Patents by Inventor Osamu Tanitsu

Osamu Tanitsu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20090316132
    Abstract: There is disclosed a polarization-modulating element for modulating a polarization state of incident light into a predetermined polarization state, the polarization-modulating element being made of an optical material with optical activity and having a circumferentially varying thickness profile.
    Type: Application
    Filed: August 25, 2009
    Publication date: December 24, 2009
    Applicant: NIKON CORPORATION
    Inventors: Osamu Tanitsu, Koji Shigematsu, Hiroyuki Hirota, Tomoyuki Matsuyama
  • Publication number: 20090284727
    Abstract: An illumination optical system is one for illuminating a surface to be illuminated with light from a light source, which has a distribution forming optical system including an optical integrator and forming a pupil intensity distribution on an illumination pupil located behind the optical integrator, and an optical attenuator arranged on a predetermined surface in an optical path behind the optical integrator and having an attenuation characteristic of varying an attenuation rate depending upon an angle of incidence to the predetermined surface.
    Type: Application
    Filed: February 5, 2009
    Publication date: November 19, 2009
    Applicant: NIKON CORPORATION
    Inventors: Kouji Muramatsu, Osamu Tanitsu, Hirohisa Tanaka, Masaya Yamamoto, Norio Miyake, Yasushi Mizuno, Ryuji Takaya, Risa Yoshimoto, Hiroyuki Hirota
  • Publication number: 20090185154
    Abstract: An optical unit comprises a first optical path in which a spatial light modulator with a plurality of optical elements arranged two-dimensionally and controlled individually can be arranged; a second optical path including a mechanism for insertion of an angle distribution providing element including a predetermined fixed pattern on a surface thereof; and a third optical path being an optical path of light having traveled through both of the first optical path and the second optical path. When the angle distribution providing element is inserted in the second optical path, an angle distribution is provided to light exited based on light incident to the angle distribution providing element.
    Type: Application
    Filed: October 31, 2008
    Publication date: July 23, 2009
    Applicant: NIKON CORPORATION
    Inventor: OSAMU TANITSU
  • Publication number: 20090135396
    Abstract: An illumination optical apparatus is able to individually illuminate two regions separate from each other, under required illumination conditions. The illumination optical apparatus comprises a first illumination system to illuminate a illumination region and a second illumination region to illuminate a second illumination region. The first illumination system includes a first variable system which varies a shape or size of a light intensity distribution on an illumination pupil of the first illumination system and the second illumination system includes a second variable system which varies a shape or size of a light intensity distribution on an illumination pupil of the second illumination system. The first variable system and the second variable system vary the light intensity distribution on the illumination pupil of the first illumination system and the light intensity distribution on the illumination pupil of the second illumination system independently of each other.
    Type: Application
    Filed: October 3, 2008
    Publication date: May 28, 2009
    Applicant: NIKON CORPORATION
    Inventors: Yasushi Mizuno, Koji Shigematsu, Kouji Muramatsu, Hirohisa Tanaka, Osamu Tanitsu
  • Publication number: 20090115990
    Abstract: An illumination optical system with a simple structure reduces the effects of illumination variations caused by a spatial coherency of illumination light, while maintaining a high usage efficiency of illumination light that is emitted in pulses. The illumination optical system illuminates an irradiated plane with pulse-emitted illumination light and includes a spatial light modulator including a plurality of mirror elements each of which spatially modulates the illumination light in accordance with an incident position of the illumination light. A modulation control unit controls the mirror elements, whenever at least one pulse light is emitted, in a manner that the optical elements spatially modulate the illumination light differently from one another manner and forms substantially the same intensity distribution for the illumination light on a predetermined plane.
    Type: Application
    Filed: November 6, 2008
    Publication date: May 7, 2009
    Inventors: Soichi Owa, Osamu Tanitsu, Hirohisa Tanaka
  • Publication number: 20090116093
    Abstract: To optionally forming a multilevel light intensity distribution on an illumination pupil plane, the illumination apparatus implements Köhler illumination on an illumination target surface, using as a light source the light intensity distribution formed on the illumination pupil plane on the basis of light from a light source. The illumination apparatus has a spatial light modulator, a condensing optical system, and a control unit. The spatial light modulator has a plurality of reflecting surfaces which are two-dimensionally arranged and postures of which can be controlled independently of each other. The condensing optical system condenses light from the reflecting surfaces to form a predetermined light intensity distribution on the illumination pupil plane.
