Abstract: An exposure method is provided, in which a speckle pattern (interference fringe) formed on a pattern of a transfer objective can be reduced without complicating an illumination optical system so much, without increasing the size of the illumination optical system so much, and without prolonging the exposure time, even when an exposure light beam having high coherence is used. A laser beam (LB) as an exposure light beam from an exposure light source (9) is introduced into a ring-shaped delay optical system (22), for example, via a modified illumination mechanism (19) and a light-collecting lens (21). A plurality of light fluxes, which have passed through the interior of the delay optical system (22) a variety of numbers of times depending on angular apertures in accordance with internal reflection, are superimposed and extracted as a laser beam (LB3). The laser beam (LB3) illuminates a reticle (R), for example, via a fly's eye lens (25) and a condenser lens (7).

Abstract: A method and illumination optical system forms a modified illumination configuration on an optical integrator so that a secondary light source having a desired modified illumination configuration is formed and light loss is minimized. A light beam shape changing element that diffuses illumination in a plurality of directions, and an angular light beam forming element that forms a plurality of light source images operate together to create a modified illumination configuration on the optical integrator. Since the secondary light source has a desired modified illumination configuration, an aperture stop used to restrict the size and/or shape of the secondary light source blocks only a small amount of illumination, or can be eliminated altogether.

Abstract: An exposure apparatus with optimum illumination conditions without dependence on the directionality of the fine pattern on a reticle comprises an illumination optical system for illuminating a reticle having a pattern to be transferred and a projection optical system for projecting and transforming the reticle pattern on a substrate. The illumination optical system has pupil shape forming unit for forming four substantially planar light sources on the plane in the vicinity of its pupil. These four substantially planar light sources are arranged at each substantial vertices of a narrow rectangle whose barycenter is located on the illumination optical axis.

Abstract: An illumination optical apparatus successfully realizes mutually different illumination conditions in orthogonal two directions on an illumination objective plane. A magnification-varying optical system for similarly changing the entire size of a secondary multiple light source is arranged in an optical path between a first optical integrator for forming a first multiple light source on the basis of a light beam from a light source and a second optical integrator for forming the second multiple light source having light sources of a larger number on the basis of a light beam from the first multiple light source. The apparatus further comprises an aspect ratio-changing element for changing the aspect ratio of the incoming light beam in order to change the angle of incidence of the incoming light beam into the first optical integrator in a predetermined direction.

Abstract: An illumination optical apparatus (14-40) and exposure apparatus (10) provided with the illumination apparatus, capable of employing a high-output light source. The illumination apparatus comprises, in order along an optical axis, a light source (14) capable of providing a primary light beam (B) having a cross-section, a condenser optical system (30) to condense the primary light beam so as to form a convergence point (F) adjacent the condenser optical system, a light-pipe optical integrator (160) having a rectangular cross-sectional shape with a first side of length dx, a second side of length dy, and a most light-source-wise incident surface (160a) axially spaced from the convergence point by a spacing (L2). The integrator is capable of forming a plurality of secondary light sources and corresponding secondary light beams (B′) from the primary light beam. Adjacent the integrator is an imaging optical system (40) to converge the primary and secondary light beams to illuminate the illumination surface.

Abstract: An illumination optical apparatus (IOA1) and an exposure apparatus (EA1) having same, that reduces coherence in the illumination light beam, which in turn eliminates illumination non-uniformities at the mask (13) and wafer (17). The illumination apparatus comprises, in order along an optical axis (AX), a coherent light source (1) capable of generating a first light beam (b1) having a coherence length, the light beam being directed along a first optical path. Further included is a depolarizer (3) and a first optical delay element (4). The latter is capable of splitting from the first light beam a second light beam (b4) which travels a delay optical path (DOP1) with a path length not less than the coherence length of the first light beam. The delay optical path returns to said first optical path at a deflection angle from said optical delay element. The illumination optical system may also include a plurality (i.e., second, third, etc.) optical delay elements or splitting delay stages (e.g.

