Patents by Inventor Paul Gräupner

Paul Gräupner has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7209241
    Abstract: In a method for manufacturing an optical imaging system, wavefront aberrations caused by an optical imaging system are determined before and after transporting the optical imaging system. At least some of the aberration parameters which are determined in the preceding determination are used as a given precondition for determining aberration parameters in the subsequent determination. This results in a hybrid method, in which the strength of at least two measurement methods are used in a combined form, and specific weaknesses of any one method are avoided.
    Type: Grant
    Filed: March 27, 2006
    Date of Patent: April 24, 2007
    Assignee: Carl Zeiss SMT AG
    Inventors: Wolfgang Emer, Paul Graeupner
  • Publication number: 20060164655
    Abstract: In a method for manufacturing an optical imaging system, wavefront aberrations caused by an optical imaging system are determined before and after transporting the optical imaging system. At least some of the aberration parameters which are determined in the preceding determination are used as a given precondition for determining aberration parameters in the subsequent determination. This results in a hybrid method, in which the strength of at least two measurement methods are used in a combined form, and specific weaknesses of any one method are avoided.
    Type: Application
    Filed: March 27, 2006
    Publication date: July 27, 2006
    Inventors: Wolfgang Emer, Paul Graeupner
  • Patent number: 7019846
    Abstract: In a method for determining wavefront aberrations for the characterization of imaging characteristics in an optical imaging system, the measurement results from two different measurement methods, which are carried out at successive times, are combined. In this case, at least some of the aberration parameters which are determined in the previous first measurement method are used as a given precondition for determining aberration parameters with the aid of the second measurement method, and are assessed accordingly. This results in a hybrid method, in which the strength of at least two measurement methods are used in a combined form, and specific weaknesses of any one method can be avoided.
    Type: Grant
    Filed: May 27, 2003
    Date of Patent: March 28, 2006
    Assignee: Carl Zeiss SMT AG
    Inventors: Wolfgang Emer, Paul Graeupner
  • Publication number: 20050264780
    Abstract: A method is disclosed for improving an optical imaging property, for example spherical aberration or the focal length, of a projection objective of a microlithographic projection exposure apparatus. First, an immersion liquid is introduced into an interspace between a photosensitive surface and an end face of the projection objective. Then an imaging property of the projection objective is determined, for example using an interferometer or a CCD sensor arranged in an image plane of the projection objective. This imaging property is compared with a target imaging property. Finally, the temperature of the immersion liquid is changed until the determined imaging property is as close as possible to the target imaging property.
    Type: Application
    Filed: June 10, 2005
    Publication date: December 1, 2005
    Applicant: Carl Zeiss SMT AG
    Inventor: Paul Graeupner
  • Publication number: 20050237506
    Abstract: A method of optimizing an imaging performance of a projection exposure system is provided, wherein the projection exposure system comprises an illumination optical system for illuminating a patterning structure and a projection optical system for imaging a region of the illuminated patterning structure onto a corresponding field. The method comprises setting the field to a first exposure field, setting optical parameters of the projection exposure system to a first setting such that the imaging performance within the first exposure field is a first optimum performance, changing the field to a second exposure field, and changing the optical parameters to a second setting such that the imaging performance within the second exposure field is a second optimum performance.
    Type: Application
    Filed: April 11, 2005
    Publication date: October 27, 2005
    Applicant: Carl Zeiss SMT AG
    Inventors: Gerd Reisinger, Manfred Maul, Paul Graeupner, Martin Schriever, Ulrich Wegmann
  • Patent number: 6934011
    Abstract: In order to optimize the image properties of several optical elements of which at least one is moved relative to at least one stationary optical element, the overall image defect resulting from the interaction of all optical elements is first of all measured. This is represented as a linear combination of the base functions of an orthogonal function set. The movable element is then moved to a new measurement position and the overall image defect is measured once again. After the linear combination representation of the new overall image defect, the image defects of the movable element and of the stationary element are calculated from the data thereby obtained. With only one movable optical element a target position in which the overall image defect is minimized can be directly calculated and adjusted there from. If several movable optical elements are available, methods are given for the efficient determination of the respective target position.
    Type: Grant
    Filed: October 30, 2003
    Date of Patent: August 23, 2005
    Assignee: Carl Zeiss SMT AG
    Inventors: Bernd Geh, Paul Gräupner, Thomas Stammler, Dirk Stenkamp, Jochen Stühler, Klaus Wurmbrand
  • Publication number: 20050174550
    Abstract: In an immersion lithography apparatus or device manufacturing method, the position of focus of the projected image is changed during imaging to increase focus latitude. In an embodiment, the focus may be varied using the liquid supply system of the immersion lithographic apparatus.
    Type: Application
    Filed: October 15, 2004
    Publication date: August 11, 2005
    Applicants: ASML NETHERLANDS B.V., CARL ZEISS SMT AG
    Inventors: Bob Streefkerk, Johannes Jacobus Baselmans, Adrianus Engelen, Jozef Finders, Paul Graeupner, Johannes Catharinus Mulkens, Jan Bernard Van Schoot
  • Publication number: 20040109237
    Abstract: A method of adjusting a projection objective permits the projection objective to be adjusted between an immersion configuration and a dry configuration with few interventions in the system, and therefore to be used optionally as an immersion objective or as a dry objective. The projection objective has a multiplicity of optical elements which are arranged along an optical axis of the projection objective, the optical elements comprising a first group of optical elements following the object plane and a last optical element following the first group, arranged next to the image plane and defining an exit surface of the projection objective which is arranged at a working distance from the image plane. The last optical element is substantially without refracting power and has no curvature or only slight curvature.
    Type: Application
    Filed: May 30, 2003
    Publication date: June 10, 2004
    Applicant: CARL ZEISS SMT AG
    Inventors: Alexander Epple, Paul Graeupner, Winfried Kaiser, Reiner Garreis, Wilhelm Ulrich
  • Publication number: 20040032579
    Abstract: In a method for determining wavefront aberrations for the characterization of imaging characteristics in an optical imaging system, the measurement results from two different measurement methods, which are carried out at successive times, are combined. In this case, at least some of the aberration parameters which are determined in the previous first measurement method are used as a given precondition for determining aberration parameters with the aid of the second measurement method, and are assessed accordingly. This results in a hybrid method, in which the strength of at least two measurement methods are used in a combined form, and specific weaknesses of any one method can be avoided.
    Type: Application
    Filed: May 27, 2003
    Publication date: February 19, 2004
    Applicant: CARL ZEISS SMT AG
    Inventors: Wolfgang Emer, Paul Graeupner
  • Patent number: 6678240
    Abstract: In order to optimize the image properties of several optical elements of which at least one is moved relative to at least one stationary optical element, the overall image defect resulting from the interaction of all optical elements is first of all measured. This is represented as a linear combination of the base functions of an orthogonal function set. The movable element is then moved to a new measurement position and the overall image defect is measured once again. After the linear combination representation of the new overall image defect, the image defects of the movable element and of the stationary element are calculated from the data thereby obtained. With only one movable optical element a target position in which the overall image defect is minimized can be directly calculated and adjusted there from. If several movable optical elements are available, methods are given for the efficient determination of the respective target position.
    Type: Grant
    Filed: September 19, 2002
    Date of Patent: January 13, 2004
    Assignee: Carl Zeiss SMT AG
    Inventors: Bernd Geh, Paul Gräupner, Klaus Wurmbrand, Thomas Stammler, Dirk Stenkamp, Jochen Stühler