Abstract: A fluid containing member includes a first containing chamber that contains a first fluid, and a second containing chamber that contains a second fluid. The first containing chamber and the second containing chamber are separated from each other by a first separation film on a side of the first containing chamber and a second separation film on a side of the second containing chamber. The first separation film and the second separation film are partly connected to each other or partly contact each other so as to move together in accordance with a change in an internal pressure of the first containing chamber or an internal pressure of the second containing chamber.

Abstract: There is provided an ejection material receiving unit capable of increasing the filling amount of ejection material with as little enlargement of the container itself as possible and an ejection material ejecting apparatus including the unit. Therefore, an ejection material receiving unit includes: a first receiving space capable of receiving ejection material; a second receiving space capable of receiving liquid; and a flexible member separating the first receiving space and the second receiving space, and is characterized in that the flexible member has a concave part which takes a concave shape in a state where the first receiving space is not filled with the ejection material and the second receiving space is not filled with the liquid, and the concave shape is a shape dented toward the second receiving space from the first receiving space, and is also a shape conforming to a wall forming the second receiving space.

Abstract: An imprint apparatus comprises a mold holder configured to move while holding the mold, and a substrate holder including a plurality of suction regions for chucking the substrate and configured to move while holding the substrate. When performing the mold separation, among the plurality of suction regions, a suction force of a suction region at a position where the mold is to be separated from the imprint material is made weaker than a suction force of a suction region on a peripheral side of the substrate than the position where the mold is to be separated, and the mold holder is tilted after at least one of the mold holder and the substrate holder is moved by a predetermined amount so as to widen a gap between the mold and the substrate.

Abstract: The present invention provides an imprint apparatus that molds an imprint material on a shot region of a substrate by using a mold, comprising a detection unit configured to detect first light with which a first mark of the mold and a second mark of the substrate are irradiated and measure a position deviation between the first mark and the second mark, a heating unit configured to irradiate the substrate with second light for heating the substrate and deforming the shot region, and a control unit configured to control alignment between the mold and the substrate based on the position deviation, wherein a parameter of the detection unit or the heating unit is set not to detect the second light by the detection unit while the first light is detected and the substrate is irradiated with the second light.

Abstract: Provided is an ejection device and an imprint apparatus which can suppress ejection failures and breakage of a mold. To achieve this, a circulation mechanism including a degassing unit is provided in an ejection head.

Abstract: The present invention provides an imprint apparatus that molds an imprint material on a shot region of a substrate by using a mold, comprising a detection unit configured to detect first light with which a first mark of the mold and a second mark of the substrate are irradiated and measure a position deviation between the first mark and the second mark, a heating unit configured to irradiate the substrate with second light for heating the substrate and deforming the shot region, and a control unit configured to control alignment between the mold and the substrate based on the position deviation, wherein a parameter of the detection unit or the heating unit is set not to detect the second light by the detection unit while the first light is detected and the substrate is irradiated with the second light.

Abstract: There is provided an ejection material receiving unit capable of increasing the filling amount of ejection material with as little enlargement of the container itself as possible and an ejection material ejecting apparatus including the unit. Therefore, an ejection material receiving unit includes: a first receiving space capable of receiving ejection material; a second receiving space capable of receiving liquid; and a flexible member separating the first receiving space and the second receiving space, and is characterized in that the flexible member has a concave part which takes a concave shape in a state where the first receiving space is not filled with the ejection material and the second receiving space is not filled with the liquid, and the concave shape is a shape dented toward the second receiving space from the first receiving space, and is also a shape conforming to a wall forming the second receiving space.

Abstract: A fluid containing member includes a first containing chamber that contains a first fluid, and a second containing chamber that contains a second fluid. The first containing chamber and the second containing chamber are separated from each other by a first separation film on a side of the first containing chamber and a second separation film on a side of the second containing chamber. The first separation film and the second separation film are partly connected to each other or partly contact each other so as to move together in accordance with a change in an internal pressure of the first containing chamber or an internal pressure of the second containing chamber.

Abstract: An imprint apparatus molds an uncured resin on a substrate and cures the resin to form a pattern of the cured resin on the substrate. The apparatus includes a mold holding unit that holds the mold, a substrate holding unit that holds the substrate, a deforming unit that deforms the mold held by the mold holding unit into a convex shape toward the substrate, a driving unit that changes an attitude of the mold or the substrate during a releasing operation in which the mold deformed into the convex shape is released from the resin to thereby make the position of a contact region at which the mold is brought into contact with the resin movable, a measuring unit that acquires image information indicating a state of the contact region, and a control unit configured to control the operation of the driving unit based on the image information.

Abstract: The present invention provides an imprint apparatus including an amplifier configured to amplify a signal of displacement between a mold and a substrate, and a control unit configured to perform alignment between the mold and the substrate based on the amplified signal, wherein the control unit performs the alignment through a first operation of moving the substrate with respect to the mold in a first direction and a second operation of moving the substrate with respect to the mold in a second direction that is opposite to the first direction, and in the first operation, the control unit sets the gain of the amplifier to a first gain and changes the gain of the amplifier from the first gain to a second gain.

Abstract: The present invention provides an imprint apparatus which forms an imprint material on a substrate using a mold, comprising a driving unit driving at least one of the mold and the substrate, a measurement unit measuring a position deviation amount between the mold and the substrate, and a control unit controlling alignment between the mold and the substrate based on the position deviation amount, wherein in a first period from a start of contact between the mold and the imprint material until a distance between the mold and the substrate falls within a target range, and a second period in which the distance is maintained, the control unit obtains a command value for controlling the driving unit and controls the driving unit such that a amplification factor of the command value in the second period is larger than that in the first period.

