Abstract: A method of manufacturing an extreme ultraviolet (EUV) lithography mask includes forming an image pattern in an absorption layer of EUV mask blank. The EUV mask blank includes: a multilayer stack including alternating molybdenum (Mo) and silicon (Si) layers disposed over a first surface of a mask substrate, a capping layer disposed over the multilayer stack, and an absorption layer disposed over the capping layer. A border region surrounds the image pattern having a trench wherein the absorption layer, the capping layer and at least a portion of the multilayer stack are etched. Concave sidewalls are formed in the border region or an inter-diffused portion is formed in the multilayer stack of the trench.

Abstract: An image processing apparatus including an image data processing unit is provided. The image data processing unit is configured to generate an output frame according to an input frame. For any one of sub-pixels of a display panel, the image data processing unit performs a sub-pixel rendering operation on a part of input sub-pixel data of the input frame to generate an output sub-pixel data corresponding to said any one of sub-pixels in the output frame. The output sub-pixel data is written into said any one of sub-pixels. Data positions that the parts of input sub-pixel data of different input frames locate in respective input frames are partially overlapped and not totally the same. In addition, a method for generating display data of the display panel is provided.

Abstract: A method comprises receiving a workpiece that includes a substrate having a low temperature expansion material, a reflective multilayer over the substrate, a capping layer over the reflective multilayer, and an absorber layer over the capping layer. The method further comprises patterning the absorber layer to provide first trenches corresponding to circuit patterns on a wafer, and patterning the absorber layer, the capping layer, and the reflective multilayer to provide second trenches corresponding to a die boundary area on the wafer, thereby providing an extreme ultraviolet lithography (EUVL) mask. The method further comprises treating the EUVL mask with a treatment chemical that prevents exposed surfaces of the absorber layer from oxidation.

Abstract: An antenna structure includes a dielectric substrate and a metal element. The metal element is disposed on the dielectric substrate, and includes a transmission element and a radiation element. A first triangular hollow region and a second triangular hollow region are formed on the radiation element.

Abstract: A display apparatus including a display panel, an image data processor unit and a display driver is provided. The image data processor unit is configured to generate a plurality of partial output frames according to a plurality of input frames. With respect to one pixel in the display panel, each partial output frame among the partial output frames includes a part, instead of all, of sub-pixel data to be displayed by the pixel. The display driver is coupled to the image data processor unit and a data signal input terminal of the display panel. In addition, a display panel is also provided.

Abstract: A structure including an EUV mask and a pellicle attached to the EUV mask. The pellicle includes a pellicle frame and a plurality of pellicle membrane layers attached to the pellicle frame. The plurality of pellicle membrane layers include at least one core pellicle membrane layer and an additional pellicle membrane layer is disposed on the at least one core pellicle membrane layer. In some embodiments, the additional pellicle membrane layer is a material having a thermal emissivity greater than 0.2, a transmittance greater than 80%, and a refractive index (n) for 13.5 nanometer source of greater than 0.9.

Abstract: The present invention discloses the Cordyceps cicadae mycelia, the active substances of C. cicadae mycelia, its submerged fermentation product and its pharmaceutical composition for preventing, delaying or treating cataracts, and the methods for preparing the products above. The C. cicadae mycelia, the active substances of C. cicadae mycelia, its submerged fermentation product and its pharmaceutical composition further can be prepared as a health food for preventing or delaying cataracts.

Abstract: A power management circuit is provided with groups of switches and a single shared inductor and is selectively configured in a first mode to act as a buck regulator and a second mode to act as a buck-boost regulator. There is a two-stage circuit topology, where both charging and regular operation of the device can be optimized. There is a switching charger integrated circuit that can be dedicated to performing a charging function, and there is a DC-DC power management integrated circuit that can be dedicated to regulating the system voltage provided by the battery while the battery is discharging.

Abstract: The present disclosure generally relates to an optical measurement module, an optical measurement device, and a method for optical measurement. The optical measurement module provides optical architecture to measure the optical properties of an analyte. The optical measurement device comprising the optical measurement module is configured to measure the optical properties of an analyte. The method for the optical measurement provides steps for optical measurement.

Abstract: A lithography mask includes a substrate, a reflective structure disposed over a first side of the substrate, and a patterned absorber layer disposed over the reflective structure. The lithography mask includes a first region and a second region that surrounds the first region in a top view. The patterned absorber layer is located in the first region. A substantially non-reflective material is located in the second region. The lithography mask is formed by forming a reflective structure over a substrate, forming an absorber layer over the reflective structure, defining a first region of the lithography mask, and defining a second region of the lithography mask. The defining of the first region includes patterning the absorber layer. The second region is defined to surround the first region in a top view. The defining of the second region includes forming a substantially non-reflective material in the second region.

