Patents by Inventor Paul Gräupner

Paul Gräupner has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20100157266
    Abstract: A projection exposure method for the exposure of a radiation-sensitive substrate arranged in the region of an image surface of a projection objective with at least one image of a pattern of a mask arranged in the region of an object surface of the projection objective includes exposing the substrate with the image of the pattern in an effective image field of the projection objective during an exposure time interval and also altering a relative positioning between a surface of the substrate and a focus surface of the projection objective during the exposure time interval in such a way that image points in the effective image field are exposed with different focus positions of the image of the mask during the exposure time interval.
    Type: Application
    Filed: December 21, 2009
    Publication date: June 24, 2010
    Applicant: Carl Zeiss SMT AG
    Inventors: Joerg Zimmermann, Heiko Feldmann, Tilmann Heil, Paul Graeupner, Ulrich Gebhardt
  • Publication number: 20100060873
    Abstract: An illumination system for illuminating a mask in a microlithographic exposure apparatus has an optical axis and a pupil surface. The system can include an array of reflective or transparent beam deflection elements such as mirrors. Each deflection element can be adapted to deflect an impinging light ray by a deflection angle that is variable in response to a control signal. The beam deflection elements can be arranged in a first plane. The system can further include an optical raster element, which includes a plurality of microlenses and/or diffractive structures. The beam deflection elements), which can be arranged in a first plane, and the optical raster element, which can be arranged in a second plane, can commonly produce a two-dimensional far field intensity distribution. An optical imaging system can optically conjugate the first plane to the second plane.
    Type: Application
    Filed: July 31, 2009
    Publication date: March 11, 2010
    Applicant: CARL ZEISS SMT AG
    Inventors: Markus Deguenther, Paul Graeupner, Juergen Fischer
  • Patent number: 7649702
    Abstract: An immersion lithography objective has a housing in which at least one first optical element is arranged, a second optical element, which follows the first optical element in the direction of the optical axis of the objective, an immersion medium that adjoins the second optical element being located downstream of the latter in the direction of the optical axis, and a retaining structure for the second optical element. The retaining structure has a greater stiffness in the direction of the optical axis than in a direction perpendicular to the optical axis.
    Type: Grant
    Filed: January 25, 2008
    Date of Patent: January 19, 2010
    Assignees: Carl Zeiss SMT AG, ASML Netherlands B.V.
    Inventors: Bernhard Gellrich, Paul Graeupner, Juergen Fischer, Andreas Wurmbrand, Bauke Jansen, Bob Streefkerk, Christiaan Alexander Hoogendam, Johannes Jacobus Matheus Baselmans
  • Publication number: 20090280437
    Abstract: Projection exposure methods, systems, sub-systems and components are disclosed. Methods can include performing a first exposure to image a first sub-pattern of the pattern, where the first sub-pattern includes a plurality of first features extending in a first direction and spaced apart essentially periodically at a predominant periodicity length P in a second direction perpendicular to the first direction. The first exposure can be performed using a multipolar illumination mode that includes at least one substantially dipolar intensity distribution having two illumination poles positioned on a pole orientation axis substantially parallel to the second direction and spaced apart from each other. The poles of the dipolar intensity distribution can each have an azimuthal width defined by a pole angle ?, and a pole area APOLE according to: 0.6<APOLE/AOPT<1.
    Type: Application
    Filed: June 12, 2009
    Publication date: November 12, 2009
    Applicant: CARL ZEISS SMT AG
    Inventor: Paul Graeupner
  • Patent number: 7570345
    Abstract: A method of optimizing an imaging performance of a projection exposure system is provided, wherein the projection exposure system includes an illumination optical system for illuminating a patterning structure and a projection optical system for imaging a region of the illuminated patterning structure onto a corresponding field. The method involves setting the field to a first exposure field, setting optical parameters of the projection exposure system to a first setting such that the imaging performance within the first exposure field is a first optimum performance, changing the field to a second exposure field, and changing the optical parameters to a second setting such that the imaging performance within the second exposure field is a second optimum performance.
