Abstract: A packaged semiconductor device includes a substrate with first and second opposing major surfaces. A stacked semiconductor device structure is connected to the first major surface and includes a plurality of semiconductor die having terminals. Conductive interconnect structures electrically connect the terminals of the semiconductor dies together. The semiconductor dies are stacked together so that the terminals are exposed, and the stacked semiconductor device structure comprises a stepped profile. The conductive interconnect structures comprise a conformal layer that substantially follows the stepped profile.

Abstract: In one example, an electronic device includes a semiconductor sensor device having a cavity extending partially inward from one surface to provide a diaphragm adjacent an opposite surface. A barrier is disposed adjacent to the one surface and extends across the cavity, the barrier has membrane with a barrier body and first barrier strands bounded by the barrier body to define first through-holes. The electronic device further comprises one or more of a protrusion pattern disposed adjacent to the barrier structure, which can include a plurality of protrusion portions separated by a plurality of recess portions; one or more conformal membrane layers disposed over the first barrier strands; or second barrier strands disposed on and at least partially overlapping the first barrier strands. The second barrier strands define second through-holes laterally offset from the first through-holes. Other examples and related methods are also disclosed herein.

Abstract: A packaged electronic device structure includes a substrate having a major surface. A semiconductor device is connected to the major surface of the substrate, the semiconductor device having a first major surface, a second major surface opposite to the first major surface, and a side surface extending between the first major surface and the second major surface. A package body encapsulates a portion of the semiconductor device, wherein the side surface of the semiconductor device is exposed through a side surface of the package body. In some examples, the side surface of the semiconductor device is an active surface. In some examples, the package body comprises a molded structure that contacts and overlaps the first major surface of the semiconductor device.

Abstract: A method for forming a packaged electronic device includes providing a substrate having a first major surface and an opposing second major surface. The method includes attaching an electronic device to the first major surface of the substrate and providing a first conductive structure coupled to at least a first portion of the substrate. The method includes forming a dielectric layer overlying at least part of the first conductive structure. The method includes forming a conductive layer overlying the dielectric layer and connected to a second portion of the substrate. The first conductive structure, the dielectric layer, and conductive layer are configured as a capacitor structure and further configured as one or more of an enclosure structure or a stiffener structure for the packaged electronic device.

Abstract: A packaged electronic device structure includes a substrate having a major surface. A semiconductor device is connected to the major surface of the substrate, the semiconductor device having a first major surface, a second major surface opposite to the first major surface, and a side surface extending between the first major surface and the second major surface. A package body encapsulates a portion of the semiconductor device, wherein the side surface of the semiconductor device is exposed through a side surface of the package body. In some examples, the side surface of the semiconductor device is an active surface. In some examples, the package body comprises a molded structure that contacts and overlaps the first major surface of the semiconductor device.

Abstract: Integrated circuits and methods of producing such integrated circuits are provided. In an exemplary embodiment, a method of producing an integrated circuit includes forming an upper interlayer dielectric overlying an optical modulator and a photodetector, where the photodetector has a shoulder and a plug. An etch stop is formed overlying the upper interlayer dielectric. The etch stop is a first, second, and third distance from an uppermost surface of the optical modulator, the shoulder, and the plug, respectively, where the first, second, and third distances are all different from each other. A first, second, and third contact are formed through the upper interlayer dielectric, where the first, second and third contacts are in electrical communication with the optical modulator, the shoulder, and the plug, respectively.

Abstract: Methods for removing low-k dielectric material from dicing lanes in a bonded pair of IC wafers and the resulting device are disclosed. Embodiments include providing low-k dielectric and standard dielectric layers on upper surfaces of top and bottom IC substrates, each including an array of adjacent IC die areas separated by dicing lanes; removing from the dicing lanes the standard and low-k dielectric layers to form cavities exposing sections of the upper surfaces of IC substrates; depositing a standard dielectric material in the cavities and on upper surfaces of the standard dielectric layer of the top and bottom IC substrates; planarizing upper surfaces of the standard dielectric material of the IC substrates; forming a face-to-face bonding of the IC substrates, wherein the dicing lanes in the IC substrates are vertically aligned; and dicing adjacent bonded IC die areas through vertically aligned dicing lanes in the IC substrates.

Abstract: Device and a method of forming a device are disclosed. The method includes providing a substrate. The substrate includes a buried oxide (BOX) layer having an initial thickness TB1 sandwiched in between a top surface layer and a base substrate. The top surface layer is processed to form one or more photonic devices and first and second isolation regions. An interlevel dielectric (ILD) layer is formed on the substrate. Through dielectric via (TDV) contacts extending from a top surface of the dielectric ILD layer to within the BOX layer of the substrate are formed. Lower and upper interconnect levels are formed on the ILD layer. A carrier substrate is provided over a top surface of the upper interconnect levels. The base substrate and a portion of the BOX layer are removed to expose a bottom surface of the TDV contacts.

