Patents by Inventor Naresh Kumar

Naresh Kumar has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20200259792
    Abstract: Cloud-based Intrusion Prevention Systems (IPS) include receiving traffic associated with a user of a plurality of users, wherein each user is associated with a customer of a plurality of customers for a cloud-based security system, and wherein the traffic is between the user and the Internet; analyzing the traffic based on a set of signatures including stream-based signatures and security patterns; blocking the traffic responsive to a match of a signature of the set of signatures; and performing one or more of providing an alert based on the blocking and updating a log based on the blocking.
    Type: Application
    Filed: April 27, 2020
    Publication date: August 13, 2020
    Inventors: Srikanth Devarajan, Sushil Pangeni, Vladimir Stepanenko, Ravinder Verma, Naresh kumar Povlavaram Munirathnam
  • Publication number: 20200250163
    Abstract: Index sharding in a low-latency database analysis system includes obtaining index configuration data for indexing constituent data, the constituent data including a plurality of logical tables, and indexing, by an indexing unit, the constituent data by partitioning the constituent data based on a characteristic of the constituent data into at least a first partition and a second partition, segmenting the first partition into a first segment of the first partition, sharding the first segment into a first shard of the first segment of the first partition, segmenting, using hash-partitioning, the second partition into one or more segments of the second partition, and for each segment of the second partition, sharding the segment into one or more respective shards.
    Type: Application
    Filed: August 30, 2019
    Publication date: August 6, 2020
    Inventors: Peter Kuimelis, Naresh Kumar, Satyam Shekhar, Amit Prakash, Abhishek Rai
  • Patent number: 10711158
    Abstract: The present invention provides aqueous chemical mechanical planarization polishing (CMP polishing) compositions, such as for semiconductor substrates, comprising an abrasive of one or more dispersions of elongated, bent or nodular colloidal silica particles which contain a cationic nitrogen atom, and one or more amine carboxylic acids having an isoelectric point (pI) below 5, preferably, acidic amine carboxylic acids or pyridine acids, wherein the compositions have a pH of from 2 to 5. The compositions enable polishing at a high oxide:nitride removal rate ratio.
    Type: Grant
    Filed: September 28, 2017
    Date of Patent: July 14, 2020
    Assignee: Rohm and Haas Electronic Materials CMP Holdings, Inc.
    Inventors: Naresh Kumar Penta, Zifeng Li
  • Publication number: 20200210323
    Abstract: Systems, methods, and computer program products for testing new software are provided. Multiple payloads that correspond to scenarios in a production computing environment are identified. From the multiple payloads unique payloads are identified. User data that corresponds to the unique payloads is created. A first testing environment conducts a test using software components in the production environment, the unique payloads, and the user data to generate expected results. A second testing environment conducts a test using new software that replaces at least one of the software components in the production environment, the unique payloads, and the user data, to generate actual results. The one or more attributes in the expected results are compared to the one or more attributes in the actual results to determine if the new software causes an error.
    Type: Application
    Filed: December 31, 2018
    Publication date: July 2, 2020
    Inventors: Prasanth Kuricheti, Jogendar Singh, Rajesh Kumar, Xinran Fang, Naresh Kumar Paturi, Durjay Kumar Mishra, Anil Kumar Kandru, Venkata Siva Sai Manepalli
  • Patent number: 10686904
    Abstract: An alert notification is received and evaluated by a processor. An identifier of a subscriber who is registered to receive the first alert notification is identified. The subscriber identifier is used to select assessment rules corresponding to the first alert notification. The assessment rules are applied to the alert notification to determine whether the receipt of the alert notification satisfies a condition for taking one or more actions. If the condition is met, one or more commands are issued to effectuate the one or more actions.
    Type: Grant
    Filed: October 18, 2017
    Date of Patent: June 16, 2020
    Assignee: Time Warner Cable Enterprises LLC
    Inventor: Naresh Kumar
  • Patent number: 10662841
    Abstract: Embodiments of emission reduction system including various embodiments of an emission filters for a power plant including a gas turbine are disclosed. The system includes: an emission filter; and a retraction system operably coupled to an exhaust passage of the gas turbine. The exhaust passage defines an exhaust path of exhaust from the gas turbine. The retraction system selectively moves the emission filter between a first location within the exhaust path and a second location out of the exhaust path. In a combined cycle power plant, the first location is upstream of a heat recovery steam generator (HRSG). The systems and filters described allow for temporary positioning of emission filter(s) just downstream of a gas turbine exhaust outlet, or upstream of an HRSG, where provided, for emission reduction at low loads or startup conditions, and removal of the emission filter(s) once operations move to higher loads.