    Type: Grant
    Filed: June 8, 2007
    Date of Patent: August 4, 2009
    Assignee: Carl Zeiss SMT AG
    Inventors: Gerd Reisinger, Manfred Maul, Paul Graeupner, Martin Schriever, Ulrich Wegmann
  • Publication number: 20090002661
    Abstract: A method is disclosed for improving an optical imaging property, for example spherical aberration or the focal length, of a projection objective of a microlithographic projection exposure apparatus. Firsts an immersion liquid is introduced into an interspace between a photosensitive surface and an end face of the projection objective. Then an imaging property of the projection objective is determined, for example using an interferometer or a CCD sensor arranged in an image plane of the projection objective. This imaging property is compared with a target imaging property. Finally, the temperature of the immersion liquid is changed until the determined imaging property is as close as possible to the target imaging property.
    Type: Application
    Filed: September 3, 2008
    Publication date: January 1, 2009
    Applicant: CARL ZEISS SMT AG
    Inventor: Paul Graeupner
  • Publication number: 20080212211
    Abstract: An immersion lithography objective has a housing in which at least one first optical element is arranged, a second optical element, which follows the first optical element in the direction of the optical axis of the objective, an immersion medium that adjoins the second optical element being located downstream of the latter in the direction of the optical axis, and a retaining structure for the second optical element. The retaining structure has a greater stiffness in the direction of the optical axis than in a direction perpendicular to the optical axis.
    Type: Application
    Filed: January 25, 2008
    Publication date: September 4, 2008
    Applicant: CARL ZEISS SMT AG
    Inventors: Bernhard Gellrich, Paul Graeupner, Juergen Fischer, Andreas Wurmbrand, Bauke Jansen, Bob Streefkerk, Christiaan Alexander Hoogendam, Johannes Jacobus Matheus Baselmans
  • Publication number: 20080170215
    Abstract: In an immersion lithography apparatus or device manufacturing method, the position of focus of the projected image is changed during imaging to increase focus latitude. In an embodiment, the focus may be varied using the liquid supply system of the immersion lithographic apparatus.
    Type: Application
    Filed: March 17, 2008
    Publication date: July 17, 2008
    Applicants: ASML NETHERLANDS B.V., CARL ZEISS SMT AG
    Inventors: Bob Streefkerk, Johannes Jacobus Matheus Baselmans, Adrianus Fransiscus Petrus Engelen, Jozef Maria Finders, Paul Graeupner, Johannes Catharinus Hubertus Mulkens, Jan Bernard Pechelmus Van Schoot
  • Publication number: 20080094599
    Abstract: In a projection objective for imaging a pattern arranged in the object plane of the projection objective into the image plane of the projection objective, at least one optical component is provided which has a substrate in which at least one substrate surface is covered with an interference layer system having a great spatial modulation of the reflectance and/or of the transmittance over a usable cross section of the optical component, the modulation being adapted to a spatial transmission distribution of the remaining components of the projection objective in such a way that an intensity distribution of the radiation that is measured in a pupil surface has a substantially reduced spatial modulation in comparison with a projection objective without the interference layer system.
    Type: Application
    Filed: June 3, 2005
    Publication date: April 24, 2008
    Applicant: CARL ZEISS SMT AG
    Inventors: Patrick Scheible, Alexandra Pazidis, Reiner Garreis, Michael Totzeck, Heiko Feldmann, Paul Graeupner, Hans-Juergen Rostalski, Wolfgang Singer
  • Patent number: 7352435
    Abstract: In an immersion lithography apparatus or device manufacturing method, the position of focus of the projected image is changed during imaging to increase focus latitude. In an embodiment, the focus may be varied using the liquid supply system of the immersion lithographic apparatus.
