Patents by Inventor Nicholas C. M. Fuller
Nicholas C. M. Fuller has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11195145Abstract: Techniques facilitating blockchain ledgers of material spectral signatures for supply chain integrity management are provided. In one example, a computer-implemented method comprises validating, by a device operatively coupled to a processor, spectral signature data associated with a material, resulting in validated spectral signature data; and generating, by the device, a set of information corresponding to a transaction of the material in a blockchain associated with the material, wherein the set of information is related to the validated spectral signature data. In some embodiments, the computer-implemented method further comprises authenticating, by the device, a first party device associated with a first party to the transaction and a second party device associated with a second party to the transaction and including identities of the first party and the second party as indicated by the respective party devices in the set of information.Type: GrantFiled: October 3, 2019Date of Patent: December 7, 2021Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATIONInventors: Nicholas C. M. Fuller, Prabhakar Kudva, Deborah Ann Neumayer
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Patent number: 10721328Abstract: To provide a client with access to an API available from a provider, a request is received from a marketplace to subscribe to the API, responsive to the client selecting the API from a catalog of the marketplace. A subscriber identifier, which is uniquely associated with the request by the client to subscribe to the selected API, is generated. An authorization record is created within a proxy; it indicates that a request by the client to invoke the API received by the proxy should be forwarded to the provider from which the API is available if the request to invoke the API includes the subscriber identifier. The generated subscriber identifier and an address of the proxy are provided to the marketplace. Thus, the client is configured to invoke the API by sending a request including the subscriber identifier to the address of the proxy.Type: GrantFiled: August 26, 2015Date of Patent: July 21, 2020Assignee: International Business Machines CorporationInventors: Han Chen, Nicholas C. M. Fuller, Minkyong Kim, Isabelle M. Rouvellou
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Patent number: 10685323Abstract: Techniques facilitating blockchain ledgers of material spectral signatures for supply chain integrity management are provided. In one example, a computer-implemented method comprises validating, by a device operatively coupled to a processor, spectral signature data associated with a material, resulting in validated spectral signature data; and generating, by the device, a set of information corresponding to a transaction of the material in a blockchain associated with the material, wherein the set of information is related to the validated spectral signature data. In some embodiments, the computer-implemented method further comprises authenticating, by the device, a first party device associated with a first party to the transaction and a second party device associated with a second party to the transaction and including identities of the first party and the second party as indicated by the respective party devices in the set of information.Type: GrantFiled: December 11, 2017Date of Patent: June 16, 2020Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATIONInventors: Nicholas C. M. Fuller, Prabhakar Kudva, Deborah Ann Neumayer
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Patent number: 10651286Abstract: A silicon nitride cap on a gate stack is removed by etching with a fluorohydrocarbon-containing plasma subsequent to formation of source/drain regions without causing unacceptable damage to the gate stack or source/drain regions. A fluorohydrocarbon-containing polymer protection layer is selectively deposited on the regions that are not to be etched during the removal of the nitride cap. The ability to remove the silicon nitride material using gas chemistry, causing formation of a volatile etch product and protection layer, enables reduction of the ion energy to the etching threshold.Type: GrantFiled: June 17, 2019Date of Patent: May 12, 2020Assignee: International Business Machines CorporationInventors: Ravi K. Dasaka, Sebastian U. Engelmann, Nicholas C. M. Fuller, Masahiro Nakamura, Richard S. Wise
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Publication number: 20200051008Abstract: Techniques facilitating blockchain ledgers of material spectral signatures for supply chain integrity management are provided. In one example, a computer-implemented method comprises validating, by a device operatively coupled to a processor, spectral signature data associated with a material, resulting in validated spectral signature data; and generating, by the device, a set of information corresponding to a transaction of the material in a blockchain associated with the material, wherein the set of information is related to the validated spectral signature data. In some embodiments, the computer-implemented method further comprises authenticating, by the device, a first party device associated with a first party to the transaction and a second party device associated with a second party to the transaction and including identities of the first party and the second party as indicated by the respective party devices in the set of information.Type: ApplicationFiled: October 3, 2019Publication date: February 13, 2020Inventors: Nicholas C. M. Fuller, Prabhakar Kudva, Deborah Ann Neumayer
