Abstract: The present invention belongs to the field of biopharmaceuticals and relates to an anti-DKK1 antibody, a pharmaceutical composition thereof, and use thereof. Specifically, the present invention relates to an anti-DKK1 antibody or an antigen-binding fragment thereof, wherein the anti-DKK1 antibody comprises a heavy chain variable region comprising HCDR1 to HCDR3 and a light chain variable region comprising LCDR1 to LCDR3, wherein the amino acid sequence of HCDR1 is selected from SEQ ID NO: 1, etc., the amino acid sequence of HCDR2 is selected from SEQ ID NO: 2, etc., the amino acid sequence of HCDR3 is selected from SEQ ID NO: 3, etc., the amino acid sequence of LCDR1 is selected from SEQ ID NO: 4, etc., the amino acid sequence of LCDR2 is selected from SEQ ID NO: 5, etc., and the amino acid sequence of LCDR3 is selected from SEQ ID NO: 6, etc.

Abstract: The invention provides a carbon dioxide-based polyurethane elastomer with damping and anti-fatigue aging properties and its preparation method. It is obtained from Component A and Component B; Component A includes: PTMG-1000 45˜60 parts, carbon dioxide-based polyol 25˜30 parts, poly-DOPO-ITA-pentanediol ester 10˜20 parts, BDO 3˜5 parts, water 0.3˜0.5 parts, N-methylimidazole 0.5˜0.8 parts, bis(2-dimethylaminoethyl) ether 0.1˜0.2 parts, needle-shaped nano-titanium dioxide 0.5 parts, hindered phenol 0.2˜0.5 parts, dibutyltin dilaurate 0.1˜0.3 parts, strontium chloride 0.005˜0.01 parts, rhodium chloride 0.02˜0.03 parts, foaming agent 0.2˜0.5 parts; Component B includes: carbon dioxide-based polyol 50˜55 parts, MDI-50 45˜50 parts, organic zinc 0.01˜0.02 parts, organic bismuth 0.01˜0.02 parts.

Abstract: An apparatus for in-situ etching monitoring in a plasma processing chamber includes a continuous wave broadband light source, an illumination system configured to illuminate an area on a substrate with an incident light beam being directed from the continuous wave broadband light source at normal incidence to the substrate, a collection system configured to collect a reflected light beam being reflected from the illuminated area on the substrate, and to direct the reflected light beam to a first light detector, and a controller. The controller is configured to determine a property of the substrate or structures formed thereupon based on a reference light beam and the reflected light beam, and control an etch process based on the determined property. The reference light beam is generated by the illumination system by splitting a portion of the incident light beam and directed to a second light detector.

Abstract: Provided are an aromatic vinyl compound, a metal complex thereof, and a preparation method therefor and the use thereof. The aromatic vinyl compound and the metal complex thereof have an inhibitory activity on the binding of PD-1/PD-L1, and therefore the aromatic vinyl compound and the metal complex thereof can be used for treating related diseases such as tumors. In addition, the obtained metal complex can also be used as an imaging agent.

Abstract: An image processing method and apparatus, an electronic device, and a storage medium. The method includes: determining a target drawing viewpoint corresponding to a trigger operation on a target object when the trigger operation is detected; determining a target grid region to which the target drawing viewpoint belongs based on a pre-generated target sphere grid model, and determining a target interpolation image corresponding to the target drawing viewpoint according to at least one optical flow information set of the target grid region; and issuing the target interpolation image to a target client, so as to display, on the target client, the target interpolation image corresponding to the trigger operation.

Abstract: The present application provides improved methods and compositions for in vitro transcription of mRNA that has reduced levels of dsRNA contaminant.

Abstract: A ventilation structure of a core chamber of a turbofan engine having a large bypass ratio, said structure comprising: an outer bypass wall surface (1), a core chamber wall surface (4) and a core casing (7). An outer bypass flow channel (2) is formed between the outer bypass wall surface (1) and the core chamber wall surface (4). A core chamber (6) is formed between the core chamber wall surface (4) and the core casing (7). An air intake annular cavity (3) is provided in the core casing and is located at the upstream position. The air intake annular cavity (3) is used to put the outer bypass flow channel (2) and the core chamber (6) in communication. An exhaust grille (5) is further provided on the core chamber wall surface (4) and is located at a tail position.