    Type: Grant
    Filed: October 15, 2004
    Date of Patent: April 1, 2008
    Assignees: ASML Netherlands B.V., Carl Zeiss SMT AG
    Inventors: Bob Streefkerk, Johannes Jacobus Matheus Baselmans, Adrianus Franciscus Petrus Engelen, Jozef Maria Finders, Paul Graeupner, Johannes Catharinus Hubertus Mulkens, Jan Bernard Plechelmus Van Schoot
  • Publication number: 20080036982
    Abstract: 1. Method for patterning a substrate using multiple exposure. 2.1. The invention relates to a method for patterning a substrate using exposure processes of an adjustable optical system, a multiple exposure being used for producing a structure image on the substrate. 2.2. According to the invention, for at least one of the plurality of exposures, the imaging quality of the optical system is determined by means of a respective measurement step and at least one parameter of the optical system that influences the imaging quality is set depending on this. 2.3. Use e.g. for the patterning of semiconductor wafers in microlithography projection exposure apparatuses.
    Type: Application
    Filed: April 11, 2005
    Publication date: February 14, 2008
    Inventors: Ulrich Wegmann, Gerd Reisinger, Manfred Maul, Paul Graeupner, Martin Schriever, Aksel Goehnermeier
  • Publication number: 20080032207
    Abstract: In a method for correcting optical proximity effects (optical Proximity Correction, OPC) when imaging a pattern, arranged in the object surface of a projection objective, into the image surface of the projection objective with the aid of a projection objective, a multiplicity of optical elements and at least one pupil surface that is Fourier-transformed to the image surface are arranged between the object surface and the image surface. An optical filtering of the light used for the imaging is carried out with the aid of at least one OPC filter inserted between the object surface and the image surface in accordance with an OPC filter function that is adapted to the pattern and corresponds to a spatially dependent transmission filtering in the region of the pupil surface of the imaging system.
    Type: Application
    Filed: May 18, 2007
    Publication date: February 7, 2008
    Applicant: CARL ZEISS SMT AG
    Inventor: Paul GRAEUPNER
  • Publication number: 20080007706
    Abstract: A method of optimizing an imaging performance of a projection exposure system is provided, wherein the projection exposure system includes an illumination optical system for illuminating a patterning structure and a projection optical system for imaging a region of the illuminated patterning structure onto a corresponding field. The method involves setting the field to a first exposure field, setting optical parameters of the projection exposure system to a first setting such that the imaging performance within the first exposure field is a first optimum performance, changing the field to a second exposure field, and changing the optical parameters to a second setting such that the imaging performance within the second exposure field is a second optimum performance.
    Type: Application
    Filed: June 8, 2007
    Publication date: January 10, 2008
    Applicant: Carl Zeiss SMT AG
    Inventors: Gerd Reisinger, Manfred Maul, Paul Graeupner, Martin Schriever, Ulrich Wegmann
  • Patent number: 7310187
    Abstract: A method of adjusting a projection objective permits the projection objective to be adjusted between an immersion configuration and a dry configuration with few interventions in the system, and therefore to be used optionally as an immersion objective or as a dry objective. The projection objective has a multiplicity of optical elements which are arranged along an optical axis of the projection objective, the optical elements comprising a first group of optical elements following the object plane and a last optical element following the first group, arranged next to the image plane and defining an exit surface of the projection objective which is arranged at a working distance from the image plane. The last optical element is substantially without refracting power and has no curvature or only slight curvature.
    Type: Grant
    Filed: April 13, 2007
    Date of Patent: December 18, 2007
    Assignee: Carl Zeiss SMT AG
    Inventors: Alexander Epple, Paul Graeupner, Winfried Kaiser, Reiner Garreis, Wilhelm Ulrich
  • Patent number: 7301622
    Abstract: In order to optimize the image properties of several optical elements of which at least one is moved relative to at least one stationary optical element, the overall image defect resulting from the interaction of all optical elements is first of all measured. This is represented as a linear combination of the base functions of an orthogonal function set. The movable element is then moved to a new measurement position and the overall image defect is measured once again. After the linear combination representation of the new overall image defect, the image defects of the movable element and of the stationary element are calculated from the data thereby obtained. With only one movable optical element a target position in which the overall image defect is minimized can be directly calculated and adjusted there from. If several movable optical elements are available, methods are given for the efficient determination of the respective target position.