    Type: Grant
    Filed: February 21, 2017
    Date of Patent: May 26, 2020
    Assignee: General Electric Company
    Inventors: Parag Prakash Kulkarni, Naresh Kumar Amineni, Lewis Berkley Davis, Jr., Gordon Raymond Smith
  • Patent number: 10655518
    Abstract: Embodiments of emission reduction system including various embodiments of an emission filters for a power plant including a gas turbine are disclosed. The system includes: an emission filter; and a retraction system operably coupled to an exhaust passage of the gas turbine. The exhaust passage defines an exhaust path of exhaust from the gas turbine. The retraction system selectively moves the emission filter between a first location within the exhaust path and a second location out of the exhaust path. In a combined cycle power plant, the first location is upstream of a heat recovery steam generator (HRSG). The systems and filters described allow for temporary positioning of emission filter(s) just downstream of a gas turbine exhaust outlet, or upstream of an HRSG, where provided, for emission reduction at low loads or startup conditions, and removal of the emission filter(s) once operations move to higher loads.
    Type: Grant
    Filed: February 21, 2017
    Date of Patent: May 19, 2020
    Assignee: General Electric Company
    Inventors: Parag Prakash Kulkarni, Naresh Kumar Amineni, Lewis Berkley Davis, Jr., Gordon Raymond Smith
  • Publication number: 20200151154
    Abstract: A method and system may be implemented for automatically analyzing data in a database. A method for use in a low-latency database analysis system may include generating a schema. The schema may be based on a portion of an external database. The method may include storing the schema in an in-memory database. The method may include receiving a data-query. The method may include generating a resolved-request. The resolved-request may be based on the data-query and the stored schema. The stored schema may be used for executing the query on the external database. The method may include receiving results data responsive to the data-query from the external database. The method may include outputting the results data for display on a user interface.
    Type: Application
    Filed: November 12, 2019
    Publication date: May 14, 2020
    Inventors: Sandeep Kumar, Siva Singaram, Rakesh Kothari, Naresh Kumar, Jasmeet Singh Jaggi, Manikanta Balakavi, Tushar Mahale, Rahul Paliwal
  • Publication number: 20200151166
    Abstract: Improved systems and methods for database analysis are described herein. A method includes generating a graph-based ontological data structure including nodes connected by edges in a low-latency database analysis system, wherein each node represents a respective analytical-object in the low-latency database analysis system, maintaining versions for each of the nodes in the graph-based ontological data structure, maintaining versions for each of the edges in the graph-based ontological data structure, maintaining a transaction log for each transaction with respect to the graph-based ontological data structure, reverting to an earlier version of at least a portion of the graph-based ontological data structure using the transaction log, versioned nodes, and versioned edges in response to an event, and outputting a version of the graph-based ontological data structure in a defined form for presentation to a user or for use by a client.
    Type: Application
    Filed: November 13, 2019
    Publication date: May 14, 2020
    Inventors: Satyam Shekhar, Naresh Kumar, Nitish Rajguru, Mayank Raj, Priyendra Singh Deshwal
  • Patent number: 10626298
    Abstract: Chemical mechanical polishing compositions contain polyethoxylated amines, phosphoric acid or salts thereof, and positively charged nitrogen containing colloidal silica abrasive particles. The chemical mechanical polishing compositions are used in polishing methods for suppressing the removal rate of amorphous silicon while maintaining tunable oxide to silicon nitride removal rate ratios. The chemical mechanical polishing compositions can be used in front-end-of line semiconductor processing.
    Type: Grant
    Filed: March 20, 2019
    Date of Patent: April 21, 2020
    Assignee: Rohm and Haas Electronic Materials CMP Holdings, Inc.
