Abstract: An illumination optical apparatus is arranged to illuminate a surface to be illuminated, with light in a desired polarization state, without substantive influence of manufacturing error of an optical member functioning as a wave plate. The illumination optical apparatus illuminates the surface to be illuminated (M, W) on the basis of light from a light source (1). The illumination optical apparatus is provided with a polarization converting element (12) disposed on or near an illumination pupil plane and adapted for converting a polarization state of incident light into a predetermined polarization state. The polarization converting element has a plurality of variable optical rotating members for variably yielding an angle of rotation to incident linearly polarized light. Each variable optical rotating member has two deviation prisms which are made of an optical material with an optical rotatory power and which are movable relative to each other along a direction intersecting with the optical axis (AX).

Abstract: An illumination optical system having a more simplified structure forms various quadrupole-shaped secondary light sources with two-time rotational symmetry with respect to an optical axis. The apparatus can provide illumination conditions that differ in two perpendicular directions on a radiation-receiving plane. In order to form a secondary light source with a quadrupole-shaped light intensity distribution on an illumination pupil plane, a diffractive optical device is provided in which an entrance light beam is converted into four light beams, and a light beam having a shape of four points centered about the optical axis is formed in a far field. The diffractive optical device is provided with a first diffractive optical member that is rotatable about a first axis parallel to the optical axis, and a second diffractive optical member that is rotatable about a second axis parallel to the optical axis, and that is arranged adjacent to the first diffractive optical member.

Abstract: A part of exposure beam through a liquid via a projection optical system enters a light-transmitting section, enters an optical member without passing through gas, and is focused. The exposure apparatus receives the exposure light from the projection optical system to perform various measurements even if the numerical aperture of the projection optical system increases.

Abstract: There is disclosed a polarization-modulating element for modulating a polarization state of incident light into a predetermined polarization state, the polarization-modulating element being made of an optical material with optical activity and having a circumferentially varying thickness profile.

Abstract: A part of exposure beam through a liquid via a projection optical system enters a light-transmitting section, enters an optical member without passing through gas, and is focused. The exposure apparatus receives the exposure light from the projection optical system to perform various measurements even if the numerical aperture of the projection optical system increases.

Abstract: An illuminating optical system capable of preventing a change in the polarized status of a linearly polarized light passing through a light transmitting member formed of a cubic-system crystal material such as fluorite. An illuminating optical system comprising a light source unit (1) for suppling a linearly polarized light to illuminate surfaces (M, W) to be illuminated with a light from the light source unit. The system is provided with a polarized status switching means (10, 20) disposed on a light path between the light source unit and the surfaces to be illuminated, for switching the polarized status of a light, that illuminates the surfaces to be illuminated, between a linearly polarized status and a non-linearly polarized status. The polarized status switching means has a phase member (10) for changing the polarization surface of an incident linearly polarized light as needed, and a depolarizer (20) for depolarizing an incident linearly polarized light as needed.

Abstract: An illumination optical system for, when installed in an exposure system, realizing a suitable illumination condition by varying the polarized state of the illumination light according to the pattern characteristics of the mask while suppressing the loss of the intensity of the light. The illumination optical system has a light source unit for supplying a linearly polarized light for illuminating surfaces to be illuminated therewith, and a polarized state changing device for changing the polarized state of the illuminating light from a predetermined polarized state to a nonpolarized state and vice versa. The polarized state changing device is arranged in the optical path between the light source unit and the surfaces to be illuminated. The polarized state changing device can be removed from the illumination optical path and has a depolarizer for selectively depolarizing the incident linearly polarized light.

Abstract: The present invention provides an optical illumination device that permits an increase in the fill of a multiplicity of light sources that constitute a secondary source formed on an illuminated pupil plane. A fly's eye lens that forms a multiplicity of light sources from a light beam emitted by an optical integrator is disposed in the optical path between the optical integrator and an irradiation surface. The fly's eye lens comprises, in order from the light-source side, a first fly's eye member and a second fly's eye member. A cylindrical lens group arranged in a first direction is formed on each of the light source-side surface of a first fly's eye member and the light source-side surface of a second fly's eye member, and a cylindrical lens is group arranged in a second direction orthogonal to the first direction is formed on each of the irradiation surface side surface of the first fly's eye member and the irradiation surface side surface of the second fly's eye member.

