Abstract: A spectrum measuring device according to the present disclosure includes an accommodation part having a space for accommodating a culture solution containing a medium and cells, a light source device for irradiating a first surface of the space with excitation light, a light receiving device for receiving fluorescence occurring from the first surface, and an arithmetic device for spectral analysis of the fluorescence received by the light receiving device. In the space, the depth from the first surface of a fluorescence region where fluorescence is produced by incident excitation light is a value giving an internal shield of a prescribed level of less in the fluorescence region. The arithmetic device calculates the fluorescence spectrum of the cells by subtracting the fluorescence spectrum of the medium from the spectrum of the fluorescence of the culture solution obtained by the light receiving device.

Abstract: A device of measuring an amount of lipid accumulation in microalgae includes a flow cell through which a fluid containing the microalgae is supplied to flow, an excitation light source irradiating the flow cell with excitation light, a fluorescence detector detecting autofluorescence generated from a chloroplast of each of the microalgae that have been irradiated with the excitation light, a scattered light detector detecting scattered light caused by each of the microalgae that have been irradiated with the excitation light, and an arithmetic unit calculating a size of the microalga from intensity of the scattered light, calculating a fluorescence density corresponding to intensity of the autofluorescence generated from the chloroplast per unit size of the microalga based on both the intensity of the autofluorescence generated from the chloroplast and the size of the microalga, and calculating an amount of lipid accumulation per microalga from the fluorescence density.

Abstract: A spectrum measuring device according to the present disclosure includes an accommodation part having a space for accommodating a culture solution containing a medium and cells, a light source device for irradiating a first surface of the space with excitation light, a light receiving device for receiving fluorescence occurring from the first surface, and an arithmetic device for spectral analysis of the fluorescence received by the light receiving device. In the space, the depth from the first surface of a fluorescence region where fluorescence is produced by incident excitation light is a value giving an internal shield of a prescribed level of less in the fluorescence region. The arithmetic device calculates the fluorescence spectrum of the cells by subtracting the fluorescence spectrum of the medium from the spectrum of the fluorescence of the culture solution obtained by the light receiving device.

Abstract: A cell survival rate determining device includes a survival rate calculation unit calculating the survival rate of cells in a cell population based on a peak wavelength giving a peak intensity of autofluorescence emitted by the cell population and a peak wavelength of excitation light giving the peak intensity of autofluorescence; and a determination unit determining whether the calculated survival rate of cells is reliable or not based on an amount of a shift and a direction of the shift per unit time in the peak wavelength of autofluorescence and an amount of a shift and a direction of the shift per unit time in the peak wavelength of excitation light.

Abstract: A cell survival rate determining device includes a distribution acquisition unit acquiring a particle size distribution in a solution containing particles including cultured cells; a classification unit classifying the particles into a small particle group and a large particle group using a predetermined threshold in the distribution; a ratio calculation unit calculating the value of a ratio between the number of particles belonging to the small particle group and the number of particles belonging to the large particle group; and a survival rate determination unit determining the survival rate of the cultured cells from the value of the ratio using a pre-acquired relationship between the ratio and cell survival rate.

Abstract: A power supply unit includes primary and secondary circuits and a transformer. The primary circuit is connected to an alternating-current power supply and includes a switching device. The transformer includes primary and secondary windings. The primary winding receives an alternating current so that an alternating current is induced in the secondary winding. The received alternating current is generated through switching using the switching device. The secondary circuit rectifies, for output, the alternating current induced in the secondary winding. The primary winding includes first and second windings. When the alternating-current power supply is a power supply of a first voltage, the first winding is connected to the second winding in parallel in the primary winding. When the alternating-current power supply is a power supply of a second voltage higher than the first voltage, the first winding is connected to the second winding in series in the primary winding.