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Patent number: 10467586Abstract: Techniques facilitating blockchain ledgers of material spectral signatures for supply chain integrity management are provided. In one example, a computer-implemented method comprises validating, by a device operatively coupled to a processor, spectral signature data associated with a material, resulting in validated spectral signature data; and generating, by the device, a set of information corresponding to a transaction of the material in a blockchain associated with the material, wherein the set of information is related to the validated spectral signature data. In some embodiments, the computer-implemented method further comprises authenticating, by the device, a first party device associated with a first party to the transaction and a second party device associated with a second party to the transaction and including identities of the first party and the second party as indicated by the respective party devices in the set of information.Type: GrantFiled: March 23, 2017Date of Patent: November 5, 2019Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATIONInventors: Nicholas C. M. Fuller, Prabhakar Kudva, Deborah Ann Neumayer
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Patent number: 10325998Abstract: A silicon nitride cap on a gate stack is removed by etching with a fluorohydrocarbon-containing plasma subsequent to formation of source/drain regions without causing unacceptable damage to the gate stack or source/drain regions. A fluorohydrocarbon-containing polymer protection layer is selectively deposited on the regions that are not to be etched during the removal of the nitride cap. The ability to remove the silicon nitride material using gas chemistry, causing formation of a volatile etch product and protection layer, enables reduction of the ion energy to the etching threshold.Type: GrantFiled: March 18, 2017Date of Patent: June 18, 2019Assignees: International Business Machines Corporation, ZEON CORPORATIONInventors: Ravi K. Dasaka, Sebastian U. Engelmann, Nicholas C. M. Fuller, Masahiro Nakamura, Richard S. Wise
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Patent number: 10269924Abstract: A silicon nitride cap on a gate stack is removed by etching with a fluorohydrocarbon-containing plasma subsequent to formation of source/drain regions without causing unacceptable damage to the gate stack or source/drain regions. A fluorohydrocarbon-containing polymer protection layer is selectively deposited on the regions that are not to be etched during the removal of the nitride cap. The ability to remove the silicon nitride material using gas chemistry, causing formation of a volatile etch product and protection layer, enables reduction of the ion energy to the etching threshold.Type: GrantFiled: March 18, 2017Date of Patent: April 23, 2019Assignees: INTERNATIONAL BUSINESS MACHINES CORPORATION, ZEON CORPORATIONInventors: Ravi K. Dasaka, Sebastian U. Engelmann, Nicholas C. M. Fuller, Masahiro Nakamura, Richard S. Wise
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Patent number: 10216486Abstract: One or more processors receive information regarding a program module that includes a description of a function, license terms, and non-functional properties of the program module. The license terms, the description of function, and the non-functional properties of the program module are identified, based on an analysis of the information. An object of interest of each license term of the license terms is determined, such that the object of interest is directed to a condition influencing license term compliance. Rules corresponding to compliance of the one or more license terms of the program module are determined, and the analyzed information of the program module is stored in a meta-model format organized into categories including the description of function, the one or more license terms, and the non-functional properties of the program module, utilizing standardized syntax and semantics.Type: GrantFiled: August 24, 2016Date of Patent: February 26, 2019Assignee: International Business Machines CorporationInventors: Nicholas C. M. Fuller, Jim A. Laredo, Hui Lei, Sriram K. Rajagopal, Maja Vukovic, Liangzhao Zeng
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Publication number: 20180276597Abstract: Techniques facilitating blockchain ledgers of material spectral signatures for supply chain integrity management are provided. In one example, a computer-implemented method comprises validating, by a device operatively coupled to a processor, spectral signature data associated with a material, resulting in validated spectral signature data; and generating, by the device, a set of information corresponding to a transaction of the material in a blockchain associated with the material, wherein the set of information is related to the validated spectral signature data. In some embodiments, the computer-implemented method further comprises authenticating, by the device, a first party device associated with a first party to the transaction and a second party device associated with a second party to the transaction and including identities of the first party and the second party as indicated by the respective party devices in the set of information.Type: ApplicationFiled: March 23, 2017Publication date: September 27, 2018Inventors: Nicholas C. M. Fuller, Prabhakar Kudva, Deborah Ann Neumayer
