Patents by Inventor Richard Phillips

Richard Phillips has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10840061
    Abstract: A processing chamber in a substrate processing system includes an upper surface, sidewalls, and a bottom surface and a showerhead connected to and extending downward from the upper surface of the processing chamber. The showerhead includes a stem portion and a base portion. An inverted conical surface is arranged adjacent to the upper surface and the sidewalls of the processing chamber and includes an angled surface arranged to redirect gas flow above the showerhead from a horizontal direction to a downward direction and into a gap between a radially outer portion of the base portion and the sidewalls of the processing chamber.
    Type: Grant
    Filed: August 30, 2019
    Date of Patent: November 17, 2020
    Assignee: LAM RESEARCH CORPORATION
    Inventors: Richard Phillips, Ryan Blaquiere, Shankar Swaminathan
  • Publication number: 20200346765
    Abstract: Certain aspects of the present disclosure provide an ice management system, including: a plurality of pulsejets located within an interior volume of an aircraft and configured to heat an aircraft surface, wherein each pulsejet of the plurality of pulsejets comprises: an inlet; a combustor; a fuel source; and an exhaust nozzle; and a plurality of intake apertures in the aircraft, wherein each intake aperture of the plurality of intake apertures corresponds to an inlet of one pulsejet of the plurality of pulsejets.
    Type: Application
    Filed: April 30, 2019
    Publication date: November 5, 2020
    Inventors: Aaron J. KUTZMANN, William Noll KAMEROW, Steven Edmon CHAPEL, Richard Phillip OUELLETTE, Robert Erik GRIP
  • Patent number: 10808585
    Abstract: A catalytic wall-flow monolith filter for use in an emission treatment system comprises a wall flow substrate having a first and a second face, and first and second pluralities of channels. The first plurality of channels is open at the first face and closed at the second face. The second plurality of channels is open at the second face and closed at the first face. The monolith filter comprises a porous substrate having a first zone extending from the first face towards the second face and a second zone extending from the second face towards the first face. Each of the zones are less that filter length. A first catalytic material is distributed throughout the first zone of the porous substrate, and a second catalytic material covers at least a portion of the surfaces in the second zone of the porous substrate and is not distributed throughout the porous substrate.
    Type: Grant
    Filed: October 26, 2017
    Date of Patent: October 20, 2020
    Assignee: Johnson Matthey Public Limited Company
    Inventors: Guy Richard Chandler, Keith Anthony Flanagan, Paul Richard Phillips, David Marvell
  • Patent number: 10798798
    Abstract: A lighting control device is provided which includes a microcontroller, at least one wireless transceiver, at least one dimmer, one or more lighting terminals powered by the at least one dimmer, at least one environmental sensor, and at least one input device. In operation, the microcontroller obtains environmental data from the at least one environmental sensor, obtains input data from the at least one input device, transmits the environmental data and the input data to an external server, obtains a lighting operating schedule based on the environmental data and the input data from the external server, and executes the lighting operating schedule from the external server by controlling one or more smart bulbs via the at least one wireless transceiver and controlling the electrical current output to lighting terminals.
    Type: Grant
    Filed: January 7, 2019
    Date of Patent: October 6, 2020
    Assignee: Lime Green Lighting, LLC
    Inventor: Jonathan Richard Phillips
  • Publication number: 20200299838
    Abstract: Methods and apparatuses for performing atomic layer deposition are provided. A method may include determining an amount of accumulated deposition material currently on an interior region of a deposition chamber interior, wherein the amount of accumulated deposition material changes over the course of processing a batch of substrates; applying the determined amount of accumulated deposition material to a relationship between a number of ALD cycles required to achieve a target deposition thickness, and a variable representing an amount of accumulated deposition material, wherein the applying returns a compensated number of ALD cycles for producing the target deposition thickness given the amount of accumulated deposition material currently on the interior region of the deposition chamber interior; and performing the compensated number of ALD cycles on one or more substrates in the batch.
