Abstract: An exhaust gas purification apparatus for purifying exhaust gas exhausted from a diesel internal combustion engine and containing therein harmful substances including particulates, NOx, HC and CO, at least, comprises a removal part for trapping and removing particulates in the exhaust gas, a purification part for purifying NOx, HC and CO through contact, and a heat transfer part for transferring heat generated in the removal part to the purification part.

Abstract: A light scanning system causes a light spot to scan a surface at a constant speed. The light scanning system includes a light source radiating a light bundle, a deflector which deflects the light bundle, a line image imaging optical system which images the light bundle on a deflecting surface of the deflector as a line image, and a scanning/imaging optical system which images the deflected light bundle on the surface as a light spot. The scanning/imaging optical system consists of a first aspheric mirror which is symmetric with respect to an axis of rotation and is disposed on the light inlet side and a second aspheric mirror which is anamorphic and is disposed on the light outlet side. The first aspheric mirror has a negative power in the light deflecting direction and the second aspheric mirror has a positive power in the light deflecting direction.

Abstract: Nitrogen oxides contained in an exhaust gas emitted from a lean-burn engine-mounted internal combustion engines are eliminated with a high efficiency.

Abstract: In an exhaust gas purification process for eliminating nitrogen oxides contained in a combustion exhaust gas emitted from an internal combustion engine with a reducing gas such as carbon monoxide, hydrocarbons, etc. contained in the exhaust gas in the presence of a catalyst, a catalyst comprising all of Rh, Pt and Pd, at least one member selected from alkali metals and alkaline earth metals, and Mn or its compound, supported on a porous carrier is used.

Abstract: A substrate processing system includes a notch aligner. The notch aligner includes a rotating support device, a servomotor for rotating the rotating support device, a sensor for detecting a notch formed in a wafer, a wafer lifting device, a cylinder actuator for vertically moving the wafer lifting device, and a CPU. The rotating support device holds a wafer in a horizontal position. The sensor detects the notch to determine the orientation of the wafer. The wafer lifting device receives the wafer from the rotating support device and lifts up the wafer from the rotating support device. A notch detection signal provided by the sensor is given to the CPU. The CPU gives control signals to the servomotor and the pneumatic cylinder actuator to operate the servomotor and the cylinder actuator so that the wafer is aligned.

Abstract: A moisture removal device for an internal combustion engine use exhaust gas purifying device with a trapped moisture amount estimation means which estimates amount of moisture exhausted from an internal combustion engine and trapped in the catalyst, a judgement means which judges whether the estimated value of the trapped moisture amount exceeds a predetermined amount, and means for controlling removal of the moisture trapped in the catalyst, wherein when the estimated value of moisture trapped in the catalyst exceeds the predetermined value, a control of removing the moisture in the catalyst is performed. Whereby, since the moisture trapped by the catalyst can be removed and a possible elution of the catalyst components can be prevented, reduction of exhaust gas purifying performance of the catalyst can be prevented.

Abstract: A substrate processing apparatus for processing a substrate With a processing fluid is provided. The apparatus includes holding members 60 for holding the substrate W, a chuck member 61 for supporting the holding members 60 and a top-face member 62 approaching the substrate W to cover its surface. In arrangement, since the top-face member 62 is supported by the chuck member 61, the holding members 60 can rotate together with the top-face member 62 in one body. With this structure, it is possible to reduce the influence of particles on the substrate W and also possible to provided a low-cost substrate processing apparatus occupied as little installation space as possible.

Abstract: An exhaust gas purifying device which can sufficiently perform HC purification even if a lean NOx catalyst included in a metal substrate is used. The exhaust gas purifying device comprises, in an exhaust passage in an internal combustion engine along a flowing direction of the exhaust gas, a lean NOx catalyst including a catalyst layer which purifies nitrogen oxide contained in the exhaust gas under a hyperoxia atmosphere and a metal honeycomb, the lean NOx catalyst having the catalyst layer supported within the metal honeycomb; and a reaction catalyst for subjecting to an oxidation reaction at least hydrocarbon contained in the exhaust gas.

