Patents by Inventor Ralf Hofmann

Ralf Hofmann has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20200142292
    Abstract: An extreme ultraviolet mask and method of manufacture thereof includes: providing a glass-ceramic block; forming a glass-ceramic substrate from the glass-ceramic block; and depositing a planarization layer on the glass-ceramic substrate.
    Type: Application
    Filed: December 19, 2019
    Publication date: May 7, 2020
    Inventors: Ralf Hofmann, Majeed A. Foad, Cara Beasley
  • Publication number: 20200124737
    Abstract: A method for sending correction data and for determining a highly accurate position of a mobile unit includes receiving a reference region that includes the mobile unit, the reference region being determined as a function of a rough position of the mobile unit; determining the correction data as a function of the reference region, the correction data describing a deviation of the rough position from the highly accurate position of the mobile unit; ascertaining a deviation of the correction data from reference correction data, the reference correction data being assigned to the reference region; and sending the correction data to the mobile unit in order to determine the highly accurate position of the mobile unit as a function of the deviation.
    Type: Application
    Filed: April 24, 2018
    Publication date: April 23, 2020
    Inventors: Frank Hofmann, Ralf Luebben
  • Publication number: 20200058213
    Abstract: An extreme ultraviolet (EUV) mask blank production system includes: a substrate handling vacuum chamber for creating a vacuum; a substrate handling platform, in the vacuum, for transporting an ultra-low expansion substrate loaded in the substrate handling vacuum chamber; and multiple sub-chambers, accessed by the substrate handling platform, for forming an EUV mask blank includes: a multi-layer stack, formed above the ultra-low expansion substrate, for reflecting an extreme ultraviolet (EUV) light, and an absorber layer, formed above the multi-layer stack, for absorbing the EUV light at a wavelength of 13.5 nm includes the absorber layer has a thickness of less than 80 nm and less than 2% reflectivity.
    Type: Application
    Filed: December 14, 2018
    Publication date: February 20, 2020
    Applicant: Applied Materials, Inc.
    Inventors: Vinayak Vishwanath Hassan, Majeed A. Foad, Cara Beasley, Ralf Hofmann
  • Patent number: 10551732
    Abstract: An extreme ultraviolet (EUV) mask blank production system includes: a substrate handling vacuum chamber for creating a vacuum; a substrate handling platform, in the vacuum, for transporting an ultra-low expansion substrate loaded in the substrate handling vacuum chamber; and multiple sub-chambers, accessed by the substrate handling platform, for forming an EUV mask blank includes: a multi-layer stack, formed above the ultra-low expansion substrate, for reflecting an extreme ultraviolet (EUV) light, and an absorber layer, formed above the multi-layer stack, for absorbing the EUV light at a wavelength of 13.5 nm includes the absorber layer has a thickness of less than 80 nm and less than 2% reflectivity.
    Type: Grant
    Filed: December 14, 2018
    Date of Patent: February 4, 2020
    Assignee: Applied Materials, Inc.
    Inventors: Vinayak Vishwanath Hassan, Majeed A. Foad, Cara Beasley, Ralf Hofmann
  • Patent number: 10551731
    Abstract: An extreme ultraviolet mask and method of manufacture thereof includes: providing a glass-ceramic block; forming a glass-ceramic substrate from the glass-ceramic block; and depositing a planarization layer on the glass-ceramic substrate.
    Type: Grant
    Filed: December 19, 2014
    Date of Patent: February 4, 2020
    Assignee: Applied Materials, Inc.
    Inventors: Ralf Hofmann, Majeed Foad, Cara Beasley
  • Patent number: 10522375
    Abstract: A monitoring and deposition control system and method of operation thereof including: a deposition chamber for depositing a material layer on a substrate; a sensor array for monitoring deposition of the material layer for changes in a layer thickness of the material layer during deposition; and a processing unit for adjusting deposition parameters based on the changes in the layer thickness during deposition.
    Type: Grant
    Filed: December 13, 2017
    Date of Patent: December 31, 2019
    Assignee: Applied Materials, Inc.
    Inventors: Edward W. Budiarto, Majeed A. Foad, Ralf Hofmann, Thomas Nowak, Todd Egan, Mehdi Vaez-Iravani
  • Publication number: 20190130731
    Abstract: An extreme ultraviolet (EUV) mask blank production system includes: a substrate handling vacuum chamber for creating a vacuum; a substrate handling platform, in the vacuum, for transporting an ultra-low expansion substrate loaded in the substrate handling vacuum chamber; and multiple sub-chambers, accessed by the substrate handling platform, for forming an EUV mask blank includes: a multi-layer stack, formed above the ultra-low expansion substrate, for reflecting an extreme ultraviolet (EUV) light, and an absorber layer, formed above the multi-layer stack, for absorbing the EUV light at a wavelength of 13.5 nm includes the absorber layer has a thickness of less than 80 nm and less than 2% reflectivity.
    Type: Application
    Filed: December 14, 2018
    Publication date: May 2, 2019
    Applicant: Applied Materials, Inc.