    Type: Grant
    Filed: July 22, 2005
    Date of Patent: November 27, 2007
    Assignee: Carl Zeiss SMT AG
    Inventors: Bernd Geh, Paul Gräupner, Thomas Stammler, Dirk Stenkamp, Jochen Stühler, Klaus Wurmbrand
  • Publication number: 20070195299
    Abstract: A method is disclosed for improving an optical imaging property, for example spherical aberration or the focal length, of a projection objective of a microlithographic projection exposure apparatus. First, an immersion liquid is introduced into an interspace between a photosensitive surface and an end face of the projection objective. Then an imaging property of the projection objective is determined, for example using an interferometer or a CCD sensor arranged in an image plane of the projection objective. This imaging property is compared with a target imaging property. Finally, the temperature of the immersion liquid is changed until the determined imaging property is as close as possible to the target imaging property.
    Type: Application
    Filed: April 24, 2007
    Publication date: August 23, 2007
    Applicant: CARL-ZEISS SMT AG
    Inventor: Paul Graeupner
  • Publication number: 20070188881
    Abstract: A method of adjusting a projection objective permits the projection objective to be adjusted between an immersion configuration and a dry configuration with few interventions in the system, and therefore to be used optionally as an immersion objective or as a dry objective. The projection objective has a multiplicity of optical elements which are arranged along an optical axis of the projection objective, the optical elements comprising a first group of optical elements following the object plane and a last optical element following the first group, arranged next to the image plane and defining an exit surface of the projection objective which is arranged at a working distance from the image plane. The last optical element is substantially without refracting power and has no curvature or only slight curvature.
    Type: Application
    Filed: April 13, 2007
    Publication date: August 16, 2007
    Inventors: Alexander Epple, Paul Graeupner, Winfried Kaiser, Reiner Garreis, Wilhelm Ulrich
  • Patent number: 7233386
    Abstract: A method of optimizing an imaging performance of a projection exposure system is provided, wherein the projection exposure system includes an illumination optical system for illuminating a patterning structure and a projection optical system for imaging a region of the illuminated patterning structure onto a corresponding field. The method involves setting the field to a first exposure field, setting optical parameters of the projection exposure system to a first setting such that the imaging performance within the first exposure field is a first optimum performance, changing the field to a second exposure field, and changing the optical parameters to a second setting such that the imaging performance within the second exposure field is a second optimum performance.
    Type: Grant
    Filed: April 11, 2005
    Date of Patent: June 19, 2007
    Assignee: Carl Zeiss SMT AG
    Inventors: Gerd Reisinger, Manfred Maul, Paul Graeupner, Martin Schriever, Ulrich Wegmann
  • Patent number: 7227616
    Abstract: A method is disclosed for improving an optical imaging property, for example spherical aberration or the focal length, of a projection objective of a microlithographic projection exposure apparatus. First, an immersion liquid is introduced into an interspace between a photosensitive surface and an end face of the projection objective. Then an imaging property of the projection objective is determined, for example using an interferometer or a CCD sensor arranged in an image plane of the projection objective. This imaging property is compared with a target imaging property. Finally, the temperature of the immersion liquid is changed until the determined imaging property is as close as possible to the target imaging property.
    Type: Grant
    Filed: June 10, 2005
    Date of Patent: June 5, 2007
    Assignee: Carl Zeiss SMT AG
    Inventor: Paul Graeupner
  • Patent number: 7209292
    Abstract: A method of adjusting a projection objective permits the projection objective to be adjusted between an immersion configuration and a dry configuration. The projection objective includes optical elements arranged along an optical axis thereof, which include a first group of elements following the object plane and a last optical element following the first group, which is arranged near the image plane. The last optical element defines an exit surface of the projection objective, which is arranged at a working distance from the image plane. The last optical element is substantially without refracting power and has no or only slight curvature. The method includes varying the thickness of the last optical element, changing the refractive index of the space between the exit surface and the image plane by introducing or removing an immersion medium, and axially displacing the last optical element to set a working distance.
    Type: Grant
    Filed: May 30, 2003
    Date of Patent: April 24, 2007
    Assignee: Carl Zeiss SMT AG
    Inventors: Alexander Epple, Paul Graeupner, Winfried Kaiser, Reiner Garreis, Wilhelm Ulrich