Patents by Inventor Osamu Kuroda

Osamu Kuroda has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7492812
    Abstract: An RFID transceiver device is capable of high sensitivity reception, by the reduction of noise, irrespective of the distance to the tag. The RFID transceiver device includes a delay circuit between a local oscillation circuit and a demodulation circuit, wherein the amount of delay of the delay circuit is set to a magnitude corresponding to the path difference between the path of leakage, via a duplexer into the demodulation circuit, of transmission signal output from the local oscillation circuit for transmission, and the path of direct input of the local oscillation signal from the local oscillation circuit to the demodulation circuit.
    Type: Grant
    Filed: August 24, 2005
    Date of Patent: February 17, 2009
    Assignee: Fujitsu Limited
    Inventors: Teruhisa Ninomiya, Yusuke Kawasaki, Osamu Kuroda, Yoshinori Tanaka
  • Patent number: 7449709
    Abstract: A cassette is delivered from a cassette loader through a stock unit to a releasing unit. After a stimulable phosphor panel is supplied from the cassette to a reading unit by an unlocking mechanism and a panel ejecting mechanism, the cassette is fed to a position below an erasing unit so as to wait for the stimulable phosphor panel. After recorded radiation image information is read from the stimulable phosphor panel by the reading unit, the stimulable phosphor panel is fed to the erasing unit, which erases remaining radiation image information from the stimulable phosphor panel. Thereafter, the stimulable phosphor panel is stored back into the waiting cassette, which is delivered to a cassette discharger.
    Type: Grant
    Filed: September 16, 2005
    Date of Patent: November 11, 2008
    Assignee: FUJIFILM Corporation
    Inventors: Yuzuru Ohtsuka, Masakazu Nakajo, Osamu Kuroda, Yoshihiro Ishikawa, Hideki Suzuki, Yasunori Ohta
  • Patent number: 7438866
    Abstract: A catalyst for use in purifying exhaust gas from an internal combustion engine. The active components of an exhaust gas purification catalyst for an internal combustion engine tend to be melted or softened and then to move outside the carrier, because the components become in contact with exhaust gas at a high temperature. Hence, anchoring materials are provided between carriers in order to suppress the moving of catalytically active components. Anchoring materials 22 do not form compounds with catalytically active components 24, and are selected from substances that do not melt even in contact with exhaust gas at a high temperature. When the active components contain sodium, potassium, cesium, lithium, strontium, barium, noble metals and the like, the best anchoring material is MgO. The anchoring material functions as a barrier that prevents the moving of active components.
    Type: Grant
    Filed: February 2, 2001
    Date of Patent: October 21, 2008
    Assignee: Hitachi, Ltd.
    Inventors: Hidehiro Iizuka, Mariko Okude, legal representative, Masato Kaneeda, Hisao Yamashita, Yuichi Kitahara, Osamu Kuroda, Kojiro Okude
  • Publication number: 20080210278
    Abstract: A substrate processing apparatus is provided. The apparatus includes a plurality of fluid suppliers 61, 61, 63 for supplying different processing fluids. In processing a wafer W, the substrate processing apparatus moves the fluid suppliers 61, 62, 63 along the peripheral part of the wafer W relatively. The fluid suppliers 61, 62, 63 are arranged in a direction extending from the circumference of the wafer W to its inside. With the arrangement, the apparatus is capable of stable processing of the wafer W in spite of rotating the wafer W at a low speed. Further, it is possible to improve a throughput of the apparatus in resist processing.
    Type: Application
    Filed: May 8, 2008
    Publication date: September 4, 2008
    Inventors: Takehiko Orii, Tatsuya Nishida, Osamu Kuroda
  • Patent number: 7404407
    Abstract: The substrate processing apparatus has an enclosure structure enclosing a substrate support member to define a processing space. The enclosure structure has an opening closed by a shutter. A processing fluid supply unit, which supplies processing fluid, such as chemical liquid, is accommodated in a housing. The processing fluid supply unit accommodated in the housing is advanced into the processing space through the opening of the enclosure structure to feed the processing fluid onto the substrate supported by the substrate support member.
