Patents by Inventor Norihisa Mino

Norihisa Mino has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5466523
    Abstract: A chemically adsorbed film containing hydrophilic groups is formed on a substrate such that it is chemically bonded by Si covalent bonds to the substrate. The adsorbed film has an improved hydrophilic property. In addition, the film provides an excellently durable and transparent fog-proof substrate. According to the method of the invention, a substrate containing hydrophilic groups is contacted with a non-aqueous solution containing a surface active material having straight chain molecules each having at one end a chlorosilyl group and at the other end at least one functional group selected from the group consisting of a bromo group, iodo group, cyano group, thiocyano group, chlorosilyl group etc. to cause a dehydrochlorination reaction between hydrophilic groups on the substrate surface and chlorosilyl groups of the surface active material, thereby forming a chemically adsorbed film on the substrate surface.
    Type: Grant
    Filed: May 31, 1994
    Date of Patent: November 14, 1995
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Kazufumi Ogawa, Norihisa Mino, Mamoru Soga
  • Patent number: 5466487
    Abstract: A chemically adsorbed monomolecular or a laminated monomolecular film comprising a monomolecular film formed on said substrate surface by covalent S-bonds is disclosed. For example, the covalent S-bond is selected of a group consisting of --(S.dbd.O)-- and --(O.dbd.S.dbd.O)--. A method of producing a chemical adsorption film comprising; contacting a substrate containing hydroxl groups present on the surface with a non-aqueous solvent containing a material having a thionyl halide group or sulfuryl haloride group; removing unreacted surface active material remaining on the substrate by washing the substrate with a non-aqueous organic solution for making monomolecular a precursor film; reacting unreacted surface active material remaining on the adsorbed monomolecular precursor film with water; and drying the adsorbed monomolecular film is also disclosed.
    Type: Grant
    Filed: September 30, 1994
    Date of Patent: November 14, 1995
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Tadashi Ohtake, Norihisa Mino, Kazufumi Ogawa
  • Patent number: 5466486
    Abstract: The invention to provide a chemically adsorbed monomolecular lamination film comprising a chemically adsorbed monomolecular film formed via a siloxane-based monomolecular or polymer film on a substrate surface.
    Type: Grant
    Filed: September 30, 1994
    Date of Patent: November 14, 1995
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Kazufumi Ogawa, Norihisa Mino, Mamoru Soga
  • Patent number: 5461166
    Abstract: Disclosed are a conductive thienyl derivative monomolecular film covalently bonded to a substrate surface and method of manufacturing the same, and a silicon compound comprising 3-thienyl groups (thiophene derivative) used for forming the conductive monomolecular film and a method of manufacturing the same. A monomolecular ultrathin film comprising 3-thienyl groups and silicon groups is formed in the invention. The silicon compound used for forming the film is provided by reacting .omega.-(3-thienyl)-1-alkene compound to a monosilane derivative compound, in which three out of four hydrogen atoms of monosilane are replaced with halogen or alkoxy groups, in the presence of a transition metal catalyst. A substrate is dipped and held in a nonaqueous solution of the above-noted compound, thus chemically bonding the monomolecular film to the substrate surface. Furthermore, a thienyl derivative ultrathin film is formed by the electrolytic or catalytic polymerization of the monomolecular film.
    Type: Grant
    Filed: February 3, 1995
    Date of Patent: October 24, 1995
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Norihisa Mino, Kazufumi Ogawa, Toshinobu Ishihara, Mikio Endo, Tohru Kubota, Kazuyuki Asakura
  • Patent number: 5455360
    Abstract: Disclosed are a conductive pyrrole derivative monomolecular film covalently bonded to a substrate surface and method of manufacturing the same, and a monomer used for forming the conductive pyrrole derivative monomolecular film and method of manufacturing the same. The invention relates to a monomolecular ultrathin film comprising 1-pyrrolyl groups and silicon groups. The monomer used for forming the film is provided by reacting .omega.-(1-pyrrolyl)-1-alkene compound to a monosilane derivative compound, in which three out of four hydrogen atoms of monosilane are replaced with halogen or alkoxy groups, in the presence of a transition metal catalyst. A substrate is dipped and held in a nonaqueous solution of the above-noted monomer, thus chemically bonding a monomolecular film to a substrate surface. Furthermore, a polypyrrole derivative ultrathin film is formed by the electrolytic or catalytic polymerization of the monomolecular film.
