Abstract: An illumination optical system includes: a stop configured to define an illumination range of a surface to be illuminated; an imaging optical system configured to form an image of an aperture of the stop onto the surface to be illuminated; an calculation unit configured to calculate an offset amount between a size of the aperture and a target illumination range of the surface to be illuminated using data on the target illumination range; and an adjusting unit configured to adjust the size of the aperture based on the calculated offset amount. The offset amount differs according to a size of the target illumination range.

Abstract: An optical system illuminating a surface to be illuminated includes a wavefront splitting type integrator configured to split the wavefront of incident light to form a plurality of light sources on the exit surface side, and an optical element whose surface is polished in a scanning direction using a polishing tool. The optical element is disposed between the wavefront splitting type integrator and the surface to be illuminated, and has a direction indicating portion indicating the scanning direction. The arrangement direction of the plurality of light sources in a plane perpendicular to the optical axis of the optical system is non-parallel to the scanning direction indicated by the direction indicating portion.

Abstract: An illumination optical system includes: a stop configured to define an illumination range of a surface to be illuminated; an imaging optical system configured to form an image of an aperture of the stop onto the surface to be illuminated; an calculation unit configured to calculate an offset amount between a size of the aperture and a target illumination range of the surface to be illuminated using data on the target illumination range; and an adjusting unit configured to adjust the size of the aperture based on the calculated offset amount. The offset amount differs according to a size of the target illumination range.

Abstract: An object of this invention is to provide a fine powder of diamond particles of less than 50 nm with a narrow particle size range. The diamond is single crystalline and characterized with a lot of sharp edges and sharp points. Another object is to provide a method for efficiently producing such fine powder. The method comprises mechanically crushing a raw material of single crystalline diamond particles to prepare starting minute particles of diamond, then imparting hydrophilic quality to the surface of diamond particles. As hydrophilic the diamond particles are dispersed in water to form a slurry, which is set and kept weakly alkaline. The slurry is then subjected to a preliminary grading step, whereby the slurry is removed of a top particle size fraction of the diamond particles that has a D50 size of 60 nm or more. Eliminated of said top particle size fraction, the slurry is then diluted with water to regulate the diamond concentration to 0.1% (by weight) or less.

Abstract: An immersion exposure apparatus including an optical element 11, a reflective surface 42, a water repellent coating layer 43 in which peeled areas 45 and 46 are formed, a light intensity sensor 4 which detects light intensity of first light and second light, and an arithmetic processing unit which calculates a reflectance of the optical element 11, wherein the first light enters the projection optical system 1, passes through the peeled area 46 to be reflected by the reflective surface 42, is reflected on a surface of the optical element 11, and passes through the peeled area 45 to be received by the light intensity sensor 4, and the second light enters the projection optical system 1 and passes through the peeled area 45 to be received by the light intensity sensor 4 without being reflected on the reflective surface 42 and the surface of the optical element 11.

Abstract: A data transfer control device includes an OUT-transfer transmitter circuit which transmits OUT data by driving a serial signal line, a clock-transfer transmitter circuit which transmits a clock signal CLK by driving a serial signal line, a PLL circuit which generates the clock signal CLK, and a power-down setting circuit which sets a power-down mode. In a first power-down mode, the OUT-transfer transmitter circuit is set to the power-down mode, and the clock-transfer transmitter circuit is set to the power-down mode to stop a system clock signal of a target-side data transfer control device. In a second power-down mode, the OUT-transfer transmitter circuit is set to the power-down mode without setting the clock-transfer transmitter circuit to the power-down mode.

Abstract: An exposure apparatus comprising a projection optical system configured to project a pattern image of an original onto a substrate, and a sensor configured to detect light emerging from the projection optical system, the sensor including a light receiving element having a light receiving surface, and an optical member having a reflection surface which reflects the light emerging from the projection optical system toward the light receiving surface, wherein the reflection surface forms an acute angle with respect to the light receiving surface.

Abstract: An exposure apparatus comprises an optical system configured to illuminate a reticle, including an imaging optical system having an optical element, a reflecting surface which reflects light toward the optical element, and a processor which extracts information from a first signal based on first light which is incident on the imaging optical system and reflected by the reflecting surface and a surface of the optical element, and information from a second signal based on second light which is incident on the imaging optical system, and which obtains information indicating a surface condition of the optical element using the information extracted from the first and second signals.

Abstract: This invention provides an exposure apparatus which exposes a substrate (51) with a pattern formed on a reticle (3), and includes a projection optical system (1) including an optical element (11-14) and a reflecting surface (42) which reflects light toward the projection optical system (1). The exposure apparatus further includes a processor (P) which obtains information indicating a surface condition of the optical element (11-14) based on first light which is incident on the projection optical system (1) and reflected by the reflecting surface (42) and a surface of the optical element (11-14) and second light which is incident on the projection optical system (1) and not reflected by the reflecting surface (42) and the surface of the optical element (11-14).

Abstract: An immersion exposure apparatus including an optical element 11, a reflective surface 42, a water repellent coating layer 43 in which peeled areas 45 and 46 are formed, a light intensity sensor 4 which detects light intensity of first light and second light, and an arithmetic processing unit which calculates a reflectance of the optical element 11, wherein the first light enters the projection optical system 1, passes through the peeled area 46 to be reflected by the reflective surface 42, is reflected on a surface of the optical element 11, and passes through the peeled area 45 to be received by the light intensity sensor 4, and the second light enters the projection optical system 1 and passes through the peeled area 45 to be received by the light intensity sensor 4 without being reflected on the reflective surface 42 and the surface of the optical element 11.