    Type: Grant
    Filed: December 26, 2006
    Date of Patent: July 29, 2008
    Assignee: Tokyo Electron Limited
    Inventors: Takehiko Orii, Osamu Kuroda
  • Patent number: 7387131
    Abstract: A substrate processing apparatus for processing a substrate With a processing fluid is provided. The apparatus includes holding members 60 for holding the substrate W, a chuck member 61 for supporting the holding members 60 and a top-face member 62 approaching the substrate W to cover its surface. In arrangement, since the top-face member 62 is supported by the chuck member 61, the holding members 60 can rotate together with the top-face member 62 in one body. With this structure, it is possible to reduce the influence of particles on the substrate W and also possible to provided a low-cost substrate processing apparatus occupied as little installation space as possible.
    Type: Grant
    Filed: January 29, 2003
    Date of Patent: June 17, 2008
    Assignee: Tokyo Electron Limited
    Inventors: Osamu Kuroda, Hiroki Taniyama, Takayuki Toshima
  • Publication number: 20080125992
    Abstract: According to evaluation of tone quality of exhaust sound adapted to human audition, a characteristic of the tone quality of exhaust sound is objectively analyzed. There are provided a measuring process (M1) for sampling exhaust sound to be analyzed, by means of a microphone disposed in an exhaust system EX and converting the exhaust sound into an electric signal, an analyzing process (M2) for amplifying a high frequency component of the electric signal and performing a frequency analysis of the electric signal at an arbitrary time interval, a detecting process (M3) for detecting a first formant of the first peak from the low frequency side and a second formant of the second peak from the low frequency side, and a displaying process (M4) for displaying a relationship (brightness and sharpness) between the first formant and second formant in a predetermined time range.
    Type: Application
    Filed: June 28, 2005
    Publication date: May 29, 2008
    Applicant: SANGO CO., LTD
    Inventor: Osamu Kuroda
  • Patent number: 7332055
    Abstract: A substrate processing apparatus is provided. The apparatus includes a plurality of fluid suppliers 61, 61, 63 for supplying different processing fluids. In processing a wafer W, the substrate processing apparatus moves the fluid suppliers 61, 62, 63 along the peripheral part of the wafer W relatively. The fluid suppliers 61, 62, 63 are arranged in a direction extending from the circumference of the wafer W to its inside. With the arrangement, the apparatus is capable of stable processing of the wafer W in spite of rotating the wafer W at a low speed. Further, it is possible to improve a throughput of the apparatus in resist processing.
    Type: Grant
    Filed: August 1, 2002
    Date of Patent: February 19, 2008
    Assignee: Tokyo Electron Limited
    Inventors: Takehiko Orii, Tatsuya Nishida, Osamu Kuroda
  • Publication number: 20080003967
    Abstract: A receiver device 1 comprises a gain control portion 40 which regulates a received signal by controlling the opening and closing of a switch 52 which bypasses a first amplifier 12 and providing variable control over the gain of a second amplifier 16, and which also switches the gain of the second amplifier 16 to compensate for gain fluctuations due to the opening and closing of the switch 12. This gain control portion 40 also comprises a digital logic circuit which can program a time offset between the open/closing period of the switch 52 and the switching period of the gain of the second amplifier 16.
    Type: Application
    Filed: September 28, 2006
    Publication date: January 3, 2008
    Inventor: Osamu Kuroda
  • Publication number: 20070272480
    Abstract: A single valve member is provided for selecting communication of one of two flow passages constituting an exhaust flow passage, and continuously providing a flow passage area of the selected one of the two flow passages. According to this valve member, a changeover of flow passage between a main flow passage with an exhaust processing device disposed therein and a bypass flow passage is performed, and each flow passage area is regulated, to meet an output requirement, exhaust processing requirement and muffling requirement, appropriately. For example, a single valve member 5 is disposed on the upstream side or downstream side of a start catalytic converter 3, whereby communication of one of a main flow passage 1 and a bypass flow passage 2 is selected, and a flow passage area of the selected passage is continuously provided.
