Patents by Inventor Paul Ma

Paul Ma has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 12241158
    Abstract: Methods for forming transition metal layers on a surface of a substrate are disclosed. Exemplary methods include forming a transition layer prior to forming the transition metal layer. The transition layer can be used to facilitate subsequent deposition of the transition metal layer on high aspect ratio features, while mitigating bending of the features during deposition of the transition metal layer.
    Type: Grant
    Filed: July 15, 2021
    Date of Patent: March 4, 2025
    Assignee: ASM IP Holding B.V.
    Inventors: Paul Ma, Roghayyeh Lotfi, Jaebeom Lee, Eric Christopher Stevens, Charith Eranga Nanayakkara
  • Patent number: 12237171
    Abstract: Methods and systems for depositing vanadium nitride layers onto a surface of the substrate and structures and devices formed using the methods are disclosed. An exemplary method includes using a cyclical deposition process, depositing a vanadium nitride layer onto a surface of the substrate. The cyclical deposition process can include providing a vanadium halide precursor to the reaction chamber and separately providing a nitrogen reactant to the reaction chamber. The cyclical deposition process may desirably be a thermal cyclical deposition process.
    Type: Grant
    Filed: October 12, 2023
    Date of Patent: February 25, 2025
    Assignee: ASM IP Holding B.V.
    Inventors: Giuseppe Alessio Verni, Qi Xie, Henri Jussila, Charles Dezelah, Jiyeon Kim, Eric James Shero, Paul Ma
  • Publication number: 20240401192
    Abstract: Various examples of the present disclosure relate to methods, systems, and apparatus for coupling a delivery vessel disposed at a first location on a substrate processing platform to a remote refill vessel disposed in a second location remote from the substrate processing platform, storing a chemical in the remote refill vessel in a first phase, changing the chemical in the remote refill vessel to a second phase, transporting the chemical in the second phase, to the delivery vessel, maintaining a temperature gradient within an inner volume of the delivery vessel, and returning the chemical to the first phase within the inner volume.
    Type: Application
    Filed: May 28, 2024
    Publication date: December 5, 2024
    Inventors: Eric James Shero, Paul Ma, Jereld Lee Winkler, Todd Robert Dunn, Shuaidi Zhang, Jacqueline Wrench, Shubham Garg, Jonathan Bakke
  • Publication number: 20240401194
    Abstract: The current disclosure relates to example method, system and apparatus for coupling a delivery vessel disposed at a first location on a substrate processing platform to a remote refill vessel disposed in a second location remote from the substrate processing platform via a first chemical delivery line, storing a chemical in the remote refill vessel in a first phase, changing the chemical in the remote refill vessel to a second phase, transporting the chemical in the second phase, to the delivery vessel via the first chemical delivery line, heating the first chemical delivery line to a first temperature equal to or above a phase change temperature of the chemical, and coupling the delivery vessel to an accumulator via a second chemical delivery line.
    Type: Application
    Filed: May 28, 2024
    Publication date: December 5, 2024
    Inventors: Shuaidi Zhang, Mustafa Muhammad, Moataz Bellah Mousa, Paul Ma, Jonathan Bakke, Todd Robert Dunn, Eric James Shero, Jereld Lee Winkler, YoungChol Byun, Shubham Garg, Jacqueline Wrench
  • Publication number: 20240401190
    Abstract: Methods for depositing a film on a surface of substrate by cyclical deposition methods including pulsed purge processed are disclosed. The pulsed purge processes include introducing a purge gas into a reaction chamber at a first flow rate, and introducing a purge gas into the reaction chamber at second flow rate, the first flow rate being different to the second flow rate.
    Type: Application
    Filed: May 24, 2024
    Publication date: December 5, 2024
    Inventors: Do Han Kim, Jereld Lee Winkler, Amit Mishra, Paul Ma, Todd Robert Dunn, Moataz Bellah Mousa
  • Publication number: 20240371662
    Abstract: Described herein are example, method, system and apparatus for supporting a substrate in a chamber wherein the substrate comprises a surface, contacting the surface of the substrate with an excited species within the chamber, contacting the surface of the substrate with an etchant species within the chamber and removing organic residue or non-organic residue, or a combination thereof, from the surface of the substrate responsive to executing the above steps.
    Type: Application
    Filed: May 1, 2024
    Publication date: November 7, 2024
    Inventors: Rajkumar Jakkaraju, Paul Ma, Yi Zhang, Dong Li
  • Publication number: 20240258154
    Abstract: Methods, systems, and assemblies suitable for gas-phase processes are disclosed. An exemplary assembly includes a susceptor plate and a susceptor attachment. The susceptor attachment can comprise a ramp region and a conductance control region above and exterior to the ramp region. Methods, systems, and assemblies can be used to obtain desired (e.g., composition and/or thickness) profiles of material on a substrate surface.