    Inventors: Naresh Kumar Penta, Kwadwo E. Tettey, Matthew Van Hanehem
  • Patent number: 10611865
    Abstract: The present invention provides a solid organomagnesium precursor having formula {Mg(OR?)X}.a{MgX2}.b{Mg(OR?)2}.c{R?OH}, wherein R? is selected from a hydrocarbon group, X is selected from a halide group, and a:b:c is in range of 0.01-0.5:0.01-0.5:0.01-5 and process for preparing the same, said process comprising contacting a magnesium source with a solvating agent, an organohalide and an alcohol to obtain the solid organomagnesium precursor. The present invention also provides a process for preparing a catalyst system using the organomagnesium precursor and its use thereof for polymerization of olefins.
    Type: Grant
    Filed: August 20, 2018
    Date of Patent: April 7, 2020
    Assignee: INDIAN OIL CORPORATION LIMITED
    Inventors: Sukhdeep Kaur, Gurmeet Singh, Bhasker Bantu, Naresh Kumar, Gurpreet Singh Kapur, Shashi Kant, Biswajit Basu, Ravinder Kumar Malhotra
  • Publication number: 20200102475
    Abstract: A chemical mechanical polishing composition for polishing silicon dioxide over silicon nitride includes certain acidic heterocyclic nitrogen compounds having a pK value of 5 of less. Also, methods for polishing a substrate to remove some of the silicon dioxide and silicon nitride are disclosed.
    Type: Application
    Filed: September 28, 2018
    Publication date: April 2, 2020
    Inventors: Penta Naresh Kumar, Robert L. Auger
  • Publication number: 20200104152
    Abstract: In one aspect, a computerized method includes the step of providing a first virtual machine on first server. The method includes the step of, with the first virtual machine, communicating a network traffic to a second virtual machine on a second server using a virtual network identified with a virtual local area network (VLAN). The method includes the step of, with a virtual function (VF) on a physical network interface controller (pNIC) of the second server, assigning to the VLAN to a specified VF. The method includes the step of, sending a data packet is sent out of the pNIC towards a TOR switch, wherein the TOR switch has the VLAN enabled and other user specific policies configured. The method includes the step of, sending the data packet to a second TOR switch. The method includes the step of, with the second TOR switch, sending the data packet towards the pNIC on the second server based on a destination the second virtual machine's MAC address.
    Type: Application
    Filed: March 18, 2019
    Publication date: April 2, 2020
    Inventors: SRINIVAS VEGESNA, JAYAPRAKASH KUMAR, PRAMOD VENKATESH, NARESH KUMAR THUKKANI
  • Publication number: 20200102478
    Abstract: A chemical mechanical polishing composition for polishing silicon dioxide over silicon nitride includes certain acidic heterocyclic nitrogen compounds having a pK value of 5 of less. Also, methods for polishing a substrate to remove some of the silicon dioxide and silicon nitride are disclosed.
    Type: Application
    Filed: September 25, 2019
    Publication date: April 2, 2020
    Inventors: Naresh Kumar Penta, Robert L. Auger
  • Patent number: 10594871
    Abstract: A broadband provisioning system configured for bulk provisioning of communications services is provided. The system includes an order manager that includes machine executable instructions stored on machine readable media, the instructions for: receiving a request to provision a plurality of telephone numbers with communications services; creating details for the request and setting an initial state for the request; and upon commencement of processing of the request, updating the state of the request to indicate ongoing processing, provisioning each telephone number in the request by associating resources therewith, and updating a status for each telephone number provisioned; and upon completion of processing, changing the state of the request to indicate completion.
    Type: Grant
    Filed: April 25, 2017
    Date of Patent: March 17, 2020
    Assignee: Time Warner Cable Enterprises LLC
    Inventors: Prasanna Nagaraj, Naresh Kumar, Srinivas Guduru
  • Patent number: 10584265
    Abstract: The present invention provides aqueous chemical mechanical planarization polishing (CMP polishing) compositions comprising one or more dispersions of aqueous colloidal silica particles, preferably, spherical colloidal silica particles, one or more amine carboxylic acids having an isolectric point (pI) below 5, preferably, an acidic amino acid or a pyridine acid, and one or more ethoxylated anionic surfactants having a C6 to C10 alkyl, aryl or alkylaryl hydrophobic group, wherein the compositions have a pH of from 3 to 5. The compositions enable good silicon nitride removal and selectivity of nitride to oxide removal in polishing.
    Type: Grant
    Filed: September 28, 2017
    Date of Patent: March 10, 2020
    Assignee: Rohm and Haas Electronic Materials CMP Holdings, Inc.