Abstract: Methods for integrating MOL TSVs in 3D SoC devices including face-to-face bonded IC chips. Embodiments include providing a device layer in each of IC chips on upper surfaces of top and bottom silicon wafers; forming, subsequent to the device layer, through-silicon vias (TSVs) extending through an upper surface of the device layer in each of the IC chips and into the bottom Si wafer; forming, subsequent to the TSVs, a dielectric layer on the upper surface of the device layer in each of the IC chips of the top and bottom Si wafers; forming a back-end-of-line metal layer in the dielectric layer of each of the IC chips of the top and bottom Si wafers; face-to-face bonding of opposing IC chips of the top and bottom Si wafers; and dicing adjacent bonded IC chips through vertically aligned dicing lanes in the top and bottom Si wafers.

Abstract: A methodology for a thin, flexible substrate having integrated passive circuit elements, and the resulting device are disclosed. Embodiments may include integrating one or more passive circuit components on a first or second surface of a substrate, and interconnecting one or more integrated circuit (IC) dies on a second surface of the interposer to the one or more passive circuit components with one or more metal-filled vias between the first and second surfaces, the first and second surfaces being opposite surfaces of the substrate.

Abstract: A methodology for a thin, flexible substrate having integrated passive circuit elements, and the resulting device are disclosed. Embodiments may include integrating one or more passive circuit components on a first or second surface of a substrate, and interconnecting one or more integrated circuit (IC) dies on a second surface of the interposer to the one or more passive circuit components with one or more metal-filled vias between the first and second surfaces, the first and second surfaces being opposite surfaces of the substrate.

Abstract: A methodology for a thin, flexible substrate having integrated passive circuit elements, and the resulting device are disclosed. Embodiments may include integrating one or more passive circuit components on a first or second surface of a substrate, and interconnecting one or more integrated circuit (IC) dies on a second surface of the interposer to the one or more passive circuit components with one or more metal-filled vias between the first and second surfaces, the first and second surfaces being opposite surfaces of the substrate.

Abstract: A method for fabricating a semiconductor device comprises patterning a layer of photoresist material to form a plurality of mandrels. The method further comprises depositing an oxide material over the plurality of mandrels by an atomic layer deposition (ALD) process. The method further comprises anisotropically etching the oxide material from exposed horizontal surfaces. The method further comprises selectively etching photoresist material.

Abstract: Exemplary embodiments of the present invention provide a V0 via unit cell with multiple keep out zones. The keep out zones are oriented concentrically and provide support for multiple sizes of through-silicon vias (TSVs). An off-center alignment between the V0 via unit cell and a probe pad is used to improve contact between the V0 vias and a probe pad. During a chip redesign, the TSV size may be changed without the need to revise the V0 mask.

Abstract: Exemplary embodiments of the present invention provide a V0 via unit cell with multiple keep out zones. The keep out zones are oriented concentrically and provide support for multiple sizes of through-silicon vias (TSVs). An off-center alignment between the V0 via unit cell and a probe pad is used to improve contact between the V0 vias and a probe pad. During a chip redesign, the TSV size may be changed without the need to revise the V0 mask.

Abstract: A method for selectively removing nano-crystals on an insulating layer. The method includes providing an insulating layer with nano-crystals thereon; exposing the nano-crystals to a high density plasma comprising a source of free radical chlorine, ionic chlorine, or both to modify the nano-crystals; and removing the modified nano-crystals with a wet etchant.

Abstract: One illustrative device disclosed herein includes a device substrate having a plurality of first die formed adjacent a front side of the device substrate, a glass window wafer attached to a back side of the device substrate, wherein the glass window wafer has a plurality of openings formed therein and a coefficient of thermal expansion that is within plus or minus 200-500% of the coefficient of thermal expansion of the device wafer, and a plurality of second die, each of which is positioned in one of the openings in the glass window wafer and electrically coupled to one of the first die.

Abstract: One illustrative method disclosed herein includes forming a plurality of die above a crystalline semiconducting substrate, irradiating and cooling an edge region of the substrate to form an amorphous region in the edge region of the substrate and, after forming the amorphous region, performing at least one process operation to reduce the thickness of the substrate.

Abstract: One illustrative method disclosed herein includes forming a plurality of die above a crystalline semiconducting substrate, irradiating and cooling an edge region of the substrate to form an amorphous region in the edge region of the substrate and, after forming the amorphous region, performing at least one process operation to reduce the thickness of the substrate.

Abstract: A method of forming an integrated circuit device includes providing a substrate including an active device, forming a through silicon via into the substrate, forming a device contact to the active device, forming a conductive layer over the through silicon via and the device contact, and forming a connecting via structure for electrically connecting the conductive layer with the through silicon via. An integrated circuit device includes a through silicon via formed into a substrate silicon material, a conductive layer formed over the through silicon via, and a connecting via structure formed between the conductive layer and the through silicon via for electrically connecting the conductive layer with the through silicon via. The connecting via structure comprises a first series of via bars intersected with a second series of via bars.