    Type: Application
    Filed: June 2, 2020
    Publication date: September 24, 2020
    Inventors: Richard Phillips, Chloe Baldasseroni, Nishanth Manjunath
  • Patent number: 10773251
    Abstract: The invention provides an exhaust gas cleaning oxidation catalyst and in particular to an oxidation catalyst for cleaning the exhaust gas discharged from internal combustion engines of compression ignition type (particularly diesel engines). The invention further relates to a catalysed substrate monolith comprising an oxidising catalyst on a substrate monolith for use in treating exhaust gas emitted from a lean-burn internal combustion engine. In particular, the invention relates to a catalysed substrate monolith comprising a first washcoat coating and a second washcoat coating, wherein the second washcoat coating is disposed in a layer above the first washcoat coating.
    Type: Grant
    Filed: August 6, 2019
    Date of Patent: September 15, 2020
    Assignee: Johnson Matthey Public Limited Company
    Inventors: Philip Gerald Blakeman, Gavin Michael Brown, Sougato Chatterjee, Andrew Francis Chiffey, Jane Gast, Paul Richard Phillips, Hanako Oyamada, Raj Rao Rajaram, Satoshi Sumiya, Andrew Peter Walker, Lifeng Wang
  • Publication number: 20200285593
    Abstract: In one example, a processor executes computer-readable instructions that cause the processor to: for each of a plurality of buckets of a data structure stored in a cache of a computer system, execute a first thread such that: a plurality of entries stored in the bucket are inspected to identify a respective entry for removal from the cache based on respective usage metrics of the entries of the bucket, wherein each entry comprises a container of data chunks, access is restricted to the bucket by at least a second thread during the inspection of the respective entries from the bucket by the first thread, one entry of the identified entries is selected for removal from the cache based on a comparison between the respective usage metrics of the identified entries, and the processor enables concurrent access to the plurality of buckets by multiple threads requesting access to the cache, whereby a thread can access and inspect one of the buckets and, during the inspecting, at least one other thread can access anot
    Type: Application
    Filed: March 4, 2019
    Publication date: September 10, 2020
    Inventors: Richard Phillip Mayo, Michael John Dowdle
  • Patent number: 10732881
    Abstract: In some examples, region cloning may include obtaining a clone request to clone a logical range of a source backup. The clone request may specify the source backup, a logical start offset, and a logical end offset. A source manifest associated with the logical range of the source backup may be determined. A start entry of the source manifest may be identified based on the logical start offset. The start entry may represent a start data chunk. A determination may be made as to whether the logical start offset represents an intermediate position of the start data chunk, and if so, a start partial chunk entry representing a sub-range of the start data chunk may be appended to a destination manifest. A backup of the logical range of the source backup may be generated based on the destination manifest with the appended start partial chunk entry.
    Type: Grant
    Filed: January 30, 2019
    Date of Patent: August 4, 2020
    Assignee: Hewlett Packard Enterprise Development LP
    Inventors: Richard Phillip Mayo, David Malcolm Falkinder
  • Publication number: 20200241784
    Abstract: In some examples, region cloning may include obtaining a clone request to clone a logical range of a source backup. The clone request may specify the source backup, a logical start offset, and a logical end offset. A source manifest associated with the logical range of the source backup may be determined. A start entry of the source manifest may be identified based on the logical start offset. The start entry may represent a start data chunk. A determination may be made as to whether the logical start offset represents an intermediate position of the start data chunk, and if so, a start partial chunk entry representing a sub-range of the start data chunk may be appended to a destination manifest. A backup of the logical range of the source backup may be generated based on the destination manifest with the appended start partial chunk entry.
    Type: Application
    Filed: January 30, 2019
    Publication date: July 30, 2020
    Inventors: Richard Phillip MAYO, David Malcolm Falkinder
  • Publication number: 20200227334
    Abstract: A semiconductor arrangement and an inverter incorporating the semiconductor arrangement, in particular to an inverter for use with traction power units e.g. for on and off road vehicles and stationary power inversion, are described. In the arrangement, semiconductor devices are thermally and electrically coupled to a heatsink as a module. The heatsink is configured as a bus bar to electrically connect the one or more semiconductor devices together to transmit power between the one or more semiconductor devices. The semiconductor devices may be cooled using the structure to which they are attached, and also immersed in a cooling medium to further increase the cooling of the device.