Abstract: An exposure apparatus for patterning a photosensitive substrate with a pattern formed on a mask includes an illumination optical system for illuminating the mask, and a projection optical system arranged in an optical path between the mask and the photosensitive substrate, so as to project an image of the pattern formed on the mask onto the photosensitive substrate. The illumination optical system includes a light source, a light guide optical system, an internal reflection-type integrator and an imaging optical system. The light source provides a light beam having a cross-sectional shape. The light guide optical system is disposed in the optical path between the light source and the mask, so as to guide the light beam to a convergence point. The internal reflection-type integrator is disposed in the optical path between the light guide optical system and the mask so as to form a plurality of secondary light sources.

Abstract: An illumination optical apparatus (8) includes a light source (10) and light conducting system (L) that conducts a light beam (14) from the light source to an object (M) such as a mask having a pattern, to be irradiated. A light-attenuating member (18) or other light-intensity controlling member, such as filter, for controlling the intensity of the light beam is arranged in the optical path between the light source and light conducting system. Also disclosed is a method for manufacturing semiconductor devices using the abovementioned illumination optical apparatus.

Abstract: An illumination apparatus in which angles and positional deviations of a laser beam on an illuminated surface can be detected by one detecting system with high accuracy. The illumination apparatus includes a light dividing unit (such as a beamsplitter) that is located between a laser source and the illuminated surface and that splits off a portion of the laser beam, a detecting unit that detects positional deviations and angular deviations of the laser beam relative to a reference axis based on the split off portion of the laser beam, and a light controlling unit, such as a shutting member with a pinhole. The light controlling unit is positioned on the optical path between the laser source and the illuminated surface when an angle of the laser beam are detected relative to the reference axis. The shutting member is removed from the optical path when positional deviations of the laser beam are detected relative to the reference axis.

Abstract: A projection optical system of the present invention comprises a shaping optical system which is disposed in an optical path between a first surface and a second surface on which an image of the first surface is formed and has a refractive power in only one of two directions which are perpendicular to an optical axis of the projection optical system and orthogonal to each other. This shaping optical system comprises a first lens group which has a refractive power in only one of the two directions which are orthogonal to each other and a second lens group which has a refractive power only in the direction in which the first lens group has the refractive power.

Abstract: Projection-exposure photolithography apparatus are disclosed that include a light source supported by a first structural body, an illumination optical system that is supported by a second structural body isolated from the first structural body, a first light-collecting system supported by the first structural body, and a second light-collecting system supported by the second structural body. The illumination optical system includes, at its incident side, a surface conjugate to a mask defining a mask pattern. Light reaches the incident surface from the second light-collecting system. The apparatus is arranged such that a prescribed surface and the exit plane of the light source are optically conjugate relative to each other by way of the first light-collecting system and the second light-collecting system.

Abstract: An illumination optical system having an afocal optical system includes a first group of lenses having negative refracting power, a second group of lenses having positive refracting power and being positioned further away from a light source than the first group of lenses, and a third group of lenses having positive refracting power and being positioned further away from the light source than the second group of lenses, wherein the afocal optical system expands a parallel beam of light emitted from the light source or converts the parallel beam of light into a parallel beam having equivalent magnification.

Abstract: An exposure apparatus comprises a light source for supplying light with a predetermined wavelength and an illumination optical system for guiding the light from this light source onto a mask formed with a predetermined pattern. The illumination optical system includes a plurality of light-transmitting optical members which transmit therethrough the light from the light source, while at least one of the plurality of light-transmitting optical members is comprised of fluorite. Even when the mask is irradiated with exposure light for a long period, the optical members in the illumination optical system can be prevented from deteriorating, whereby a stable exposure operation can be realized over a long period.

