Abstract: In accordance with the present invention, there is provided a valve assembly wherein a heating modality such as an induction heater is cooperatively engaged to a prescribed location on a valve housing or body of a valve to effectively maintain the temperature of the valve above the saturation temperature of the related system pressure. Maintaining this temperature differential effectively avoids the accumulation of condensate within the interior of the valve body and/or on other internal structural features thereof.

Abstract: A gas distributor for a CVD or OVPD reactor comprises two or more gas volumes (1, 2) into each of which opens a feed pipe (3, 4) for a process gas, each gas volume (1, 2) being connected to a plurality of corresponding process gas outlets (6, 7) which open into the bottom (5) of the gas distributor. In order to increase the homogeneity of the gas composition, the two gas volumes (1, 2) comprise pre-chambers (10, 10?, 11) located in a first common plane (8) and a plurality of gas distribution chambers (12, 13) each associated with a gas volume are provided in a second plane (9?) adjacent to the bottom of the gas distributor. The pre-chambers (10, 10?, 11) and gas distribution chambers (12, 13) associated with each gas volume (1, 2) are connected with connection channels (14, 15).

Abstract: The invention relates to a gas inlet element (2) for a CVD reactor with a chamber (4), which has a multitude of bottom-side outlet openings (23), via which a process gas introduced into the chamber (4) via edge-side access openings (10) exits into a process chamber (21) of the CVD reactor (1). In order to homogenize the gas composition, the invention provides that at least one mixing chamber arrangement (11, 12, 13) is situated upstream from the access openings (10), and at least two process gases are mixed with one another inside this mixing chamber arrangement.

Abstract: The invention relates to a method for deposition of at least one layer containing at least one first component on at least one substrate in a process chamber, wherein first and second starting materials are introduced in gaseous form into the process chamber in alternation cyclically, at least the first starting material of which contains the first component, to deposit essentially only one layer of the first component in each cycle.

Abstract: The present invention relates to an aqueous composition comprising at least one finely divided filler and at least one water-soluble amphoteric copolymer, a process for the preparation of such a composition and its use as an additive in the production of paper, cardboard and board.

Abstract: A device for absorbing side forces during a side impact of a motor vehicle has a reinforcing structure (12) with a transversely extending reinforcing beam (14). An end (15) of the reinforcing beam (14) is mounted in a bracket (20) that is fixed to the vehicle. A profile part (30) is at the end (15) of the reinforcing beam (14) and supports the reinforcing beam (14). The profile part (30) is connected firmly to the bracket (20) that is fixed to the vehicle thereby providing improved side impact protection and enhanced safety for vehicle occupants.

Abstract: For the reinforcement of a body structure of a motor vehicle which extends adjacent to a front side door of the vehicle, a hollow member structure formed by channel reinforcements is arranged in the body structure. The hollow member structure extends approximately in a horizontal plane from the B pillar into a rear region of the body structure. The channel reinforcements are intended to absorb, in a stable fashion, the forces which enter into the side part via the door in the event of a frontal crash.

Abstract: Aqueous slurries of finely divided fillers which are at least partly coated with polymers and which are obtainable by treating aqueous slurries of finely divided fillers with at least one water-soluble amphoteric copolymer whose structures are identified in the specification are used as an additive to the paper stock in the production of filler-containing paper, filler-containing cardboard or filler-containing board by draining of the paper stock.

Abstract: A device for absorbing side forces during a side impact of a motor vehicle has a reinforcing structure (12) with a transversely extending reinforcing beam (14). An end (15) of the reinforcing beam (14) is mounted in a bracket (20) that is fixed to the vehicle. A profile part (30) is at the end (15) of the reinforcing beam (14) and supports the reinforcing beam (14). The profile part (30) is connected firmly to the bracket (20) that is fixed to the vehicle thereby providing improved side impact protection and enhanced safety for vehicle occupants.

Abstract: For the reinforcement of a body structure of a motor vehicle which extends adjacent to a front side door of the vehicle, a hollow member structure formed by channel reinforcements is arranged in the body structure. The hollow member structure extends approximately in a horizontal plane from the B pillar into a rear region of the body structure. The channel reinforcements are intended to absorb, in a stable fashion, the forces which enter into the side part via the door in the event of a frontal crash.

Abstract: The invention relates to a method for depositing at least one semiconductor layer on at least one substrate in a processing chamber (2). Said semiconductor layer is composed of several components which are evaporated by non-continuously injecting a liquid starting material (3) or a starting material (3) dissolved in a liquid into a tempered evaporation chamber (4) with the aid of one respective injector unit (5) while said vapor is fed to the processing chamber by means of a carrier gas (7). The inventive method is characterized in that the mass flow rate parameters, such as the preliminary injection pressure, the injection frequency, the pulse/pause ratio, and the phase relation between the pulses/pauses and the pulses/pauses of the other injector unit(s), which determine the progress of the mass flow rate of a first silicon-containing starting material and a germanium-containing second starting material (3) through the associated injector unit (5), are individually adjusted or varied.