Abstract: A method for creating a collage among members of a chat group of a social networking application is performed at a terminal, comprising: generating a first collage using a user-selected collage template after receiving a user-selected picture for a predefined location in the user-selected collage template; generating a configuration file used for describing the first collage; and submitting the first collage and the configuration file to the social networking application, wherein the social networking application is configured to forward the first collage and the configuration file to another member of the chat group when there are one or more blank sections in the first collage and the other member of the chat group is configured to update the first collage by adding at least one picture to one of the one or more blank sections until there is no blank section in the first collage.

Abstract: An isolation coupling structure for transmitting a feedback signal between a secondary side and a primary side of a voltage conversion device includes a first dielectric layer including a first face and a second face opposite to the first face, a first coupling coil disposed on the first face enclosing to form an inner region; a second coupling coil configured to couple with the first coupling coil. The second coupling coil includes a first coil portion and a second coil portion, where the first coil portion is disposed on the second face, the second coil portion is disposed on the first face and located inside the inner region. The second coil portion is isolated from the first coupling coil, and the first coil portion and the second coil portion are electrically connected. The technical effect is that it can realize the electrical isolation and the coupling with low cost and small package size.

Abstract: A method for fabricating a pellicle for EUV lithography processes includes placing a hard mask in contact with a surface of a substrate. In some embodiments, the hard mask is configured to pattern the surface of the substrate to include a first region and a second region surrounding the first region. By way of example, while the mask in positioned in contact with the substrate, an etch process of the substrate is performed to etch the first and second regions into the substrate. Thereafter, an excess substrate region is removed so as to separate the etched first region from the excess substrate region. In various embodiments, the etched and separated first region serves as a pellicle for an extreme ultraviolet (EUV) lithography process.

Abstract: A mask container for storing a mask for photolithography, includes a cover and a base having a plurality of tapered corners. The tapered corners taper outward and downward from a top major surface of the base. The cover having the tapered corners extends downward that covers the tapered corners of the base when the cover is attached to the base. The tapered corners of the cover are tapered at about the same angle as the tapered corners of the base so that a surface of the tapered corners of the cover is substantially parallel to a corresponding surface of the tapered corner of the base when the cover is attached to the base. A recess is located in the tapered corners of the cover. A biasing member and a ball-shaped member are located in the tapered corners of the base to mate with the recess when the cover is attached to the base.

Abstract: A method of removing a pellicle from a photomask includes removing a portion of a membrane from a pellicle frame, wherein the pellicle frame remains attached to the photomask following the removing of the portion of the membrane. The method further includes removing the pellicle frame from the photomask. The method further includes cleaning the photomask.

Abstract: A voltage converter comprises a second controller as a power switch of the secondary side of the transformer for comparing a detection voltage representing an output voltage and/or load current with a first reference voltage and generating a control signal, and a coupling element for transmitting the control signal generated by the second controller to the first controller on the primary side of the transformer enabling the first controller to generate a first pulse signal driving the power switch to control the on/off state of the primary side winding.

Abstract: An antenna structure includes a dielectric substrate and a metal element. The metal element is disposed on the dielectric substrate, and includes a transmission element and a radiation element. A first triangular hollow region and a second triangular hollow region are formed on the radiation element.

Abstract: The present invention discloses the Cordyceps cicadae mycelia, the active substances of C. cicadae mycelia, its submerged fermentation product and its pharmaceutical composition for preventing, delaying or treating cataracts, and the methods for preparing the products above. The C. cicadae mycelia, the active substances of C. cicadae mycelia, its submerged fermentation product and its pharmaceutical composition further can be prepared as a health food for preventing or delaying cataracts.

Abstract: A voltage converter comprises a second controller as a power switch of the secondary side of the transformer for comparing a detection voltage representing an output voltage and/or load current with a first reference voltage and generating a control signal, and a coupling element for transmitting the control signal generated by the second controller to the first controller on the primary side of the transformer enabling the first controller to generate a first pulse signal driving the power switch to control the on/off state of the primary side winding.

Abstract: Additive color mixing across the visible spectrum was demonstrated from a light emitting diode (LED) pixel comprising of red, green, and blue subpixels monolithically integrated and enabled by local strain engineering. The device was fabricated using a top-down approach on a metal-organic chemical vapor deposition-grown sample consisting of a typical LED epitaxial stack. The three color subpixels were defined in a single lithographic step. The device was characterized for its electrical properties and emission spectra under an uncooled condition, which is desirable in practical applications. The color mixing was controlled by pulse width modulation and the degree of color control was also characterized.