Abstract: At least one monomolecule film is formed on a transparent substrate surface directly or via a protective film.

Abstract: A highly dense chemically adsorbed film is formed by repeating the alternate process of adsorption reaction and washing. Adsorption reaction is directed by contacting the substrate surface, which has or is given an alkali metal or a functional group, with a chemical adsorbent, having halosilyl or alkoxysilyl groups at the end of molecules. An unreacted chemical adsorbent is then washed away from the substrate surface. The alternate treatment of adsorption reaction and washing is repeated, thereby covalently bonding a chemically adsorbed film to the substrate surface.

Abstract: By forming a film that comprises a microcrystalline polymer having at least a fluorocarbon group and has a rough surface on a surface of a base material, super-water-repellency is provided, the dew condensation water of an air conditioner, for example, can be easily removed, and the freezing of the fin of the heat exchanger can be prevented. A fin that is made of aluminium is coated with a solution for forming a coating film, in which CF3(CF2)7—(CH2)2—SiCl3 is diluted with nonaqueous cyclohexamethyl trisiloxane at a concentration of 10 vol. % for preparation, to a thickness of 1 to 10 &mgr;m by a brush, and then the cyclohexamethyl trisiloxane is vaporized in an atmosphere having a relative humidity of about 75% at room temperature. CF3(CF2)7—(CH2)2—SiCl3 that remained on the fin is rapidly hydrolyzed with the moisture in the atmosphere, and the moisture in air and a —SiCl3 group dehydrochlorinated to form a microcrystalline polymer on the fin.

Abstract: At least one monomolecule film is formed on a transparent substrate surface directly or via a protective film.

Abstract: A highly dense chemically adsorbed film is formed by repeating the alternate process of adsorption reaction and washing. Adsorption reaction is directed by contacting the substrate surface, which has or is given an alkali metal or a functional group, with a chemical adsorbent, having halosilyl or alkoxysilyl groups at the end of molecules. An unreacted chemical adsorbent is then washed away from the substrate surface. The alternate treatment of adsorption reaction and washing is repeated, thereby covalently bonding a chemically adsorbed film to the substrate surface.

Abstract: A highly dense chemically adsorbed film is formed by repeating the alternate process of adsorption reaction and washing. Adsorption reaction is directed by contacting the substrate surface, which has or is given an alkali metal or a functional group, with a chemical adsorbent, having halosilyl or alkoxysilyl groups at the end of molecules. An unreacted chemical adsorbent is then washed away from the substrate surface. The alternate treatment of adsorption reaction and washing is repeated, thereby covalently bonding a chemically adsorbed film to the substrate surface.

Abstract: A thin film composed of a silane-based compound comprising an alkyl group or a fluoroalkyl group is bonded to the surface of an electrically insulating substrate through a covalent bond, thus obtaining an electrically chargeable substrate maintaining a charged state for a long time regardless of relative humidity of an atmosphere. A glass plate for placing a sheet in an overhead projector is dipped into a solution comprising CF3(CF)7(CH2)2SiCl3. As a result, a molecular composed of CF3(CF2)7(CH2)2Si(O)3—is chemically bonded to the glass surface. A high charged state, a water-repelling property having a static contact angle of pure water on the thin film formed on the glass surface of 110 degrees and a volume electric resistivity in the range of 1×1011−1×1019&OHgr;·cm are provided.

Abstract: An electrically insulating film capable of maintaining a preferable insulating property even with a film thickness of only some &mgr;and a method for preparing the same are disclosed. The insulating film comprises a first layer formed on a surface of a conductor substrate of a transition metal and comprised of molecules fixed on the surface of the conductor substrate through chemical bonds such as transition metal-sulfur bonds or chelate bonds, and a second layer formed on the first layer and comprised of a resin bonded to the molecules of the first layer through covalent bonds.

Abstract: A method for forming a molecular film includes the steps of: coating a surface of a substrate having active hydrogen atoms on its surface with a coating solution containing a silane-based compound having at least one reactive group selected from the group consisting of a chloro group, an alkoxy group and an isocyanate group; and effecting an elimination reaction between the active hydrogen atoms on the surface of the substrate and reactive groups of the silane-based compound, thereby covalently bonding the silane-based compounds to the surface of the substrate. The substrate is supplied to a chamber in which an atmosphere is maintained at a low water vapor density. The surface of the substrate is coated with a coating solution containing the silane-based compound and a solvent by using a transfer element. A dehydrochlorination reaction is effected between the active hydrogen atoms and the chloro groups of the silane-based compounds.

