Patents by Inventor Pei Cheng

Pei Cheng has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20200259260
    Abstract: An antenna structure includes a first radiation element, a second radiation element, and a third radiation element. The first radiation element has a feeding point. The third radiation element is coupled through the second radiation element to the first radiation element. The third radiation element has a first opening and a second opening which are separate from each other. The antenna structure covers a first frequency band, a second frequency band, and a third frequency band.
    Type: Application
    Filed: April 10, 2019
    Publication date: August 13, 2020
    Inventors: Nien-Chao CHUANG, Pei-Cheng HU, Feng-Yi LIN
  • Patent number: 10726815
    Abstract: A display apparatus including a display panel, an image data processor unit and a display driver is provided. The image data processor unit is configured to generate a plurality of partial output frames according to a plurality of input frames. With respect to one pixel in the display panel, each partial output frame among the partial output frames includes a part, instead of all, of sub-pixel data to be displayed by the pixel. The display driver is coupled to the image data processor unit and a data signal input terminal of the display panel. In addition, a display panel is also provided.
    Type: Grant
    Filed: April 18, 2019
    Date of Patent: July 28, 2020
    Assignee: Novatek Microelectronics Corp.
    Inventors: Hsueh-Yen Yang, Ching-Pei Cheng
  • Publication number: 20200235491
    Abstract: An antenna system includes a dielectric substrate, a ground plane, and a first antenna array. The ground plane is disposed on a second surface of the dielectric substrate. The first antenna array is disposed on a first surface of the dielectric substrate. The first antenna array includes a first transmission line, a first antenna element, a second antenna element, a third antenna element, a fourth antenna element, a fifth antenna element, and a sixth antenna element. The first transmission line has a first feeding point and is coupled to the first antenna element, the second antenna element, the third antenna element, the fourth antenna element, the fifth antenna element, and the sixth antenna element. The first antenna element, the second antenna element, the third antenna element, the fourth antenna element, the fifth antenna element, and the sixth antenna element are all substantially arranged in a first straight line.
    Type: Application
    Filed: February 21, 2019
    Publication date: July 23, 2020
    Inventors: Ying-Sheng FANG, Po-Tsang LIN, Chia-Wei SU, Pei-Cheng HU
  • Patent number: 10708995
    Abstract: Additive color mixing across the visible spectrum was demonstrated from a light emitting diode (LED) pixel comprising of red, green, and blue subpixels monolithically integrated and enabled by local strain engineering. The device was fabricated using a top-down approach on a metal-organic chemical vapor deposition-grown sample consisting of a typical LED epitaxial stack. The three color subpixels were defined in a single lithographic step. The device was characterized for its electrical properties and emission spectra under an uncooled condition, which is desirable in practical applications. The color mixing was controlled by pulse width modulation and the degree of color control was also characterized.
    Type: Grant
    Filed: May 11, 2018
    Date of Patent: July 7, 2020
    Assignee: THE REGENTS OF THE UNIVERSITY OF MICHIGAN
    Inventors: Pei-Cheng Ku, Kunook Chung, Brandon Demory
  • Patent number: 10691927
    Abstract: A method and system are provided. The method includes positioning facial feature base points in a face image in an obtained image. A deformation template is obtained, the deformation template carrying configuration reference points and configuration base points. In the facial feature base points, a current reference point is determined corresponding to the configuration reference point, and a to-be-matched base point is determined corresponding to the configuration base point. A target base point is determined that corresponds to the configuration base point and that is in a to-be-processed image. The target base point and the corresponding to-be-matched base point forming form a mapping point pair. A to-be-processed image point is mapped to a corresponding target location according to a location relationship between the target base point and the to-be-matched base point, and a location relationship between the mapping point pair and the to-be-processed image point.