    Type: Application
    Filed: January 29, 2024
    Publication date: August 1, 2024
    Inventors: Jereld Lee Winkler, Eric Christopher Stevens, Amit Mishra, Chad Russell Lunceford, Paul Ma
  • Publication number: 20240234129
    Abstract: Methods and systems for forming structure comprising a threshold voltage tuning layer are disclosed. Exemplary methods include providing a treatment reactant to a reaction chamber to form a treated surface on the substrate surface and depositing threshold voltage tuning material overlying the treated surface. Additionally or alternatively, exemplary methods can include direct formation of metal silicide layers. Additionally or alternatively, exemplary methods can include use of an etchant.
    Type: Application
    Filed: January 3, 2024
    Publication date: July 11, 2024
    Inventors: Charles Dezelah, Michael Eugene Givens, Eric Jen Cheng Liu, Eric James Shero, Fu Tang, Marko Tuominen, Eva Elisabeth Tois, Andrea Illiberi, Tatiana Ivanova, Paul Ma, Gejian Zhao
  • Publication number: 20240218506
    Abstract: The substrate processing system includes a delivery vessel having a first inner volume, disposed in a first location on a substrate processing platform, a remote refill vessel in fluid communication with the delivery vessel via a chemical delivery line, the remote refill vessel comprising a second inner volume greater than the first inner volume and disposed in a second location remote from the substrate processing platform, and a first heating device or a first pressurizing device, or a combination thereof, proximate the remote refill vessel, operable to heat or pressurize, or a combination thereof, a chemical disposed in the remote refill vessel sufficient to change a phase of the chemical from a first phase to a second phase.
    Type: Application
    Filed: December 26, 2023
    Publication date: July 4, 2024
    Inventors: Eric James Shero, Jonathan Bakke, Arjav Prafulkumar Vashi, Todd Robert Dunn, Paul Ma, Jacqueline Wrench, Jereld Lee Winkler, Shuaidi Zhang, Shubham Garg, YoungChol Byun
  • Publication number: 20240191352
    Abstract: Various embodiments of the present technology may provide a first vessel to contain a slurry of a solid precursor powder and an inert liquid, a second vessel to receive the slurry, evaporate the inert liquid, and sublimate the solid precursor powder a first time to form a vapor, a third vessel to recondense the vapor back into a solid state and sublimate the solid precursor a second time to form a vapor, and a reaction chamber to receive the vapor from the third vessel.
    Type: Application
    Filed: December 6, 2023
    Publication date: June 13, 2024
    Inventors: Jereld Lee Winkler, Jacqueline Wrench, Paul Ma, Todd Robert Dunn, Jonathan Bakke, Eric James Shero, Shuaidi Zhang, Shubham Garg, YoungChol Byun
  • Patent number: 12006572
    Abstract: A reactor system including a gas distribution assembly and method of using the reactor system are disclosed. The gas distribution assembly includes a gas distribution device, a gas expansion area, and a showerhead plate downstream of the gas distribution device and the expansion area.
    Type: Grant
    Filed: October 1, 2020
    Date of Patent: June 11, 2024
    Assignee: ASM IP Holding B.V.
    Inventors: Xing Lin, Peipei Gao, Prajwal Nagaraj, Mingyang Ma, Wentao Wang, Ion Hong Chao, Alexandros Demos, Paul Ma, Hichem M'Saad
  • Publication number: 20240165681
    Abstract: Various embodiments of the present technology may provide methods and apparatus for cleaning a source vessel. The source vessel may be filled or partially filled with a solvent to form a solution. The solution is removed from the source vessel and contained in a waste vessel that is connected to the source vessel. The waste vessel may have a bellow or other mechanism inside of it to create a negative pressure in the waste vessel to pull the solution out of the source vessel and into the waste vessel. Alternatively, a liquid pump may be used to pull the solution from the source vessel to the waste vessel.
    Type: Application
    Filed: November 15, 2023
    Publication date: May 23, 2024
    Inventors: Jereld Lee Winkler, Paul Ma, Eric James Shero, Shubham Garg, Jonathan Bakke, Todd Dunn, Jacqueline Wrench, Shuaidi Zhang
  • Publication number: 20240141486
    Abstract: Apparatus for mixing two or more gases prior to entering a reaction chamber, reactor systems including the apparatus, and methods of using the apparatus and systems are disclosed. The systems and methods as described herein can be used to, for example, pulse a mixture of two or more precursors to a reaction chamber.
    Type: Application
    Filed: January 11, 2024
    Publication date: May 2, 2024
    Inventors: Hannu Huotari, Todd Robert Dunn, Michael Eugene Givens, Jereld Lee Winkler, Paul Ma, Eric Shero
  • Publication number: 20240133033
    Abstract: Herein disclosed are systems and methods related to delivery systems using solid source chemical fill vessels. The delivery system can include a vapor deposition reactor, two or more fill vessels, of which one of more can be remote from the vapor deposition reactor. Each fill vessel is configured to hold solid source chemical reactant therein. An interconnect line or conduit can fluidly connect the vapor deposition reactor with one or more of the fill vessels. A line heater can heat at least a portion of the interconnect line to at least a minimum line temperature.