Abstract: A chemically adsorbed film comprising carbon-chain organic molecules is formed on a substrate surface via covalent bonds, and organic compounds comprising carbon chains are physically adsorbed to the surface of the chemically adsorbed film, thus providing a lubricating film which is thin and durable against friction, and with good anti-abrasion and sliding properties. The thickness of the lubricating film is at the nanometer level. More specifically, a lubricating film is made by forming a chemically adsorbed film on a substrate surface after dipping and holding the substrate in a nonaqueous solution dissolving chemical admolecules, and by coating a chloroform solution of a long-chain hydrocarbon-based fatty acid ester compound on the surface of the chemically adsorbed film.

Abstract: It is provided a water repellent coating method and apparatus which permits efficient coating either plain or curved surfaces of articles. There is disclosed in the present specification a water repellent coating method comprises the steps of: (a) loading to a carrier in the form of endless belt a coating solution containing at least a water repellent, (b) bringing said carrier into contact with an article to transfer said coating solution on the material, and (c) forming a water repellent film on said article.

Abstract: By forming a film that comprises a microcrystalline polymer having at least a fluorocarbon group and has a rough surface on a surface of a base material, super-water-repellency is provided, the dew condensation water of an air conditioner, for example, can be easily removed, and the freezing of the fin of the heat exchanger can be prevented. A fin that is made of aluminium is coated with a solution for forming a coating film, in which CF.sub.3 (CF.sub.2).sub.7 --(CH.sub.2).sub.2 --SiCl.sub.3 is diluted with nonaqueous cyclohexamethyl trisiloxane at a concentration of 10 vol. % for preparation, to a thickness of 1 to 10 .mu.m by a brush, and then the cyclohexamethyl trisiloxane is vaporized in an atmosphere having a relative humidity of about 75% at room temperature. CF.sub.3 (CF.sub.2).sub.7 --(CH.sub.2).sub.2 --SiCl.sub.3 that remained on the fin is rapidly hydrolyzed with the moisture in the atmosphere, and the moisture in air and a --SiCl.sub.

Abstract: According to the invention, a fluorine-based or siloxane-based chemical adsorbed film containing a fluorocarbon compound can be formed on a given substrate surface in a laminated state and through chemical bonds (i.e., covalent bonds) with the substrate, it is possible to obtain a laminated film which has satisfactory adhesion to the substrate, is substantially pin-hole free and is very thin. Further, since the outermost layer may be substituted by fluorocarbon groups or hydroxyl groups, it is possible to obtain a film which has excellent water- and oil-repelling properties or hydrophilic and oil-repelling properties and can replace fluorine-based coating films, thus improving the performance of products requiring a coating having a water- and oil-repelling resistant property, weather-resistant property, wear-resistant property and so forth which are desirable in electric products, vehicles, industrial devices and so forth.

Abstract: A method for forming a molecular film includes the steps of: coating a surface of a substrate having active hydrogen atoms on its surface with a coating solution containing a silane-based compound having at least one reactive group selected from the group consisting of a chloro group, an alkoxy group and an isocyanate group; and effecting an elimination reaction between the active hydrogen atoms on the surface of the substrate and reactive groups of the silane-based compound, thereby covalently bonding the silane-based compounds to the surface of the substrate. The substrate is supplied to a chamber in which an atmosphere is maintained at a low water vapor density. The surface of the substrate is coated with a coating solution containing the silane-based compound and a solvent by using a transfer element. A dehydrochlorination reaction is effected between the active hydrogen atoms and the chloro groups of the silane-based compounds.

Abstract: A latent image comprising a first substance formed on a substrate of a second substance having a surface tension different from a surface tension of the first substance, the first substance and the substrate having a difference of 0.1 to 100 nm in height from each other. The latent image is formed by a method comprising the-step of subjecting a substrate of a first substance to a chemical treatment or a physical treatment to form a surface of a second substance which has a surface tension different from a surface tension of the first substance and has a difference of 0.1 to 100 nm in height from the substrate on part of the substrate. The latent image is developed by a method comprising the steps of contacting a latent image comprising a first substance formed on a substrate of a second substance having a surface tension different from a surface tension of the first substance with a third substance different from the first substance and the second substance, and applying a developing ray to the latent image.

