Patents by Inventor Robert D. Wieting

Robert D. Wieting has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20140138243
    Abstract: An in-line sputtering system includes a chamber and a sputtering target near a top region of the chamber. The system also includes a moving device located on a bottom region of the chamber configured to move a plurality of planar substrates loaded horizontally in a row with at least a gap distance between any neighboring substrates, The gap distance allows the bottom region to be subjected to a deposition from the sputtering target as the gap distance moves across the entire bottom region along with the plurality of planar substrates by the moving device, The system further includes a bottom shield disposed to cover entire bottom region except the moving device and configured to adhere the deposition through the gap distance from the sputtering target for preventing a deposition buildup.
    Type: Application
    Filed: November 18, 2013
    Publication date: May 22, 2014
    Inventors: Rajiv Pethe, Robert D. Wieting
  • Patent number: 8673675
    Abstract: A method for processing a thin film photovoltaic module. The method includes providing a plurality of substrates, each of the substrates having a first electrode layer and an overlying absorber layer composed of copper indium gallium selenide (CIGS) or copper indium selenide (CIS) material. The absorber material comprises a plurality of sodium bearing species. The method maintains the plurality of substrates in a controlled environment after formation of at least the absorber layer through one or more processes up to a lamination process. The controlled environment has a relative humidity of less than 10% and a temperature ranging from about 10 degrees Celsius to about 40 degrees Celsius. The method subjects the plurality of substrates to a liquid comprising water at a temperature from about 10 degrees Celsius to about 80 degrees Celsius to process the plurality of substrates after formation of the absorber layer.
    Type: Grant
    Filed: May 12, 2011
    Date of Patent: March 18, 2014
    Assignee: Stion Corporation
    Inventor: Robert D. Wieting
  • Publication number: 20140014170
    Abstract: A method of fabricating a thin film photovoltaic device is provided. The method subjects a soda lime glass substrate having a front side, backside, and edges to a first cleaning process and forms a first coating of silicon dioxide overlying the backside and the edges. The method further subjects the substrate to a second cleaning process and forms a second coating of silicon dioxide overlying the front side and the edges of the substrate. Furthermore, the method includes causing a barrier layer comprising the first coating and the second coating to encapsulate entirely the front side, backside, and edges. The barrier layer includes at least a thickness of oxygen rich silicon dioxide to contain any sodium bearing material within the substrate. Moreover, the method includes forming a thickness of metal material overlying the second coating on the front side followed by an absorber material and window material plus a top electrode.
    Type: Application
    Filed: September 19, 2012
    Publication date: January 16, 2014
    Applicant: Stion Corporation
    Inventors: James H. Whittemore, IV, Laila Dounas, Chester A. Farris, III, Robert D. Wieting
  • Patent number: 8628997
    Abstract: A method for fabricating a thin film photovoltaic device is provided. The method includes providing a substrate comprising a thin film photovoltaic absorber which has a surface including copper, indium, gallium, selenium, and sulfur. The method further includes subjecting the surface to a material containing at least a zinc species substantially free of any cadmium. The surface is heated to cause formation of a zinc doped material. The zinc doped material is free from cadmium. Furthermore the method includes forming a zinc oxide material overlying the zinc doped material and forming a transparent conductive material overlying the zinc oxide material.
    Type: Grant
    Filed: September 19, 2011
    Date of Patent: January 14, 2014
    Assignee: Stion Corporation
    Inventors: Kannan Ramanathan, Robert D. Wieting
  • Publication number: 20130306150
    Abstract: A method for manufacturing a thin-film photovoltaic device includes providing a glass substrate contained sodium species. The glass substrate comprising a surface region and a peripheral edge region surround the surface region. The method further includes forming a barrier material overlying the surface region and partially overlying the peripheral edge region and forming a conductor material overlying the barrier material. Additionally, the method includes forming at least a first trench in a vicinity of the peripheral edge region to remove substantially the conductor material therein and forming precursor materials overlying the patterned conductor material. Furthermore, the method includes thermally treating the precursor materials to transform the precursor materials into a film of photovoltaic absorber. The first trench is configured to maintain the film of photovoltaic absorber substantially free from peeling off the conductor material.