Abstract: The purpose of the present invention is to provide a pattern measurement device which adequately evaluates a pattern formed by means of a patterning method for forming a pattern that is not in a photomask. In order to fulfil the purpose, the present invention suggests a pattern measurement device provided with a computation device for measuring the dimensions between patterns formed on a sample, wherein: the centroid of the pattern formed on the sample is extracted from data to be measured obtained by irradiating beams; a position alignment process is executed between the extracted centroid and measurement reference data in which a reference functioning as the measurement start point or measurement end point is set; and the dimensions between the measurement start point or the measurement end point of the measurement reference data, which was subjected to position alignment, and the edge or the centroid of the pattern contained in the data to be measured is measured.

Abstract: A pattern-measuring apparatus and a semiconductor-measuring system are provided which are able to obtain an evaluation result for suitably selecting processing with respect to a semiconductor device. In particular, there is proposed a pattern-measuring apparatus including an arithmetic device which compares a circuit pattern of an electronic device with a reference pattern, in which the arithmetic device classifies the circuit pattern in processing unit of the circuit pattern on the basis of a comparison of a measurement result between the circuit pattern and the reference pattern with at least two threshold values.

Abstract: A fluorescent particle measuring method comprising the steps of trapping a fluorescent particle included in a fluid that is to be evaluated; identifying, by a material analyzing device, a material of a fluorescent particle that has been trapped; measuring, by a fluorescent particle measuring device, a number of fluorescent particles included in the fluid; and identifying, as the material of a fluorescent particle that has been measured by the fluorescent particle measuring device, a material identified by the material analyzing device.

Abstract: A cell survival rate determining device includes a survival rate calculation unit calculating the survival rate of cells in a cell population based on a peak wavelength giving a peak intensity of autofluorescence emitted by the cell population and a peak wavelength of excitation light giving the peak intensity of autofluorescence; and a determination unit determining whether the calculated survival rate of cells is reliable or not based on an amount of a shift and a direction of the shift per unit time in the peak wavelength of autofluorescence and an amount of a shift and a direction of the shift per unit time in the peak wavelength of excitation light.

Abstract: A cell survival rate determining device includes a distribution acquisition unit acquiring a particle size distribution in a solution containing particles including cultured cells; a classification unit classifying the particles into a small particle group and a large particle group using a predetermined threshold in the distribution; a ratio calculation unit calculating the value of a ratio between the number of particles belonging to the small particle group and the number of particles belonging to the large particle group; and a survival rate determination unit determining the survival rate of the cultured cells from the value of the ratio using a pre-acquired relationship between the ratio and cell survival rate.

Abstract: A pattern-measuring apparatus and a semiconductor-measuring system are provided which are able to obtain an evaluation result for suitably selecting processing with respect to a semiconductor device. In particular, there is proposed a pattern-measuring apparatus including an arithmetic device which compares a circuit pattern of an electronic device with a reference pattern, in which the arithmetic device classifies the circuit pattern in processing unit of the circuit pattern on the basis of a comparison of a measurement result between the circuit pattern and the reference pattern with at least two threshold values.

Abstract: A power supply unit includes primary and secondary circuits and a transformer. The primary circuit is connected to an alternating-current power supply and includes a switching device. The transformer includes primary and secondary windings. The primary winding receives an alternating current so that an alternating current is induced in the secondary winding. The received alternating current is generated through switching using the switching device. The secondary circuit rectifies, for output, the alternating current induced in the secondary winding. The primary winding includes first and second windings. When the alternating-current power supply is a power supply of a first voltage, the first winding is connected to the second winding in parallel in the primary winding. When the alternating-current power supply is a power supply of a second voltage higher than the first voltage, the first winding is connected to the second winding in series in the primary winding.

Abstract: An object of the present invention is to provide a pattern-measuring apparatus and a semiconductor-measuring system which are able to obtain an evaluation result for suitably selecting processing with respect to a semiconductor device. In the present invention for attaining the object described above, there is proposed a pattern-measuring apparatus including an arithmetic device which compares a circuit pattern of an electronic device with a reference pattern, in which the arithmetic device classifies the circuit pattern in processing unit of the circuit pattern on the basis of a comparison of a measurement result between the circuit pattern and the reference pattern with at least two threshold values.