Abstract: A chemically adsorbed film having a surface layer containing fluorine groups and a stem layer chemically bonded by siloxane bonds to a substrate is formed on the surface of a frictional portion of a machine part such as a gear or a bearing or on the surface of a game ball. An excellently self-lubricating low frictional resistance machine part or game ball thus can be obtained. A frictional portion of a gear or the like, made of SiO.sub.2 or like ceramic material, is dipped and held in a solution containing a surface active material, e.g.,CF.sub.3 (CF.sub.2).sub.7 (CH.sub.2).sub.2 SiCl.sub.3dissolved in a non-aqueous solvent. A hydrochloric acid removal reaction is brought about between SiCl groups of the material, which contains a fluorocarbon and a chlorosilane group, and hydroxyl groups numerously present on the SiO2 surface, thus forming bonds ofCF.sub.3 (CF.sub.2).sub.7 (CH.sub.2).sub.2 Si(O--).sub.3over the entire frictional portion surface.

Abstract: A chemically adsorbed film having a surface layer containing fluorine groups and a stem layer chemically bonded by siloxane bonds to a substrate is formed on the surface of a frictional portion of a machine part such as a gear or a bearing or on the surface of a game ball. An excellently self-lubricating low frictional resistance machine part or game ball thus can be obtained. A frictional portion of a gear or the like, made of SiO.sub.2 or like ceramic material, is dipped and held in a solution containing a surface active material, e.g., CF.sub.3 (CF.sub.2).sub.7 (CH.sub.2).sub.2 SiCl.sub.3 dissolved in a non-aqueous solvent. A hydrochloric acid removal reaction is brought about between SiCl groups of the material, which contains a fluorocarbon and a chlorosilane group, and hydroxyl groups numerously present on the SiO2 surface, thus forming bonds ofCF.sub.3 (CF.sub.2).sub.7 (CH.sub.2).sub.2 Si (O--).sub.3over the entire frictional portion surface.

Abstract: An antistatic film comprising a chemically adsorbed film of straight chain molecules each containing a conductive group and provided on a chargeable substrate via covalent bonds each containing a Si group, said chemically adsorbed film having a conductivity of 10.sup.-10 S/cm or above. With the antistatic chemically adsorbed film according to the invention, conductive functional groups are secured via chemically adsorbed molecules and by siloxane bonds to the surface of a substrate material such as ceramics, glass, synthetic resins or synthetic fibers, a film, a plate, an display screen surface, a light-emitting tube. Thus, the film provides an antistatic effect and does not separate. In addition, this chemically adsorbed film has a thickness at the nanometer level and is thus excellently transparent, as well as capable of preventing contamination of the substrate surface due to charging thereof. The film is also excellently durable.

Abstract: A method for manufacturing a chemically bonding material comprising the steps of: mixing a compound expressed by a general formula ABX.sub.n (Formula 1), wherein A shows a group including carbon, B indicates Si, Ge, Sn, Ti or Zr, X is a hydrolyzable group and n indicates 1, 2 or 3, and at least one kind of compound not including active hydrogen groups in a dry atmosphere having a water vapor density of 0.0076 kg/m.sup.3 or less; and storing the same in a dry atmosphere having a water vapor density of 0.0076 kg/m.sup.3 or less. A coating solution including compounds that are easily hydrolyzed is stored in a dry state so that the material is not deactivated before reacting with a substrate.

Abstract: A chemically adsorbed multilayer film is formed through the process of replacing a halogen atom on the surface of a chemically adsorbed film with an alkaline metal or changing the halogen atom to a Grignard group by Grignard reaction. This manufacturing method does not disrupt the molecules of the chemically adsorbed film, is easy to perform, low in cost and is safe. After replacing the halogen (for example, Br) on the surface of the film with an alkaline metal such as Li, a condensation reaction including a dealkalihalide reaction is promoted by contacting the chemically adsorbed film with an adsorbent, such as a chemical adsorbent--containing a halosilane group at one end of a molecule--dissolved in a nonaqueous solvent. A chemically adsorbed multilayer film is then formed by reacting the chemically adsorbed film with chemical absorption composition and with water after removing unreacted adsorbents using a nonaqueous solution.