Abstract: Methods and apparatuses are provided herein for independently adjusting flowpath conductance. One multi-station processing apparatus may include a processing chamber, a plurality of process stations in the processing chamber that each include a showerhead having a gas inlet, and a gas delivery system including a junction point and a plurality of flowpaths, in which each flowpath includes a flow element, includes a temperature control unit that is thermally connected with the flow element and that is controllable to change the temperature of that flow element, and fluidically connects one corresponding gas inlet of a process station to the junction point such that each process station of the plurality of process stations is fluidically connected to the junction point by a different flowpath.

Abstract: We describe a method and controller for controlling an axial flux machine in which an alternating current supplied to the plurality of coils injects a compensation current to reduce a mechanical resonant component of the rotor. The compensation current is a modulated current component added to at least one of the Quadrature Current (Iq) and Direct Current (Id) components (when the alternating current is represented as a vectored DC component), when the rotor is rotating over one or more ranges of rotational speeds. The modulated current component has an electrical frequency that varies over a range of frequencies between a first frequency and a second frequency depending on the rotational speed of the rotor, the range of frequencies including a frequency that is substantially the same as a fundamental mechanical resonant frequency of the rotor, and having a phase that is out of phase with the fundamental mechanical resonant frequency of the rotor.

Abstract: A pedestal is arranged in a processing chamber to support a substrate on a top surface of the pedestal. A first annular recess in the pedestal extends downwardly from the top surface of the pedestal and radially inwardly from an outer edge of the pedestal towards an outer edge of the substrate. The first annular recess has an inner diameter that is greater than a diameter of the substrate. An annular ring made of a dielectric material is arranged around the substrate in the first annular recess. A second annular recess in the pedestal is located under the annular ring. The second annular recess has a height and extends radially inwardly from the outer edge of the pedestal towards the outer edge of the substrate.

Abstract: A system to deposit a film on a substrate using atomic layer deposition includes a pedestal arranged in a processing chamber to support the substrate on a top surface of the pedestal when depositing the film on the substrate. A first annular recess in the pedestal extends downwardly from the top surface of the pedestal and radially inwardly from an outer edge of the pedestal towards an outer edge of the substrate. The first annular recess has an inner diameter that is greater than a diameter of the substrate. An annular ring is made of a dielectric material and is arranged around the substrate in the first annular recess. A second annular recess in the pedestal is located under the annular ring. The second annular recess has a height and extends radially inwardly from the outer edge of the pedestal towards the outer edge of the substrate.

Abstract: Various implementations include an axial flux machine including a rotor bearing a set of permanent magnets and a stator containing electro-magnetic coil assemblies disposed circumferentially at intervals about an axis. Each coil assembly has an axially extending stator tooth, one or more coils wound around the tooth, and one or more end shoes at an end of the stator tooth. The end shoes each have at least one circumferential edge adjacent a neighbouring coil assembly. In some implementations, radially innermost and outermost portions of the at least one circumferential edge are separated by a step projecting from the at least one circumferential edge. In some implementations, at least part of the at least one circumferential edge has a thickness less than a thickness of the inner radial edge thereby reducing a leakage flux between neighbouring electro-magnetic coil assemblies.

Abstract: Various implementations include a stator assembly for an axial flux permanent magnet machine. The stator assembly may include a set of stator bars and a set of shoes for the stator bars. A shoe may be provided at one or each end of a stator bar. The stator assembly may further include a set of coils each wound around a respective stator bar. Each shoe has an inner surface adjacent to the end of one of the stator bars. The end of each stator bar has a rim, and each inner surface has a cut-away region over part of the rim to reduce a component of magnetic flux at the end of the stator bar.

Abstract: A variety of improved techniques for homebuyers to access undeveloped and/or uncompleted communities with homes that are not yet built and lots that are not yet parceled or recognized with addresses are disclosed.

Abstract: We describe techniques to reduce DC ripple voltage in an inverter by determining a plurality of switching events for each of the three phases in each Pulse Width Modulation (PWM) period. The switching events provide a desired target output voltage for the respective PWM period. From this determination of the switching events, a comparison can be made to determine a first time period between a first and second switching event across all of the phases, and a second time period between the second and a third switching event across all of the phases. The timing of one or more switching events in only one of the phases in the respective PWM period is adjusted in response to the determined time period being greater than a threshold in order to reduce the determined first or second time period.

Abstract: We describe a method and controller for controlling an axial flux machine in which an alternating current supplied to the plurality of coils injects a compensation current to reduce a mechanical resonant component of the rotor. The compensation current is a modulated current component added to at least one of the Quadrature Current (Iq) and Direct Current (Id) components (when the alternating current is represented as a vectored DC component), when the rotor is rotating over one or more ranges of rotational speeds. The modulated current component has an electrical frequency that varies over a range of frequencies between a first frequency and a second frequency depending on the rotational speed of the rotor, the range of frequencies including a frequency that is substantially the same as a fundamental mechanical resonant frequency of the rotor, and having a phase that is out of phase with the fundamental mechanical resonant frequency of the rotor.

