Abstract: An acid chemical mechanical polishing composition polishes silicon nitride over silicon dioxide and simultaneously inhibits damage to the silicon dioxide. The acid chemical mechanical polishing composition includes polyvinylpyrrolidone polymers, anionic functional colloidal silica abrasive particles and an amine carboxylic acid. The pH of the acid chemical mechanical polishing composition is 5 or less.

Abstract: The present invention provides aqueous chemical mechanical planarization (CMP) polishing compositions that comprise a mixture of (a) one or more alkoxylated diamines having a number average molecular weight (Mn) of from 1,000 to 20,000, or, preferably, from 1000-15000 and having four (poly)alkoxy ether groups each containing from 5 to 100 alkoxy repeat units; (b) from 0.01 to 2 wt. % or, preferably, from 0.1 to 1.5 wt. %, as solids, based on the total weight of the compositions, of one or more aqueous dispersions of elongated, bent or nodular colloidal silica particles, preferably, having a secondary particle size as determined by dynamic light scattering (DLS) of from 20 to 60 nm; and (c) ammonia or an amine base, wherein the compositions have a pH ranging from 9 to 11. The compositions are substantially free of metals, such as alkali or alkaline earth metals that can damage substrates in polishing.

Abstract: The current invention discloses a method for managing a multi-tenant server enclosure comprising a plurality of resources including a plurality of compute servers, storage modules, and network interfaces. The method comprises defining a first virtual enclosure template for provisioning a virtual enclosure for a tenant, the virtual enclosure includes a plurality of resources comprising one or more compute servers, one or more storage modules and one or more network interfaces from the plurality of compute servers, storage modules and network interfaces; and creating a first virtual enclosure dedicated to a first tenant and a second virtual enclosure dedicated to a second tenant based on the virtual enclosure template, wherein a plurality of resources of the first virtual enclosure are physically distinct from a plurality of resources of the second virtual enclosure.

Abstract: Acid chemical mechanical polishing compositions and methods have enhanced defect inhibition and selectively polish silicon nitride over silicon dioxide in an acid environment. The acid chemical mechanic polishing compositions include poly(2-ethyl-2-oxazoline) polymers, anionic functional colloidal silica particles, amine carboxylic acids and have a pH of 5 or less.

Abstract: The present disclosure relates to a system for performing static timing analysis in an electronic design. Embodiments may include providing, using at least one processor, an electronic design and extracting hierarchical crossing path exception information from a hierarchical design view associated with the electronic design. Embodiments may further include transferring the hierarchical crossing path exception information to a block view associated with the electronic design and extracting a timing model based upon, at least in part, the hierarchical crossing path exception information. Embodiments may also include implementing the timing model at a top-level view associated with the electronic design.

Abstract: A static timing analysis system for finding timing violations in a digital circuit design prior to circuit fabrication, and associated methods, use infinite-depth path-based analysis (IPBA) to achieve reduced pessimism as opposed to systems or methods employing only graph-based analysis (GBA), but with greatly reduced compute time requirements, or greater logic path coverage, versus systems or methods employing conventional or exhaustive path-based analysis. IPBA achieves the improved coverage or compute time results by slotting nodes of a circuit design graph into stages, propagating phases stage-by-stage for all paths in parallel, and merging phases wherever possible during the analysis.

Abstract: A method for machine learning based prediction of at least one subsequent UI layout is provided. The method may include detecting, by the electronic device, a first transition event. Further, the method may include identifying, by the electronic device, a UI layout associated with a first application of the electronic device. Further, the method may include predicting, by the electronic device, the at least one subsequent UI layout to be displayed based on at least one transition parameter, wherein the at least one subsequent UI layout is associated with at least one of the first application or at least one second application. Further, the method may include loading, by the electronic device, the at least one subsequent UI layout in a memory of the electronic device.

Abstract: Cloud-based Intrusion Prevention Systems (IPS) include receiving traffic associated with a user of a plurality of users, wherein each user is associated with a customer of a plurality of customers for a cloud-based security system, and wherein the traffic is between the user and the Internet; analyzing the traffic based on a set of signatures including stream-based signatures and security patterns; blocking the traffic responsive to a match of a signature of the set of signatures; and performing one or more of providing an alert based on the blocking and updating a log based on the blocking.

Abstract: Index sharding in a low-latency database analysis system includes obtaining index configuration data for indexing constituent data, the constituent data including a plurality of logical tables, and indexing, by an indexing unit, the constituent data by partitioning the constituent data based on a characteristic of the constituent data into at least a first partition and a second partition, segmenting the first partition into a first segment of the first partition, sharding the first segment into a first shard of the first segment of the first partition, segmenting, using hash-partitioning, the second partition into one or more segments of the second partition, and for each segment of the second partition, sharding the segment into one or more respective shards.

Abstract: The present invention provides aqueous chemical mechanical planarization polishing (CMP polishing) compositions, such as for semiconductor substrates, comprising an abrasive of one or more dispersions of elongated, bent or nodular colloidal silica particles which contain a cationic nitrogen atom, and one or more amine carboxylic acids having an isoelectric point (pI) below 5, preferably, acidic amine carboxylic acids or pyridine acids, wherein the compositions have a pH of from 2 to 5. The compositions enable polishing at a high oxide:nitride removal rate ratio.

