Abstract: Various methods and structures for fabricating a plurality of vertical fins in a vertical fin pattern on a semiconductor substrate where the vertical fins in the vertical fin pattern are separated by wide-open spaces, along a critical dimension, in a low duty cycle of 1:5 or lower. Adjacent vertical fins in the vertical fin pattern can be all separated by respective wide-open spaces, along a critical dimension, in a low duty cycle, and wherein pairs of adjacent vertical fins in the vertical fin pattern, along the critical dimension, are separated by a constant pitch value at near zero tolerance.

Abstract: Various methods and structures for fabricating a plurality of vertical fins in a vertical fin pattern on a semiconductor substrate where the vertical fins in the vertical fin pattern are separated by wide-open spaces, along a critical dimension, in a low duty cycle of 1:5 or lower. Adjacent vertical fins in the vertical fin pattern can be all separated by respective wide-open spaces, along a critical dimension, in a low duty cycle, and wherein pairs of adjacent vertical fins in the vertical fin pattern, along the critical dimension, are separated by a constant pitch value at near zero tolerance.

Abstract: Methods for fabricating and replicating self-aligned multi-tier nanoscale structures for a variety of cross-sectional geometries. These methods can utilize a single lithography step whereby the need for alignment and overlay in the process is completely eliminated thereby enabling near-zero overlay error. Furthermore, techniques are developed to use these methods to fabricate self-aligned nanoscale multi-level/multi-height patterns with various shapes for master templates, replica templates and nanoimprint based pattern replication. Furthermore, the templates can be used to pattern multiple levels in a sacrificial polymer resist and achieve pattern transfer of the levels into a variety of substrates to form completed large area nanoelectronic and nanophotonic devices using only one patterning step.

Abstract: Methods for fabricating and replicating self-aligned multi-tier nanoscale structures for a variety of cross-sectional geometries. These methods can utilize a single lithography step whereby the need for alignment and overlay in the process is completely eliminated thereby enabling near-zero overlay error. Furthermore, techniques are developed to use these methods to fabricate self-aligned nanoscale multi-level/multi-height patterns with various shapes for master templates, replica templates and nanoimprint based pattern replication. Furthermore, the templates can be used to pattern multiple levels in a sacrificial polymer resist and achieve pattern transfer of the levels into a variety of substrates to form completed large area nanoelectronic and nanophotonic devices using only one patterning step.

Abstract: Methods for fabricating and replicating self-aligned multi-tier nanoscale structures for a variety of cross-sectional geometries. These methods can utilize a single lithography step whereby the need for alignment and overlay in the process is completely eliminated thereby enabling near-zero overlay error. Furthermore, techniques are developed to use these methods to fabricate self-aligned nanoscale multi-level/multi-height patterns with various shapes for master templates, replica templates and nanoimprint based pattern replication. Furthermore, the templates can be used to pattern multiple levels in a sacrificial polymer resist and achieve pattern transfer of the levels into a variety of substrates to form completed large area nanoelectronic and nanophotonic devices using only one patterning step.

Abstract: Methods for fabricating and replicating self-aligned multi-tier nanoscale structures for a variety of cross-sectional geometries. These methods can utilize a single lithography step whereby the need for alignment and overlay in the process is completely eliminated thereby enabling near-zero overlay error. Furthermore, techniques are developed to use these methods to fabricate self-aligned nanoscale multi-level/multi-height patterns with various shapes for master templates, replica templates and nanoimprint based pattern replication. Furthermore, the templates can be used to pattern multiple levels in a sacrificial polymer resist and achieve pattern transfer of the levels into a variety of substrates to form completed large area nanoelectronic and nanophotonic devices using only one patterning step.

Abstract: A deployable air dam for an automotive vehicle has panel, a plurality of four-bar linkages coupling the panel to a front of the vehicle, and an electric clutched actuator coupled to the four-bar linkages for moving the panel of the air-dam between a deployed and an undeployed position wherein the panel extends vertically down from a bottom of a bumper of the vehicle when in the deployed position.

Abstract: A deployable air dam for an automotive vehicle has panel, a plurality of four-bar linkages coupling the panel to a front of the vehicle, and an electric clutched actuator coupled to the four-bar linkages for moving the panel of the air-dam between a deployed and an undeployed position wherein the panel extends vertically down from a bottom of a bumper of the vehicle when in the deployed position.