Abstract: An object of this invention is to provide a fine powder of diamond particles of less than 50 nm with a narrow particle size range. The diamond is single crystalline and characterized with a lot of sharp edges and sharp points. Another object is to provide a method for efficiently producing such fine powder. The method comprises mechanically crushing a raw material of single crystalline diamond particles to prepare starting minute particles of diamond, then imparting hydrophilic quality to the surface of diamond particles. As hydrophilic the diamond particles are dispersed in water to form a slurry, which is set and kept weakly alkaline. The slurry is then subjected to a preliminary grading step, whereby the slurry is removed of a top particle size fraction of the diamond particles that has a D50 size of 60 nm or more. Eliminated of said top particle size fraction, the slurry is then diluted with water to regulate the diamond concentration to 0.1% (by weight) or less.

Abstract: A receiver circuit includes: a current/voltage conversion circuit which performs a current/voltage conversion based on current which flows through the differential signal lines and outputs voltage signals; a comparator which compares the voltage signals and outputs an output signal; a power-down detection circuit which, when the transmitter circuit transmits a power-down command by current-driving the differential signal lines in a normal transfer mode, detects the transmitted power-down command based on a comparison result from the comparator; and a power-down setting circuit which sets at least one of the current/voltage conversion circuit and the comparator to a power-down mode when the power-down command is detected.

Abstract: A data transfer control device having: a hub dedicated data storage section which stores a packet transferred between the data transfer control device and a hub; a packet transmission section which cyclically issues a token packet to the hub for asking whether the state of the hub has changed or not; a packet reception section which receives a response packet sent from the hub in response to the token packet; and a transfer controller which writes the response packet received by the packet reception section into the hub dedicated data storage section, and generates an interrupt which indicates that the state of the hub has changed.

Abstract: This invention provides an exposure apparatus which exposes a substrate (51) with a pattern formed on a reticle (3), and includes a projection optical system (1) including an optical element (11-14) and a reflecting surface (42) which reflects light toward the projection optical system (1). The exposure apparatus further includes a processor (P) which obtains information indicating a surface condition of the optical element (11-14) based on first light which is incident on the projection optical system (1) and reflected by the reflecting surface (42) and a surface of the optical element (11-14) and second light which is incident on the projection optical system (1) and not reflected by the reflecting surface (42) and the surface of the optical element (11-14).

Abstract: A data transfer control device includes an OTG (state) controller which controls a plurality of states including a host operation state and a peripheral operation state, a host controller which is connected with a transceiver during the host operation, a peripheral controller which is connected with the transceiver during the peripheral operation, a register section including transfer condition registers which are used commonly during the host operation and the peripheral operation, and a buffer controller which controls access to a packet buffer used commonly by the host controller and the peripheral controller. Pipe regions PIPE0 to PIPEe are allocated in the packet buffer during the host operation, and endpoint regions EP0 to EPe are allocated in the packet buffer during the peripheral operation.

Abstract: A force sensor includes a shaft to which a magnet is fixed, and a case which can reciprocate with respect to the shaft and to which a Hall IC element is fixed. The Hall IC element outputs an output voltage which changes in accordance with relative displacement between the Hall IC element and the magnet. A main spring is interposed between the shaft and the case and elastically deforms in accordance with force produced between the shaft and the case in the reciprocating direction. A sub spring is provided in order to impart a preload such that when the amount of elastic deformation of the main spring is substantially zero, no axial clearance is formed between a flange portion of the shaft and one end portion of the main spring, and no axial clearance is formed between the case and the other end of the main spring.

Abstract: When transfer condition information is set and the start of automatic control transfer is instructed, a transfer controller (host controller) automatically issues a setup stage transaction and automatically transfers a setup stage packet, then, if there is data to be transferred, it automatically issues a data stage transaction and automatically transfers a data stage packet. It then automatically issues a status stage transaction and automatically transfers a status stage packet. Device request data, the total size of transfer data, data stage present/absent information, transfer direction in the data stage, and maximum packet size are set in transfer condition registers. A pipe region is allocated in the packet buffer during host operation of USB On-The-Go.

Abstract: A data transfer control device includes a PATA I/F connected to a PATA bus, a SATA I/F connected to a SATA bus, and a sequence controller that controls a transfer sequence. The PATA I/F includes a task file register that is a pseudo register provided to implement a PATA/SATA bus bridge, and the SATA I/F includes a shadow task file register, a register value being transferred between the shadow task file register and the task file register.

Abstract: When a first mode (with-SOF mode) has been set, data transfer is performed while SOF packets are transferred at frame periods, and when a second mode (non-SOF mode) has been set and also non-periodic (bulk) transfer is being performed, the periodic transfer of SOF packets is disabled and non-periodic data is transferred. If there is no non-periodic data to be transferred, a SOF packet is transferred in the frame period, even if the second mode has been set. During host operation with USB on-the-go (OTG), pipe regions are allocated to the packet buffer, and non-periodic data is transferred automatically to or from end points while the periodic transfer of SOF packets is disabled. When all of the automatic transfer instruction signals of the pipe regions are inactive, SOF packets are transferred periodically even if the second mode has been set.

Abstract: An exposure apparatus comprising a projection optical system configured to project a pattern image of an original onto a substrate, and a sensor configured to detect light emerging from the projection optical system, the sensor including a light receiving element having a light receiving surface, and an optical member having a reflection surface which reflects the light emerging from the projection optical system toward the light receiving surface, wherein the reflection surface forms an acute angle with respect to the light receiving surface.