    Type: Application
    Filed: October 22, 2008
    Publication date: May 7, 2009
    Applicant: NIKON CORPORATION
    Inventor: Osamu TANITSU
  • Publication number: 20090109417
    Abstract: An illumination optical apparatus has an optical unit. The optical unit has a light splitter to split an incident beam into two beams; a first spatial light modulator which can be arranged in an optical path of a first beam; a second spatial light modulator which can be arranged in an optical path of a second beam; and a light combiner which combines a beam having passed via the first spatial light modulator, with a beam having passed via the second spatial light modulator; each of the first spatial light modulator and the second spatial light modulator has a plurality of optical elements arranged two-dimensionally and controlled individually.
    Type: Application
    Filed: October 3, 2008
    Publication date: April 30, 2009
    Applicant: NIKON CORPORATION
    Inventor: Osamu Tanitsu
  • Patent number: 7515247
    Abstract: An illumination optical system for, when installed in an exposure system, realizing a suitable illumination condition by varying the polarized state of the illumination light according to the pattern characteristics of the mask while suppressing the loss of the intensity of the light. The illumination optical system has a light source unit for supplying a linearly polarized light for illuminating surfaces to be illuminated therewith, and a polarized state changing device for changing the polarized state of the illuminating light from a predetermined polarized state to a nonpolarized state and vice versa. The polarized state changing device is arranged in the optical path between the light source unit and the surfaces to be illuminated. The polarized state changing device can be removed from the illumination optical path and has a depolarizer for selectively depolarizing the incident linearly polarized light.
    Type: Grant
    Filed: November 5, 2007
    Date of Patent: April 7, 2009
    Assignee: Nikon Corporation
    Inventors: Osamu Tanitsu, Hirohisa Tanaka, Kenichi Muramatsu, Norio Komine, Hisashi Nishinaga, Tomoyuki Matsuyama, Takehito Kudo
  • Patent number: 7515248
    Abstract: An illumination optical system for, when installed in an exposure system, realizing a suitable illumination condition by varying the polarized state of the illumination light according to the pattern characteristics of the mask while suppressing the loss of the intensity of the light. The illumination optical system has a light source unit for supplying a linearly polarized light for illuminating surfaces to be illuminated therewith, and a polarized state changing device for changing the polarized state of the illuminating light from a predetermined polarized state to a nonpolarized state and vice versa. The polarized state changing device is arranged in the optical path between the light source unit and the surfaces to be illuminated. The polarized state changing device can be removed from the illumination optical path and has a depolarizer for selectively depolarizing the incident linearly polarized light.
    Type: Grant
    Filed: November 5, 2007
    Date of Patent: April 7, 2009
    Assignee: Nikon Corporation
    Inventors: Osamu Tanitsu, Hirohisa Tanaka, Kenichi Muramatsu, Norio Komine, Hisashi Nishinaga, Tomoyuki Matsuyama, Takehito Kudo
  • Publication number: 20090073441
    Abstract: There is disclosed a polarization-modulating element for modulating a polarization state of incident light into a predetermined polarization state, the polarization-modulating element being made of an optical material with optical activity and having a circumferentially varying thickness profile.
    Type: Application
    Filed: October 29, 2008
    Publication date: March 19, 2009
    Applicant: NIKON CORPORATION
    Inventors: Osamu Tanitsu, Koji Shigematsu, Hiroyuki Hirota, Tomoyuki Matsuyama
  • Publication number: 20090073411
    Abstract: An illumination optical system which illuminates a surface to be illuminated on the basis of light from a light source has a first optical path in which a diffractive optical element can be arranged at a first position thereof; a second optical path in which a spatial light modulator with a plurality of optical elements arrayed two-dimensionally and controlled individually can be arranged at a second position thereof; and a third optical path which is an optical path of light having passed via at least one of the first optical path and the second optical path and in which a distribution forming optical system is arranged. The distribution forming optical system forms a predetermined light intensity distribution on an illumination pupil located in the third optical path, based on the light having passed via at least one of the first and second optical paths.