Abstract: Various implementations include a stator assembly for an axial flux permanent magnet machine. The stator assembly may include a set of stator bars and a set of shoes for the stator bars. A shoe may be provided at one or each end of a stator bar. The stator assembly may further include a set of coils each wound around a respective stator bar. Each shoe has an inner surface adjacent to the end of one of the stator bars. The end of each stator bar has a rim, and each inner surface has a cut-away region over part of the rim to reduce a component of magnetic flux at the end of the stator bar.

Abstract: Various implementations include an axial flux machine including a rotor bearing a set of permanent magnets and a stator containing electro-magnetic coil assemblies disposed circumferentially at intervals about an axis. Each coil assembly has an axially extending stator tooth one or more coils wound around the tooth. and one or more end shoes at an end of the stator tooth. The end shoes each have at least one circumferential edge adjacent a neighbouring coil assembly. In some implementations, radially innermost and outermost portions of the at least one circumferential edge are separated by a step projecting from the at least one circumferential edge. In some implementations, at least part of the at least one circumferential edge has a thickness less than a thickness of the inner radial edge thereby reducing a leakage flux between neighbouring electro-magnetic coil assemblies.

Abstract: Methods and apparatuses are provided herein for independently adjusting flowpath conductance. One multi-station processing apparatus may include a processing chamber, a plurality of process stations in the processing chamber that each include a showerhead having a gas inlet, and a gas delivery system including a junction point and a plurality of flowpaths, in which each flowpath includes a flow element, includes a temperature control unit that is thermally connected with the flow element and that is controllable to change the temperature of that flow element, and fluidically connects one corresponding gas inlet of a process station to the junction point such that each process station of the plurality of process stations is fluidically connected to the junction point by a different flowpath.

Abstract: A system to deposit a film on a substrate using atomic layer deposition includes a pedestal arranged in a processing chamber to support the substrate on a top surface of the pedestal when depositing the film on the substrate. A first annular recess in the pedestal extends downwardly from the top surface of the pedestal and radially inwardly from an outer edge of the pedestal towards an outer edge of the substrate. The first annular recess has an inner diameter that is greater than a diameter of the substrate. An annular ring is made of a dielectric material and is arranged around the substrate in the first annular recess. A second annular recess in the pedestal is located under the annular ring. The second annular recess has a height and extends radially inwardly from the outer edge of the pedestal towards the outer edge of the substrate.

Abstract: We describe techniques to reduce DC ripple voltage in an inverter by determining a plurality of switching events for each of the three phases in each Pulse Width Modulation (PWM) period. The switching events provide a desired target output voltage for the respective PWM period. From this determination of the switching events, a comparison can be made to determine a first time period between a first and second switching event across all of the phases, and a second time period between the second and a third switching event across all of the phases. The timing of one or more switching events in only one of the phases in the respective PWM period is adjusted in response to the determined time period being greater than a threshold in order to reduce the determined first or second time period.

Abstract: A variety of improved techniques for homebuyers to access undeveloped and/or uncompleted communities with homes that are not yet built and lots that are not yet parceled or recognized with addresses are disclosed.

Abstract: Methods and apparatuses for performing atomic layer deposition are provided. A method may include determining an amount of accumulated deposition material currently on an interior region of a deposition chamber interior, wherein the amount of accumulated deposition material changes over the course of processing a batch of substrates; applying the determined amount of accumulated deposition material to a relationship between a number of ALD cycles required to achieve a target deposition thickness, and a variable representing an amount of accumulated deposition material, wherein the applying returns a compensated number of ALD cycles for producing the target deposition thickness given the amount of accumulated deposition material currently on the interior region of the deposition chamber interior; and performing the compensated number of ALD cycles on one or more substrates in the batch.

Abstract: A semiconductor arrangement and an inverter incorporating the semiconductor arrangement, in particular to an inverter for use with traction power units e.g. for on and off road vehicles and stationary power inversion, are described. In the arrangement, semiconductor devices are thermally and electrically coupled to a heatsink as a module. The heatsink is configured as a bus bar to electrically connect the one or more semiconductor devices together to transmit power between the one or more semiconductor devices. The semiconductor devices may be cooled using the structure to which they are attached, and also immersed in a cooling medium to further increase the cooling of the device.

Abstract: A variety of improved techniques for homebuyers to access undeveloped and/or uncompleted communities with homes that are not yet built and lots that are not yet parceled or recognized with addresses are disclosed.

Abstract: A technology for providing validation and optimization for listings on an online marketing platform for home sellers is described. In some embodiments, the disclosed technology provides a validation tool for users of the online marketing platform to quality check the users' home feeds in real-time through a graphical user interface of the online marketing platform. In some embodiments, the disclosed technology provides an optimizer tool for the users to optimize the users' home feeds through a graphical user interface of the online marketing platform. The users of the online marketing platform can be home sellers, which can include, for example, home builders, brokers, and their agents.

Abstract: A processing chamber in a substrate processing system includes an upper surface, sidewalls, and a bottom surface and a showerhead connected to and extending downward from the upper surface of the processing chamber. The showerhead includes a stem portion and a base portion. An inverted conical surface is arranged adjacent to the upper surface and the sidewalls of the processing chamber and includes an angled surface arranged to redirect gas flow above the showerhead from a horizontal direction to a downward direction and into a gap between a radially outer portion of the base portion and the sidewalls of the processing chamber.