Patents by Inventor Paul Gräupner
Paul Gräupner has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 7961293Abstract: In an immersion lithography apparatus or device manufacturing method, the position of focus of the projected image is changed during imaging to increase focus latitude. In an embodiment, the focus may be varied using the liquid supply system of the immersion lithographic apparatus.Type: GrantFiled: March 17, 2008Date of Patent: June 14, 2011Assignees: ASML Netherlands B.V., Carl Zeiss SMT GmbHInventors: Bob Streefkerk, Johannes Jacobus Matheus Baselmans, Adrianus Franciscus Petrus Engelen, Jozef Maria Finders, Paul Graeupner, Johannes Catharinus Hebertus Mulkens, Jan Bernard Plechelmus Van Schoot
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Patent number: 7800732Abstract: A projection exposure method for the exposure of a radiation-sensitive substrate arranged in the region of an image surface of a projection objective with at least one image of a pattern of a mask arranged in the region of an object surface of the projection objective includes exposing the substrate with the image of the pattern in an effective image field of the projection objective during an exposure time interval and also altering a relative positioning between a surface of the substrate and a focus surface of the projection objective during the exposure time interval in such a way that image points in the effective image field are exposed with different focus positions of the image of the mask during the exposure time interval.Type: GrantFiled: December 21, 2009Date of Patent: September 21, 2010Assignee: Carl Zeiss SMT AGInventors: Joerg Zimmermann, Heiko Feldmann, Tilmann Heil, Paul Graeupner, Ulrich Gebhardt
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Publication number: 20100157266Abstract: A projection exposure method for the exposure of a radiation-sensitive substrate arranged in the region of an image surface of a projection objective with at least one image of a pattern of a mask arranged in the region of an object surface of the projection objective includes exposing the substrate with the image of the pattern in an effective image field of the projection objective during an exposure time interval and also altering a relative positioning between a surface of the substrate and a focus surface of the projection objective during the exposure time interval in such a way that image points in the effective image field are exposed with different focus positions of the image of the mask during the exposure time interval.Type: ApplicationFiled: December 21, 2009Publication date: June 24, 2010Applicant: Carl Zeiss SMT AGInventors: Joerg Zimmermann, Heiko Feldmann, Tilmann Heil, Paul Graeupner, Ulrich Gebhardt
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Publication number: 20100060873Abstract: An illumination system for illuminating a mask in a microlithographic exposure apparatus has an optical axis and a pupil surface. The system can include an array of reflective or transparent beam deflection elements such as mirrors. Each deflection element can be adapted to deflect an impinging light ray by a deflection angle that is variable in response to a control signal. The beam deflection elements can be arranged in a first plane. The system can further include an optical raster element, which includes a plurality of microlenses and/or diffractive structures. The beam deflection elements), which can be arranged in a first plane, and the optical raster element, which can be arranged in a second plane, can commonly produce a two-dimensional far field intensity distribution. An optical imaging system can optically conjugate the first plane to the second plane.Type: ApplicationFiled: July 31, 2009Publication date: March 11, 2010Applicant: CARL ZEISS SMT AGInventors: Markus Deguenther, Paul Graeupner, Juergen Fischer
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Patent number: 7649702Abstract: An immersion lithography objective has a housing in which at least one first optical element is arranged, a second optical element, which follows the first optical element in the direction of the optical axis of the objective, an immersion medium that adjoins the second optical element being located downstream of the latter in the direction of the optical axis, and a retaining structure for the second optical element. The retaining structure has a greater stiffness in the direction of the optical axis than in a direction perpendicular to the optical axis.Type: GrantFiled: January 25, 2008Date of Patent: January 19, 2010Assignees: Carl Zeiss SMT AG, ASML Netherlands B.V.Inventors: Bernhard Gellrich, Paul Graeupner, Juergen Fischer, Andreas Wurmbrand, Bauke Jansen, Bob Streefkerk, Christiaan Alexander Hoogendam, Johannes Jacobus Matheus Baselmans