Abstract: A deformation element for absorbing lateral impact forces in the lateral region of a motor vehicle has at least two hollow chambers disposed one behind another in the direction of action of the lateral impact forces. An axial extension of which is in each case oriented at right angles to the direction of action of the lateral impact forces. The deformation element has at least one fastening portion for mounting the deformation element on an associated lateral sill portion of the vehicle.

Abstract: A method for determining mass-related variables of a vehicle is described. Spring compression travel values (Le,1, Le,r) are measured on at least one sprung axle of the vehicle, and an actual value (zs,1) for the height of the center of gravity of the vehicle is determined from the measured spring compression travel values (Le,1, Le,r), their temporal variation ({dot over (L)}e,1, {dot over (L)}e,r), and at least one transversal dynamics variable which describes the transversal dynamics of the vehicle.

Abstract: The invention relates to a method for depositing at least one semiconductor layer on at least one substrate in a processing chamber (2). Said semiconductor layer is composed of several components which are evaporated by non-continuously injecting a liquid starting material (3) or a starting material (3) dissolved in a liquid into a tempered evaporation chamber (4) with the aid of one respective injector unit (5) while said vapor is fed to the processing chamber by means of a carrier gas (7). The inventive method is characterized in that the mass flow rate parameters, such as the preliminary injection pressure, the injection frequency, the pulse/pause ratio, and the phase relation between the pulses/pauses and the pulses/pauses of the other injector unit(s), which determine the progress of the mass flow rate of a first silicon-containing starting material and a germanium-containing second starting material (3) through the associated injector unit (5), are individually adjusted or varied.

Abstract: The invention relates to a gas inlet element (2) for a CVD reactor with a chamber (4), which has a multitude of bottom-side outlet openings (23), via which a process gas introduced into the chamber (4) via edge-side access openings (10) exits into a process chamber (21) of the CVD reactor (1). In order to homogenize the gas composition, the invention provides that at least one mixing chamber arrangement (11, 12, 13) is situated upstream from the access openings (10), and at least two process gases are mixed with one another inside this mixing chamber arrangement.

Abstract: A gas distributor for a CVD or OVPD reactor comprises two or more gas volumes (1,2) into each of which opens a feed pipe (3,4) for a process gas, each gas volume (1,2) being connected to a plurality of corresponding provess gas outlets (6,7) which open into the bottom (5) of the gas distributor. In order to increase the homogeneity if the gas composition, the two gas volumes (1,2) comprose pre-chambers (10, 10?, 11) located in a first common plane (8) and a plurality of gas distribution chambers (12, 13) each associated with a gas volume are provided in a second plane (9) adjacent to the bottom of the gas distributor. The pre-chambers (10, 10?, 11) and gas distribution chambers (12, 13) associated with each gas volume (1,2) are connected with connection channels (14, 15).

Abstract: The invention relates to a method for the deposition of at least one layer on at least one substrate in a process chamber, whereby the layer comprises at least one component. The at least one first metal component is vaporised in a particularly conditioned carrier gas by means of a non-continuous injection of a starting material in the form of a liquid or dissolve in a liquid and at least one second component as chemically-reactive starting material. The starting materials are alternately introduced into the process chamber and the second starting material is a chemically-reactive gas or a chemically-reactive liquid.

Abstract: The invention relates to a method and device for depositing at least one layer on at least one substrate in a process chamber. Said layer comprises several components and is insulating, passivating or electrically conductive. The components are vaporized in a tempered vaporization chamber by means of non-continuous injection of a liquid starting material or a starting material dissolved in a liquid using a respective injector unit. Said vapor is guided to the process chamber by means of a carrier gas. It is important to individually adjust or vary the material flow parameters, such as injection frequency and the pulse/pause ratio and the phase relation of the pulse/pauses to the pulse/pauses of the other injector unit, determining the time response of the flow of material through each injector unit. The pressure in the process chamber is less than 100 mbars, the process chamber is tempered and several series of layers are deposited on the substrate during one process step.

Abstract: The invention relates to a device for depositing at least one especially thin layer onto at least one substrate (9). Said device comprises a process chamber (1, 20, 11, 11?, 40, 21), housed in a reactor housing (2) and comprising a movable susceptor (20) which carries the at least one substrate (9). A plurality of gas feed lines (24) run into said process chamber and feed different process gases which comprise coat-forming components. Said process gases can be fed to the process chamber in subsequent process steps, thereby depositing the coat-forming components onto the substrate (9). In order to increase the throughput of said method, the process chamber is provided with a plurality of separate deposition chambers (11, 11?) into which different gas feed lines (24, 24?) run, thereby feeding individual gas compositions. The substrate (9) can be fed to said chambers one after the other by moving the susceptor (20) and depositing different layers or layer components.

Abstract: The present invention relates to stationary cloth media filtration systems and devices, as well as processes and devices, including improved cloth media filter backwashing using a rotating backwash arm assembly.