    Type: Application
    Filed: August 14, 2008
    Publication date: March 19, 2009
    Inventor: Osamu TANITSU
  • Publication number: 20090073414
    Abstract: There is disclosed a polarization-modulating element for modulating a polarization state of incident light into a predetermined polarization state, the polarization-modulating element being made of an optical material with optical activity and having a circumferentially varying thickness profile.
    Type: Application
    Filed: October 29, 2008
    Publication date: March 19, 2009
    Applicant: NIKON CORPORATION
    Inventors: Osamu Tanitsu, Koji Shigematsu, Hiroyuki Hirota
  • Publication number: 20090040490
    Abstract: An illumination optical apparatus is able to quickly perform switching of illumination conditions between illumination in a first region and illumination in a second region. The illumination optical apparatus of the present invention to illuminate an illumination target surface on the basis of light from a light source comprises: a path switching member arranged in an optical path between the light source and the illumination target surface and switching an optical path of an exiting beam between a first optical path and a second optical path; a path combining member combining the first optical path and the second optical path; a first pupil distribution forming member arranged in the first optical path and forming a predetermined light intensity distribution on an illumination pupil; and a second pupil distribution forming member arranged in the second optical path and forming a predetermined light intensity distribution on the illumination pupil.
    Type: Application
    Filed: October 16, 2008
    Publication date: February 12, 2009
    Applicant: NIKON CORPORATION
    Inventors: Koji SHIGEMATSU, Osamu TANITSU
  • Publication number: 20090002664
    Abstract: An optical integrator is able to keep down a light-quantity loss in modified illumination with an illumination optical apparatus. An optical integrator of a wavefront division type according to the present invention has a plurality of refracting surface regions which refract incident light, and a plurality of deflecting surface regions provided corresponding to the plurality of refracting surface regions and adapted for changing a traveling direction of the incident light. The plurality of refracting surface regions include a plurality of first refracting surface regions includes an arcuate contour with the center projecting in a first direction, and a plurality of second refracting surface regions includes an arcuate contour with the center projecting in a second direction.
    Type: Application
    Filed: June 19, 2008
    Publication date: January 1, 2009
    Inventor: Osamu Tanitsu
  • Publication number: 20080239274
    Abstract: An illumination optical system for, when installed in an exposure system, realizing a suitable illumination condition by varying the polarized state of the illumination light according to the pattern characteristics of the mask while suppressing the loss of the intensity of the light. The illumination optical system has a light source unit for supplying a linearly polarized light for illuminating surfaces to be illuminated therewith, and a polarized state changing device for changing the polarized state of the illuminating light from a predetermined polarized state to a nonpolarized state and vice versa. The polarized state changing device is arranged in the optical path between the light source unit and the surfaces to be illuminated. The polarized state changing device can be removed from the illumination optical path and has a depolarizer for selectively depolarizing the incident linearly polarized light.
    Type: Application
    Filed: June 2, 2008
    Publication date: October 2, 2008
    Applicant: NIKON CORPORATION
    Inventors: Osamu Tanitsu, Hirohisa Tanaka, Kenichi Muramatsu, Norio Komine, Hisashi Nishinaga, Tomoyuki Matsuyama, Takehito Kudo
  • Patent number: 7423731
    Abstract: An illumination optical system for, when installed in an exposure system, realizing a suitable illumination condition by varying the polarized state of the illumination light according to the pattern characteristics of the mask while suppressing the loss of the intensity of the light. The illumination optical system has a light source unit for supplying a linearly polarized light for illuminating surfaces to be illuminated therewith, and a polarized state changing device for changing the polarized state of the illuminating light from a predetermined polarized state to a nonpolarized state and vice versa. The polarized state changing device is arranged in the optical path between the light source unit and the surfaces to be illuminated. The polarized state changing device can be removed from the illumination optical path and has a depolarizer for selectively depolarizing the incident linearly polarized light.