    Type: Application
    Filed: January 30, 2018
    Publication date: July 16, 2020
    Inventors: Simon David HART, Tim WOOLMER, Christopher Stuart MALAM, Tom HILLMAN, Richard PHILLIPS
  • Publication number: 20200208557
    Abstract: A NOx adsorber catalyst and its use in an emission treatment system for internal combustion engines, is disclosed. The NOx adsorber catalyst comprises a first layer consisting essentially of a support material, one or more platinum group metals disposed on the support material, and a NOx storage material.
    Type: Application
    Filed: February 25, 2020
    Publication date: July 2, 2020
    Inventors: Andrew ARMITAGE, Desiree DURAN MARTIN, Rebecca MAKSYMOWICZ, Paul James MILLINGTON, Paul Richard PHILLIPS, Raj Rao RAJARAM, Stuart David REID, Daniel SWALLOW
  • Publication number: 20200206721
    Abstract: An oxidation catalyst for treating an exhaust gas from a compression ignition engine, which oxidation catalyst comprises: a substrate; a first washcoat region comprising palladium (Pd) and a first support material comprising cerium oxide; and a second washcoat region comprising platinum (Pt) and a second support material.
    Type: Application
    Filed: February 23, 2020
    Publication date: July 2, 2020
    Inventors: Andrew Francis CHIFFEY, Neil Robert COLLINS, John Benjamin GOODWIN, Francois MOREAU, Paul Richard PHILLIPS
  • Patent number: 10697059
    Abstract: Methods and apparatuses for performing atomic layer deposition are provided. A method may include determining an amount of accumulated deposition material currently on an interior region of a deposition chamber interior, wherein the amount of accumulated deposition material changes over the course of processing a batch of substrates; applying the determined amount of accumulated deposition material to a relationship between a number of ALD cycles required to achieve a target deposition thickness, and a variable representing an amount of accumulated deposition material, wherein the applying returns a compensated number of ALD cycles for producing the target deposition thickness given the amount of accumulated deposition material currently on the interior region of the deposition chamber interior; and performing the compensated number of ALD cycles on one or more substrates in the batch.
    Type: Grant
    Filed: October 16, 2017
    Date of Patent: June 30, 2020
    Assignee: Lam Research Corporation
    Inventors: Richard Phillips, Chloe Baldasseroni, Nishanth Manjunath
  • Publication number: 20200199774
    Abstract: Methods for forming single crystal silicon ingots with improved resistivity control are disclosed. The methods involve growth of a sample rod. The sample rod may have a diameter less than the diameter of the product ingot. The sample rod is cropped to form a center slab. The resistivity of the center slab may be measured directly such as by a four-point probe. The sample rod may be annealed in a thermal donor kill cycle prior to measuring the resistivity.
    Type: Application
    Filed: December 21, 2018
    Publication date: June 25, 2020
    Inventors: HyungMin Lee, JaeWoo Ryu, Richard Phillips, YoungJung Lee, Carissima Marie Hudson
  • Publication number: 20200199773
    Abstract: Methods for forming single crystal silicon ingots with improved resistivity control are disclosed. The methods involve growth of a sample rod. The sample rod may have a diameter less than the diameter of the product ingot. The sample rod is cropped to form a center slab. The resistivity of the center slab may be measured directly such as by a four-point probe. The sample rod may be annealed in a thermal donor kill cycle prior to measuring the resistivity.
    Type: Application
    Filed: December 21, 2018
    Publication date: June 25, 2020
    Inventors: HyungMin Lee, JaeWoo Ryu, Richard Phillips, YoungJung Lee, Carissima Marie Hudson
  • Publication number: 20200199775
    Abstract: Methods for forming single crystal silicon ingots with improved resistivity control are disclosed. The methods involve growth of a sample rod. The sample rod may have a diameter less than the diameter of the product ingot. The sample rod is cropped to form a center slab. The resistivity of the center slab may be measured directly such as by a four-point probe. The sample rod may be annealed in a thermal donor kill cycle prior to measuring the resistivity.