Abstract: Disclosed in the present application are an auxiliary transportation system for a diesel engine monorail crane locomotive in a slope and a control method thereof, relating to the field of auxiliary transportation technologies in a mine shaft. The system includes: a roadway, where a monorail crane track is arranged at a top end of the roadway; and a transfer transportation device, where the transfer transportation device runs on the monorail crane track, and a first sensing control unit is integrated in the transfer transportation device. The roadway includes an auxiliary slope mouth, the first-level to an Nth-level upper auxiliary slope bodies, the first-level to an Nth-level lower auxiliary slope bodies, the first-level to an Nth-level auxiliary slope central stations, a plurality of arc-shaped shaft bodies, and an auxiliary slope bottom.

Abstract: A thickness of a film stack of a workpiece and a composition of the film stack is determined with an x-ray technique, spectroscopic ellipsometry (SE) and/or spectroscopic reflectometry (SR), and multiwavelength Raman spectroscopy. The measurements are combined to form combined measured data. The combining includes regressing the second measurements and the third measurements. The thickness of the film stack and the composition of the film stack is then determined using the combined measured data.

Abstract: The disclosure provides a light-emitting device and a displayer. Herein, the light-emitting device includes a substrate, a light-emitting chip, a first light-transmitting layer, a second light-transmitting layer and a nano coating. The light transmittance of the second light-transmitting layer is greater than the light transmittance of the first light-transmitting layer. A reference surface corresponding to the light-emitting chip is arranged above the substrate, and the reference surface is higher than the bottom surface of the light-emitting chip and not higher than the top surface of the light-emitting chip. The first light-transmitting layer covers the surface of the light-emitting chip below the reference surface, and the second light-transmitting layer covers the surface of the light-emitting chip above the reference surface. The nano coating covers the outer surface of the first light-transmitting layer, the outer surface of the second light-transmitting layer and the side surface of the substrate.

Abstract: A multifunctional rotating control device (RCD) is provided. The multifunctional RCD includes an RCD assembly and a flow detection module. Further, the RCD assembly includes a body and a rotating sealing assembly. A bore through hole and a bypass outlet are formed in the body, and the rotating sealing assembly is provided in the bore through hole. Additionally, the bypass outlet is connected to a straight-through cut-off valve, and the flow detection module includes a flowmeter, a first flow cut-off valve, and a second flow cut-off valve. Further, the flowmeter extends upward in a direction of the bore through hole, and the first flow cut-off valve and the second flow cut-off valve are respectively provided at two ends of the flowmeter, and communicate with the flowmeter. Additionally, an inlet of the flowmeter is a flow detection input outlet, and the flow detection input outlet communicates with the straight-through cut-off valve.

Abstract: Methods and systems for improved detection of defects of interest and measurement of structures buried within complex three dimensional semiconductor structures are described herein. Through-focus scanning optical microscopy (TSOM) using non-linear, second harmonic generation (SHG) light signals emitted from a sample provides interface-selective sensitivity for metrology and inspection of advanced semiconductor structures. A TSOM/SHG system includes a spectral filter to pass collected light at wavelengths corresponding to SHG emission. In some embodiments, a TSOM/SHG system includes an ultrafast, pulsed laser source emitting ultraviolet to near infrared wavelengths to efficiently induce SHG at surface interfaces. The halving of wavelength inherent to SHG enables a doubling of illumination wavelength without penalizing resolution.

Abstract: A multifunctional rotating control device (RCD) includes an RCD assembly, a multi-way cross, and choke control modules. The RCD assembly includes a body and a rotating sealing assembly, where a bore through hole, two side outlets, and a straight-through outlet are formed in the body. The rotating sealing assembly is provided in the bore through hole, a straight-through cut-off valve is provided at the straight-through outlet, and there are two choke control modules. The two choke control modules are respectively connected to the two side outlets and the multi-way cross, and a side choke extends upward in a direction of the bore through hole. The two choke control modules are integrated onto the RCD assembly, and extend upward in the direction of the bore through hole.