Abstract: Systems, methods, and computer program products for testing new software are provided. Multiple payloads that correspond to scenarios in a production computing environment are identified. From the multiple payloads unique payloads are identified. User data that corresponds to the unique payloads is created. A first testing environment conducts a test using software components in the production environment, the unique payloads, and the user data to generate expected results. A second testing environment conducts a test using new software that replaces at least one of the software components in the production environment, the unique payloads, and the user data, to generate actual results. The one or more attributes in the expected results are compared to the one or more attributes in the actual results to determine if the new software causes an error.

Abstract: An alert notification is received and evaluated by a processor. An identifier of a subscriber who is registered to receive the first alert notification is identified. The subscriber identifier is used to select assessment rules corresponding to the first alert notification. The assessment rules are applied to the alert notification to determine whether the receipt of the alert notification satisfies a condition for taking one or more actions. If the condition is met, one or more commands are issued to effectuate the one or more actions.

Abstract: Embodiments of emission reduction system including various embodiments of an emission filters for a power plant including a gas turbine are disclosed. The system includes: an emission filter; and a retraction system operably coupled to an exhaust passage of the gas turbine. The exhaust passage defines an exhaust path of exhaust from the gas turbine. The retraction system selectively moves the emission filter between a first location within the exhaust path and a second location out of the exhaust path. In a combined cycle power plant, the first location is upstream of a heat recovery steam generator (HRSG). The systems and filters described allow for temporary positioning of emission filter(s) just downstream of a gas turbine exhaust outlet, or upstream of an HRSG, where provided, for emission reduction at low loads or startup conditions, and removal of the emission filter(s) once operations move to higher loads.

Abstract: Embodiments of emission reduction system including various embodiments of an emission filters for a power plant including a gas turbine are disclosed. The system includes: an emission filter; and a retraction system operably coupled to an exhaust passage of the gas turbine. The exhaust passage defines an exhaust path of exhaust from the gas turbine. The retraction system selectively moves the emission filter between a first location within the exhaust path and a second location out of the exhaust path. In a combined cycle power plant, the first location is upstream of a heat recovery steam generator (HRSG). The systems and filters described allow for temporary positioning of emission filter(s) just downstream of a gas turbine exhaust outlet, or upstream of an HRSG, where provided, for emission reduction at low loads or startup conditions, and removal of the emission filter(s) once operations move to higher loads.

Abstract: A method and system may be implemented for automatically analyzing data in a database. A method for use in a low-latency database analysis system may include generating a schema. The schema may be based on a portion of an external database. The method may include storing the schema in an in-memory database. The method may include receiving a data-query. The method may include generating a resolved-request. The resolved-request may be based on the data-query and the stored schema. The stored schema may be used for executing the query on the external database. The method may include receiving results data responsive to the data-query from the external database. The method may include outputting the results data for display on a user interface.

Abstract: Improved systems and methods for database analysis are described herein. A method includes generating a graph-based ontological data structure including nodes connected by edges in a low-latency database analysis system, wherein each node represents a respective analytical-object in the low-latency database analysis system, maintaining versions for each of the nodes in the graph-based ontological data structure, maintaining versions for each of the edges in the graph-based ontological data structure, maintaining a transaction log for each transaction with respect to the graph-based ontological data structure, reverting to an earlier version of at least a portion of the graph-based ontological data structure using the transaction log, versioned nodes, and versioned edges in response to an event, and outputting a version of the graph-based ontological data structure in a defined form for presentation to a user or for use by a client.

Abstract: Chemical mechanical polishing compositions contain polyethoxylated amines, phosphoric acid or salts thereof, and positively charged nitrogen containing colloidal silica abrasive particles. The chemical mechanical polishing compositions are used in polishing methods for suppressing the removal rate of amorphous silicon while maintaining tunable oxide to silicon nitride removal rate ratios. The chemical mechanical polishing compositions can be used in front-end-of line semiconductor processing.

Abstract: The present invention provides a solid organomagnesium precursor having formula {Mg(OR?)X}.a{MgX2}.b{Mg(OR?)2}.c{R?OH}, wherein R? is selected from a hydrocarbon group, X is selected from a halide group, and a:b:c is in range of 0.01-0.5:0.01-0.5:0.01-5 and process for preparing the same, said process comprising contacting a magnesium source with a solvating agent, an organohalide and an alcohol to obtain the solid organomagnesium precursor. The present invention also provides a process for preparing a catalyst system using the organomagnesium precursor and its use thereof for polymerization of olefins.

Abstract: A chemical mechanical polishing composition for polishing silicon dioxide over silicon nitride includes certain acidic heterocyclic nitrogen compounds having a pK value of 5 of less. Also, methods for polishing a substrate to remove some of the silicon dioxide and silicon nitride are disclosed.

Abstract: In one aspect, a computerized method includes the step of providing a first virtual machine on first server. The method includes the step of, with the first virtual machine, communicating a network traffic to a second virtual machine on a second server using a virtual network identified with a virtual local area network (VLAN). The method includes the step of, with a virtual function (VF) on a physical network interface controller (pNIC) of the second server, assigning to the VLAN to a specified VF. The method includes the step of, sending a data packet is sent out of the pNIC towards a TOR switch, wherein the TOR switch has the VLAN enabled and other user specific policies configured. The method includes the step of, sending the data packet to a second TOR switch. The method includes the step of, with the second TOR switch, sending the data packet towards the pNIC on the second server based on a destination the second virtual machine's MAC address.