Abstract: Amorphous hydrofluoroolefin telomers are prepared by a free-radical polymerization process conducted at high temperature and pressure in the presence of non-monomeric chain transfer agent.

Abstract: Provided are liquid perfluoro-n-alkanes that are highly transparent to UV wavelengths ranging from about 150 nm to 165 nm, and to the method by which high transparency may be obtained. The liquid, perfluoro-n-alkanes are useful in optical couplants, optical cements, optical elements, optical inspection media for semiconductor wafers and devices, and immersion photolithography at 157 nm exposure wavelength.

Abstract: Methods for purifying liquid alkanes are provided. The methods produce alkanes having low absorbance, particularly at 193 nm. The alkane liquids are useful as immersion liquids in photomicrolithography employed for production of electronic circuits.

Abstract: This invention concerns radiation durable organic compositions which are well-suited for use in 157 nm lithography by virtue of their high transparency and excellent radiation durability, and to a process for the preparation thereof.

Abstract: A one or two layer coating system has been developed for plastic substrates. The one coating system low reflective layer consists of a fluorinated copolymer having the formula: VF2/TFE/HFP, VF2/HFP or VF2/TFE/PMVE. In the two coating system, the upper coating layer consists of TFE/HFP, VF2/TFE/HFP, or TFE/Perfluorodioxole, and the lower coating layer consists of VF2/TFE/HFP, VF/TFE/HFP, VAc/TFE/HFIB, or TFE graft to PVOH.

Abstract: This invention relates to a fluoropolymer nanocomposite comprising a fluoropolymer phase and an inorganic oxide phase dispersed throughout, said inorganic oxide phase having either no particles or particles substantially all of which have a particle size of less than about 75 nm which can be determined by small angle x-ray scattering and transmission electron microscopy techniques. These nanocomposites are useful as protective coatings.

Abstract: This invention relates to a process for the synthesis of diacyl peroxide by contacting acyl halide and peroxide complex in compatible aprotic solvent substantially free of compounds oxidizable by the peroxide complex or the reaction products of organic acyl halide with peroxide complex and the initiation of polymerization with diacyl peroxide in the aprotic solvent.

Abstract: This invention relates to processes useful for fabricating electronic devices, more particularly to a process for laminating a layer of dielectric material onto a semiconductor.

Abstract: The present invention relates to in situ polymerization of fluoropolymer into porous substrates, to improve resistance to degradation by wetting and staining, and wood, to improve resistance to degradation, staining and warping.

Abstract: Fluoroolefin/acid group or protected acid group-containing copolymers for photoresist compositions and microlithography methods employing the photoresist compositions are described. These copolymer compositions comprise 1) at least one fluoroolefin, preferably hexafluoroisobutylene, and 2) an acid group or a protected acid group (e.g., a t-alkyl ester, preferably a t-butyl ester), which together impart high ultraviolet (UV) transparency and developability in basic media to these materials. The materials of this invention have high UV transparency, particularly at short wavelengths, e.g., 157 nm and 193 nm, which makes them useful for lithography at these short wavelengths.

Abstract: Disclosed are partially fluorinated and fully fluorinated polymers that are substantially transparent to ultraviolet radiation at wavelengths from 140 to 186 nanometers.

Abstract: This invention relates to a process for the synthesis of diacyl peroxide by contacting acyl halide and peroxide complex in compatible aprotic solvent substantially free of compounds oxidizable by the peroxide complex or the reaction products of organic acyl halide with peroxide complex and the initiation of polymerization with diacyl peroxide in the aprotic solvent.

Abstract: This invention concerns radiation durable organic compositions which are well-suited for use in 157 nm lithography by virtue of their high transparency and excellent radiation durability, and to a process for the preparation thereof.

Abstract: Disclosed are partially fluorinated and fully fluorinated polymers that are substantially transparent to ultraviolet radiation at wavelengths from 187 to 260 nanometers.

Abstract: This invention concerns the application of substantially amorphous fluoropolymer compositions to stone so as to protect the stone from the deleterious effects of water and pollution.

Abstract: Disclosed are partially fluorinated that are substantially transparent to ultraviolet radiation at wavelengths from approximately 150 nanometer to 260 nanometers.

Abstract: This invention relates to a fluoropolymer nanocomposite comprising a fluoropolymer phase and an inorganic oxide phase dispersed throughout, said inorganic oxide phase having either no particles or particles substantially all of which have a particle size of less than about 75 nm which can be determined by small angle x-ray scattering and transmission electron microscopy techniques. These nanocomposites are useful as protective coatings.

Abstract: A new class of low temperature initiators has been found, enabling fluoroolefin polymerizations at relatively low temperatures. These initiators are diacyl peroxides which allow improved productivity and product properties, as well as more favorable reaction conditions.

Abstract: A one or two layer coating system has been developed for plastic substrates. The one coating system low reflective layer consists of a fluorinated copolymer having the formula: VF2/TFE/HFP, VF2/HFP or VF2/TFE/PMVE. In the two coating system, the upper coating layer consists of TFE/HFP, VF2/TFE/HFP, or TFE/Perfluorodioxole, and the lower coating layer consists of VF2/TFE/HFP, VF/TFE/HFP, VAc/TFE/HFIB, or TFE graft to PVOH.

Abstract: Hexafluoroisobutylene and its higher homologs are easily reacted with SO3 to give fluorosulfates of the formula CH2═C(R)CF2OSO2F, wherein R is a linear, branched or cyclic fluoroalkyl group comprised of 1 to 10 carbon atoms and may contain ether oxygen. These compounds react under mild conditions with many nucleophiles to give CH2═C(R)CF2X, where X is derived from the nucleophile. This reaction provides a route to many substituted hexafluoroisobutylenes, which copolymerize easily with other fluoro- and hydrocarbon monomers such as vinylidene fluoride and ethylene.