    Type: Grant
    Filed: August 18, 1993
    Date of Patent: October 3, 1995
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Norihisa Mino, Kazufumi Ogawa, Toshinobu Ishihara, Mikio Endo, Tohru Kubota, Katsuya Takemura
  • Patent number: 5451459
    Abstract: According to the invention, a fluorine-based or siloxane -based chemical adsorbed film containing a fluorocarbon compound can be formed on a given substrate surface in a laminated state and through chemical bonds (i.e., covalent bonds) with the substrate, it is possible to obtain a laminated film which has satisfactory adhesion to the substrate, is substantially pin-hole free and is very thin. Further, since the outermost layer may be substituted by fluorocarbon groups or hydroxyl groups, it is possible to obtain a film which has excellent water- and oil-repelling properties or hydrophilic and oil-repelling properties and can replace fluorine-based coating films, thus improving the performance of products requiring a coating having a water- and oil-repelling resistant property, weather-resistant property, wear-resistant property and so forth which are desirable in electric products, vehicles, industrial devices and so forth.
    Type: Grant
    Filed: July 28, 1994
    Date of Patent: September 19, 1995
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Kazufumi Ogawa, Norihisa Mino, Mamoru Soga
  • Patent number: 5447778
    Abstract: An information recording layer on a substrate provides a method of recording information by selectively opening the rings of dicyclopentadiene skeletons, thus recording information by forming cyclopentadiene skeletons. The information recorded by the method can be erased by the cycloaddition of cyclopentadiene skeletons. Information can also be recorded or erased by incorporating or eliminating a metal ion from a selectively opened section of a ring of a dicyclopentadiene skeleton after forming an organic thin film comprising the dicyclopentadiene skeleton. Alternatively, after the formation of an organic thin film comprising a cyclopentadiene skeleton, a heterocycle or a benzene ring, a metal ion is incorporated or eliminated from a section between at least two rings of the cyclopentadiene skeleton, the heterocycle or the benzene ring. Thereafter, a metallocene skeleton or a skeleton analogous to the metallocene skeleton is formed or eliminated, thus recording or erasing information.
    Type: Grant
    Filed: August 17, 1993
    Date of Patent: September 5, 1995
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Tadashi Ohtake, Norihisa Mino, Kazufumi Ogawa
  • Patent number: 5443511
    Abstract: A medical member having active hydrogen groups such as hydroxyl, amino or imino groups at its surface, is dipped, either directly or after formation of an inner layer on its surface, into a solution. The solution is prepared by dissolving a surface active material, e.g., CF.sub.b 3 (CF.sub.2).sub.7 (CH.sub.2).sub.2 SiCl.sub.3 in a non-aqueous solvent. A dehydrochlorination reaction is brought about between active hydrogen groups at the surface of the member and SiCl groups of the surface active material, thus producing bonds ofCF.sub.3 (CF.sub.2).sub.7 (CH.sub.2).sub.2 Si(O--).sub.3over the entire surface. A fluorine-containing monomolecular film is formed, which is chemically (or covalently) bonded to the member surface and has a thickness at the nanometer level. Since the chemically adsorbed film is covalently bonded to the member or inner layer, it is chemically stable and difficult to separate.
    Type: Grant
    Filed: July 12, 1993
    Date of Patent: August 22, 1995
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Kazufumi Ogawa, Norihisa Mino, Mamoru Soga
  • Patent number: 5443901
    Abstract: A magnetic recording film, which has excellent slip durability, is run-proof and wear-proof as well as self-lubricating, is obtained by forming a chemically adsorbed film composed of straight carbon chain surface active materials having different carbon numbers, the chemically adsorbed film being chemically bonded via siloxane covalently bonds.In the method of manufacture, a magnetic recording medium, e.g., a hard disk, is contacted with a solution which is made by dissolving a straight carbon chain surface active material having a chlorosilyl group at one end and a fluorocarbon or hydrocarbon group at the other end in a non-aqueous solvent, thereby chemically bonding the chlorosilane-based straight chain surface active material to the surface of the magnetic recording medium via siloxane covalently bonds.
    Type: Grant
    Filed: November 22, 1993
    Date of Patent: August 22, 1995
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Norihisa Mino, Mamoru Soga, Ogawa Kazufumi
  • Patent number: 5436033
    Abstract: The invention concerns an ultra thin polymer film electret comprising a polymer and a substrate having a surface electric charge, wherein a side chain of the polymer and the substrate are physically or chemically bonded. A method of manufacturing an ultra thin polymer film electret comprising: adsorbing a monomolecular film comprising a unsaturated group or a laminated film comprising the monomolecular film on to a substrate surface, irradiating the monomolecular film or the laminated film with an energy beam to polymerize the unsaturated groups and applying a high voltage to the film is also disclosed. Further, a method of manufacturing an ultra thin polymer film electret comprising: physically bonding a side chain of the polymer to a substrate surface to form a thin film and applying a high voltage to the thin film is also disclosed.