Abstract: An imprint apparatus forms a pattern of an imprint material on a substrate by using a mold. A substrate holding unit holds the substrate by a suction force between the substrate and a holding surface and includes a first suction unit for sucking a rear surface of a first region of the substrate with a first suction force and a second suction unit for sucking a rear surface of a second region of the substrate with a second suction force. A deformation mechanism deforms a shape of the first region in a direction along the holding surface when forming the pattern of the imprint material on the first region. An adjusting unit adjusts the first and second suction forces. The first suction force is less than the second in at least a portion of a period during the deforming of the shape of the first region by the deformation mechanism.

Abstract: An imprint apparatus forms a pattern of a resin on a region to be processed of a substrate using a mold including a pattern region on which a pattern is formed and includes a correction unit configured to correct a shape of a target region that is either the pattern region on the mold or the region to be processed on the substrate, wherein the correction unit further includes: a heating unit configured to heat an object corresponding to the target region of either the mold or the substrate in a heating region having an area smaller than that of the pattern region on the mold; a scanning unit configured to scan the heating region with respect to the target region by changing the relative position of the target region and the heating region; and a control unit configured to acquire information regarding a correction deformation amount of the target region and control the heating unit and the scanning unit based on the information.

Abstract: An imprinting apparatus can form a pattern of an imprint material supplied to a substrate with a mold. The imprinting apparatus includes a substrate holding unit configured to hold the substrate, a mold holding unit configured to hold the mold, and a control unit configured to control the mold holding unit that changes an inclination of the mold while the mold is kept in contact with the imprint material based on a position in a surface direction of the substrate where the mold contacts the imprint material, in such a way as to reduce a relative inclination between the mold and the substrate that may occur if the substrate holding unit inclines when the mold is brought into contact with the imprint material.

Abstract: An imprint apparatus that forms a pattern of an imprint material on a substrate-side pattern region of a substrate by using a mold. A heating unit heats a partial region of the substrate, the partial region corresponding to the substrate-side pattern region, by irradiating the substrate with light that has passed through the mold and has a first wavelength different from light having a second wavelength for curing the imprint material. The heating unit heats the partial region to deform the substrate-side pattern region by forming an uneven temperature distribution on the substrate-side pattern region by an irradiation of the light having the first wavelength with an uneven illumination distribution.

Abstract: An imprint apparatus forms a pattern of an imprint material on a substrate by using a mold. A substrate holding unit holds the substrate by a suction force between the substrate and a holding surface and includes a first suction unit for sucking a rear surface of a first region of the substrate with a first suction force and a second suction unit for sucking a rear surface of a second region of the substrate with a second suction force. A deformation mechanism deforms a shape of the first region in a direction along the holding surface when forming the pattern of the imprint material on the first region. An adjusting unit adjusts the first and second suction forces. The first suction force is less than the second in at least a portion of a period during the deforming of the shape of the first region by the deformation mechanism.

Abstract: An imprint apparatus that transfers a pattern formed on a mold onto a resin on a substrate. A light irradiation unit irradiates the resin with light to cure the resin. A shape correction mechanism applies a force to the mold to deform a pattern region formed on the mold. A heating mechanism heats a substrate-side pattern region formed on the substrate to deform the substrate-side pattern region. A control unit obtains information regarding a difference between shapes of the pattern region formed on the mold and the substrate-side pattern region and controls the shape correction mechanism and the heating mechanism so as to reduce the difference between the shapes of the pattern region formed on the mold and the substrate-side pattern region based on the obtained information. The control unit controls a temperature distribution in the substrate-side pattern region by using the heating mechanism.

Abstract: An imprint method of forming a pattern of a resin on a substrate held on a holding surface. An uncured resin on the substrate is brought in contact with a mold. A partial region of the substrate is thermally deformed by irradiating the region with light so as to change an outer circumferential shape of the region. The uncured resin is cured on the region by irradiating light having a wavelength different from the deforming light. The mold is released from the cured resin on the region in contact with the mold. In at least a portion of a period during the deforming step, a region different from the region is held at a first suction force, while the region is held at a second suction force less than the first. The first suction force and the second suction force act between the substrate and the holding surface.

Abstract: The exposure apparatus of the present invention has an original holding unit including a holding frame that holds an original M by attracting the outer peripheral portion thereof and a drive unit that is capable of moving the holding frame while changing an irradiation area of the light to be irradiated on a pattern. Here, the holding frame has a penetrating portion, which is capable of flowing gas which is present in a space defined by the original and the holding frame into and out from the space, provided at both front and back lateral sides of the holding frame in the direction of movement thereof, and the penetrating portion has a shape or a configuration such that the pressure loss in the flow of the gas in a first direction is less than the pressure loss in the flow of the gas in a second direction.

Abstract: A mold for use in an imprinting apparatus that forms patterns of an imprint material on a plurality of shot regions on a substrate includes a plurality of pattern regions for forming the patterns. The pattern regions are disposed so as not to be next to each other in a first direction and a second direction. The plurality of pattern regions each have a first peripheral region and a second peripheral region at both ends in the first direction. The first peripheral region and the second peripheral region are disposed such that, in forming the patterns in the plurality of shot regions along the first direction, a pattern of the imprint material formed in a shot region using the first peripheral region of the pattern region is superposed on a pattern of the imprint material formed in a next shot region using the second peripheral region.