Patents by Inventor Roman CAUDILLO

Roman CAUDILLO has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20190273197
    Abstract: One superconducting qubit device package disclosed herein includes a die having a first face and an opposing second face, and a package substrate having a first face and an opposing second face. The die includes a quantum device including a plurality of superconducting qubits and a plurality of resonators on the first face of the die, and a plurality of conductive pathways coupled between conductive contacts at the first face of the die and associated ones of the plurality of superconducting qubits or of the plurality of resonators. The second face of the package substrate also includes conductive contacts. The device package further includes first level interconnects disposed between the first face of the die and the second face of the package substrate, coupling the conductive contacts at the first face of the die with associated conductive contacts at the second face of the package substrate.
    Type: Application
    Filed: December 27, 2016
    Publication date: September 5, 2019
    Applicant: Intel Corporation
    Inventors: Jeanette M. Roberts, Adel A. Elsherbini, Shawna Liff, Johanna M. Swan, Roman Caudillo, Zachary R. Yoscovits, Nicole K. Thomas, Ravi Pillarisetty, Hubert C. George, James S. Clarke
  • Patent number: 10388848
    Abstract: Embodiments of the present disclosure describe use of isotopically purified materials in donor- or acceptor-based spin qubit devices and assemblies. An exemplary spin qubit device assembly may include a semiconductor host layer that includes an isotopically purified material, a dopant atom in the semiconductor host layer, and a gate proximate to the dopant atom. An isotopically purified material may include a lower atomic-percent of isotopes with nonzero nuclear spin than the natural abundance of those isotopies in the non-isotopically purified material. Reducing the presence of isotopes with nonzero nuclear spin in a semiconductor host layer may improve qubit coherence and thus performance of spin qubit devices and assemblies.
    Type: Grant
    Filed: March 19, 2018
    Date of Patent: August 20, 2019
    Assignee: Intel Corporation
    Inventors: Nicole K. Thomas, James S. Clarke, Jessica M. Torres, Lester Lampert, Ravi Pillarisetty, Hubert C. George, Kanwaljit Singh, Jeanette M. Roberts, Roman Caudillo, Zachary R. Yoscovits, David J. Michalak
  • Publication number: 20190252536
    Abstract: A quantum dot device is disclosed that includes a fin and a gate above the fin. The fin may extend away from a base and include a quantum well stack in which one or more quantum dots may be formed during operation of the quantum dot device. The gate may include a gate electrode material having a first portion and a second portion, where the first portion is above the quantum well stack and the second portion is a portion that is not above the quantum well stack and is separated from the base by an insulating material. The quantum dot device may further include a metal structure between the second portion of the gate electrode material and the base, forming a portion of a diode provided in series with the gate, which diode may provide at least some ESD protection for the quantum dot device.
    Type: Application
    Filed: September 27, 2018
    Publication date: August 15, 2019
    Applicant: Intel Corporation
    Inventors: Hubert C. George, Ravi Pillarisetty, Lester Lampert, James S. Clarke, Nicole K. Thomas, Roman Caudillo, Kanwaljit Singh, David J. Michalak, Jeanette M. Roberts
  • Patent number: 10361353
    Abstract: Disclosed herein are fabrication techniques for providing metal gates in quantum devices, as well as related quantum devices. For example, in some embodiments, a method of manufacturing a quantum device may include providing a gate dielectric over a qubit device layer, providing over the gate dielectric a pattern of non-metallic elements referred to as “gate support elements,” and depositing a gate metal on sidewalls of the gate support elements to form a plurality of gates of the quantum device.
    Type: Grant
    Filed: February 8, 2018
    Date of Patent: July 23, 2019
    Assignee: Intel Corporation
    Inventors: Hubert C. George, Zachary R. Yoscovits, Nicole K. Thomas, Lester Lampert, James S. Clarke, Jeanette M. Roberts, Ravi Pillarisetty, David J. Michalak, Kanwaljit Singh, Roman Caudillo
  • Patent number: 10347834
    Abstract: Embodiments of the present disclosure propose two methods for integrating vacancy centers (VCs) on semiconductor substrates for forming VC-based spin qubit devices. The first method is based on using a self-assembly process for integrating VC islands on a semiconductor substrate. The second method is based on using a buffer layer of a III-N semiconductor material over a semiconductor substrate, and then integrating VC islands in an insulating carbon-based material such as diamond that is either grown as a layer on the III-N buffer layer or grown in the openings formed in the III-N buffer layer. Integration of VC islands on semiconductor substrates typically used in semiconductor manufacturing according to any of these methods may provide a substantial improvement with respect to conventional approaches to building VC-based spin qubit devices and may promote wafer-scale integration of VC-based spin qubits for use in quantum computing devices.