    Type: Grant
    Filed: June 21, 2018
    Date of Patent: June 23, 2020
    Assignee: TENCENT TECHNOLOGY (SHENZHEN) COMPANY LIMITED
    Inventors: Meng Ren Qian, Zhi Bin Wang, Pei Cheng, Xuan Qiu, Xiao Yi Li
  • Patent number: 10670959
    Abstract: A pellicle includes a frame. The frame includes a check valve, wherein the check valve is configured to permit gas flow from an interior of the pellicle to an exterior of the pellicle. The frame further includes a recess in a bottom surface of the frame. The pellicle further includes a membrane extending across the frame. The pellicle further includes a gasket configured to fit within the recess.
    Type: Grant
    Filed: May 10, 2017
    Date of Patent: June 2, 2020
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Chue San Yoo, Hsin-Chang Lee, Pei-Cheng Hsu, Yun-Yue Lin
  • Patent number: 10670950
    Abstract: A transparent rotating device comprising a shaft, a transparent rotating assembly and a motor is provided. The transparent rotating assembly includes at least one first transparent sheet and at least one second transparent sheet that are annularly and alternatively arranged around a shaft. A motor is connected to the shaft, wherein the first transparent sheet and the second transparent sheet sequentially enter the transmission path of the image beam. The angle at which the first transparent sheet is inclined with respect to the shaft is different from the angle at which the second transparent sheet is inclined with respect to the shaft. The image beam penetrates the first transparent sheet to be deflected and transmitted to a first position, and the image beam penetrates the second transparent sheet to be deflected and transmitted to a second position.
    Type: Grant
    Filed: August 12, 2019
    Date of Patent: June 2, 2020
    Assignee: Coretronic Corporation
    Inventors: Pei-Cheng Liao, Kuang-Hsiang Chang, Heng Li, Yun-Sheng Wang
  • Publication number: 20200133113
    Abstract: A reflective mask includes a substrate, a light absorbing layer over the substrate, a reflective layer over the light absorbing layer, and an absorption pattern over the reflective layer. The reflective layer covers a first portion of the light absorbing layer, and a second portion of the light absorbing layer is free from coverage by the reflective layer.
    Type: Application
    Filed: October 17, 2019
    Publication date: April 30, 2020
    Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Tsiao-Chen WU, Pei-Cheng HSU
  • Patent number: 10631763
    Abstract: A method for non-invasive glucose monitoring includes the following steps. At least one ray of light is emitted from at least one light source. The light emitted from the light source is leaded into an eyeball and focused on the eyeball through a first beam splitter. The reflected light reflected from the eyeball is transmitted through the first beam splitter to a set of photo detectors. Optical angular information and energy information of the reflected light transmitted to the set of photo detectors are measured. Optical angular difference and energy difference resulting from the light emitted from the light source and the reflected light transmitted to the set of photo detectors are obtained. Glucose information is obtained by analyzing the optical angular difference and the energy difference. Since glucose information has a corresponding relationship with blood glucose information, blood glucose information may be obtained.
    Type: Grant
    Filed: July 16, 2017
    Date of Patent: April 28, 2020
    Assignee: Taiwan Biophotonic Corporation
    Inventors: Yu-Tang Li, Chang-Sheng Chu, Pei-Fang Tsou, Pei-Cheng Ho, Kuan-Jui Ho
  • Patent number: 10630080
    Abstract: A charger comprises a housing, a first multi-layer printed circuit board (PCB), a second multi-layer PCB, and a third multi-layer PCB. The first PCB comprises at least a portion of a primary side circuit. The second PCB comprises at least a portion of a secondary side circuit. The third PCB is perpendicular to the first PCB and the second PCB. An isolation coupling element is disposed on the third PCB. The isolation coupling element comprises a multi-layer PCB. The first PCB comprises a high voltage (HV) semiconductor package. A surface of a die paddle of the HV semiconductor package is exposed from a molding encapsulation of the HV semiconductor package.
    Type: Grant
    Filed: June 28, 2019
    Date of Patent: April 21, 2020
    Assignee: ALPHA AND OMEGA SEMICONDUCTOR (CAYMAN) LTD.