    Inventors: Vinayak Vishwanath Hassan, Majeed A. Foad, Cara Beasley, Ralf Hofmann
  • Patent number: 10236198
    Abstract: Methods of processing a plurality of substrates using a processing chamber with bottom and top openings and a plurality of processing slots are provided. A substrate positioned on a carrier is loaded into a first end of a processing chamber body through the bottom opening. The carrier is moved through a plurality of processing slots to a top opening at a second end of the chamber body and then removed from the processing chamber through the top opening.
    Type: Grant
    Filed: August 29, 2017
    Date of Patent: March 19, 2019
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Banqiu Wu, Nag B. Patibandla, Toshiaki Fujita, Ralf Hofmann, Pravin K. Narwankar, Jeonghoon Oh, Srinivas Satya, Li-Qun Xia
  • Patent number: 10209613
    Abstract: An integrated extreme ultraviolet (EUV) blank production system includes: a vacuum chamber for placing a substrate in a vacuum; a first deposition system for depositing a planarization layer having a planarized top surface over the substrate; and a second deposition system for depositing a multi-layer stack on the planarization layer without removing the substrate from the vacuum. The EUV blank is in an EUV lithography system includes: an extreme ultraviolet light source; a mirror for directing light from the EUV source; a reticle stage for placing a EUV mask blank with a planarization layer; and a wafer stage for placing a wafer. The EUV blank includes: a substrate; a planarization layer to compensate for imperfections related to the surface of the substrate, the planarization layer having a flat top surface; and a multi-layer stack on the planarization layer.
    Type: Grant
    Filed: May 27, 2016
    Date of Patent: February 19, 2019
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Cara Beasley, Ralf Hofmann, Majeed Foad, Timothy Michaelson
  • Patent number: 10197907
    Abstract: An extreme ultraviolet (EUV) mask blank production system includes: a substrate handling vacuum chamber for creating a vacuum; a substrate handling platform, in the vacuum, for transporting an ultra-low expansion substrate loaded in the substrate handling vacuum chamber; and multiple sub-chambers, accessed by the substrate handling platform, for forming an EUV mask blank includes: a multi-layer stack, formed above the ultra-low expansion substrate, for reflecting an extreme ultraviolet (EUV) light, and an absorber layer, formed above the multi-layer stack, for absorbing the EUV light at a wavelength of 13.5 nm includes the absorber layer has a thickness of less than 80 nm and less than 2% reflectivity.
    Type: Grant
    Filed: February 21, 2017
    Date of Patent: February 5, 2019
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Vinayak Vishwanath Hassan, Majeed A. Foad, Cara Beasley, Ralf Hofmann
  • Patent number: 10199660
    Abstract: A magnetic handling assembly for thin-film processing of a substrate, a system and method for assembling and disassembling a shadow mask to cover a top of a workpiece for exposure to a processing condition. The assembly may include a magnetic handling carrier and a shadow mask disposed over, and magnetically coupled to, the magnetic handling carrier to cover a top of a workpiece that is to be disposed between the shadow mask and the magnetic handling carrier when exposed to a processing condition. A system includes a first chamber with a first support to hold the shadow mask, a second support to hold a handling carrier, and an alignment system to align the shadow mask a workpiece to be disposed between the carrier and shadow mask. The first and second supports are moveable relative to each other.
    Type: Grant
    Filed: March 21, 2016
    Date of Patent: February 5, 2019
    Assignee: Applied Materials, Inc.
    Inventors: Byung-Sung Leo Kwak, Stefan Bangert, Ralf Hofmann, Michael Koenig
  • Patent number: 10012908
    Abstract: An apparatus and method of manufacture of an extreme ultraviolet reflective element includes: a substrate; a multilayer stack on the substrate, the multilayer stack includes a plurality of reflective layer pairs having a first reflective layer formed from silicon and a second reflective layer formed from niobium or niobium carbide for forming a Bragg reflector; and a capping layer on and over the multilayer stack for protecting the multilayer stack by reducing oxidation and mechanical erosion.
    Type: Grant
    Filed: January 19, 2017
    Date of Patent: July 3, 2018
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Ralf Hofmann, Vinayak Vishwanath Hassan, Cara Beasley, Majeed A. Foad
  • Patent number: 10012897
    Abstract: An extreme ultraviolet (EUV) mask blank production system includes: a substrate handling vacuum chamber for creating a vacuum; a substrate handling platform, in the vacuum, for transporting an ultra-low expansion substrate loaded in the substrate handling vacuum chamber; and multiple sub-chambers, accessed by the substrate handling platform, for forming an EUV mask blank includes: a first sub-chamber for forming a multi-layer stack, above the ultra-low expansion substrate, for reflecting an extreme ultraviolet (EUV) light; and a second sub-chamber for forming a bi-layer absorber, formed above the multi-layer stack, for absorbing the EUV light at a wavelength of 13.5 nm provides a reflectivity of less than 1.9%.
