Abstract: Optoelectronic device including light-emitting means in the form of nanowires (2, 3) having a core/shell-type structure and produced on a substrate (11), in which said nanowires comprise an active zone (22, 32) including at least two types of quantum wells associated with different emission wavelengths and distributed among at least two different regions (220, 221; 320, 321) of said active zone, in which the device also includes a first electrical contact zone (15) on the substrate and a second electrical contact zone (16) on the emitting means, in which said second zone is arranged so that, as the emitting means are distributed according to at least two groups, the electrical contact is achieved for each of said at least two groups at a different region of the active zone, and the electrical power supply is controlled so as to obtain the emission of a multi-wavelength light.

Abstract: A device for back-scattering an incident light ray, including: a host substrate; a structured layer; a first face in contact with a front face of the host substrate; a second flat face parallel to the first face; a first material and a second material which form, in a mixed plane, alternating surfaces at least one of whose dimensions is between 300 nm and 800 nm, the mixed plane is between the first and second face of the structured layer; wherein the refractive index of the first and of the second material are different, the structured layer is covered by a specific layer, the specific layer is made of a material which is different from the first and second materials of the structured layer, and the specific layer is crystalline and semi-conductive.

Abstract: A method of manufacturing at least one semiconducting micro- or nano-wire used for formation of an optoelectric structure, optoelectronic structures including the micro- or nano-wires, and a method enabling manufacture of the photoelectronic structures. The method includes providing a semiconducting substrate, forming a crystalline buffer layer on the substrate, the buffer layer having a first zone over at least part of its thickness composed mainly of magnesium nitride in a form MgxNy, and forming at least one semiconducting micro- or nano-wire on the buffer layer.

Abstract: A method of manufacturing a device based on LEDs includes the growth of semiconducting nanowires on a first electrode produced on an insulating face, and encapsulation thereof in planarizing material; the formation, on the planarizing material, of a second electrode with contact take-up areas. LEDs are formed by releasing a band of the first electrode around each take-up area, including forming a mask defining the bands on the second electrode, chemically etching the planarizing material, stopped so as to preserve planarizing material, chemically etching the portion of nanowires thus released, and then chemically etching the remaining planarizing material. A trench is formed along each of the bands as far as the insulating face and the LEDs are placed in series by connecting the take-up areas and bands of the first electrode.

Abstract: An optoelectronic device includes at least first and second light-emitting nanowires on a support, each comprising an area for the injection of holes and an area for the injection of electrons, a series electric connection including a connection nanowire on the support, which includes a first region forming an electric path with the hole injection area of the first nanowire, a second region forming an electric path with the electron injection area of the second nanowire, and a third region enabling a current to flow between first and second regions. Also included are a first conductive area connecting the hole injection area of the first nanowire and the first region of the connection nanowire and electrically insulated from the second nanowire, and a second conductive area connecting the second region of the connection nanowire and electron injection area of the second nanowire and electrically insulated from the first nanowire.

Abstract: A process of making a microelectronic light-emitting device, including: a) growth on a metallic support of multiple wires based on one or more semi-conducting materials designed to emit radiant light, and b) formation of at least one electrical conducting zone of contact on at least one of the wires.

Abstract: The invention relates to a method for making optoelectronic devices comprising nanowire semiconductors, in which: the nanowires (2) are formed on a substrate (1), said nanowires being capable of emitting a light beam; a first electric contact area is formed at the substrate, and a second electric contact area is formed at the nanowires, characterized in that the second electric contact area is formed on the edge of the nanowires (2) in direct contact with said nanowires, on a predetermined height (h) thereof and in the vicinity of their end opposite the substrate, as well as between said nanowires, the upper surface (20) of the nanowires being exposed.

Abstract: Optoelectronic device including light-emitting means in the form of nanowires (2, 3) having a core/shell-type structure and produced on a substrate (11), in which said nanowires comprise an active zone (22, 32) including at least two types of quantum wells associated with different emission wavelengths and distributed among at least two different regions (220, 221; 320, 321) of said active zone, in which the device also includes a first electrical contact zone (15) on the substrate and a second electrical contact zone (16) on the emitting means, in which said second zone is arranged so that, as the emitting means are distributed according to at least two groups, the electrical contact is achieved for each of said at least two groups at a different region of the active zone, and the electrical power supply is controlled so as to obtain the emission of a multi-wavelength light.