    Type: Application
    Filed: December 21, 2018
    Publication date: June 25, 2020
    Inventors: HyungMin Lee, JaeWoo Ryu, Richard Phillips, YoungJung Lee, Carissima Marie Hudson
  • Patent number: 10688475
    Abstract: A catalysed substrate monolith 12 for use in treating exhaust gas emitted from a lean-burn internal combustion engine, which catalysed substrate monolith 12 comprising a first washcoat coating 16 and a second washcoat coating 18, wherein the first washcoat coating comprises a catalyst composition comprising at least one platinum group metal (PGM) and at least one support material for the at least one PGM, wherein at least one PGM in the first washcoat coating is liable to volatilise when the first washcoat coating is exposed to relatively extreme conditions including relatively high temperatures, wherein the second washcoat coating comprises at least one metal oxide for trapping volatilised PGM and wherein the second washcoat coating is oriented to contact exhaust gas that has contacted the first washcoat coating.
    Type: Grant
    Filed: February 6, 2019
    Date of Patent: June 23, 2020
    Assignee: Johnson Matthey Public Limited Company
    Inventors: Philip Gerald Blakeman, Gavin Michael Brown, Sougato Chatterjee, Andrew Francis Chiffey, Jane Gast, Paul Richard Phillips, Raj Rao Rajaram, Glen Spreitzer, Andrew Peter Walker
  • Patent number: 10658172
    Abstract: Methods and apparatuses for depositing material into high aspect ratio features, features in a multi-laminate stack, features having positively sloped sidewalls, features having negatively sloped sidewalls, features having a re-entrant profile, and/or features having sidewall topography are described herein. Methods involve depositing a first amount of material, such as a dielectric (e.g., silicon oxide), into a feature and forming a sacrificial helmet on the field surface of the substrate, etching some of the first amount of the material to open the feature opening and/or smoothen sidewalls of the feature, and depositing a second amount of material to fill the feature. The sacrificial helmet may be the same as or different material from the first amount of material deposited into the feature.
    Type: Grant
    Filed: March 6, 2019
    Date of Patent: May 19, 2020
    Assignee: Lam Research Corporation
    Inventors: Joseph R. Abel, Pulkit Agarwal, Richard Phillips, Purushottam Kumar, Adrien LaVoie
  • Publication number: 20200133544
    Abstract: Examples include selection of a remote object storage system for a deduplication data item. Some examples may include determination of an expected usage frequency for the deduplication data item, selection of a remote object cloud storage system based on the expected usage frequency for the data item, and provision of the deduplication data item to the selected remote object storage system for storage as an object in the selected remote object storage system.
    Type: Application
    Filed: October 25, 2018
    Publication date: April 30, 2020
    Inventors: Alastair Slater, Richard Phillip Mayo
  • Patent number: 10625208
    Abstract: An exhaust system for a compression ignition engine comprising an oxidation catalyst for treating carbon monoxide (CO) and hydrocarbons (HCs) in exhaust gas from the compression ignition engine, wherein the oxidation catalyst comprises: a platinum group metal (PGM) component selected from the group consisting of a platinum (Pt) component, a palladium (Pd) component and a combination thereof; an alkaline earth metal component; a support material comprising a modified alumina incorporating a heteroatom component; and a substrate, wherein the platinum group metal (PGM) component, the alkaline earth metal component and the support material are disposed on the substrate.
    Type: Grant
    Filed: May 3, 2019
    Date of Patent: April 21, 2020
    Assignee: Johnson Matthey Public Limited Company
    Inventors: David Bergeal, Andrew Francis Chiffey, John Benjamin Goodwin, Daniel Hatcher, Francois Moreau, Agnes Raj, Raj Rao Rajaram, Paul Richard Phillips, Cathal Prendergast