    Type: Grant
    Filed: August 1, 1994
    Date of Patent: July 25, 1995
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Norihisa Mino, Yoshikazu Yamagata, Kazufumi Ogawa
  • Patent number: 5425989
    Abstract: A chemically adsorbed film having a surface layer containing fluorine groups and a stem layer chemically bonded by siloxane bonds to a substrate is formed on the surface of a frictional portion of a machine part such as a gear or a bearing or on the surface of a game ball. An excellently self-lubricating low frictional resistance machine part or game ball thus can be obtained. A frictional portion of a gear or the like, made of SiO.sub.2 or like ceramic material, is dipped and held in a solution containing a surface active material, e.g., CF.sub.3 (CF.sub.2).sub.7 (CH.sub.2).sub.2 SiCl.sub.3 dissolved in a non-aqueous solvent. A hydrochloric acid removal reaction is brought about between SiCl groups of the material, which contains a fluorocarbon and a chlorosilane group, and hydroxyl groups numerously present on the SiO2 surface, thus forming bonds ofCF.sub.3 (CF.sub.2).sub.7 (CH.sub.2).sub.2 Si(O--).sub.3over the entire frictional portion surface.
    Type: Grant
    Filed: November 4, 1993
    Date of Patent: June 20, 1995
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Kazufumi Ogawa, Norihisa Mino, Mamoru Soga
  • Patent number: 5425988
    Abstract: A recording and reproducing device is provided. The device comprises a recording medium, a head giving and receiving recording signals to or from the recording medium, and a mechanism section and a circuit section giving and receiving the recording signals, wherein at least one protective film, and at least one fluorine-containing monomolecular film are formed in this order on the recording layer of the recording medium or on the surface of the head which comes into contact with said recording layer, wherein said protective film is a metal film, oxidized metal film, semi-conductor film, oxidized semi-conductor film, or organic monomolecular film, and wherein said fluorine-containing monomolecular film is formed by the chemical adsorption of a specific-type of silane compound that contains a perfluoroalkyl group at the molecular end on the surface of the protective film.
    Type: Grant
    Filed: September 27, 1993
    Date of Patent: June 20, 1995
    Assignees: Matsushita Electrical Industrial Co., Ltd., Shin-Etsu Chemical Co., Ltd.
    Inventors: Kazufumi Ogawa, Norihisa Mino, Toshinobu Ishihara, Mikio Endo, Tohru Kubota, Yasuhisa Tanaka
  • Patent number: 5424098
    Abstract: A method of manufacturing an organic film comprises dipping and holding a substrate having an active hydrogen atom on its surface in a metallic compound having an electrophilic property or solution of the metallic compound and washing the substrate with a nonaqueous solvent, thereby manufacturing a metallic monomolecular film on the substrate surface, or dipping and holding a substrate having an organic monomolecular film in organic compound or acid anhydride of organic compound or solution dissolving the organic solution, thereby, manufacturing an organic monomolecular film on a metallic compound monomolecular film. According to the method of manufacturing an organic film above mentioned, unlike the Langmuir-Blodgett technique, a complicated operation is not required and contamination of impurity to inside of film is avoided. As a result, a film having a complicated structure can be manufactured on a substrate simply.
    Type: Grant
    Filed: September 20, 1993
    Date of Patent: June 13, 1995
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Kazuhiro Nishiyama, Norihisa Mino, Kazufumi Ogawa
  • Patent number: 5407709
    Abstract: This invention provides for an anti-contaminating film which is adsorbed to a substrate surface. The film contains a --Si-- group and fluorocarbon group. The --Si-- group is covalently bonded to the substrate surface. It also provides a forming method of an anti-contaminating film on a hydrogen active substrate surface by contacting the substrate surface with a non-aqueous solution, containing a surface active material having fluorocarbon groups and chlorosilane groups, the substrate surface having active hydrogen groups, removing unreacted surface active material remaining on the substrate by washing the substrate with a non-aqueous organic solution for making a monomolecular precursor film, reacting chlorosilane groups unreacted in the adsorbed monomolecular a precursor film with water after the removing step, and drying the adsorbed monomolecular film.
