Abstract: A directed chemical conjugate of a glucagon-like peptide-2 mutant, and a use thereof are provided. The glucagon-like peptide-2 mutant is based on the human glucagon-like peptide-2 through multiple site mutations and carboxy terminus extensions. By introducing a targeted chemical modification site, the glucagon-like peptide-2 mutant has biological activities consistent with the natural human glucagon-like peptide-2, and meanwhile, the half-life period in vivo is significantly prolonged, and the administration frequency is reduced, thereby achieving the purpose of treating or preventing short intestinal syndrome, intestinal mucosa injury caused by chemotherapy medicaments or radioactive treatment factors, ulcerative enteritis, chronic enteritis and non-inflammatory bowel injury disease.

Abstract: A method, computer program product and system are provided for preloading debug information based on the presence of incremental source code files. Based on parsed input parameters to a source code debugger, a source code repository and a local storage area are searched for an incremental file. In response to the incremental file being located, a preload indicator in the incremental file, which is a source code file, is set. Based on the preload indicator being set, debug symbol data from the incremental file is merged to a preload symbol list. In response to receiving a command to examine the debug symbol data from the incremental file, the preload symbol list is searched for the requested debug symbol data.

Abstract: A monocrystalline SiC substrate comprising a first surface and a second surface. The first surface comprises pinning regions and a device region. Each of the pinning regions is configured to provide a potential well which is capable to attract dislocations from a region surrounding said pinning region. The device region is configured to provide a part of the monocrystalline SiC substrate for manufacturing a semiconductor device. The device region is surrounded by the pinning regions, and a density of dislocations in a central portion of the device region is smaller than a density of dislocations in an edge of the device region due to the pinning regions. The pinning regions surrounding the device region attracts dislocations of the device region into the edge portion, so that the density of dislocations in the central portion is reduced. A yield of the semiconductor devices is improved.

Abstract: Described herein are T cells engineered to express a chimeric antigen receptor (CAR), such as an anti-mesothelin CAR alone or in combination with a follicle-stimulating hormone receptor (FSHR) binding domain and/or a dominant negative transforming growth factor-? receptor II (dnTGF?RII) for the treatment of diseases associated with mesothelin expression. Also described are T cells engineered to express a modified T cell receptor (TCR).

Abstract: A combined bio-artificial liver support system, includes branch tubes that are connected in sequence: a blood input branch tube, an upstream tail end, a first plasma separation branch tube comprising at least a first plasma separator, a non-biological purification branch tube comprising at least a plasma perfusion device and a bilirubin adsorber, a biological purification branch tube comprising at least a hepatocyte culture cartridge assembly, and a plasma return branch tube, a downstream tail end of which is set as a blood output end.

Abstract: A system, method, and/or non-transitory computer readable medium may implement or be configured to implement the following computational operations associated with electrochemical or vapor phase deposition: (a) defining an interface of a substrate where deposition of a deposited material is to occur or is occurring; (b) using a computational model of the deposition to determine a local deposition rate of the deposited material at multiple locations on the interface, where the computational model of the deposition computes the local deposition rate as a function of one or more geometric parameters of the one or more recessed or protruding features; and (c) computationally adjusting the location of the interface to produce an adjusted interface.

Abstract: Systems and methods for performing local Critical Dimension Uniformity (CDU) modeling in a virtual fabrication environment are discussed. More particularly, local CD variance is replicated in the virtual fabrication environment in order to produce a CDU mask that can be used during a virtual fabrication sequence to produce more accurate results reflecting the CD variance of features that occurs in a pattern for a semiconductor device being physically fabricated.

Abstract: Systems and methods for performing depth-dependent oxidation modeling and depth-dependent etch modeling in a virtual fabrication environment are discussed. More particularly, a virtual fabrication environment models, as part of a process sequence, oxidant dispersion in a depth-dependent manner and simulates the subsequent oxidation reaction based on the determined oxidant thickness along an air/silicon interface. Further the virtual fabrication environment performs depth-dependent etch modeling as part of a process sequence to determine etchant concentration and simulate the etching of material along an air/material interface.

Abstract: Systems and methods for performing reflow modeling in a virtual fabrication environment are discussed. More particularly, the virtual fabrication environment may determine metal or material “reflow” or movement during fabrication of a semiconductor device structure. A reflow modeling step with user-specified parameters may be inserted into a process sequence used during fabrication of the semiconductor device structure.

Abstract: Systems and methods for performing depth-dependent oxidation modeling and depth-dependent etch modeling in a virtual fabrication environment are discussed. More particularly, a virtual fabrication environment models, as part of a process sequence, oxidant dispersion in a depth-dependent manner and simulates the subsequent oxidation reaction based on the determined oxidant thickness along an air/silicon interface. Further the virtual fabrication environment performs depth-dependent etch modeling as part of a process sequence to determine etchant concentration and simulate the etching of material along an air/material interface.

