Abstract: An element having a support, and at least an antireflective layer; wherein the antireflective layer is prepared from a composition having a polymer selected from the group consisting of (a) a fluorine-containing copolymer comprising a repeat unit derived from at least one ethylenically unsaturated compound characterized in that at least one ethylenically unsaturated compound is polycyclic; (b) a branched polymer containing protected acid groups, said polymer comprising one or more branch segment(s) chemically linked along a linear backbone segment; (c) fluoropolymers having at least one fluoroalcohol group having the structure:—C(Rf)(Rf′)OH wherein Rf and Rf′ are the same or different fluoroalkyl groups of from 1 to about 10 carbon atoms or taken together are (CF2)n wherein n is 2 to 10; (d) amorphous vinyl homopolymers of perfluoro-2,2-dimethyl-1,3-dioxole or CX2═CY2, where X is —F, or —CF3 and Y is H, or amorphous vinyl copolymers of perfluoro-2,2-dimethyl-1,3-dioxole and

Abstract: This invention concerns radiation durable organic compositions which are well-suited for use in 157 nm lithography by virtue of their high transparency and excellent radiation durability, and to a process for the preparation thereof.

Abstract: The present invention relates to in situ polymerization of fluoropolymer into porous substrates, to improve resistance to wear, tear and creep, decay, and degradation by wetting, staining and warping, and to improve durability while maintaining the appearance of the substrate.

Abstract: Fluoroolefin/acid group or protected acid group-containing copolymers for photoresist compositions and microlithography methods employing the photoresist compositions are described. These copolymer compositions comprise 1) at least one fluoroolefin, preferably hexafluoroisobutylene, and 2) an acid group or a protected acid group (e.g., a t-alkyl ester, preferably a t-butyl ester), which together impart high ultraviolet (UV) transparency and developability in basic media to these materials. The materials of this invention have high UV transparency, particularly at short wavelengths, e.g., 157 nm and 193 nm, which makes them useful for lithography at these short wavelengths.

Abstract: This invention concerns the application of substantially amorphous fluoropolymer compositions to stone so as to protect the stone from the deleterious effects of water and pollution.

Abstract: The present invention relates to in situ polymerization of fluoropolymer into porous substrates, to improve resistance to degradation by wetting and staining, and wood, to improve resistance to degradation, staining and warping.

Abstract: The present invention relates to in situ polymerization of fluoropolymer into porous substrates, to improve resistance to degradation by wetting and staining, and wood, to improve resistance to degradation, staining and warping.

Abstract: Disclosed herein are novel amorphous tetrafluoroethylene-hexafluoropropylene (TFE-HFP) dipolymers, and other copolymers containing TFE, HFP and a third monomer, many of which are more random than previous amorphous TFE-HFP copolymers, as well as a novel high productivity continuous process for making these polymers. The polymers are particularly useful in the form of coatings, films and encapsulants.

Abstract: Novel copolymers of fluorinated olefins and maleic anhydride, maleic acid, dichloromaleic anhydride or dichloromaleic acid may be made by using as solvents for the maleic anhydride or acid a perfluorinated alkyl carboxylic acid, or liquid or supercritical hexafluoropropylene or carbon dioxide. The resulting polymers are useful as adhesives or compatibilizing agents for fluoropolymers, and in coatings.

Abstract: This invention relates to a process for the synthesis of diacyl peroxide by contacting acyl halide and peroxide complex in liquid or supercritical carbon dioxide.

Abstract: This invention concerns a process for the use of hydrogen halides as chain transfer agents in fluoroolefin polymerization.

Abstract: This invention relates to a process for the synthesis of diacyl peroxide by contacting acyl halide and peroxide complex in compatible aprotic solvent substantially free of compounds oxidizable by the peroxide complex or the reaction products of organic acyl halide with peroxide complex.

Abstract: This invention relates to a process for the synthesis of diacyl peroxide by contacting acyl halide and peroxide complex in liquid or supercritical carbon dioxide.

Abstract: The present invention relates to in situ polymerization of fluoropolymer into porous substrates, to improve resistance to wear, tear and creep, decay, and degradation by wetting, staining and warping, and to improve durability while maintaining the appearance of the substrate.

Abstract: The present invention relates to in situ polymerization of fluoropolymer into porous substrates, to improve resistance to wear, tear and creep, decay, and degradation by wetting, staining and warping, and to improve durability while maintaining the appearance of the substrate.

Abstract: Disclosed is a liquid/gelatinous composition of matter comprising: (a) a solvent or a mixture of solvents selected from the group consisting of: (i) a CnF2n+2−xHx compound, wherein n is an integer from 6 to 15 and x is an integer from 1 to 3; and (ii) a Cn′F2n′−x′Hx′ compound, wherein n′ is an integer from 7 to 15 and x′ is an integer from 1 to 3; and (b) one or more amorphous fluoropolymers selected from the group consisting of: (i) poly(HFP/TFE); (ii) iodine ended poly(TFE/PMVE); (iii) poly(TFE/PMVE/PEVE); (iv) poly(TFE/PDD); (v) poly(TFE/perfluorovinylether); (vi) poly(CF2═CF(CF2)2OCF═CF2/TFE); and wherein the amorphous fluoropolymer has no detectable Tm (<1 J/g) by differential scanning calorimetry and wherein the amorphous fluoropolymer makes up 0.05 to 30 wt % of the composition and wherein at least 5% of the amorphous fluoropolymer present is in solution in the solvent or mixture of solvents.

Abstract: Novel copolymers of fluorinated olefins and maleic anhydride, maleic acid, dichloromaleic anhydride or dichloromaleic acid may be made by using as solvents for the maleic anhydride or acid a perfluorinated alkyl carboxylic acid, or liquid or supercritical hexafluoropropylene or carbon dioxide. The resulting polymers are useful as adhesives or compatibilizing agents for fluoropolymers, and in coatings.

Abstract: Disclosed herein are novel amorphous tetrafluoroethylene-hexafluoropropylene (TFE-HFP) dipolymers, and other copolymers containing TFE, HFP and a third monomer, many of which are more random than previous amorphous TFE-HFP copolymers, as well as a novel high productivity continuous process for making these polymers. The polymers are particularly useful in the form of coatings, films and encapsulants.

Abstract: Polymer compositions containing a mixture of an elastomer and a fluoropolymer can be made by diffusing fluorinated olefins and free radical initiators in preferably swollen elastomers and polymerizing the fluorinated olefins. The resulting compositions have useful properties, such as reduced sliding friction, which makes them useful for seals in contact with moving surfaces, and for other uses.

Abstract: Novel copolymers of fluorinated olefins and maleic anhydride, maleic acid, dichloromaleic anhydride or dichloromaleic acid may be made by using as solvents for the maleic anhydride or acid a perfluorinated alkyl carboxylic acid, or liquid or supercritical hexafluoropropylene or carbon dioxide. The resulting polymers are useful as adhesives or compatibilizing agents for fluoropolymers, and in coatings.