Abstract: One illustrative method disclosed herein includes forming a patterned hard mask layer comprised of a plurality of discrete openings above a structure, wherein the patterned hard mask layer is comprised of a plurality of intersecting line-type features, forming a patterned etch mask above the patterned hard mask layer that exposes at least one, but not all, of the plurality of discrete openings, and performing at least one etching process through the patterned etch mask and the at least one exposed opening in the patterned hard mask layer to define an opening in the structure.

Abstract: A method of constructing a spark plug that has positive and ground electrodes configured such a spark plug defined between the positive and ground electrode extenders comprises an elongate channel which opens axially and away from the body and is substantially unobstructed in the axial direction to provide better ignition resulting in improved fuel economy. The method involves taking a body part of a conventional spark plug and welding an adapter part to the body part to produce a spark plug with the elongate channel.

Abstract: An illustrative DSA formulation disclosed herein includes a block copolymer material, a casting solvent and at least one plasticizer agent. An illustrative method disclosed herein includes depositing a liquid DSA formulation on a guide layer, performing a spin-coating process to form a DSA-based material layer comprised of the liquid DSA formulation above the guide layer, wherein the DSA-based material layer includes at least one plasticizing agent and, after performing the spin-coating process, performing at least one heating process on the DSA-based material layer while at least some of the plasticizing agent remains in the DSA-based material layer so as to enable phase separation of block copolymer materials.

Abstract: One illustrative method disclosed herein includes the steps of performing a directed self-assembly process to form a DSA masking layer, performing at least one process operation to remove at least one of the features of the DSA masking layer so as to thereby define a patterned DSA masking layer with a DSA masking pattern, performing at least one process operation to form a patterned transfer masking layer having a transfer masking pattern comprised of a plurality of features that define a plurality of openings in the transfer masking layer, wherein the transfer masking pattern is the inverse of the DSA masking pattern, and performing at least one etching process through the patterned transfer masking layer on a layer of material to form a plurality of trench/via features in the layer of material.

Abstract: The plug comprises a nut, a coupling extending from the nut and adapted to receive an ignition wire and an insulator extending from the nut and away from the coupling. A positive electrode extends through the insulator. An externally-threaded tubular portion extends from the nut in surrounding relation to the insulator and terminating, short of the insulator end, in a cap that is disposed in spaced relation to the insulator. The cap defines a void having: a central portion into which the positive electrode extends; an annular channel surrounding the central portion; and a plurality of lobes, each positioned with respect to the central portion as the planet gears are positioned with respect to the sun gear in a planetary gear. The cap has a central surface that is axially spaced from the insulator and a convex surface that surrounds and extends to the central surface.

Abstract: Approaches for utilizing laser annealing to optimize lithographic processes such as directed self assembly (DSA) are provided. Under a typical approach, a substrate (e.g., a wafer) will be subjected to a lithographic process (e.g., having a set of stages/phases, aspects, etc.) such as DSA. Before or during such process, a set of laser annealing passes/scans will be made over the substrate to optimize one or more of the stages. In addition, the substrate could be subjected to additional processes such as hotplate annealing, etc. Still yet, in making a series of laser annealing passes, the techniques utilized and/or beam characteristics of each pass could be varied to further optimize the results.

Abstract: Methods for creating chemical guide patterns by DSA lithography for fabricating an integrated circuit are provided. In one example, an integrated circuit includes forming a bifunctional brush layer of a polymeric material overlying an anti-reflective coating on a semiconductor substrate. The polymeric material has a neutral polymeric block portion and a pinning polymeric block portion that are coupled together. The bifunctional brush layer includes a neutral layer that is formed of the neutral polymeric block portion and a pinning layer that is formed of the pinning polymeric block portion. A portion of the neutral layer or the pinning layer is selectively removed to define a chemical guide pattern. A block copolymer layer is deposited overlying the chemical guide pattern. The block copolymer layer is phase separated to define a nanopattern that is registered to the chemical guide pattern.

Abstract: One illustrative method disclosed herein includes forming a patterned hard mask layer comprised of a plurality of discrete openings above a structure, wherein the patterned hard mask layer is comprised of a plurality of intersecting line-type features, forming a patterned etch mask above the patterned hard mask layer that exposes at least one, but not all, of the plurality of discrete openings, and performing at least one etching process through the patterned etch mask and the at least one exposed opening in the patterned hard mask layer to define an opening in the structure.

Abstract: Methods for creating chemical guide patterns by DSA lithography for fabricating an integrated circuit are provided. In one example, an integrated circuit includes forming a bifunctional brush layer of a polymeric material overlying an anti-reflective coating on a semiconductor substrate. The polymeric material has a neutral polymeric block portion and a pinning polymeric block portion that are coupled together. The bifunctional brush layer includes a neutral layer that is formed of the neutral polymeric block portion and a pinning layer that is formed of the pinning polymeric block portion. A portion of the neutral layer or the pinning layer is selectively removed to define a chemical guide pattern. A block copolymer layer is deposited overlying the chemical guide pattern. The block copolymer layer is phase separated to define a nanopattern that is registered to the chemical guide pattern.