Abstract: A ventilation structure of a core chamber of a turbofan engine having a large bypass ratio, said structure comprising: an outer bypass wall surface (1), a core chamber wall surface (4) and a core casing (7). An outer bypass flow channel (2) is formed between the outer bypass wall surface (1) and the core chamber wall surface (4). A core chamber (6) is formed between the core chamber wall surface (4) and the core casing (7). An air intake annular cavity (3) is provided in the core casing and is located at the upstream position. The air intake annular cavity (3) is used to put the outer bypass flow channel (2) and the core chamber (6) in communication. An exhaust grille (5) is further provided on the core chamber wall surface (4) and is located at a tail position.

Abstract: The present disclosure discloses a method for special effect rendering, an electronic device and a storage medium. The method includes: acquiring foreground special effect data corresponding to a special effect rendering instruction, background special effect data corresponding to the special effect rendering instruction and a real-time live video stream of a target live streaming room in response to receiving the special effect rendering instruction for the target live streaming room; obtaining merging special effect data by performing special effect fusion on the real-time live video stream based background special effect data; and displaying a first live page corresponding to the target live streaming room by performing parallel rendering on the merging special effect data and the foreground special effect data.

Abstract: An antibody specifically binding to CD112R or an antigen binding fragment thereof, a composition comprising same, a nucleic acid molecule encoding the antibody or the antigen binding fragment thereof, a vector and a host cell for expressing the antibody or the antigen binding fragment thereof, a treatment and diagnostic method using the antibody or the antigen binding fragment thereof, and use of the antibody or the antigen binding fragment thereof.

Abstract: An inspection system may perform an inspection recipe by receiving reference SHG images of a reference structure based on a scan of the reference structure with an illumination beam and collecting second harmonic generation (SHG) light in response to the illumination beam, where the reference structure includes a multilayer structure including one or more inversion-symmetric materials. The system may further receive test SHG images of a test structure based on a scan of the test structure by illuminating the test structure with the illumination beam and collecting the SHG light in response to the illumination beam, where the test structure and the reference structure have a common design. The system may further identify defects in the test structure by comparing the test and reference SHG images.

Abstract: Methods and systems for measuring values of one or more parameters of interest, including changes in values of one or more parameters of interest, based on measured spectral differences are presented herein. A trained spectral difference based measurement model determines changes in the values of one or more parameters of interest based on a measure of differences in spectra measured before and after one or more process steps. In some examples, a measure of spectral difference is determined based on a difference in measured intensity, a difference in harmonic signal values, or a difference in value of one or more Mueller Matrix elements. A measure of spectral difference may be expressed as a set of difference values, a scalar value, or coefficients of a functional fit to difference values. A measure of spectral difference may be determined based on a weighting of spectral differences according to wavelength.

Abstract: A metrology system may include an illumination source to generate an illumination beam and an illumination sub-system to direct the illumination beam to a sample with an inversion-symmetric substrate and one or more films disposed on the inversion-symmetric substrate. The system may further include a filter configured to block a wavelength of the illumination beam and pass a wavelength associated with a second harmonic of the illumination beam and a detector to capture second harmonic generation (SHG) light. The system may further include a controller to receive metrology data from the detector associated with the SHG light from with an interface between the inversion-symmetric substrate and the one or more films and generate one or more metrology measurements associated with the one or more films based on the metrology data.

Abstract: An apparatus for in-situ etching monitoring in a plasma processing chamber includes a continuous wave broadband light source, an illumination system configured to illuminate an area on a substrate with an incident light beam being directed from the continuous wave broadband light source at normal incidence to the substrate, a collection system configured to collect a reflected light beam being reflected from the illuminated area on the substrate, and to direct the reflected light beam to a first light detector, and a controller. The controller is configured to determine a property of the substrate or structures formed thereupon based on a reference light beam and the reflected light beam, and control an etch process based on the determined property. The reference light beam is generated by the illumination system by splitting a portion of the incident light beam and directed to a second light detector.