    Type: Grant
    Filed: November 8, 1993
    Date of Patent: April 18, 1995
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Kazufumi Ogawa, Norihisa Mino, Mamoru Soga
  • Patent number: 5397597
    Abstract: A chemically adsorbed film containing fluorocarbon groups is formed on an optical recording medium. Thus, an excellently water- and moisture-proof optical recording medium can be obtained. The optical recording medium is obtained by forming a chemically adsorbed film composed of fluorocarbon chain surface active material. The chemically adsorbed film is chemically bonded via siloxane covalent bonds. In the method of manufacture, an optical recording medium, e.g., an optical recording disk, is contacted with a solution which is made by dissolving a straight carbon chain surface active material having a chlorosilyl group at one end and a fluorocarbon group at the other end in a non-aqueous solvent or a gaseous phase condition, thereby chemically bonding the chlorosilane-based straight chain surface active material to the surface of the substrate via covalent siloxane bonds.
    Type: Grant
    Filed: July 19, 1993
    Date of Patent: March 14, 1995
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Mamoru Soga, Shinji Ozaki, Norihisa Mino, Kazufumi Ogawa
  • Patent number: 5391913
    Abstract: In the present invention, for the purpose of precluding defective image caused by stains adhering on the surfaces of a semiconductor device and a color filter of a solid-state color image sensor, a semiconductor device excellent in the water- and oil- repellency, anti-soiling property and durability is provided, by forming on the each surface a uniform water- and oil-repellent protective film with a thickness on the order of nanometer, by treating with a nonaqueous solvent containing a chlorosilane surface treating agent having a fluoroalkyl.
    Type: Grant
    Filed: December 24, 1992
    Date of Patent: February 21, 1995
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Yoshiko Mino, Kazufumi Ogawa, Norihisa Mino
  • Patent number: 5380585
    Abstract: The invention to provide a chemically adsorbed monomolecular lamination film comprising a chemically adsorbed monomolecular film formed via a siloxane-based monomolecular or polymer film on a substrate surface.
    Type: Grant
    Filed: March 26, 1993
    Date of Patent: January 10, 1995
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Kazufumi Ogawa, Norihisa Mino, Mamoru Soga
  • Patent number: 5372851
    Abstract: This invention aims to form uniformly and effectively an ultra thin chemical adsorbing film having an excellent water repellent property, oil repellent property, and contamination-proof property on the surface of a substrate by chemically adsorbing in a gas phase atmosphere. A chemically adsorbed film can be formed on any type of substrate and in a short time by chemically adsorbing a chlorosilane based surface-active agent on the surface of a substrate having active hydrogen groups. Further, a chemically adsorbed monomolecular film, or a polymer film, can be formed on any type of substrate and in a short time by forming a siloxane based monomolecular film or a polysiloxane adsorbed film in a gas atmosphere having a chlorosilane based surface-active agent having plurality of chlorosilyl groups.
    Type: Grant
    Filed: December 2, 1992
    Date of Patent: December 13, 1994
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Kazufumi Ogawa, Norihisa Mino, Mamoru Soga, Hidetaka Higashino
  • Patent number: 5372888
    Abstract: Disclosed is an ornament with a thin film formed on the ornament surface. The thin film includes a fluorocarbon-based adsorbed monomolecular film, and the thin film is covalently bonded to the ornament. By contacting the ornament with the non-aqueous solution containing a chlorosilane group at one end and a fluorocarbon chain at the other end, a reaction occurs between hydroxyl groups at the ornament surface and the chlorosilyl groups of the material having a plurality of chlorosilyl groups. A monomolecular film which is covalently bonded to the ornament surface is thereby obtained. A thin, fluorine-containing, monomolecular film thus can be formed on the ornament such that it is chemically bonded to the ornament. The film is anti-contaminating, water- and oil-repelling, durable and does not spoil the intrinsic luster of the ornament.
    Type: Grant
    Filed: February 5, 1992
    Date of Patent: December 13, 1994
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Kazufumi Ogawa, Norihisa Mino, Mamoru Soga
  • Patent number: 5356703
    Abstract: A chemically adsorbed monomolecular or a laminated monomolecular film comprising a monomolecular film formed on said substrate surface by covalent S-bonds is disclosed. For example, the covalent S-bond is selected of a group consisting of --(S.dbd.O)-- and --(O.dbd.S.dbd.O)--. A method of producing a chemical adsorption film comprising; contacting a substrate containing hydroxl groups present on the surface with a non-aqueous solvent containing a material having a thionyl halide group or sulfuryl haloride group; removing unreacted surface active material remaining on the substrate by washing the substrate with a non-aqueous organic solution for making monomolecular a precursor film; reacting unreacted surface active material remaining on the adsorbed monomolecular precursor film with water; and drying the adsorbed monomolecular film is also disclosed.
    Type: Grant
    Filed: July 13, 1992
    Date of Patent: October 18, 1994
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Tadashi Ohtake, Norihisa Mino, Kazufumi Ogawa