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Publication number: 20090280437Abstract: Projection exposure methods, systems, sub-systems and components are disclosed. Methods can include performing a first exposure to image a first sub-pattern of the pattern, where the first sub-pattern includes a plurality of first features extending in a first direction and spaced apart essentially periodically at a predominant periodicity length P in a second direction perpendicular to the first direction. The first exposure can be performed using a multipolar illumination mode that includes at least one substantially dipolar intensity distribution having two illumination poles positioned on a pole orientation axis substantially parallel to the second direction and spaced apart from each other. The poles of the dipolar intensity distribution can each have an azimuthal width defined by a pole angle ?, and a pole area APOLE according to: 0.6<APOLE/AOPT<1.Type: ApplicationFiled: June 12, 2009Publication date: November 12, 2009Applicant: CARL ZEISS SMT AGInventor: Paul Graeupner
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Patent number: 7570345Abstract: A method of optimizing an imaging performance of a projection exposure system is provided, wherein the projection exposure system includes an illumination optical system for illuminating a patterning structure and a projection optical system for imaging a region of the illuminated patterning structure onto a corresponding field. The method involves setting the field to a first exposure field, setting optical parameters of the projection exposure system to a first setting such that the imaging performance within the first exposure field is a first optimum performance, changing the field to a second exposure field, and changing the optical parameters to a second setting such that the imaging performance within the second exposure field is a second optimum performance.Type: GrantFiled: June 8, 2007Date of Patent: August 4, 2009Assignee: Carl Zeiss SMT AGInventors: Gerd Reisinger, Manfred Maul, Paul Graeupner, Martin Schriever, Ulrich Wegmann
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Publication number: 20090002661Abstract: A method is disclosed for improving an optical imaging property, for example spherical aberration or the focal length, of a projection objective of a microlithographic projection exposure apparatus. Firsts an immersion liquid is introduced into an interspace between a photosensitive surface and an end face of the projection objective. Then an imaging property of the projection objective is determined, for example using an interferometer or a CCD sensor arranged in an image plane of the projection objective. This imaging property is compared with a target imaging property. Finally, the temperature of the immersion liquid is changed until the determined imaging property is as close as possible to the target imaging property.Type: ApplicationFiled: September 3, 2008Publication date: January 1, 2009Applicant: CARL ZEISS SMT AGInventor: Paul Graeupner
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Publication number: 20080212211Abstract: An immersion lithography objective has a housing in which at least one first optical element is arranged, a second optical element, which follows the first optical element in the direction of the optical axis of the objective, an immersion medium that adjoins the second optical element being located downstream of the latter in the direction of the optical axis, and a retaining structure for the second optical element. The retaining structure has a greater stiffness in the direction of the optical axis than in a direction perpendicular to the optical axis.Type: ApplicationFiled: January 25, 2008Publication date: September 4, 2008Applicant: CARL ZEISS SMT AGInventors: Bernhard Gellrich, Paul Graeupner, Juergen Fischer, Andreas Wurmbrand, Bauke Jansen, Bob Streefkerk, Christiaan Alexander Hoogendam, Johannes Jacobus Matheus Baselmans
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Publication number: 20080170215Abstract: In an immersion lithography apparatus or device manufacturing method, the position of focus of the projected image is changed during imaging to increase focus latitude. In an embodiment, the focus may be varied using the liquid supply system of the immersion lithographic apparatus.Type: ApplicationFiled: March 17, 2008Publication date: July 17, 2008Applicants: ASML NETHERLANDS B.V., CARL ZEISS SMT AGInventors: Bob Streefkerk, Johannes Jacobus Matheus Baselmans, Adrianus Fransiscus Petrus Engelen, Jozef Maria Finders, Paul Graeupner, Johannes Catharinus Hubertus Mulkens, Jan Bernard Pechelmus Van Schoot