Abstract: A catalyst being formed of a porous supporter supporting alkali metals, Ti and noble metal, or further supporting at least one of rare earth metal and magnesium, being disposed in a flow passage of the internal combustion engine, and being used to purify NOx contained in the exaust gas. The above catalyst has excellent NOx resistance not only to the exaust gas burnt with the stoichiometric air-to-fuel ratio or rich condition, but to the exhaust gas burnt with the lean condition, and furthermore has a high resistivity to poisoning of SOx slightly contained in the fuel.

Abstract: A light scanning system causes a light spot to scan a surface at a constant speed. The light scanning system includes a light source radiating a light bundle, a deflector which deflects the light bundle, a line image imaging optical system which images the light bundle on a deflecting surface of the deflector as a line image, and a scanning/imaging optical system which images the deflected light bundle on the surface as a light spot. The scanning/imaging optical system consists of a first aspheric mirror which is symmetric with respect to an axis of rotation and is disposed on the light inlet side and a second aspheric mirror which is anamorphic and is disposed on the light outlet side. The first aspheric mirror has a negative power in the light deflecting direction and the second aspheric mirror has a positive power in the light deflecting direction.

Abstract: In one embodiment of a liquid processing apparatus, a cleaning unit (CLN) 12 includes a rotary plate 61, supporting members 64a, holding members 64b, a chemical nozzle 51 for supplying a wafer W with a chemical liquid, a spring 120 and a pressing mechanism 121 both of which moves each of the holding members 64b. The pressing mechanism 121 moves the corresponding holding member 64b so that the wafer W is held by the holding members 64b while the wafer W is apart from the supporting members 64a and conversely, the wafer W is supported by the supporting members 64a while the wafer W is apart from the holding members 64b. The spring 120 holds the corresponding holding member 64b so that the wafer W is held by the holding members 64b while the wafer W is apart from the supporting members 64a. By supplying the wafer W held by the holding members 64b with the cleaning liquid, it is possible to prevent an occurrence of unprocessed portions on the cleaned wafer W, accomplishing a uniform cleaning for the wafer W.

Abstract: Exhaust gas from internal combustion engines is treated with catalyst comprising an inorganic oxide supporter which supports at least one of noble metals selected from Rh, Pt, and Pd, alkali rare earth metals, rare earth metals, and magnesium in order to remove NOx effectively with superior durability of the catalyst notwithstanding the internal combustion engine is under a stoichiometric operation condition or a lean burning operation condition.

Abstract: A substrate processing apparatus is provided. The apparatus includes a plurality of fluid suppliers 61, 61, 63 for supplying different processing fluids. In processing a wafer W, the substrate processing apparatus moves the fluid suppliers 61, 62, 63 along the peripheral part of the wafer W relatively. The fluid suppliers 61, 62, 63 are arranged in a direction extending from the circumference of the wafer W to its inside. With the arrangement, the apparatus is capable of stable processing of the wafer W in spite of rotating the wafer W at a low speed. Further, it is possible to improve a throughput of the apparatus in resist processing.

Abstract: The substrate processing apparatus has an enclosure structure enclosing a substrate support member to define a processing space. The enclosure structure has an opening closed by a shutter. A processing fluid supply unit, which supplies processing fluid, such as chemical liquid, is accommodated in a housing. The processing fluid supply unit accommodated in the housing is advanced into the processing space through the opening of the enclosure structure to feed the processing fluid onto the substrate supported by the substrate support member.

