Abstract: Systems and methods are provided for dynamic selection of anomaly detection options for particular metric data. Metric data corresponding to one or more configuration items of an information technology (IT) infrastructure is collected. A selected anomaly detection action option that applies to the metric data is identified. An action is performed using the metric data, based upon the selected anomaly detection action option. A dashboard graphical user interface (GUI) display results of the action.

Abstract: The present approach relates generally to systems and methods for outputting metric data from resources with a database accessible by a client instance. The client instance is hosted by one or more data centers and accessible by one or more remote client networks. In accordance with the present approach, a request to track metric data related to a resource is received. Further, a configuration item (CI) is retrieved from a database accessible by the client instance based at least in part on data associated with the request. Further, a type of CI is identified. Even further, a resource type associated with the type of the CI is identified based at least in part on a resource abstraction layer accessible by the client instance. Further still, the resource type is linked to the resource table and metric data associated with the resource is outputted.

Abstract: Disclosed is a method for a metrology measurement on an area of a substrate comprising at least a portion of a target structure. The method comprises receiving a radiation information representing a portion of radiation scattered by the are, and using a filter in a Fourier domain for removing or suppressing at least a portion of the received radiation information that does not relate to radiation that has been scattered by the target structure for obtaining a filtered radiation information for the metrology measurement, wherein characteristics of the filter are based on target information about the target structure.

Abstract: A patterning device for patterning product structures onto a substrate and an associated substrate patterned using such a patterning device. The patterning device includes target patterning elements for patterning at least one target from which a parameter of interest can be inferred. The patterning device includes product patterning elements for patterning the product structures. The target patterning elements and product patterning elements are configured such that the at least one target has at least one boundary which is neither parallel nor perpendicular with respect to the product structures on the substrate.

Abstract: Systems and methods are provided for dynamic selection of anomaly detection options for particular metric data. Metric data corresponding to one or more configuration items of an information technology (IT) infrastructure is collected. A selected anomaly detection action option that applies to the metric data is identified. An action is performed using the metric data, based upon the selected anomaly detection action option. A dashboard graphical user interface (GUI) display results of the action.

Abstract: A lithographic apparatus includes an illumination system to produce a beam of radiation, a support to support a patterning device to impart a pattern on the beam, a projection system to project the patterned beam onto a substrate, and a metrology system that includes a radiation source to generate radiation, an optical element to direct the radiation toward a target, a detector to receive a first and second radiation scattered by the target and produce a first and second measurement respectively based on the received first and second radiation, and a controller. The controller determines a correction for the first measurement, an error between the correction for the first measurement and the first measurement, and a correction for the second measurement based on the correction for the first measurement, the second measurement, and the error. The lithographic apparatus uses the correction to adjust a position of a substrate.

Abstract: A method may include obtaining a dialogue of a user and a pre-trained language model. The method may include obtaining a corpus of dialogues and a corpus of response materials. The method may include modifying the pre-trained language model. The method may include identifying a dialogue topic of the dialogue of the user and identifying a set of response topics. The method may include selecting a set of response materials from the corpus of response materials. The method may include determining a first plurality of probabilities and, for each response material of the set of response materials, a respective second plurality of probabilities. The method may include comparing the first plurality of words with each respective second plurality of words associated with each respective response material of the set of response materials. The method may include selecting a response material of the set of response materials based on the comparison.

Abstract: Examples for detecting a compromised device are described. A set of threat detection rules can instruct an application on the client device how to detect whether the client device is compromised. The rules can be updated dynamically and without updating the application that is performing the compromise detection. The rules can be encoded in an interpreted scripting language and executed by a runtime environment that is embedded within the application.

Abstract: A federated machine-learning system includes a global server and client devices. The server receives updates of weight factor dictionaries and factor strengths vectors from the clients, and generates a globally updated weight factor dictionary and a globally updated factor strengths vector. A client device selects a group of parameters from a global group of parameters, and trains a model using a dataset of the client device and the group of selected parameters. The client device sends to the server a client-updated weight factor dictionary and a client-updated factor strengths vector. The client device receives the globally updated weight factor dictionary and the globally updated factor strengths vector, and retrains the model using the dataset of the client device, the group of parameters selected by the client device, and the globally updated weight factor dictionary and the globally updated factor strengths vector.

Abstract: Examples for detecting a compromised device are described. A set of threat detection rules can instruct an application on the client device how to detect whether the client device is compromised. The rules can be updated dynamically and without updating the application that is performing the compromise detection. The rules can be encoded in an interpreted scripting language and executed by a runtime environment that is embedded within the application.

Abstract: A method may include obtaining a dialogue of a user and a pre-trained language model. The method may include obtaining a corpus of dialogues and a corpus of response materials. The method may include modifying the pre-trained language model. The method may include identifying a dialogue topic of the dialogue of the user and identifying a set of response topics. The method may include selecting a set of response materials from the corpus of response materials. The method may include determining a first plurality of probabilities and, for each response material of the set of response materials, a respective second plurality of probabilities. The method may include comparing the first plurality of words with each respective second plurality of words associated with each respective response material of the set of response materials. The method may include selecting a response material of the set of response materials based on the comparison.