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Publication number: 20080094599Abstract: In a projection objective for imaging a pattern arranged in the object plane of the projection objective into the image plane of the projection objective, at least one optical component is provided which has a substrate in which at least one substrate surface is covered with an interference layer system having a great spatial modulation of the reflectance and/or of the transmittance over a usable cross section of the optical component, the modulation being adapted to a spatial transmission distribution of the remaining components of the projection objective in such a way that an intensity distribution of the radiation that is measured in a pupil surface has a substantially reduced spatial modulation in comparison with a projection objective without the interference layer system.Type: ApplicationFiled: June 3, 2005Publication date: April 24, 2008Applicant: CARL ZEISS SMT AGInventors: Patrick Scheible, Alexandra Pazidis, Reiner Garreis, Michael Totzeck, Heiko Feldmann, Paul Graeupner, Hans-Juergen Rostalski, Wolfgang Singer
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Patent number: 7352435Abstract: In an immersion lithography apparatus or device manufacturing method, the position of focus of the projected image is changed during imaging to increase focus latitude. In an embodiment, the focus may be varied using the liquid supply system of the immersion lithographic apparatus.Type: GrantFiled: October 15, 2004Date of Patent: April 1, 2008Assignees: ASML Netherlands B.V., Carl Zeiss SMT AGInventors: Bob Streefkerk, Johannes Jacobus Matheus Baselmans, Adrianus Franciscus Petrus Engelen, Jozef Maria Finders, Paul Graeupner, Johannes Catharinus Hubertus Mulkens, Jan Bernard Plechelmus Van Schoot
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Publication number: 20080036982Abstract: 1. Method for patterning a substrate using multiple exposure. 2.1. The invention relates to a method for patterning a substrate using exposure processes of an adjustable optical system, a multiple exposure being used for producing a structure image on the substrate. 2.2. According to the invention, for at least one of the plurality of exposures, the imaging quality of the optical system is determined by means of a respective measurement step and at least one parameter of the optical system that influences the imaging quality is set depending on this. 2.3. Use e.g. for the patterning of semiconductor wafers in microlithography projection exposure apparatuses.Type: ApplicationFiled: April 11, 2005Publication date: February 14, 2008Inventors: Ulrich Wegmann, Gerd Reisinger, Manfred Maul, Paul Graeupner, Martin Schriever, Aksel Goehnermeier
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Publication number: 20080032207Abstract: In a method for correcting optical proximity effects (optical Proximity Correction, OPC) when imaging a pattern, arranged in the object surface of a projection objective, into the image surface of the projection objective with the aid of a projection objective, a multiplicity of optical elements and at least one pupil surface that is Fourier-transformed to the image surface are arranged between the object surface and the image surface. An optical filtering of the light used for the imaging is carried out with the aid of at least one OPC filter inserted between the object surface and the image surface in accordance with an OPC filter function that is adapted to the pattern and corresponds to a spatially dependent transmission filtering in the region of the pupil surface of the imaging system.Type: ApplicationFiled: May 18, 2007Publication date: February 7, 2008Applicant: CARL ZEISS SMT AGInventor: Paul GRAEUPNER
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Publication number: 20080007706Abstract: A method of optimizing an imaging performance of a projection exposure system is provided, wherein the projection exposure system includes an illumination optical system for illuminating a patterning structure and a projection optical system for imaging a region of the illuminated patterning structure onto a corresponding field. The method involves setting the field to a first exposure field, setting optical parameters of the projection exposure system to a first setting such that the imaging performance within the first exposure field is a first optimum performance, changing the field to a second exposure field, and changing the optical parameters to a second setting such that the imaging performance within the second exposure field is a second optimum performance.Type: ApplicationFiled: June 8, 2007Publication date: January 10, 2008Applicant: Carl Zeiss SMT AGInventors: Gerd Reisinger, Manfred Maul, Paul Graeupner, Martin Schriever, Ulrich Wegmann