    Type: Application
    Filed: May 21, 2012
    Publication date: November 21, 2013
    Applicant: Stion Corporation
    Inventors: Laila Dounas, Robert D. Wieting, Chester A. Farris, III
  • Patent number: 8557625
    Abstract: A method for fabricating a thin film photovoltaic device. The method includes providing a substrate comprising an absorber layer and an overlying window layer. The substrate is loaded into a chamber and subjected to a vacuum environment. The vacuum environment is at a pressure ranging from 0.1 Torr to about 0.02 Torr. In a specific embodiment, a mixture of reactant species derived from diethylzinc species, water species and a carrier gas is introduced into the chamber. The method further introduces a diborane species using a selected flow rate into the mixture of reactant species. A zinc oxide film is formed overlying the window layer to define a transparent conductive oxide using the selected flow rate to provide a resistivity of about 2.5 milliohm-cm and less and an average grain size of about 3000 to 5000 Angstroms.
    Type: Grant
    Filed: February 10, 2012
    Date of Patent: October 15, 2013
    Assignee: Stion Corporation
    Inventor: Robert D. Wieting
  • Patent number: 8507786
    Abstract: A method for fabricating a shaped thin-film photovoltaic device. The method includes providing a shaped substrate member including a surface region and forming a first electrode layer overlying the surface region. Additionally, the method includes forming an absorber comprising copper species, indium species, and selenide species overlying the first electrode layer. The method further includes scribing through the absorber using a mechanical tip to form a first pattern. Furthermore, the method includes forming a window layer comprising cadmium sulfide species overlying the absorber including the first pattern. Moreover, the method includes scribing through the window layer and the absorber using the mechanical tip to form a second pattern. The second pattern is separated a distance from the first pattern.
    Type: Grant
    Filed: June 18, 2010
    Date of Patent: August 13, 2013
    Assignee: Stion Corporation
    Inventor: Robert D. Wieting
  • Publication number: 20130174900
    Abstract: A thin-film photovoltaic devices includes transparent conductive oxide which has embedded within it nanowires at less than 2% nominal shadowing area. The nanowires enhance the electrical conductivity of the conductive oxide.
    Type: Application
    Filed: July 6, 2012
    Publication date: July 11, 2013
    Applicant: Stion Corporation
    Inventors: Chester A. Farris, III, Robert D. Wieting, Ashish Tandon
  • Patent number: 8461061
    Abstract: A method of supporting a plurality of planar substrates in a tube shaped furnace for conducting a thermal treatment process is disclosed. The method uses a boat fixture having a base frame including two length portions and a first width portion, a second width portion, and one or more middle members connected between the two length portions. Additionally, the method includes mounting a removable first grooved rod respectively on the first width portion, the second width portion, and each of the one or more middle members, each first grooved rod having a first plurality of grooves characterized by a first spatial configuration. The method further includes inserting one or two substrates of a plurality of planar substrates into each groove in the boat fixture separated by a distance.
    Type: Grant
    Filed: June 28, 2011
    Date of Patent: June 11, 2013
    Assignee: Stion Corporation
    Inventors: Paul Alexander, Jurg Schmitzberger, Ashish Tandon, Robert D. Wieting
  • Patent number: 8435822
    Abstract: A method for forming a thin film photovoltaic device having patterned electrode films includes providing a soda lime glass substrate with an overlying lower electrode layer comprising a molybdenum material. The method further includes subjecting the lower electrode layer with one or more pulses of electromagnetic radiation from a laser source to ablate one or more patterns associated with one or more berm structures from the lower electrode layer. Furthermore, the method includes processing the lower electrode layer comprising the one or more patterns using a mechanical brush device to remove the one or more berm structures followed by treating the lower electrode layer comprising the one or more patterns free from the one or more berm structures. The method further includes forming a layer of photovoltaic material overlying the lower electrode layer and forming a first zinc oxide layer overlying the layer of photovoltaic material.