    Inventors: Pei-Lun Huang, Yu-Ming Chen, Tien-Chi Lin, Jung-Pei Cheng, Yueh-Ping Yu, Zhi-Qiang Niu, Xiaotian Zhang, Long-Ching Wang
  • Publication number: 20200103742
    Abstract: In a method of manufacturing a photo mask, an etching mask layer having circuit patterns is formed over a target layer of the photo mask to be etched. The photo mask includes a backside conductive layer. The target layer is etched by plasma etching, while preventing active species of plasma from attacking the backside conductive layer.
    Type: Application
    Filed: April 12, 2019
    Publication date: April 2, 2020
    Inventors: Hsin-Chang LEE, Pei-Cheng HSU, Ta-Cheng LIEN, Tzu Yi WANG
  • Publication number: 20200103743
    Abstract: A photo mask for extreme ultra violet (EUV) lithography includes a substrate having a front surface and a back surface opposite to the front surface, a multilayer Mo/Si stack disposed on the front surface of the substrate, a capping layer disposed on the multilayer Mo/Si stack, an absorber layer disposed on the capping layer, and a backside conductive layer disposed on the back surface of the substrate. The backside conductive layer is made of tantalum boride.
    Type: Application
    Filed: April 12, 2019
    Publication date: April 2, 2020
    Inventors: Hsin-Chang LEE, Pei-Cheng HSU, Ping-Hsun LIN, Ta-Cheng LIEN, Tzu Yi WANG
  • Publication number: 20200103745
    Abstract: A method includes placing a photomask having a contamination on a surface thereof in a plasma processing chamber. The contaminated photomask is plasma processed in the plasma processing chamber to remove the contamination from the surface. The plasma includes oxygen plasma or hydrogen plasma.
    Type: Application
    Filed: September 11, 2019
    Publication date: April 2, 2020
    Inventors: Chun-Fu YANG, Pei-Cheng HSU, Ta-Cheng LIEN, Hsin-Chang LEE
  • Patent number: 10595693
    Abstract: Disclosed is a dust collector using fan heat, comprising a bottom shell (10) and an upper cover (50), wherein a rear end (12) of the bottom shell (10) is provided with an air outlet (122) and a fan assembly (30), the upper cover (50) covers and is connected to the bottom shell (10), air flow from the fan assembly (30) is discharged via the air outlet (122), and the fan assembly (30) is provided with a fan (33) and a stator (331); and the rear end (12) is provided with a lower frame edge (121), the fan assembly (30) and the air outlet (122) are enclosed to form a closed air flow channel (35), and a heat collector (40) is provided on the stator (331) in the air flow channel (35), and can rapidly collect heat and warm the air flow to form hot air flow.
    Type: Grant
    Filed: July 20, 2016
    Date of Patent: March 24, 2020
    Assignee: Yejen Appliances (Shenzhen) Ltd.
    Inventor: Pei-Cheng Hsu
  • Publication number: 20200057363
    Abstract: Fabricating a photomask includes forming a protection layer over a substrate. A plurality of multilayers of reflecting films are formed over the protection layer. A capping layer is formed over the plurality of multilayers. An absorption layer is formed over capping layer. A first photoresist layer is formed over portions of absorption layer. Portions of the first photoresist layer and absorption layer are patterned, forming first openings in absorption layer. The first openings expose portions of the capping layer. Remaining portions of first photoresist layer are removed and a second photoresist layer is formed over portions of absorption layer. The second photoresist layer covers at least the first openings. Portions of the absorption layer and capping layer and plurality of multilayer of reflecting films not covered by the second photoresist layer are patterned, forming second openings. The second openings expose portions of protection layer and second photoresist layer is removed.
    Type: Application
    Filed: August 7, 2019
    Publication date: February 20, 2020
    Inventors: Pei-Cheng HSU, Ta-Cheng LIEN, Ping-Hsun LIN, Shih-Che WANG, Hsin-Chang LEE
  • Publication number: 20200050098
    Abstract: A lithography mask includes a substrate, a reflective structure disposed over a first side of the substrate, and a patterned absorber layer disposed over the reflective structure. The lithography mask includes a first region and a second region that surrounds the first region in a top view. The patterned absorber layer is located in the first region. A substantially non-reflective material is located in the second region. The lithography mask is formed by forming a reflective structure over a substrate, forming an absorber layer over the reflective structure, defining a first region of the lithography mask, and defining a second region of the lithography mask. The defining of the first region includes patterning the absorber layer. The second region is defined to surround the first region in a top view. The defining of the second region includes forming a substantially non-reflective material in the second region.