Abstract: A method of manufacturing a device based on LEDs includes the growth of semiconducting nanowires on a first electrode produced on an insulating face, and encapsulation thereof in planarising material; the formation, on the planarising material, of a second electrode with contact take-up areas. LEDs are formed by releasing a band of the first electrode around each take-up area, including forming a mask defining the bands on the second electrode, chemically etching the planarising material, stopped so as to preserve planarising material, chemically etching the portion of nanowires thus released, and then chemically etching the remaining planarising material. A trench is formed along each of the bands as far as the insulating face and the LEDs are placed in series by connecting the take-up areas and bands of the first electrode.

Abstract: The invention relates to a process for producing a p-n junction in a nanostructure, in which the nanostructure has one or more nanoconstituents made of a semiconductor material with a single type of doping having one conductivity type, characterized in that it includes a step consisting in forming a dielectric element (3, 32, . . . , 3n) embedding the nanostructure over a height h, the dielectric element generating a surface potential capable of inverting the conductivity type over a defined width W of the nanoconstituents(s) thus embedded over the height h.

Abstract: The invention relates to a method for making optoelectronic devices comprising nanowire semiconductors, in which: the nanowires (2) are formed on a substrate (1), said nanowires being capable of emitting a light beam; a first electric contact area is formed at the substrate, and a second electric contact area is formed at the nanowires, characterised in that the second electric contact area is formed on the edge of the nanowires (2) in direct contact with said nanowires, on a predetermined height (h) thereof and in the vicinity of their end opposite the substrate, as well as between said nanowires, the upper surface (20) of the nanowires being exposed.

Abstract: The invention relates to a process for producing a p-n junction in a nanostructure, in which the nanostructure has one or more nanoconstituents made of a semiconductor material with a single type of doping having one conductivity type, characterized in that it includes a step consisting in forming a dielectric element (3, 32, . . . , 3n) embedding the nanostructure over a height h, the dielectric element generating a surface potential capable of inverting the conductivity type over a defined width W of the nanoconstituents(s) thus embedded over the height h.

Abstract: Laser device comprising: a laser source (10) including a light emitting structure (1); a guide structure (40) to deliver light generated by the emitting structure, this guide structure (40) comprising at least a first portion (40.1) and a second portion (40.2), the first portion housing a diffraction grating (3) that forms a reflector of the laser source and cooperates with the emitting structure (1), the second portion (40.2) being a waveguide that delivers light generated by the emitting structure (1) and propagated in the first portion (40.1). The emitting structure (1) is made using the III-V technology or II-VI technology, and the guide structure (40) is made using the silicon technology.

Abstract: A process of making a microelectronic light-emitting device, including: a) growth on a metallic support of multiple wires based on one or more semi-conducting materials designed to emit radiant light, and b) formation of at least one electrical conducting zone of contact on at least one of the wires.

Abstract: Light-emitting system comprising an integrated control photodetector and method for fabricating said system. This system is particularly suitable for optical connections and comprises a light-emitting electronic component (2) and a light guide (4) that receives the light emitted by the component, said guide comprising a light input face (8) arranged facing the component and reflecting a part of the light it receives, and a photodetector (14) integrated with the component and that detects a part of the light emitted by said component, wherein said photodetector is placed near to the component and is capable of receiving a part of the light reflected by the light input face. The active layer of the light-emitting electronic component is made of the same material as the active layer of the photodetector.

Abstract: The invention relates to a method for producing a multilayer on a receiving substrate, including the following steps: the formation of an initial substrate comprising a first material layer formed on the surface of a supporting substrate made of a second material, molecular adhesion bonding of the surface of the initial substrate comprising the first material layer to the bonding surface of a receiving substrate to obtain a bonded structure, partial removal of the initial substrate so as to leave a thin film of said second material on the first material layer, evaporation of the second material thin film with a selective stop on the first material layer, growth of at least one layer from the first material layer bonded to the receiving substrate, with the evaporation step and the growth step being carried out in the same technological apparatus.