Abstract: An exhaust gas purification apparatus for use in an internal combustion engine comprises an exhaust gas duct connected to the engine through which the exhaust gas containing NOx gas passes and a catalyst so disposed in the exhaust gas duct that it contacts with the exhaust gas. The catalyst chemically adsorbs NOx under the condition that a stoichiometric amount of a gaseous oxidizing agent present in the exhaust gas is larger than that of a gaseous reducing agent present in the exhaust gas for reducing NOx, while NOx being adsorbed is catalytically reduced in the presence of the reducing agent under the condition that the stoichiometric amount of the oxidizing agent is not larger than that of the reducing agent. Thereby, NOx, the lean burn exhaust gas in the engine can be effectively made harmlessly.

Abstract: A cleaning apparatus 11 includes a cleaning bath 30 for cleaning wafers W, a wafer guide 31 moving up and down to accommodate the wafers W in the cleaning bath 30, a motor 49 for moving the wafer guide 31 up and down, an absolute encoder 33 for detecting the position of the wafer guide 31, a driver 62 and a controller 63. The absolute encoder 33 detects a rotational angle of a rotating shaft 53 of the motor 49 and outputs a detection signal to the driver 62. Based on this detection signal, the driver 62 detects the position of the wafer guide 31 and further outputs the positional information of the wafer guide 31 to the controller 63. Thus, the invention provides a transferring apparatus and a substrate processing apparatus both of which allow of easy detection of the wafer guide and further facilitate their maintenance.

Abstract: A substrate processing apparatus (1) includes a wafer loading/unloading and arraying part (14) to remove substrates W from a container (C) where a plurality of unprocessed substrates W to be processed are accommodated at regular intervals, substrate arraying part (51a, 51b, 60) for arranging the substrates W having been removed from two containers (C) at the loading/unloading and arraying part (14) at pitches half the pitch to arrange the substrates in the container (C), a processing part (4) for applying a designated process on the substrates (W), a transfer mechanism (17) for transporting the substrates (W) arranged by the substrate array part (51a, 51b, 60) to the processing part (4) and a stand-by part (75) to allow the substrates arranged by the substrate array parts to stand in readiness temporarily.

Abstract: An exhaust gas purification apparatus for use in an internal combustion engine comprises an exhaust gas duct connected to the engine through which the exhaust gas containing NOx gas passes and a catalyst so disposed in the exhaust gas duct that it contacts with the exhaust gas. The catalyst chemically adsorbs NOx under the condition that a stoichiometric amount of a gaseous oxidizing agent present in the exhaust gas is larger than that of a gaseous reducing agent present in the exhaust gas for reducing NOx, while NOx being adsorbed is catalytically reduced in the presence of the reducing agent under the condition that the stoichiometric amount of the oxidizing agent is not larger that of the reducing agent. Thereby, NOx the lean burn exhaust gas in the engine can be effectively made harmlessly.

Abstract: A system having an NOx adsorption catalyst in an exhaust gas flow channel of the internal combustion engine, and adsorbing and capturing NOx in an oxidative atmosphere of an exhaust gas during lean burn running and then producing a reductive atmosphere thereby regenerating the adsorption catalyst, wherein a reduction treatment of NOx is carried out based on an estimated NOx purification rate and the NOx purification rate in the lean burn exhaust gas of the internal combustion engine is always maintained at or about a predetermined level thereby decreasing the amount of exhaust gas discharged.

Abstract: A substrate transporting apparatus includes a wafer transfer arm 10 for carrying a plurality of semiconductor wafers W being processed horizontally, a pitch changer 20 for carrying the wafers W at predetermined intervals vertically and a posture changing device 30 positioned between the wafer transfer arm 10 and the pitch changer 20, for changing the posture of the wafers W to the horizontal and vertical arrangements. The pitch changer 20 includes a first holding part 21A and a second holding part 21B which are adapted so as to elevate relatively to each other. The wafers W are held by either one of the holding parts 21A, 21B at the predetermined intervals. The posture changing device 30 has a pair of holders 31 between which the semiconductor wafers W is interposed. The holders 31 are respectively provided, on their sides opposing each other, with a plurality of holding grooves 32A, 32B for retaining the wafers W independently.