    Type: Application
    Filed: January 3, 2024
    Publication date: April 25, 2024
    Inventors: Jacqueline Wrench, Shuaidi Zhang, Arjav Prafulkumar Vashi, Shubham Garg, Todd Robert Dunn, Moataz Bellah Mousa, Jonathan Bakke, Ibrahim Mohamed, Paul Ma, Bo Wang, Eric Shero, Jereld Lee Winkler
  • Patent number: 11901175
    Abstract: A method for selectively depositing silicon nitride on a first material relative to a second material is disclosed. An exemplary method includes treating the first material, and then selectively depositing a layer comprising silicon nitride on the second material relative to the first material. Exemplary methods can further include treating the deposited silicon nitride.
    Type: Grant
    Filed: July 7, 2022
    Date of Patent: February 13, 2024
    Assignee: ASM IP Holding B.V.
    Inventors: Eric James Shero, Paul Ma, Bed Prasad Sharma, Shankar Swaminathan
  • Patent number: 11885013
    Abstract: Methods and systems for depositing vanadium nitride layers onto a surface of the substrate and structures and devices formed using the methods are disclosed. An exemplary method includes using a cyclical deposition process, depositing a vanadium nitride layer onto a surface of the substrate. The cyclical deposition process can include providing a vanadium halide precursor to the reaction chamber and separately providing a nitrogen reactant to the reaction chamber. The cyclical deposition process may desirably be a thermal cyclical deposition process.
    Type: Grant
    Filed: December 7, 2020
    Date of Patent: January 30, 2024
    Assignee: ASM IP Holding B.V.
    Inventors: Giuseppe Alessio Verni, Qi Xie, Henri Jussila, Charles Dezelah, Jiyeon Kim, Eric James Shero, Paul Ma
  • Publication number: 20230349040
    Abstract: A method and system for forming a structure are disclosed. An exemplary method includes providing a substrate comprising a plurality of gaps within a first reaction chamber, forming a doped adhesion film on the surface of a substrate and within the plurality of gaps, wherein the doped adhesion film comprises a first material and a second material, and depositing a metal overlying the doped adhesion film. Exemplary methods can further include a step of depositing a nucleation layer overlying the doped adhesion film. An exemplary system can perform the method of forming the structure.
    Type: Application
    Filed: May 1, 2023
    Publication date: November 2, 2023
    Inventors: Moataz Bellah Mousa, Jiyeon Kim, Jaebeom Lee, Charith Eranga Nanayakkara, Paul Ma, Chuandao Wang, YoungChol Byun, Jacqueline Wrench, Guannan Chen
  • Publication number: 20230343596
    Abstract: Methods for forming structures with reduced feature (e.g., line) bending are provided. Exemplary methods include using a cyclic deposition process, forming a layer comprising one or more of molybdenum, tungsten, and ruthenium, and providing a nitrogen-containing reactant to the reaction chamber to form a transient surface species. Use of the nitrogen-containing reactant is thought to mitigate metal interactions that are thought to contribute to feature bending.
    Type: Application
    Filed: April 18, 2023
    Publication date: October 26, 2023
    Inventors: Jaebeom Lee, Charith Eranga Nanayakkara, Roghayyeh Lotfi, Paul Ma
  • Patent number: 11791153
    Abstract: Methods for forming hafnium oxide within a three-dimensional structure, such as in a high aspect ratio hole, are provided. The methods may include depositing a first hafnium-containing material, such as hafnium nitride or hafnium carbide, in a three-dimensional structure and subsequently converting the first hafnium-containing material to a second hafnium-containing material comprising hafnium oxide by exposing the first hafnium-containing material to an oxygen reactant. The volume of the second hafnium-containing material may be greater than that of the first hafnium-containing material. Voids or seams formed during the deposition of the first hafnium-containing material in the three-dimensional structure may be filled by the expanded material after exposing the first hafnium-containing material to the oxygen reactant. Thus, the three-dimensional structure, such as a high aspect ratio hole, can be filled with hafnium oxide substantially free of voids or seams.
    Type: Grant
    Filed: February 8, 2021
    Date of Patent: October 17, 2023
    Assignee: ASM IP Holding B.V.
    Inventors: Jiyeon Kim, Petri Raisanen, Sol Kim, Ying-Shen Kuo, Michael Schmotzer, Eric James Shero, Paul Ma
  • Publication number: 20230279539
    Abstract: Methods and systems for forming molybdenum layers on a surface of a substrate and structures and devices formed using the methods are disclosed. Exemplary methods include forming an underlayer prior to forming the molybdenum layer. The underlayer can be used to manipulate stress in the molybdenum layer and/or reduce a nucleation temperature and/or deposition temperature of a step of forming the molybdenum layer.
    Type: Application
    Filed: May 2, 2023
    Publication date: September 7, 2023
    Inventors: Paul Ma, Roghayyeh Lotfi, Jaebeom Lee, Eric Christopher Stevens, Amit Mishra