    Type: Application
    Filed: June 28, 2005
    Publication date: November 29, 2007
    Applicant: SANGO CO., LTD.
    Inventors: Osamu Kuroda, Masashi Ota, Masayoshi Tange
  • Patent number: 7288780
    Abstract: A plurality of stacked cassettes are loaded into a cassette loader, and the cassettes loaded in the cassette loader are changed in attitude and stocked in an erected state in a stock unit. After the cassettes are processed, they are discharged in an erected state into a cassette discharger.
    Type: Grant
    Filed: September 21, 2005
    Date of Patent: October 30, 2007
    Assignee: Fujifilm Corporation
    Inventors: Yuzuru Ohtsuka, Masakazu Nakajo, Osamu Kuroda, Yoshihiro Ishikawa, Hideki Suzuki, Yasunori Ohta
  • Publication number: 20070204595
    Abstract: An exhaust gas purification apparatus for use in an internal combustion engine comprises an exhaust gas duct connected to the engine through which exhaust gas containing NOx gas passes, and a catalyst disposed in the exhaust gas duct such that it contacts the exhaust gas. The catalyst chemically adsorbs NOx when a stoichiometric amount of a gaseous oxidizing agent present in the exhaust gas is larger than that of a gaseous reducing agent present in the exhaust gas for reducing NOx, adsorbed NOx is catalytically reduced in the presence of a reducing agent when the stoichiometric amount of the oxidizing agent is not larger that of the reducing agent.
    Type: Application
    Filed: May 9, 2007
    Publication date: September 6, 2007
    Applicants: HITACHI, LTD., HONDA MOTOR CO., LTD.
    Inventors: Hiroshi HANAOKA, Osamu Kuroda, Ryouta Doi, Hidehiro Iizuka, Toshio Ogawa, Hisao Yamashita, Shigeru Azuhata, Yuichi Kitahara, Toshifumi Hiratsuka, Kojiro Okude, Norihiro Shinotsuka, Toshio Manaka
  • Patent number: 7250622
    Abstract: After a housing of a cassette is opened by a suction cup, then a stimulable phosphor sheet is removed from the cassette by a shiftable roller and then fed in an auxiliary scanning direction by a feed mechanism. While being fed in the auxiliary scanning direction, the stimulable phosphor sheet is irradiated with a laser beam emitted from a stimulating optical system. Light emitted from the stimulable phosphor sheet upon exposure to the laser beam is guided through a light guide to a photoelectric transducer. After the recorded radiation image information is read from the stimulable phosphor sheet, the stimulable phosphor sheet is stored back into the cassette, and erasing light from erasing light sources is applied to the stimulable phosphor sheet in the cassette to erase remaining radiation image information from the stimulable phosphor sheet.
    Type: Grant
    Filed: January 21, 2005
    Date of Patent: July 31, 2007
    Assignee: Fujifilm Corporation
    Inventors: Masakazu Nakajo, Yasunori Ohta, Osamu Kuroda, Yuzuru Ohtsuka, Yoshihiro Ishikawa, Hideki Suzuki
  • Publication number: 20070144143
    Abstract: An object of the present invention is to provide a new exhaust gas purification apparatus for an internal combustion engine operated under a condition of an air fuel ratio leaner than a theoretical air fuel ratio, a method for purification of exhaust gas and an exhaust gas purification catalyst, which is suitable for suppressing degradation of the NOx purification catalyst by sulfur components.
    Type: Application
    Filed: March 24, 2004
    Publication date: June 28, 2007
    Applicant: BABCOCK-HITACHI K.K.
    Inventors: Masato Kaneeda, Hidehiro Iizuka, Kazutoshi Higashiyama, Yuichi Kitahara, Osamu Kuroda
  • Publication number: 20070105380
    Abstract: The substrate processing apparatus has an enclosure structure enclosing a substrate support member to define a processing space. The enclosure structure has an opening closed by a shutter. A processing fluid supply unit, which supplies processing fluid, such as chemical liquid, is accommodated in a housing. The processing fluid supply unit accommodated in the housing is advanced into the processing space through the opening of the enclosure structure to feed the processing fluid onto the substrate supported by the substrate support member.
