Patents by Inventor Richard Anthony DiPietro

Richard Anthony DiPietro has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Vibrational methods of deaggregation of electrically conductive polymers and precursors thereof
    Patent number: 6139778
    Abstract: The present invention is directed to vibrational methods of fabricating electrically conducting polymers and precursors thereof in which the polymer chains are deaggregated. Such deaggregated conducting polymers and precursors thereof exhibit better solution processability and higher electrical conductivity than do the corresponding aggregated polymers. The polymers in the non-doped precursor form or in the conducting form in solution or during the polymerization process are exposed to ultrasound and shear mixing. Due to this treatment, the chains become deaggregated. Furthermore, ultrasound and shear mixing is used during the doping of the precursor polymers. This treatment allows more uniform doping, enhanced solubility, and higher electrical conductivity. The solutions treated with ultrasound/shear mixing are subsequently processed into a structural part, a film, or a fiber.
    Type: Grant
    Filed: March 9, 2000
    Date of Patent: October 31, 2000
    Assignee: International Business Machines Corporation
    Inventors: Marie Angelopoulos, Richard Anthony DiPietro, Jane Margaret Shaw
  • Vibrational methods of deaggregation of electrically conductive polymers and precursors thereof
    Patent number: 6099756
    Abstract: The instant invention is drawn vibrational methods of deaggregating electrically conductive polymers. Said methods include the steps of:I) providing an intrinsically conductive polymer comprising a specific morphology;II) determining by experimental or theoretical means a desired degree of aggregation for said intrinsically conductive polymer;III) agitating said intrinsically conductive polymer by a method selected from the group consisting of ultrasound, vibration, shear mixing and cavitation, said agitation being performed at a rate sufficient to achieve the determined degree of aggregation.
    Type: Grant
    Filed: October 2, 1998
    Date of Patent: August 8, 2000
    Assignee: International Business Machines Corporation
    Inventors: Marie Angelopoulos, Richard Anthony DiPietro, Jane Margaret Shaw
  • Integrated circuit device and process for its manufacture
    Patent number: 5962113
    Abstract: The invention relates to an integrated circuit device comprising (i) a substrate; (ii) metallic circuit lines positioned on the substrate and (iii) a dielectric material positioned on the circuit lines. The dielectric material comprises the reaction product of an organic polysilica and polyamic ester preferably terminated with an alkoxysilyl alkyl group.
    Type: Grant
    Filed: October 28, 1996
    Date of Patent: October 5, 1999
    Assignee: International Business Machines Corporation
    Inventors: Hugh Ralph Brown, Kenneth Raymond Carter, Hyuk-Jin Cha, Richard Anthony Dipietro, James Lupton Hedrick, John Patrick Hummel, Robert Dennis Miller, Do Yeung Yoon
  • Process for manufacture of integrated circuit device
    Patent number: 5895263
    Abstract: The invention relates to a process for forming an integrated circuit device comprising (i) a substrate; (ii) metallic circuit lines positioned on the substrate and (iii) a dielectric material positioned on the circuit lines. The dielectric material comprises porous organic polysilica.
    Type: Grant
    Filed: December 19, 1996
    Date of Patent: April 20, 1999
    Assignee: International Business Machines Corporation
    Inventors: Kenneth Raymond Carter, Daniel Joseph Dawson, Richard Anthony DiPietro, Craig Jon Hawker, James Lupton Hedrick, Robert Dennis Miller, Do Yeung Yoon
  • Integrated circuit device and process for its manufacture
    Patent number: 5883219
    Abstract: The invention relates to an integrated circuit device comprising (i) a substrate, (ii) metallic circuit lines positioned on the substrate, and (iii) a porous dielectric material positioned on the circuit lines. The dielectric material comprises the reaction product of an organic polysilica and polyamic ester preferably terminated with an alkoxysilyl alkyl group.
    Type: Grant
    Filed: May 29, 1997
    Date of Patent: March 16, 1999
    Assignee: International Business Machines Corporation
    Inventors: Kenneth Raymond Carter, Daniel Joseph Dawson, Richard Anthony Dipietro, Craig Jon Hawker, James Lupton Hedrick, Robert Dennis Miller, Do Yeung Yoon
  • Process for use of photoresist composition with deep ultraviolet radiation
    Patent number: 5786131
    Abstract: The present invention relates to a process for generating a resist image on a substrate utilizing a resist composition comprising (a) a radiation-sensitive acid generator, (b) a substituted androstane, and (c) a copolymer acrylate binder. The resist image is made using deep ultraviolet radiation.
    Type: Grant
    Filed: July 12, 1996
    Date of Patent: July 28, 1998
    Assignee: International Business Machines Corporation
    Inventors: Robert David Allen, Richard Anthony DiPietro, Gregory Michael Wallraff