    Type: Grant
    Filed: December 7, 2010
    Date of Patent: May 7, 2013
    Assignee: Stion Corporation
    Inventor: Robert D. Wieting
  • Patent number: 8436445
    Abstract: A method for processing a thin-film absorber material with enhanced photovoltaic efficiency includes forming a barrier layer on a soda lime glass substrate followed by formation of a stack structure of precursor layers. The method further includes subjecting the soda-lime glass substrate with the stack structure to a thermal treatment process with at least H2Se gas species at a temperature above 400° C. to cause formation of an absorber material. By positioning the substrates close together, during the process sodium from an adjoining substrate in the furnace also is incorporated into the absorber layer.
    Type: Grant
    Filed: November 30, 2011
    Date of Patent: May 7, 2013
    Assignee: Stion Corporation
    Inventor: Robert D. Wieting
  • Patent number: 8425739
    Abstract: A method of processing a photovoltaic materials using a sputtering process including providing at least one transparent substrate having an overlying first electrode layer. The method further including forming an overlying copper and gallium layer using a first sputtering process within a first chamber from a first target including a copper species and a gallium species. Additionally, the method includes forming an indium layer overlying the copper and the gallium layer using a second sputtering process within the first chamber from a second target including an indium species. The method further includes forming a sodium bearing layer overlying the indium layer using a third sputtering process within the first chamber, thereby forming a composite film including the copper and gallium layer, the indium layer, and the sodium bearing layer.
    Type: Grant
    Filed: September 23, 2009
    Date of Patent: April 23, 2013
    Assignee: Stion Corporation
    Inventor: Robert D. Wieting
  • Patent number: 8398772
    Abstract: An apparatus for reactive thermal treatment of thin film photovoltaic devices includes a furnace tube including an inner wall extended from a first end to a second end. The apparatus further includes a gas supply device coupled to the second end and configured to fill one or more working gases into the furnace tube. Additionally, the apparatus includes a cover configured to seal the furnace tube at the first end and serve as a heat sink for the one or more working gases. Furthermore, the apparatus includes a fixture mechanically attached to the cover. The fixture is configured to load an array of substrates into the furnace tube as the cover seals the furnace tube. Moreover, the apparatus includes a crescent shaped baffle member disposed seamlessly at a lower portion of the inner wall for blocking a convection current of the one or more working gases cooled by the cover.
    Type: Grant
    Filed: August 17, 2010
    Date of Patent: March 19, 2013
    Assignee: Stion Corporation
    Inventors: Ashish Tandon, Robert D. Wieting, Jurg Schmizberger, Paul Alexander
  • Patent number: 8383450
    Abstract: A method for forming a thin film photovoltaic material. The method includes providing a plurality of substrates. Each of the substrates has a surface region, an overlying first electrode material, an absorber material including at least a copper species, an indium species, and a selenium species. The method immerses the plurality of substrates in an aqueous solution including an ammonia species, a cadmium species, and a organosulfur (for example, thiourea) species in a bath to form a cadmium sulfide window material having a thickness of less than about 200 Angstroms overlying the absorber material. The aqueous solution is maintained at a temperature ranging from about 50 to about 60 Degrees Celsius. The plurality of substrates having at least the absorber material and the window layer are removed from the aqueous solution. The aqueous solution is further subjected to a filter process to substantially remove one or more particles greater than about 5 microns.