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Publication number: 20180276600Abstract: Techniques facilitating blockchain ledgers of material spectral signatures for supply chain integrity management are provided. In one example, a computer-implemented method comprises validating, by a device operatively coupled to a processor, spectral signature data associated with a material, resulting in validated spectral signature data; and generating, by the device, a set of information corresponding to a transaction of the material in a blockchain associated with the material, wherein the set of information is related to the validated spectral signature data. In some embodiments, the computer-implemented method further comprises authenticating, by the device, a first party device associated with a first party to the transaction and a second party device associated with a second party to the transaction and including identities of the first party and the second party as indicated by the respective party devices in the set of information.Type: ApplicationFiled: December 11, 2017Publication date: September 27, 2018Inventors: Nicholas C. M. Fuller, Prabhakar Kudva, Deborah Ann Neumayer
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Patent number: 10043153Abstract: Automatically associating information technology resource patterns with specific information technology products by receiving a set of data about information technology assets, matching a subset of that data to a pattern in a set of patterns, determining that the subset of the data represents a product associated with that pattern, reporting this determination; receiving feedback on the accuracy of the determination, and updating pattern set information in response to that feedback.Type: GrantFiled: July 24, 2014Date of Patent: August 7, 2018Assignee: International Business Machines CorporationInventors: Liya Fan, Nicholas C. M. Fuller, Jian Qiu, Zhe Zhang
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Patent number: 9633948Abstract: A stack that includes, from bottom to top, a nitrogen-containing dielectric layer, an interconnect level dielectric material layer, and a hard mask layer is formed on a substrate. The hard mask layer and the interconnect level dielectric material layer are patterned by an etch. Employing the patterned hard mask layer as an etch mask, the nitrogen-containing dielectric layer is patterned by a break-through anisotropic etch, which employs a fluorohydrocarbon-containing plasma to break through the nitrogen-containing dielectric layer. Fluorohydrocarbon gases used to generate the fluorohydrocarbon-containing plasma generate a carbon-rich polymer residue, which interact with the nitrogen-containing dielectric layer to form volatile compounds. Plasma energy can be decreased below 100 eV to reduce damage to physically exposed surfaces of the interconnect level dielectric material layer.Type: GrantFiled: October 20, 2015Date of Patent: April 25, 2017Assignees: GLOBALFOUNDRIES INC., ZEON CORPORATIONInventors: Markus Brink, Robert L. Bruce, Sebastian U. Engelmann, Nicholas C. M. Fuller, Hiroyuki Miyazoe, Masahiro Nakamura
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Patent number: 9627533Abstract: A silicon nitride cap on a gate stack is removed by etching with a fluorohydrocarbon-containing plasma subsequent to formation of source/drain regions without causing unacceptable damage to the gate stack or source/drain regions. A fluorohydrocarbon-containing polymer protection layer is selectively deposited on the regions that are not to be etched during the removal of the nitride cap. The ability to remove the silicon nitride material using gas chemistry, causing formation of a volatile etch product and protection layer, enables reduction of the ion energy to the etching threshold.Type: GrantFiled: February 5, 2015Date of Patent: April 18, 2017Assignees: INTERNATIONAL BUSINESS MACHINES CORPORATION, ZEON CORPORATIONInventors: Ravi K. Dasaka, Sebastian U. Engelmann, Nicholas C. M. Fuller, Masahiro Nakamura, Richard S. Wise
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Publication number: 20160364213Abstract: One or more processors receive information regarding a program module that includes a description of a function, license terms, and non-functional properties of the program module. The license terms, the description of function, and the non-functional properties of the program module are identified, based on an analysis of the information. An object of interest of each license term of the license terms is determined, such that the object of interest is directed to a condition influencing license term compliance. Rules corresponding to compliance of the one or more license terms of the program module are determined, and the analyzed information of the program module is stored in a meta-model format organized into categories including the description of function, the one or more license terms, and the non-functional properties of the program module, utilizing standardized syntax and semantics.Type: ApplicationFiled: August 24, 2016Publication date: December 15, 2016Inventors: Nicholas C. M. Fuller, Jim A. Laredo, Hui Lei, Sriram K. Rajagopal, Maja Vukovic, Liangzhao Zeng