Abstract: A portal application can receive a listing of available applications in response to a request sent to a management server. The listing can include a plurality of attributes for each available application, such as the requirements for using the features of each application or a dependency upon another application. Based on the plurality of attributes received, the portal application can determine that a first application requires installation of a second application in order for the first application to provide additional functionality. The portal application can display icons corresponding to the available applications and display one or more UI elements, indicating that the first application requires installation of the second application. The portal application can also push the second application to the device and assist in installing and initializing the second application on the device.

Abstract: Systems and methods are provided for dynamic selection of anomaly detection options for particular metric data. Metric data corresponding to one or more configuration items of an information technology (IT) infrastructure is collected. A selected anomaly detection action option that applies to the metric data is identified. An action is performed using the metric data, based upon the selected anomaly detection action option. A dashboard graphical user interface (GUI) display results of the action.

Abstract: Embodiments herein describe techniques for a semiconductor device including a substrate, a first inter-level dielectric (ILD) layer above the substrate, and a second ILD layer above the first ILD layer. A first capacitor and a second capacitor are formed within the first ILD layer and the second ILD layer. A first top plate of the first capacitor and a second top plate of the second capacitor are formed at a boundary between the first ILD layer and the second ILD layer. The first capacitor and the second capacitor are separated by a dielectric area in the first ILD layer. The dielectric area includes a first dielectric area that is coplanar with the first top plate or the second top plate, and a second dielectric area above the first dielectric area and to separate the first top plate and the second top plate. Other embodiments may be described and/or claimed.

Abstract: Embodiments herein describe techniques for a semiconductor device including a substrate, a first inter-level dielectric (ILD) layer above the substrate, and a second ILD layer above the first ILD layer. The semiconductor device further includes a capacitor having a bottom plate above the substrate, a capacitor dielectric layer adjacent to and above the bottom plate, and a top plate adjacent to and above the capacitor dielectric layer. The bottom plate, the capacitor dielectric layer, and the top plate are within the first ILD layer or the second ILD layer. Furthermore, an air gap is formed next to the top plate and below a top surface of the second ILD layer. Other embodiments may be described and/or claimed.

Abstract: Embodiments herein describe techniques for a semiconductor device including a substrate. A first capacitor includes a first top plate and a first bottom plate above the substrate. The first top plate is coupled to a first metal electrode within an inter-level dielectric (ILD) layer to access the first capacitor. A second capacitor includes a second top plate and a second bottom plate, where the second top plate is coupled to a second metal electrode within the ILD layer to access the second capacitor. The second metal electrode is disjoint from the first metal electrode. The first capacitor is accessed through the first metal electrode without accessing the second capacitor through the second metal electrode. Other embodiments may be described and/or claimed.

Abstract: Embodiments herein describe techniques for a semiconductor device having an interconnect structure including an inter-level dielectric (ILD) layer between a first layer and a second layer of the interconnect structure. The interconnect structure further includes a separation layer within the ILD layer. The ILD layer includes a first area with a first height to extend from a first surface of the ILD layer to a second surface of the ILD layer. The ILD layer further includes a second area with a second height to extend from the first surface of the ILD layer to a surface of the separation layer, where the first height is larger than the second height. Other embodiments may be described and/or claimed.

Abstract: Examples herein describe systems and methods for on-device, application-specific compliance enforcement. An example method can include receiving, at a user device, an application having a compliance engine. The user device can also store a compliance rule that applies to the received application. The compliance rule can specify a condition and a remedial action for the application. The user device can execute the application. The application can determine, using the compliance engine within the application, whether the condition is present. The determination can be made regardless of whether the device has internet or cellular connectivity. Based on determining that the condition is present, the application can perform the remedial action.

Abstract: Methods and masks for manufacturing component of gas turbine engines are described. The methods include applying a mask to a protected surface of the component, the component having a designated surface to be treated by a shot peen operation. The mask includes a full masking portion configured to prevent a shot peen media from impacting the protected surface. A masking control region is arranged around the designated surface. The masking control region is configured to control an amount of force imparted to the component by shot peen media during the shot peen operation, wherein the masking control region extends from the full masking portion to the designated surface. The designated surface is shot peened with shot peen media to form a compressive stress region within the component proximate the designated surface and a tapering transition of compressive forces within the component proximate the masking control region.

Abstract: An integrated circuit structure comprises one or more backend-of-line (BEOL) interconnects formed over a first ILD layer. An etch stop layer is over the one or more BEOL interconnects, the etch stop layer having a plurality of vias that are in contact with the one or more BEOL interconnects. An array of BEOL thin-film-transistors (TFTs) is over the etch stop layer, wherein adjacent ones of the BEOL TFTs are separated by isolation trench regions. The TFTs are aligned with at least one of the plurality of vias to connect to the one or more BEOL interconnects, wherein each of the BEOL TFTs comprise a bottom gate electrode, a gate dielectric layer over the bottom gate electrode, and an oxide-based semiconductor channel layer over the bottom gate electrode having source and drain regions therein. Contacts are formed over the source and drain regions of each of BEOL TFTs, wherein the contacts have a critical dimension of 35 nm or less, and wherein the BEOL TFTs have an absence of diluted hydro-fluoride (DHF).