    Type: Application
    Filed: October 22, 2019
    Publication date: February 13, 2020
    Inventors: Chin-Hsiang Lin, Chien-Cheng Chen, Hsin-Chang Lee, Chia-Jen Chen, Pei-Cheng Hsu, Yih-Chen Su, Gaston Lee, Tran-Hui Shen
  • Publication number: 20200050090
    Abstract: A transparent rotating device comprising a shaft, a transparent rotating assembly and a motor is provided. The transparent rotating assembly includes at least one first transparent sheet and at least one second transparent sheet that are annularly and alternatively arranged around a shaft. A motor is connected to the shaft, wherein the first transparent sheet and the second transparent sheet sequentially enter the transmission path of the image beam. The angle at which the first transparent sheet is inclined with respect to the shaft is different from the angle at which the second transparent sheet is inclined with respect to the shaft. The image beam penetrates the first transparent sheet to be deflected and transmitted to a first position, and the image beam penetrates the second transparent sheet to be deflected and transmitted to a second position.
    Type: Application
    Filed: August 12, 2019
    Publication date: February 13, 2020
    Applicant: Coretronic Corporation
    Inventors: Pei-Cheng Liao, Kuang-Hsiang Chang, Heng Li, Yun-Sheng Wang
  • Patent number: 10559244
    Abstract: A display driver adapted to drive a display panel is provided. The display panel includes a pixel column direction and a pixel row direction. The display driver includes an image data processor unit. The image data processor unit performs a two-dimensional subpixel rendering operation on an input image data to generate an output image data. The display driver drives the display panel according to the output image data. The two-dimensional subpixel rendering operation includes a first one-dimensional subpixel rendering operation in a first direction and a second one-dimensional subpixel rendering operation in a second direction. The first direction is one of the pixel column direction and the pixel row direction, and the second direction is another one of the pixel column direction and the pixel row direction.
    Type: Grant
    Filed: November 8, 2017
    Date of Patent: February 11, 2020
    Assignee: Novatek Microelectronics Corp.
    Inventors: Hsueh-Yen Yang, Sheng-Tien Cho, Ching-Pei Cheng
  • Publication number: 20200034996
    Abstract: The present disclosure discloses an image processing method, including: recognizing basic feature points of a source object in a source image and basic feature points of a base object in a base image; determining, according to distribution of the basic feature points in each of the images, auxiliary feature points that meet a filling condition according to the distribution in a corresponding image; determining feature points of a same type in the source object and the base object, the feature points of the same type including basic feature points of a same type and auxiliary feature points of a same type in the source object and the base object; determining average feature points according to positions of the feature points of the same type; deforming the source object and the base object according to the average feature points; and fusing the deformed source object with the deformed base object. The present disclosure further discloses an image processing apparatus, a terminal, and a storage medium.
    Type: Application
    Filed: October 4, 2019
    Publication date: January 30, 2020
    Inventors: Mengren QIAN, Xiaoqi LI, Pei CHENG, Bin FU, Yuan HUA
  • Publication number: 20200020089
    Abstract: The present disclosure provides an image processing method, including: recognizing a source object in a source image, and determining, according to feature points of the source object, an orientation and a size of the source object; adjusting, according to matching relationships between the orientation and the size of the source object and the orientation and the size of the target object, the orientation and the size of the source object; adjusting a shape of the source object and a shape of the target object according to an average shape of the source object and an average shape of the target object; and fusing, in real time, the source image and the target image in a manner of aligning the shape of the source object with the shape of the target object.
    Type: Application
    Filed: September 25, 2019
    Publication date: January 16, 2020
    Inventors: Pei CHENG, Bin Fu, Mengren Qian