Abstract: A change in the optical characteristics which is caused by an unevenness of the intensity of illumination, following a change of the form or the size of a multiple light source, is corrected by an adjustment mechanism with a simple structure. This mechanism further comprises a first correction device (21, 14B) which corrects unevenness of the intensity of illumination generated on a plane to be irradiated due to a change of the form and the size of the multiple light source made by a change device(13), and a second correction device (22, 14A1) which corrects at least one of a change of the back focus of a condenser optical system and a change in the telecentricity of the illumination light on the irradiated plane caused due to a correcting operation of the first correction device.

Abstract: An illumination optical apparatus has an optical integrator and a condenser optical system. The optical integrator has first and second stages in which a plurality of lens elements each having a rectangular lens surface with long and short sides are arranged while the short sides are set adjacent to each other. The first and second stages are arranged adjacent to each other. A position where the short sides are adjacent to each other in the first stage is different from that in the second stage along a longitudinal direction. Therefore, in the illumination optical apparatus, a resolution difference between a pattern along the vertical direction and that in the horizontal direction caused by a rectangular illuminated area with long and short sides or an arcuated illuminated area can be prevented, so that resolution with a uniform line width can be achieved.

Abstract: An illumination apparatus has at least one of a luminous flux angle adjustment means and a luminous flux translation means. Due to these luminous flux angle adjustment means and luminous flux translation means, the inclination and positional deviation of a luminous flux can be corrected with a high accuracy without finely adjusting the position of the light source. Accordingly, when this illumination apparatus is incorporated in a projection exposure apparatus, change in exposure light quantity and fluctuation in illuminance can be suppressed so as to stably effect exposure.

Abstract: An optical element for X-ray reflection according to the present invention is provided with a number of fine convex surfaces or concave surfaces regularly arranged on a substrate. Multilayer films reflecting X-rays are formed over the convex surfaces or concave surfaces. The convex surfaces or concave surfaces have such a shape that when X-rays enter each concave surface or convex surface, they are reflected with a certain diverging angle by the multilayer films and as a result that a plurality of secondary X-ray sources having the diverging angle are formed on a same plane located a certain distance apart from the concave surfaces or convex surfaces. By this, a number of secondary X-ray sources are formed to enable uniform irradiation of X-rays in a wide region.

Abstract: An optical illumination system according to the present invention is provided with an optical reflector for illuminating a surface to be illuminated in the shape of arc or annulus. A reflective plane of the optical reflector is shaped in a special curved surface. Specifically, an arbitrary parabola with a first axis passing through the vertex and the focus of the parabola is rotated about a second axis passing through a point located on the opposite side of the directrix of the parabola with respect to the focus and being parallel to the directrix. The rotation of the parabola yields a parabolic toric surface. The reflective plane of the optical reflector has the curved surface constituting at least a part of the parabolic toric surface. The reflective plane so shaped reflects a light source image emitted from a light source system to illuminate the surface to be illuminated in the shape of arc or annulus.

Abstract: An illumination optical apparatus for illuminating an object to be illuminated in an arcuate or rectangular shape. A first optical integrator forms a plurality of light source images in a substantially linear arrangement, based on a beam of parallel rays. Then a second optical integrator forms a plurality of light source images in a substantially square arrangement, based on the beam from the first optical integrator. A relay optical system is disposed between the first and second optical integrator, and makes a position of the light source images formed by the first optical cintegrator conjugate with a position of the light source images formed by the second optical integrator.

Abstract: An optical element for X-ray reflection according to the present invention is provided with a number of fine convex surfaces or concave surfaces regularly arranged on a substrate. Multilayer films reflecting X-rays are formed over the convex surfaces or concave surfaces. The convex surfaces or concave surfaces have such a shape that when X-rays enter each concave surface or convex surface, they are reflected with a certain diverging angle by the multilayer films and as a result that a plurality of secondary X-ray sources having the diverging angle are formed on a same plane located a certain distance apart from the concave surfaces or convex surfaces. By this, a number of secondary X-ray sources are formed to enable uniform irradiation of X-rays in a wide region.