singh Mehta, Wayne Anthony Bather, Ajith Varghese
  • Patent number: 7396728
    Abstract: A method forms a semiconductor device comprising isolation structures that selectively induce strain into active regions of NMOS and PMOS devices. Form a hard mask layer over a semiconductor body. A resist layer is formed on the hard mask layer that exposes and defines isolation regions. The hard mask layer is patterned and trench regions are formed using the hard mask layer as a mask. An oxide trench liner that induces compressive strain into active regions of the PMOS region is formed within trench regions of the PMOS region. A nitride trench liner that induces tensile strain into active regions of the NMOS region is formed within the NMOS trench regions.
    Type: Grant
    Filed: June 29, 2005
    Date of Patent: July 8, 2008
    Assignee: Texas Instruments Incorporated
    Inventors: Ajith Varghese, Narendra Singh Mehta, Jonathan McAulay Holt
  • Patent number: 7384861
    Abstract: A method forms a semiconductor device comprising a modifiable strain inducing layer. A semiconductor body is provided. First and second regions of the semiconductor body are identified. A modifiable tensile strain inducing layer is formed over the device within the first and second regions. A mask is then formed that exposes the second region and covers the first region. A material is selected for a modification implant and the selected material is implanted into the second region thereby converting a portion of the modifiable tensile strain inducing layer into a compressive strain inducing layer within the PMOS region.
    Type: Grant
    Filed: July 18, 2005
    Date of Patent: June 10, 2008
    Assignee: Texas Instruments Incorporated
    Inventors: Narendra Singh Mehta, Wayne Anthony Bather, Ajith Varghese
  • Publication number: 20080103192
    Abstract: Compounds having an artemisinin-related endoperoxide moiety covalently coupled to a hydrazone moiety through a linker. Compositions and methods for treating cancer using the compounds.
    Type: Application
    Filed: October 15, 2007
    Publication date: May 1, 2008
    Applicant: Washington, University of
    Inventors: Tomikazu Sasaki, Henry Lai, Narendra Singh
  • Patent number: 7163964
    Abstract: This invention presents an ion exchange media including a plurality of cation exchange zones and anion exchange zones in flow paths that are contained in a substantially nonporous resin transport framework. During electrodeionization and other potential applications the ion exchange media of the invention prevents unfavorable water splitting at resin-membrane interfaces and encourages water splitting at resin—resin interfaces where the water splitting may be constructively used to regenerate the resin.
    Type: Grant
    Filed: October 16, 2003
    Date of Patent: January 16, 2007
    Assignee: Aquatech International Corporation
    Inventors: Ravi Chidambaran, Pavan Raina, Devesh Sharma, Narendra Singh Bisht
  • Publication number: 20040168968
    Abstract: This invention presents an ion exchange media including a plurality of cation exchange zones and anion exchange zones in flow paths that are contained in a substantially nonporous resin transport framework. During electrodeionization and other potential applications the ion exchange media of the invention prevents unfavorable water splitting at resin-membrane interfaces and encourages water splitting at resin-resin interfaces where the water splitting may be constructively used to regenerate the resin.
    Type: Application
    Filed: October 16, 2003
    Publication date: September 2, 2004
    Inventors: Ravi Chidambaran, Pavan Raina, Devesh Sharma, Narendra Singh Bisht
  • Publication number: 20030099729
    Abstract: The present invention provides new uses of Gugulipid, an ethyl acetate extract of the resin of the plant Comiphora wighitii, for controlling or preventing cognitive dysfunction, hyperglycemia and some infective conditions of the skin and a method of preparing Gugulipid by agitating the resin in shake flask assembly or sonicating assembly and preparing a solid or a creamy dosage forms.
    Type: Application
    Filed: December 20, 2002
    Publication date: May 29, 2003
    Inventors: Ram Pratap, Raghwendra Pal, Satyawan Singh, Girja Shankar, Chandeshwar Nath, Hemant Kumar Singh, Depak Raina, Arwind Kumar Srivastava, Anil Kumar Rastogi, Puvvada Sri Ramachandra Murthy, Sudhir Srivastava, Onkar Prasad Asthana, Narendra Singh, Nitya Nand
  • Publication number: 20020119206
    Abstract: The present invention provides new uses of Gugulipid, an ethyl acetate extract of the resin of the plant Comiphora wighitii, for controlling or preventing cognitive dysfunction, hyperglycemia and some infective conditions of the skin and a method of preparing Gugulipid by agitating the resin in shake flask assembly or sonicating assembly and preparing a solid or a creamy dosage forms.
    Type: Application
    Filed: December 22, 2000
    Publication date: August 29, 2002
    Inventors: Ram Pratap, Raghwendra Pal, Satyawan Singh, Girja Shankar, Chandeshwar Nath, Hemant Kumar Singh, Depak Raina, Arwind Kumar Srivastava, Anil Kumar Rastogi, Puvvada Ramachandra Murthy, Sudhir Srivastava, Onkar Prasad Asthana, Narendra Singh, Nitya Nand