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Patent number: 9460273Abstract: A processor stores information associated with one or more programming modules, including one or more license terms associated with the one or more programming modules. The processor receives an input indicating a set of programming modules selected from the one or more programming modules, based on the information which is stored. The processor compares the one or more license terms associated with the set of programming modules. In response to determining a conflict between the one or more license terms of the set of programming modules, the processor applies a set of rules to resolve the conflict between the one or more license terms of the set of programming modules, and the processor composes a composite license for the set of programming modules, based on the one or more license terms of the set of programming modules and the set of rules applied to resolve the conflict.Type: GrantFiled: October 29, 2014Date of Patent: October 4, 2016Assignee: International Business Machines CorporationInventors: Nicholas C. M. Fuller, Jim A. Laredo, Hui Lei, Sriram K. Rajagopal, Maja Vukovic, Liangzhao Zeng
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Patent number: 9405582Abstract: Dynamically adjusting the parameters of a parallel, distributed job in response to changes to the status of the job cluster. Includes beginning execution of a job in a cluster, receiving cluster status information, determining a job performance impact of the cluster status, reconfiguring job parameters based on the performance impact, and continuing execution of the job using the updated configuration. Dynamically requesting a change to the resources of the job cluster for a parallel, distributed job in response to changes in job status. Includes beginning execution of a job in a cluster, receiving job status information, determining a job performance impact, requesting a changed allocation of cluster resources based on the determined job performance impact, reconfiguring one or more job parameters based on the changed allocation, and continuing execution of the job using the updated configuration.Type: GrantFiled: June 20, 2014Date of Patent: August 2, 2016Assignee: International Business Machines CorporationInventors: Nicholas C. M. Fuller, Vijay K. Naik, Liangzhao Zeng, Li Zhang
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Publication number: 20160125172Abstract: A processor stores information associated with one or more programming modules, including one or more license terms associated with the one or more programming modules. The processor receives an input indicating a set of programming modules selected from the one or more programming modules, based on the information which is stored. The processor compares the one or more license terms associated with the set of programming modules. In response to determining a conflict between the one or more license terms of the set of programming modules, the processor applies a set of rules to resolve the conflict between the one or more license terms of the set of programming modules, and the processor composes a composite license for the set of programming modules, based on the one or more license terms of the set of programming modules and the set of rules applied to resolve the conflict.Type: ApplicationFiled: October 29, 2014Publication date: May 5, 2016Inventors: Nicholas C. M. Fuller, Jim A. Laredo, Hui Lei, Sriram K. Rajagopal, Maja Vukovic, Liangzhao Zeng
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Publication number: 20160111374Abstract: A stack that includes, from bottom to top, a nitrogen-containing dielectric layer, an interconnect level dielectric material layer, and a hard mask layer is formed on a substrate. The hard mask layer and the interconnect level dielectric material layer are patterned by an etch. Employing the patterned hard mask layer as an etch mask, the nitrogen-containing dielectric layer is patterned by a break-through anisotropic etch, which employs a fluorohydrocarbon-containing plasma to break through the nitrogen-containing dielectric layer. Fluorohydrocarbon gases used to generate the fluorohydrocarbon-containing plasma generate a carbon-rich polymer residue, which interact with the nitrogen-containing dielectric layer to form volatile compounds. Plasma energy can be decreased below 100 eV to reduce damage to physically exposed surfaces of the interconnect level dielectric material layer.Type: ApplicationFiled: October 20, 2015Publication date: April 21, 2016Inventors: Markus Brink, Robert L. Bruce, Sebastian U. Engelmann, Nicholas C. M. Fuller, Hiroyuki Miyazoe, Masahiro Nakamura
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Patent number: 9263393Abstract: One embodiment of an integrated circuit includes a plurality of semiconductor devices and a plurality of conductive lines connecting the plurality of semiconductor devices, wherein at least some of the plurality of conductive lines have pitches of less than one hundred nanometers and sidewall tapers of between approximately eighty and ninety degrees. Another embodiment of an integrated circuit includes a plurality of semiconductor devices and a plurality of conductive lines connecting the plurality of semiconductor devices, wherein at least some of the plurality of conductive lines are fabricated by providing a layer of conductive metal in a multi-layer structure fabricated upon a wafer and sputter etching the layer of conductive metal using a methanol plasma, wherein a portion of the layer of conductive metal that remains after the sputter etching forms the one or more conductive lines.Type: GrantFiled: May 14, 2015Date of Patent: February 16, 2016Assignee: GLOBALFOUNDRIES INC.Inventors: Cyril Cabral, Jr., Benjamin L. Fletcher, Nicholas C. M. Fuller, Eric A. Joseph, Hiroyuki Miyazoe