    Type: Application
    Filed: December 26, 2006
    Publication date: May 10, 2007
    Inventors: Takehiko Orii, Tatsuya Nishida, Osamu Kuroda
  • Publication number: 20070105379
    Abstract: The substrate processing apparatus has an enclosure structure enclosing a substrate support member to define a processing space. The enclosure structure has an opening closed by a shutter. A processing fluid supply unit, which supplies processing fluid, such as chemical liquid, is accommodated in a housing. The processing fluid supply unit accommodated in the housing is advanced into the processing space through the opening of the enclosure structure to feed the processing fluid onto the substrate supported by the substrate support member.
    Type: Application
    Filed: December 26, 2006
    Publication date: May 10, 2007
    Inventors: Takehiko Orii, Osamu Kuroda
  • Patent number: 7171973
    Abstract: The substrate processing apparatus has an enclosure structure enclosing a substrate support member to define a processing space. The enclosure structure has an opening closed by a shutter. A processing fluid supply unit, which supplies processing fluid, such as chemical liquid, is accommodated in a housing. The processing fluid supply unit accommodated in the housing is advanced into the processing space through the opening of the enclosure structure to feed the processing fluid onto the substrate supported by the substrate support member.
    Type: Grant
    Filed: July 16, 2002
    Date of Patent: February 6, 2007
    Assignee: Tokyo Electron Limited
    Inventors: Takehiko Orii, Tatsuya Nishida, Osamu Kuroda
  • Publication number: 20060229032
    Abstract: An RFID transceiver device is capable of high sensitivity reception, by the reduction of noise, irrespective of the distance to the tag. The RFID transceiver device includes a delay circuit between a local oscillation circuit and a demodulation circuit, wherein the amount of delay of the delay circuit is set to a magnitude corresponding to the path difference between the path of leakage, via a duplexer into the demodulation circuit, of transmission signal output from the local oscillation circuit for transmission, and the path of direct input of the local oscillation signal from the local oscillation circuit to the demodulation circuit.
    Type: Application
    Filed: August 24, 2005
    Publication date: October 12, 2006
    Inventors: Teruhisa Ninomiya, Yusuke Kawasaki, Osamu Kuroda, Yoshinori Tanaka
  • Patent number: 7108752
    Abstract: A liquid processing apparatus comprises a liquid processing section for applying a liquid processing to wafers W, a carrier delivery section for delivering the carrier housing the wafers W, a carrier stock section capable of storing a plurality of carriers, an interface section for transferring the wafers W between the carrier stock section and the liquid processing section, a carrier transfer device for transferring the carrier, a wafer inspecting device for inspecting the wafers W within the carrier, and a carrier transfer device control section for controlling the carrier transfer device. The carrier transfer device control section controls the carrier transfer device such that the carrier, which has been judged to be capable of a liquid processing on the basis of the result of the inspection of the wafers W, is stored in the carrier stock section, and the liquid processing is started after completion of the inspection of a predetermined number of carriers.
    Type: Grant
    Filed: June 4, 2001
    Date of Patent: September 19, 2006
    Assignee: Tokyo Electron Limited
    Inventor: Osamu Kuroda
  • Patent number: 7102149
    Abstract: The inspection method comprises: preparing a storage fluorescent inspection sheet that has stored and recorded a radiation inspection image which has a density pattern in which one or more low-density and high-density regions having a contrast difference of at least 1:20 are arrayed in a horizontal scanning direction; obtaining an image inspection signal representing the radiation inspection image, by photoelectrically reading the radiation inspection image from the storable fluorescent inspection sheet; and inspecting the influence of stray light, based on an image reproduced from the image inspection signal. An inspection image plate has contrast differences of high-density and low-density regions of at least 1:20.
    Type: Grant
    Filed: March 9, 2001
    Date of Patent: September 5, 2006
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Osamu Kuroda, Hiroyuki Karasawa