Abstract: Methods for fabricating guide patterns and methods for fabricating integrated circuits using guide patterns are provided. In an embodiment, a method for fabricating a guide pattern includes forming a coating of a material with latent grafting sites and a photosensitive component configured to activate the latent grafting sites upon exposure over a substrate. The method exposes selected latent grafting sites in the coating to convert the selected latent grafting sites to active grafting sites. A grafting agent is bonded to the active grafting sites to form the guide pattern.

Abstract: Approaches for utilizing laser annealing to optimize lithographic processes such as directed self assembly (DSA) are provided. Under a typical approach, a substrate (e.g., a wafer) will be subjected to a lithographic process (e.g., having a set of stages/phases, aspects, etc.) such as DSA. Before or during such process, a set of laser annealing passes/scans will be made over the substrate to optimize one or more of the stages. In addition, the substrate could be subjected to additional processes such as hotplate annealing, etc. Still yet, in making a series of laser annealing passes, the techniques utilized and/or beam characteristics of each pass could be varied to further optimize the results.

Abstract: An apparatus, program product and method improve management of available computing resources by adjusting use of the resource over a first interval according to actual use of the resource during a second interval. This feature enables a computing resource to exceed its normal limits during the first interval of operation. Use during the second interval may be limited to balance out the burst, or excessive resource usage of the first interval.

Abstract: An adapter, used with a spark plug body and an engine block, is disclosed. The body defines an axis and has adjacent one end, a coaxial metal ring. A coaxial metal tube extends from the ring towards the other body end and is threaded in said block in use. An insulator, having a portion inside the tube, extends axially, from inside the tube, beyond the ring, and has a void therethrough. A positive electrode occupies the void and extends axially beyond the insulator to a terminus. In use, the adapter is secured to said body and comprises: a positive electrode extender in electrically-conducting relation to the positive electrode and a ground electrode extender in electrically-conducting contacting relation to the ring. The adapter is configured such that a gap defined between the positive and ground extenders comprises a channel which opens axially away from said body and is substantially unobstructed axially.

Abstract: The present invention is directed to beverage dispensers and more specifically to a beverage dispensing nozzle that provides a short and direct beverage pathway. The nozzle is adapted for use in a self-cleaning assembly that provides for efficient cleaning of all of its surfaces that contact beverage products. The nozzle can be configured with an inlet port that provides a relatively direct product flow pathway from a beverage mixing chamber in the dispenser.

Abstract: A method is provided for forming a semiconductor-detection device that provides internal gain. The method includes forming a plurality of bottom trenches in a bottom surface of an n-doped semiconductor wafer; and forming a second plurality of top trenches in a top surface of the semiconductor wafer. The bottom surface and the top surface are opposed surfaces. Each of the bottom trenches is substantially parallel to and substantially juxtaposed to an associated one of the top trenches. The method further includes doping the semiconductor wafer with at least one p-type dopant to form a p-region that defines at least one n-well within the p-region, wherein a p-n junction is formed substantially at an interface of the n-well and the p-region; and removing a portion of the bottom surface to form a remaining-bottom surface, wherein a portion of the n-well forms a portion of the remaining-bottom surface.

Abstract: A method for optimizing the throughput of TCP/IP applications by aggregating user application data and consolidating multiple TCP/IP connection streams into a single optimized stream for delivery to a destination application. Optimization of the internet protocol uses a packet interceptor to intercept packets from a source application, a packet driver to aggregate the intercepted packets, a data mover to transport the aggregated packets to another data mover at the destination, a destination packet driver to disaggregate the transported aggregated packets, and a destination end processor to deliver the disaggregated IP packets to the destination application.

Abstract: The present invention is directed to beverage dispensers and more specifically to a beverage dispensing nozzle that provides a short and direct beverage pathway. The nozzle is adapted for use in a self-cleaning assembly that provides for efficient cleaning of all of its surfaces that contact beverage products. The nozzle can be configured with an inlet port that provides a relatively direct product flow pathway from a beverage mixing chamber in the dispenser.

Abstract: The present invention is a solid state detector that has internal gain and incorporates a special readout technique to determine the input position at which a detected signal originated without introducing any dead space to the active area of the device. In a preferred embodiment of the invention, the detector is a silicon avalanche photodiode that provides a two dimensional position sensitive readout for each event that is detected.

Abstract: A hand-held ophthalmoscope modified by the removal or augmentation of the focusing wheel and the addition of a manual or automatic focusing lens system. An electronic imager (CCD array or video camera) is placed optically conjugate to a viewing screen such that focus operations performed by the examiner to adjust the image seen by the examiner on the screen also focuses the image on the electronic imager. This is accomplished by an optical system which includes a straight path from the viewing screen to the patient's eye with a beam splitter interposed to cause the image of the patient's eye to be reflected onto the imager. As a result, when the examiner uses the focusing lens system, manual or automatic, positioned between the beam splitter and the patient's eye, to affect the image viewed by the examiner, the focus of the imager is simultaneously affected as well.

Abstract: The invention relates to a dispensing system and method for on-demand dispensing of spoonable or drinkable food products in a container. Single servings or larger portions of these products can be dispensed. The system and method achieve dispensing of the product with a visual differentiation of the components in the container. The container may be translucent or transparent so that the consumer can view the visually differentiated product therein. The products form yet another embodiment of the invention.