    Type: Grant
    Filed: September 29, 2009
    Date of Patent: February 26, 2013
    Assignee: Stion Corporation
    Inventor: Robert D. Wieting
  • Patent number: 8377736
    Abstract: The present invention provides methods for fabricating a copper indium diselenide semiconductor film. The method includes providing a plurality of substrates having a copper and indium composite structure, and including a peripheral region, the peripheral region including a plurality of openings, the plurality of openings including at least a first opening and a second opening. The method includes transferring the plurality of substrates into a furnace, each of the plurality of substrates provided in a vertical orientation with respect to a direction of gravity, the furnace including a holding apparatus. The method further includes introducing a gaseous species into the furnace and transferring thermal energy into the furnace to increase a temperature from a first temperature to at least initiate formation of a copper indium diselenide film on each of the substrates.
    Type: Grant
    Filed: January 4, 2012
    Date of Patent: February 19, 2013
    Assignee: Stion Corporation
    Inventor: Robert D. Wieting
  • Patent number: 8372684
    Abstract: The method and system for selenization in fabricating CIS and/or CIGS based thin film solar cell overlaying cylindrical glass substrates. The method includes providing a substrate, forming an electrode layer over the substrate and depositing a precursor layer of copper, indium, and/or gallium over the electrode layer. The method also includes disposing the substrate vertically in a furnace. Then a gas including a hydrogen species, a selenium species and a carrier gas are introduced into the furnace and heated to between about 350° C. and about 450° C. to at least initiate formation of a copper indium diselenide film from the precursor layer.
    Type: Grant
    Filed: May 7, 2010
    Date of Patent: February 12, 2013
    Assignee: Stion Corporation
    Inventors: Robert D. Wieting, Steven Aragon, Chester A. Farris, III
  • Publication number: 20120302002
    Abstract: A method for processing a thin-film absorber material with enhanced photovoltaic efficiency includes forming a barrier layer on a soda lime glass substrate followed by formation of a stack structure of precursor layers. The method further includes subjecting the soda-lime glass substrate with the stack structure to a thermal treatment process with at least H2Se gas species at a temperature above 400° C. to cause formation of an absorber material. By positioning the substrates close together, during the process sodium from an adjoining substrate in the furnace also is incorporated into the absorber layer.
    Type: Application
    Filed: November 30, 2011
    Publication date: November 29, 2012
    Applicant: Stion Corporation
    Inventor: Robert D. Wieting
  • Patent number: 8318531
    Abstract: thermal management for large scale processing of CIS and/or CIGS based thin film is described. The method includes providing a plurality of substrates, each of the substrates having a copper and indium composite structure. The method also includes transferring the plurality of substrates into a furnace, each of the plurality of substrates provided in a vertical orientation with respect to a direction of gravity, the plurality of substrates being defined by a number N, where N is greater than 5. The method further includes introducing a gaseous species including a selenide species and a carrier gas into the furnace and transferring thermal energy into the furnace to increase a temperature from a first temperature to a second temperature, to at least initiate formation of a copper indium diselenide film.
    Type: Grant
    Filed: November 9, 2011
    Date of Patent: November 27, 2012
    Assignee: Stion Corporation
    Inventor: Robert D. Wieting
  • Publication number: 20120240989
    Abstract: A method for fabricating a thin film photovoltaic device is provided. The method includes providing a substrate comprising a thin film photovoltaic absorber which has a surface including copper, indium, gallium, selenium, and sulfur. The method further includes subjecting the surface to a material containing at least a zinc species substantially free of any cadmium. The surface is heated to cause formation of a zinc doped material. The zinc doped material is free from cadmium. Furthermore the method includes forming a zinc oxide material overlying the zinc doped material and forming a transparent conductive material overlying the zinc oxide material.
    Type: Application
    Filed: September 19, 2011
    Publication date: September 27, 2012
    Applicant: Stion Corporation
    Inventors: Kannan Ramanathan, Robert D. Wieting
  • Patent number: D679650
    Type: Grant
    Filed: May 26, 2010
    Date of Patent: April 9, 2013
    Assignee: Stion Corporation
    Inventors: Chester A. Farris, III, Robert D. Wieting