    Type: Grant
    Filed: January 13, 2017
    Date of Patent: July 3, 2018
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Vinayak Vishwanath Hassan, Majeed Foad, Cara Beasley, Ralf Hofmann
  • Publication number: 20180158677
    Abstract: Embodiments described herein provide methods and apparatus for forming graphitic carbon such as graphene on a substrate. The method includes providing a precursor comprising a linear conjugated hydrocarbon, depositing a hydrocarbon layer from the precursor on the substrate, and forming graphene from the hydrocarbon layer by applying energy to the substrate. The precursor may include template molecules such as polynuclear aromatics, and may be deposited on the substrate by spinning on, by spraying, by flowing, by dipping, or by condensing. The energy may be applied as radiant energy, thermal energy, or plasma energy.
    Type: Application
    Filed: January 11, 2018
    Publication date: June 7, 2018
    Inventors: Cara BEASLEY, Ralf HOFMANN, Majeed A. FOAD
  • Publication number: 20180114711
    Abstract: A monitoring and deposition control system and method of operation thereof including: a deposition chamber for depositing a material layer on a substrate; a sensor array for monitoring deposition of the material layer for changes in a layer thickness of the material layer during deposition; and a processing unit for adjusting deposition parameters based on the changes in the layer thickness during deposition.
    Type: Application
    Filed: December 13, 2017
    Publication date: April 26, 2018
    Inventors: Edward W. Budiarto, Majeed A. Foad, Ralf Hofmann, Thomas Nowak, Todd Egan, Mehdi Vaez-lravani
  • Patent number: 9905418
    Abstract: Embodiments described herein provide methods and apparatus for forming graphitic carbon such as graphene on a substrate. The method includes providing a precursor comprising a linear conjugated hydrocarbon, depositing a hydrocarbon layer from the precursor on the substrate, and forming graphene from the hydrocarbon layer by applying energy to the substrate. The precursor may include template molecules such as polynuclear aromatics, and may be deposited on the substrate by spinning on, by spraying, by flowing, by dipping, or by condensing. The energy may be applied as radiant energy, thermal energy, or plasma energy.
    Type: Grant
    Filed: February 8, 2017
    Date of Patent: February 27, 2018
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Cara Beasley, Ralf Hofmann, Majeed A. Foad
  • Patent number: 9870935
    Abstract: A monitoring and deposition control system and method of operation thereof including: a deposition chamber for depositing a material layer on a substrate; a sensor array for monitoring deposition of the material layer for changes in a layer thickness of the material layer during deposition; and a processing unit for adjusting deposition parameters based on the changes in the layer thickness during deposition.
    Type: Grant
    Filed: August 28, 2015
    Date of Patent: January 16, 2018
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Edward W. Budiarto, Majeed A. Foad, Ralf Hofmann, Thomas Nowak, Todd Egan, Mehdi Vaez-Iravani
  • Publication number: 20170365491
    Abstract: A processing chamber having a plurality of movable substrate carriers stacked therein for continuously processing a plurality of substrates is provided. The movable substrate carrier is capable of being transported from outside of the processing chamber, e.g., being transferred from a load luck chamber, into the processing chamber and out of the processing chamber, e.g., being transferred into another load luck chamber. Process gases delivered into the processing chamber are spatially separated into a plurality of processing slots, and/or temporally controlled. The processing chamber can be part of a multi-chamber substrate processing system.
    Type: Application
    Filed: August 29, 2017
    Publication date: December 21, 2017
    Inventors: Banqiu Wu, Nag B. Patibandla, Toshiaki Fujita, Ralf Hofmann, Pravin K. Narwankar, Jeonghoon Oh, Srinivas Satya, Li-Qun Xia
  • Patent number: 9748125
    Abstract: A processing chamber having a plurality of movable substrate carriers stacked therein for continuously processing a plurality of substrates is provided. The movable substrate carrier is capable of being transported from outside of the processing chamber, e.g., being transferred from a load luck chamber, into the processing chamber and out of the processing chamber, e.g., being transferred into another load luck chamber. Process gases delivered into the processing chamber are spatially separated into a plurality of processing slots, and/or temporally controlled. The processing chamber can be part of a multi-chamber substrate processing system.
    Type: Grant
    Filed: January 31, 2013
    Date of Patent: August 29, 2017
    Assignee: Applied Materials, Inc.
    Inventors: Banqiu Wu, Nag B. Patibandla, Toshiaki Fujita, Ralf Hofmann, Pravin K. Narwankar, Jeonghoon Oh, Srinivas Satya, Li-Qun Xia
  • Patent number: 9739913
    Abstract: A method of manufacture of an extreme ultraviolet reflective element includes: providing a substrate; forming a multilayer stack on the substrate, the multilayer stack includes a plurality of reflective layer pairs having a first reflective layer and a second reflective layer for forming a Bragg reflector; and forming a capping layer on and over the multilayer stack, the capping layer formed from titanium oxide, ruthenium oxide, niobium oxide, ruthenium tungsten, ruthenium molybdenum, or ruthenium niobium, and the capping layer for protecting the multilayer stack by reducing oxidation and mechanical erosion.
    Type: Grant
    Filed: April 24, 2015
    Date of Patent: August 22, 2017
    Assignee: Applied Materials, Inc.
    Inventors: Cara Beasley, Ralf Hofmann, Majeed A. Foad, Rudy Beckstrom, III