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Patent number: 7310187Abstract: A method of adjusting a projection objective permits the projection objective to be adjusted between an immersion configuration and a dry configuration with few interventions in the system, and therefore to be used optionally as an immersion objective or as a dry objective. The projection objective has a multiplicity of optical elements which are arranged along an optical axis of the projection objective, the optical elements comprising a first group of optical elements following the object plane and a last optical element following the first group, arranged next to the image plane and defining an exit surface of the projection objective which is arranged at a working distance from the image plane. The last optical element is substantially without refracting power and has no curvature or only slight curvature.Type: GrantFiled: April 13, 2007Date of Patent: December 18, 2007Assignee: Carl Zeiss SMT AGInventors: Alexander Epple, Paul Graeupner, Winfried Kaiser, Reiner Garreis, Wilhelm Ulrich
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Patent number: 7301622Abstract: In order to optimize the image properties of several optical elements of which at least one is moved relative to at least one stationary optical element, the overall image defect resulting from the interaction of all optical elements is first of all measured. This is represented as a linear combination of the base functions of an orthogonal function set. The movable element is then moved to a new measurement position and the overall image defect is measured once again. After the linear combination representation of the new overall image defect, the image defects of the movable element and of the stationary element are calculated from the data thereby obtained. With only one movable optical element a target position in which the overall image defect is minimized can be directly calculated and adjusted there from. If several movable optical elements are available, methods are given for the efficient determination of the respective target position.Type: GrantFiled: July 22, 2005Date of Patent: November 27, 2007Assignee: Carl Zeiss SMT AGInventors: Bernd Geh, Paul Gräupner, Thomas Stammler, Dirk Stenkamp, Jochen Stühler, Klaus Wurmbrand
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Publication number: 20070195299Abstract: A method is disclosed for improving an optical imaging property, for example spherical aberration or the focal length, of a projection objective of a microlithographic projection exposure apparatus. First, an immersion liquid is introduced into an interspace between a photosensitive surface and an end face of the projection objective. Then an imaging property of the projection objective is determined, for example using an interferometer or a CCD sensor arranged in an image plane of the projection objective. This imaging property is compared with a target imaging property. Finally, the temperature of the immersion liquid is changed until the determined imaging property is as close as possible to the target imaging property.Type: ApplicationFiled: April 24, 2007Publication date: August 23, 2007Applicant: CARL-ZEISS SMT AGInventor: Paul Graeupner
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Publication number: 20070188881Abstract: A method of adjusting a projection objective permits the projection objective to be adjusted between an immersion configuration and a dry configuration with few interventions in the system, and therefore to be used optionally as an immersion objective or as a dry objective. The projection objective has a multiplicity of optical elements which are arranged along an optical axis of the projection objective, the optical elements comprising a first group of optical elements following the object plane and a last optical element following the first group, arranged next to the image plane and defining an exit surface of the projection objective which is arranged at a working distance from the image plane. The last optical element is substantially without refracting power and has no curvature or only slight curvature.Type: ApplicationFiled: April 13, 2007Publication date: August 16, 2007Inventors: Alexander Epple, Paul Graeupner, Winfried Kaiser, Reiner Garreis, Wilhelm Ulrich
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Patent number: 7233386Abstract: A method of optimizing an imaging performance of a projection exposure system is provided, wherein the projection exposure system includes an illumination optical system for illuminating a patterning structure and a projection optical system for imaging a region of the illuminated patterning structure onto a corresponding field. The method involves setting the field to a first exposure field, setting optical parameters of the projection exposure system to a first setting such that the imaging performance within the first exposure field is a first optimum performance, changing the field to a second exposure field, and changing the optical parameters to a second setting such that the imaging performance within the second exposure field is a second optimum performance.Type: GrantFiled: April 11, 2005Date of Patent: June 19, 2007Assignee: Carl Zeiss SMT AGInventors: Gerd Reisinger, Manfred Maul, Paul Graeupner, Martin Schriever, Ulrich Wegmann