    Type: Grant
    Filed: May 31, 2005
    Date of Patent: September 9, 2008
    Assignee: Nikon Corporation
    Inventors: Osamu Tanitsu, Hirohisa Tanaka, Kenichi Muramatsu, Norio Komine, Hisashi Nishinaga, Tomoyuki Matsuyama, Takehito Kudo
  • Publication number: 20080094602
    Abstract: An illumination optical system for, when installed in an exposure system, realizing a suitable illumination condition by varying the polarized state of the illumination light according to the pattern characteristics of the mask while suppressing the loss of the intensity of the light. The illumination optical system has a light source unit for supplying a linearly polarized light for illuminating surfaces to be illuminated therewith, and a polarized state changing device for changing the polarized state of the illuminating light from a predetermined polarized state to a nonpolarized state and vice versa. The polarized state changing device is arranged in the optical path between the light source unit and the surfaces to be illuminated. The polarized state changing device can be removed from the illumination optical path and has a depolarizer for selectively depolarizing the incident linearly polarized light.
    Type: Application
    Filed: November 5, 2007
    Publication date: April 24, 2008
    Applicant: NIKON CORPORATION
    Inventors: Osamu Tanitsu, Hirohisa Tanaka, Kenichi Muramatsu, Norio Komine, Hisashi Nishinaga, Tomoyuki Matsuyama, Takehito Kudo
  • Publication number: 20080074632
    Abstract: An illumination optical system for, when installed in an exposure system, realizing a suitable illumination condition by varying the polarized state of the illumination light according to the pattern characteristics of the mask while suppressing the loss of the intensity of the light. The illumination optical system has a light source unit for supplying a linearly polarized light for illuminating surfaces to be illuminated therewith, and a polarized state changing device for changing the polarized state of the illuminating light from a predetermined polarized state to a nonpolarized state and vice versa. The polarized state changing device is arranged in the optical path between the light source unit and the surfaces to be illuminated. The polarized state changing device can be removed from the illumination optical path and has a depolarizer for selectively depolarizing the incident linearly polarized light.
    Type: Application
    Filed: November 5, 2007
    Publication date: March 27, 2008
    Applicant: NIKON CORPORATION
    Inventors: Osamu Tanitsu, Hirohisa Tanaka, Kenichi Muramatsu, Norio Komine, Hisashi Nishinaga, Tomoyuki Matsuyama, Takehito Kudo
  • Publication number: 20080042068
    Abstract: A sensor is used at a substrate level in a lithographic projection apparatus having a projection system with a numeric aperture that is greater than 1 and is configured to project a patterned radiation beam onto a target portion of a substrate The sensor includes a radiation-detector; a transmissive plate having a front surface and a back surface, the transmissive plate being positioned such that radiation projected by the projection system passes into the front surface of the transmissive plate and out of the back surface thereof to the radiation detector; and a luminescent layer provided on the back surface of the transmissive plate, the luminescent layer absorbing the radiation and emitting luminescent radiation of a different wavelength, wherein the back surface is rough.
    Type: Application
    Filed: August 31, 2007
    Publication date: February 21, 2008
    Applicant: NIKON CORPORATION
    Inventors: Hisashi Nishinaga, Ikuo Hikima, Mitsunori Toyoda, Masahiro Nakagawa, Tsuneyuki Hagiwara, Yasushi Mizuno, Naonori Kita, Osamu Tanitsu, Nozomu Emura
  • Patent number: RE39846
    Abstract: An illumination optical apparatus for illuminating an object to be illuminated in an arcuate or rectangular shape. A first optical integrator forms a plurality of light source images in a substantially linear arrangement, based on a beam of parallel rays. Then a second optical integrator forms a plurality of light source images in a substantially square arrangement, based on the beam from the first optical integrator. A relay optical system is disposed between the first and second optical integrator, and makes a position of the light source images formed by the first optical cintegrator conjugate with a position of the light source images formed by the second optical integrator.
    Type: Grant
    Filed: June 3, 1999
    Date of Patent: September 18, 2007
    Assignee: Nikon Corporation
    Inventors: Osamu Tanitsu, Takashi Mori, Noriaki Yamamoto