Patents by Inventor Ofer Saphier

Ofer Saphier has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20070287080
    Abstract: A method of manufacturing includes depositing a material on a surface of a substrate in a liquid form using an inkjet process, whereby the material dries in an initial shape on the substrate. A photolithographic process is applied using a mask that is separate from the substrate in order to modify the initial shape.
    Type: Application
    Filed: October 26, 2006
    Publication date: December 13, 2007
    Inventors: Arie Glazer, David Bochner, Gershon Miller, Ofer Saphier, Mannie Dorfan
  • Publication number: 20070287351
    Abstract: A method of manufacturing includes depositing a material on a surface of a substrate in a liquid form using an inkjet process, whereby the material dries in an initial shape on the substrate. A photolithographic process is applied using a mask that is separate from the substrate in order to modify the initial shape.
    Type: Application
    Filed: December 29, 2006
    Publication date: December 13, 2007
    Applicant: ORBOTECH LTD.
    Inventors: Arie Glazer, David Bochner, Gershon Miller, Ofer Saphier, Mannie Dorfan
  • Publication number: 20070171404
    Abstract: An inspection system operative to inspect patterned devices having microscopic conductors, the system comprising a camera viewing a location of a candidate defect on a patterned substrate and acquiring thereat at least one image of the location, the camera defining an optical axis, the at least one image being illuminated by at least one illumination offset from the optical axis, the illumination being supplied along at least first and second axes of illumination that are mutually non-parallel in a plane corresponding to a plane of the patterned substrate, wherein a response to the illumination supplied along the first axis is differentiable from a response to the illumination supplied along the second axis and a defect classifier operative to receive the at least one image and to distinguish therewithin a candidate defect caused by a cut or a candidate defect caused by excess material, from one another and/or from other types of candidate defects.
    Type: Application
    Filed: January 26, 2006
    Publication date: July 26, 2007
    Inventors: Raphael Ben-Tulila, Emil Berladsky, Ilya Leizerson, Ofer Saphier
  • Publication number: 20070160283
    Abstract: Apparatus for high resolution processing of a generally planar workpiece having microscopic features to be imaged, comprising a video camera acquiring at least two candidate images of a microscopic portion on generally planar workpiece; a motion controller operative to effect motion, relative to the workpiece, of at least an optical element of the video camera along an optical axis extending generally normally to a location on a surface of the workpiece, the video camera acquiring the at least two candidate images at selected time intervals, each of the at least two candidate images differing by at least one image parameter; an image selector operative to select an individual image from among the at least two candidate images according to predefined criteria of image quality; and a selected image analyzer operative to analyze at least a portion of the individual image selected by the image selector.
    Type: Application
    Filed: January 11, 2006
    Publication date: July 12, 2007
    Inventors: Ofer Saphier, Raanan Adin, David Fisch