Abstract: An illumination optical system having a more simplified structure forms various quadrupole-shaped secondary light sources with two-time rotational symmetry with respect to an optical axis. The apparatus can provide illumination conditions that differ in two perpendicular directions on a radiation-receiving plane. In order to form a secondary light source with a quadrupole-shaped light intensity distribution on an illumination pupil plane, a diffractive optical device is provided in which an entrance light beam is converted into four light beams, and a light beam having a shape of four points centered about the optical axis is formed in a far field. The diffractive optical device is provided with a first diffractive optical member that is rotatable about a first axis parallel to the optical axis, and a second diffractive optical member that is rotatable about a second axis parallel to the optical axis, and that is arranged adjacent to the first diffractive optical member.

Abstract: An illumination optical apparatus successfully realizes mutually different illumination conditions in orthogonal two directions on an illumination objective plane. A magnification-varying optical system for similarly changing the entire size of a secondary multiple light source is arranged in an optical path between a first optical integrator for forming a first multiple light source on the basis of a light beam from a light source and a second optical integrator for forming the second multiple light source having light sources of a larger number on the basis of a light beam from the first multiple light source. The apparatus further comprises an aspect ratio-changing element for changing the aspect ratio of the incoming light beam in order to change the angle of incidence of the incoming light beam into the first optical integrator in a predetermined direction.

Abstract: An exposure apparatus with optimum illumination conditions without dependence on the directionality of the fine pattern on a reticle comprises an illumination optical system for illuminating a reticle having a pattern to be transferred and a projection optical system for projecting and transforming the reticle pattern on a substrate. The illumination optical system has pupil shape forming unit for forming four substantially planar light sources on the plane in the vicinity of its pupil. These four substantially planar light sources are arranged at each substantial vertices of a narrow rectangle whose barycenter is located on the illumination optical axis.

Abstract: An illumination optical system for illuminating an illumination area on an illumination surface based on a light from a light source has a wavefront dividing type optical integrator and a light source image enlarging member. The wavefront dividing type optical integrator is arranged in an optical path between the light source and the illumination surface which forms a plurality of light source image. The light source image enlarging member is arranged in an optical path between the light source and the optical integrator at or near a position optically conjugate with the illumination surface. The light source image enlarging member enlarges the light source image. The illumination area has a slot shape with a first dimension and a second dimension which is perpendicular to the first dimension and the light source image enlarging member stretches the light source image along the first direction corresponding to the first dimension.

Abstract: An illumination apparatus for illuminating a surface to be illuminated with radiation comprises a radiation source for generating a beam of radiation having a predetermined wavelength, a wavefront division type optical integrator including a plurality of unit optical systems, a condenser optical system for guiding the beams of radiation from the wavefront division type optical integrator to the surface to be illuminated, and a plurality of auxiliary optical members (OMA) for deflecting the beams of radiation through the unit optical systems. At least one of the auxiliary optical members is disposed corresponding to one of the unit optical systems.

Abstract: The present invention is aimed at providing a wavefront dividing type optical integrator which can yield a uniform illuminance distribution substantially over the whole illumination field formed thereby even when the size of each micro lens constituting the optical integrator is made smaller so as to set a large number of wavefront divisions. The optical integrator in accordance with the present invention is a wavefront dividing type optical integrator, having a number of micro lenses arranged two-dimensionally, for forming a number of light sources by dividing a wavefront of an incident beam; each micro lens having a rectangular entrance surface and a rectangular exit surface, and satisfying at least one of the following conditions: (d1/2)(D1/2)/(&lgr;·f)≧3.05 (d2/2)(D2/2)/(&lgr;·f)≧3.