Abstract: Disclosed herein are composite materials and methods of making and use thereof. The composite materials disclosed herein can comprise: a first metal oxide particle having a thermal stability and a specific reversible oxygen storage capacity, wherein the first metal oxide particle comprises a first metal oxide comprising a transition metal oxide; and a second metal oxide disposed on the first metal oxide particle; wherein the composite material has a thermal stability and a specific reversible oxygen storage capacity; and wherein the thermal stability of the composite material is greater than the thermal stability of the first metal oxide particle. The methods of use of the composite materials described herein can comprise using the composite material as a catalyst, as an oxygen carrier, as a catalyst support, in a fuel cell, in a catalytic converter, or a combination thereof.

Abstract: A vascular implant, a delivery device and a medical apparatus are disclosed. The vascular implant includes a first engagement structure, and the delivery device includes the delivery shaft and a chamber. The delivery shaft includes a second engagement structure configured for detachable retaining engagement with the first engagement structure. Both the first engagement structure and the delivery shaft are configured to be received in the chamber. When the first engagement structure and the delivery shaft are received in the chamber, the first engagement structure is confined by the chamber and thus remains in retaining engagement with the second engagement structure, thus axially locking the vascular implant to the delivery shaft. When the first engagement structure is removed from the chamber, it is no longer confined thereby and is thus detachable from the second engagement structure, thus axially unlocking the vascular implant from the delivery shaft.

Abstract: A method of preparing tunable inorganic patterned nanofeatures by infiltration of a block copolymer scaffold having a plurality of self-assembled periodic polymer microdomains. The method may be used sequential infiltration synthesis (SIS), related to atomic layer deposition (ALD). The method includes selecting a metal precursor that is configured to selectively react with the copolymer unit defining the microdomain but is substantially non-reactive with another polymer unit of the copolymer. A tunable inorganic features is selectively formed on the microdomain to form a hybrid organic/inorganic composite material of the metal precursor and a co-reactant. The organic component may be optionally removed to obtain an inorganic feature s with patterned nanostructures defined by the configuration of the microdomain.

Abstract: A camera pose information detection method, includes collecting a plurality of images by means of a multi-lens camera, and determining a road surface region image based on the plurality of images; and projecting points in the road surface region image onto a camera coordinate system, so as to obtain camera pose information.

Abstract: Systems and methods for performing depth-dependent oxidation modeling and depth-dependent etch modeling in a virtual fabrication environment are discussed. More particularly, a virtual fabrication environment models, as part of a process sequence, oxidant dispersion in a depth-dependent manner and simulates the subsequent oxidation reaction based on the determined oxidant thickness along an air/silicon interface. Further the virtual fabrication environment performs depth-dependent etch modeling as part of a process sequence to determine etchant concentration and simulate the etching of material along an air/material interface.

Abstract: Systems and methods for performing depth-dependent oxidation modeling and depth-dependent etch modeling in a virtual fabrication environment are discussed. More particularly, a virtual fabrication environment models, as part of a process sequence, oxidant dispersion in a depth-dependent manner and simulates the subsequent oxidation reaction based on the determined oxidant thickness along an air/silicon interface. Further the virtual fabrication environment performs depth-dependent etch modeling as part of a process sequence to determine etchant concentration and simulate the etching of material along an air/material interface.

Abstract: A combined bio-artificial liver support system, includes branch tubes that are connected in sequence: a blood input branch tube, an upstream tail end, a first plasma separation branch tube comprising at least a first plasma separator, a non-biological purification branch tube comprising at least a plasma perfusion device and a bilirubin adsorber, a biological purification branch tube comprising at least a hepatocyte culture cartridge assembly, and a plasma return branch tube, a downstream tail end of which is set as a blood output end.

Abstract: A semiconductor structure and a method for fabricating the semiconductor structure are provided. The method includes providing a substrate. The substrate includes an active region and a blank region disposed adjacent to the active region. The method also includes forming a fin material layer on the substrate. Further, the method includes forming a plurality of fins on the active region, and a plurality of dummy fins on the blank region by etching the fin material layer. A spacing between a fin and an adjacent dummy fin is greater than a spacing between adjacent fins.

Abstract: A method of preparing tunable inorganic patterned nanofeatures by infiltration of a block copolymer scaffold having a plurality of self-assembled periodic polymer microdomains. The method may be used sequential infiltration synthesis (SIS), related to atomic layer deposition (ALD). The method includes selecting a metal precursor that is configured to selectively react with the copolymer unit defining the microdomain but is substantially non-reactive with another polymer unit of the copolymer. A tunable inorganic features is selectively formed on the microdomain to form a hybrid organic/inorganic composite material of the metal precursor and a co-reactant. The organic component may be optionally removed to obtain an inorganic feature s with patterned nanostructures defined by the configuration of the microdomain.

Abstract: Disclosed herein are composite materials and methods of making and use thereof. The composite materials disclosed herein can comprise: a first metal oxide particle having a thermal stability and a specific reversible oxygen storage capacity, wherein the first metal oxide particle comprises a first metal oxide comprising a transition metal oxide; and a second metal oxide disposed on the first metal oxide particle; wherein the composite material has a thermal stability and a specific reversible oxygen storage capacity; and wherein the thermal stability of the composite material is greater than the thermal stability of the first metal oxide particle. The methods of use of the composite materials described herein can comprise using the composite material as a catalyst, as an oxygen carrier, as a catalyst support, in a fuel cell, in a catalytic converter, or a combination thereof.