Abstract: The purpose of the present invention is to provide a pattern measurement device which evaluates quantitatively and with high precision random patterns such as finger print patterns. In order to fulfill this purpose, a pattern measurement device which measures the pattern on a sample on the basis of an image acquired by a charged particle beam is proposed which selectively extracts linear or linearly approximable parts of the pattern on the sample, and outputs at least one of the following: the measurement of the distance between the extracted parts, the ratio of said extracted parts in a prescribed region, and the length of said extracted parts. Further, as a more specific embodiment, a pattern measurement device is proposed which calculates a frequency depending on a distance value between extracted parts, and outputs, as a pattern distance, distance values for which said frequency fulfills a prescribed condition.

Abstract: A fluorescent particle measuring method comprising the steps of trapping a fluorescent particle included in a fluid that is to be evaluated; identifying, by a material analyzing device, a material of a fluorescent particle that has been trapped; measuring, by a fluorescent particle measuring device, a number of fluorescent particles included in the fluid; and identifying, as the material of a fluorescent particle that has been measured by the fluorescent particle measuring device, a material identified by the material analyzing device.

Abstract: An image forming apparatus includes an image forming unit, a power supply switching unit, a switching unit, a switch detecting unit, and a controller. The image forming unit forms an image. The power supply switching unit switches the image forming unit between a power supplied state and a power shut-off state. The switching unit outputs a signal when operated by a user. The switch detecting unit detects the signal output by the switching unit, and transmits a power off signal to the power supply switching unit. The controller receives the signal output by the switching unit, and if normally operating, transmits a signal that invalidates the power off signal or a signal that prevents the transmission of the power off signal.

Abstract: The purpose of the present invention is to provide a pattern measurement device which adequately evaluates a pattern formed by means of a patterning method for forming a pattern that is not in a photomask. In order to fulfil the purpose, the present invention suggests a pattern measurement device provided with a computation device for measuring the dimensions between patterns formed on a sample, wherein: the centroid of the pattern formed on the sample is extracted from data to be measured obtained by irradiating beams; a position alignment process is executed between the extracted centroid and measurement reference data in which a reference functioning as the measurement start point or measurement end point is set; and the dimensions between the measurement start point or the measurement end point of the measurement reference data, which was subjected to position alignment, and the edge or the centroid of the pattern contained in the data to be measured is measured.

Abstract: A technique of forming an asymmetric pattern by using a phase shift mask, and further, techniques of manufacturing a diffraction grating and a semiconductor device, capable of improving accuracy of a product and capable of shortening manufacturing time. In a method of manufacturing a diffraction grating by using a phase shift mask (in which a light shield part and a light transmission part are periodically arranged), light emitted from an illumination light source is transmitted through the phase shift mask, and a photoresist on a surface of a Si wafer is exposed by providing interference between zero diffraction order light and positive first diffraction order light which are generated by the transmission through this phase shift mask onto the surface of the Si wafer, and a diffraction grating which has a blazed cross-sectional shape is formed on the Si wafer.

Abstract: The present invention aims to provide a pattern dimension measurement method for accurately measuring an amount of shrinkage of a pattern that shrinks and an original dimension value before the shrinkage and a charged particle beam apparatus. In order to attain the above-mentioned object, there are proposed a pattern dimension measurement method and a charged particle beam apparatus that are characterized by: forming a thin film on a sample including the pattern after carrying out beam scanning onto a first portion of the pattern; acquiring a first measurement value by scanning a beam onto a region corresponding to the first portion on which the thin film is formed; acquiring a second measurement value by scanning a beam onto a second portion that has identical dimensions as those of the first portion on design data; and finding the amount of shrinkage of the pattern based on subtraction processing of subtracting the first measurement value from the second measurement value.