Abstract: An illumination optical apparatus (14-40) and exposure apparatus (10) provided with the illumination apparatus, capable of employing a high-output light source. The illumination apparatus comprises, in order along an optical axis, a light source (14) capable of providing a primary light beam (B) having a cross-section, a condenser optical system (30) to condense the primary light beam so as to form a convergence point (F) adjacent the condenser optical system, a light-pipe optical integrator (160) having a rectangular cross-sectional shape with a first side of length dx, a second side of length dy, and a most light-source-wise incident surface (160a) axially spaced from the convergence point by a spacing (L2). The integrator is capable of forming a plurality of secondary light sources and corresponding secondary light beams (B′) from the primary light beam. Adjacent the integrator is an imaging optical system (40) to converge the primary and secondary light beams to illuminate the illumination surface.

Abstract: The present invention provides an optical illumination device that permits an increase in the fill of a multiplicity of light sources that constitute a secondary source formed on an illuminated pupil plane. A fly's eye lens that forms a multiplicity of light sources from a light beam emitted by an optical integrator is disposed in the optical path between the optical integrator and an irradiation surface. The fly's eye lens comprises, in order from the light-source side, a first fly's eye member and a second fly's eye member. A cylindrical lens group arranged in a first direction is formed on each of the light source-side surface of a first fly's eye member and the light source-side surface of a second fly's eye member, and a cylindrical lens is group arranged in a second direction orthogonal to the first direction is formed on each of the irradiation surface side surface of the first fly's eye member and the irradiation surface side surface of the second fly's eye member.

Abstract: An illumination optical apparatus (14-40) and exposure apparatus (10) provided with the illumination apparatus, capable of employing a high-output light source. The illumination apparatus comprises, in order along an optical axis, a light source (14) capable of providing a primary light beam (B) having a cross-section, a condenser optical system (30) to condense the primary light beam so as to form a convergence point (F) adjacent the condenser optical system, a light-pipe optical integrator (160) having a rectangular cross-sectional shape with a first side of length dx, a second side of length dy, and a most light-source-wise incident surface (160a) axially spaced from the convergence point by a spacing (L2). The integrator is capable of forming a plurality of secondary light sources and corresponding secondary light beams (B′) from the primary light beam. Adjacent the integrator is an imaging optical system (40) to converge the primary and secondary light beams to illuminate the illumination surface.

Abstract: A method and illumination optical system forms a modified illumination configuration on an optical integrator so that a secondary light source having a desired modified illumination configuration is formed and light loss is minimized. A light beam shape changing element that diffuses illumination in a plurality of directions, and an angular light beam forming element that forms a plurality of light source images operate together to create a modified illumination configuration on the optical integrator. Since the secondary light source has a desired modified illumination configuration, an aperture stop used to restrict the size and/or shape of the secondary light source blocks only a small amount of illumination, or can be eliminated altogether.

Abstract: A method and illumination optical system forms a modified illumination configuration on an optical integrator so that a secondary light source having a desired modified illumination configuration is formed and light loss is minimized. A light beam shape changing element that diffuses illumination in a plurality of directions, and an angular light beam forming element that forms a plurality of light source images operate together to create a modified illumination configuration on the optical integrator. Since the secondary light source has a desired modified illumination configuration, an aperture stop used to restrict the size and/or shape of the secondary light source blocks only a small amount of illumination, or can be eliminated altogether.

Abstract: A method and illumination optical system forms a modified illumination configuration on an optical integrator so that a secondary light source having a desired modified illumination configuration is formed and light loss is minimized. A light beam shape changing element that diffuses illumination in a plurality of directions, and an angular light beam forming element that forms a plurality of light source images operate together to create a modified illumination configuration on the optical integrator. Since the secondary light source has a desired modified illumination configuration, an aperture stop used to restrict the size and/or shape of the secondary light source blocks only a small amount of illumination, or can be eliminated altogether.