    Inventors: Naresh Kumar Penta, Yi Guo, David Mosley, Matthew Van Hanehem, Kwadwo E. Tettey
  • Publication number: 20200033039
    Abstract: A refrigeration system includes an evaporator within which a refrigerant absorbs heat, a gas cooler/condenser within which the refrigerant rejects heat, a compressor operable to circulate the refrigerant between the evaporator and the gas cooler/condenser, a high pressure valve operable to control a pressure of the refrigerant at an outlet of the gas cooler/condenser, and a controller. The controller is configured to automatically generate a setpoint for a measured or calculated variable of the refrigeration system based on a measured temperature of the refrigerant at the outlet of the gas cooler/condenser. The setpoint is generated using a stored relationship between the measured temperature and a maximum estimated coefficient of performance (COP) that can be achieved at the measured temperature. The controller is configured to operate the high pressure valve to drive the measured or calculated variable toward the setpoint.
    Type: Application
    Filed: July 16, 2019
    Publication date: January 30, 2020
    Applicant: Hill Phoenix, Inc.
    Inventors: Naresh Kumar Krishnamoorthy, Nassim Khaled
  • Patent number: 10516579
    Abstract: Techniques are disclosed herein for reconciling planned data for a network (such as a fiber optic network) with data describing the deployed network. Network probing and planning components obtain a snapshot of the deployed network and organize the snapshot into three “layers”: the “link layer,” which represents the physical links that underlie the network, the “digital layer,” which includes optical channel groups that divide the total capacity of the physical links, and the “service layer,” which includes the services delivered over the network. The techniques involve comparing the planned data to the deployed data in the order of link layer, digital layer, and service layer. Differences considered to be “minor” are reconciled automatically. Differences that are “major” are reconciled after receiving instructions from a planner or administrator regarding whether to update the planned data based on what was originally in the planned data or what is in the deployed network.
    Type: Grant
    Filed: December 14, 2016
    Date of Patent: December 24, 2019
    Assignee: Infinera Corporation
    Inventors: Jayaram Hanumanthappa, Naresh Kumar, Naresh Srinivasulu Jayam, Arijit Mandal, Gounda Mohammed Nabi Saheb, Alok Jain, Steven Joseph Hand
  • Patent number: 10508221
    Abstract: The present invention provides aqueous chemical mechanical planarization (CMP) polishing compositions comprising one or more dispersions of colloidal silica particles having a zeta potential of from +5 to +50 mV and having one or more aminosilane group, preferably, elongated, bent or nodular colloidal silica particles, or, more preferably, such particles which contain a cationic nitrogen atom, and at least one amine heterocycle carboxylic acid having an isolectric point (pI) of from 2.5 to 5, preferably, from 3 to 4. The compositions have a pH of from 2.5 to 5.3. Preferably, the amine heterocycle carboxylic acid is an amine-containing heterocyclic monocarboxylic acid, such as nicotinic acid, picolinic acid, or isonicotinic acid. The compositions enable enhanced oxide:nitride removal rate ratios.
    Type: Grant
    Filed: September 28, 2017
    Date of Patent: December 17, 2019
    Assignee: Rohm and Haas Electronic Materials CMP Holdings, Inc.
    Inventors: Yi Guo, David Mosley, Naresh Kumar Penta
  • Patent number: 10397591
    Abstract: A control processor for a video encode-decode engine is provided that includes an instruction pipeline. The instruction pipeline includes an instruction fetch stage coupled to an instruction memory to fetch instructions, an instruction decoding stage coupled to the instruction fetch stage to receive the fetched instructions, and an execution stage coupled to the instruction decoding stage to receive and execute decoded instructions. The instruction decoding stage and the instruction execution stage are configured to decode and execute a set of instructions in an instruction set of the control processor that are designed specifically for accelerating video sequence encoding and encoded video bit stream decoding.
    Type: Grant
    Filed: April 11, 2015
    Date of Patent: August 27, 2019
    Assignee: TEXAS INSTRUMENTS INCORPORATED
    Inventors: Dipan Kumar Mandal, Mihir Narendra Mody, Mahesh Madhukar Mehendale, Chaitanya Satish Ghone, Piyali Goswami, Naresh Kumar Yadav, Hetul Sanghvi, Niraj Nandan