    Type: Grant
    Filed: March 22, 2018
    Date of Patent: July 9, 2019
    Assignee: Intel Corporation
    Inventors: Nicole K. Thomas, Marko Radosavljevic, Sansaptak Dasgupta, Ravi Pillarisetty, Kanwaljit Singh, Hubert C. George, Jeanette M. Roberts, David J. Michalak, Roman Caudillo, Zachary R. Yoscovits, Lester Lampert, James S. Clarke
  • Patent number: 10319896
    Abstract: Disclosed herein are shielded interconnects, as well as related methods, assemblies, and devices. In some embodiments, a shielded interconnect may be included in a quantum computing (QC) assembly. For example, a QC assembly may include a quantum processing die; a control die; and a flexible interconnect electrically coupling the quantum processing die and the control die, wherein the flexible interconnect includes a plurality of transmission lines and a shield structure to mitigate cross-talk between the transmission lines.
    Type: Grant
    Filed: June 29, 2017
    Date of Patent: June 11, 2019
    Assignee: Intel Corporation
    Inventors: Javier A. Falcon, Adel A. Elsherbini, Johanna M. Swan, Shawna M. Liff, Ye Seul Nam, James S. Clarke, Jeanette M. Roberts, Roman Caudillo
  • Patent number: 10256206
    Abstract: Embodiments of the present disclosure describe novel qubit device packages, as well as related computing devices and methods. In one embodiment, an exemplary qubit device package includes a qubit die and a package substrate, where the qubit die is coupled to the package substrate using one or more preforms. In particular, a single preform may advantageously be used to replace a plurality of individual contacts, e.g. a plurality of individual solder bumps, electrically coupling the qubit die to the package substrate. Such packages may reduce design complexity and undesired coupling, and enable inclusion of larger numbers of qubits in a single qubit die.
    Type: Grant
    Filed: March 16, 2018
    Date of Patent: April 9, 2019
    Assignee: Intel Corporation
    Inventors: Javier A. Falcon, Ye Seul Nam, Adel A. Elsherbini, Roman Caudillo, James S. Clarke
  • Publication number: 20190043968
    Abstract: Embodiments of the present disclosure describe a method of fabricating spin qubit device assemblies that utilize dopant-based spin qubits, i.e. spin qubit devices which operate by including a donor or an acceptor dopant atom in a semiconductor host layer. The method includes, first, providing a pair of gate electrodes over a semiconductor host layer, and then providing a window structure between the first and second gate electrodes, the window structure being a continuous solid material extending between the first and second electrodes and covering the semiconductor host layer except for an opening through which a dopant atom is to be implanted in the semiconductor host layer. By using a defined gate-first process, the method may address the scalability challenges and create a deterministic path for fabricating dopant-based spin qubits in desired locations, promoting wafer-scale integration of dopant-based spin qubit devices for use in quantum computing devices.
    Type: Application
    Filed: March 19, 2018
    Publication date: February 7, 2019
    Applicant: Intel Corporation
    Inventors: Lester Lampert, James S. Clarke, Jeanette M. Roberts, Ravi Pillarisetty, David J. Michalak, Kanwaljit Singh, Roman Caudillo, Hubert C. George, Zachary R. Yoscovits, Nicole K. Thomas
  • Publication number: 20190044051
    Abstract: Embodiments of the present disclosure relate to quantum circuit assemblies implementing superconducting qubits, e.g., transmons, in which SQUID loops and portions of FBLs configured to magnetically couple to the SQUID loops extend substantially vertically. In contrast to conventional implementations, for a vertical SQUID according to various embodiments of the present disclosure, a line that is perpendicular to the SQUID loop is parallel to the qubit substrate. A corresponding FBL is also provided in a vertical arrangement, in order to achieve efficient magnetic coupling to the vertical SQUID loop, by ensuring that at least a portion of the FBL designed to conduct current responsible for generating magnetic field for tuning qubit frequency is substantially perpendicular to the substrate.
    Type: Application
    Filed: August 14, 2018
    Publication date: February 7, 2019
    Applicant: Intel Corporation
    Inventors: Roman Caudillo, Lester Lampert, David J. Michalak, Jeanette M. Roberts, Ravi Pillarisetty, Hubert C. George, Nicole K. Thomas, James S. Clarke
  • Publication number: 20190043822
    Abstract: Embodiments of the present disclosure describe novel qubit device packages, as well as related computing devices and methods. In one embodiment, an exemplary qubit device package includes a qubit die and a package substrate, where the qubit die is coupled to the package substrate using one or more preforms. In particular, a single preform may advantageously be used to replace a plurality of individual contacts, e.g. a plurality of individual solder bumps, electrically coupling the qubit die to the package substrate. Such packages may reduce design complexity and undesired coupling, and enable inclusion of larger numbers of qubits in a single qubit die.
    Type: Application
    Filed: March 16, 2018
    Publication date: February 7, 2019
    Applicant: Intel Corporation
    Inventors: Javier A. Falcon, Ye Seul Nam, Adel A. Elsherbini, Roman Caudillo, James S. Clarke
  • Publication number: 20190044050
    Abstract: Disclosed herein are quantum dot devices, as well as related computing devices and methods. For example, in some embodiments, a quantum dot device may include: a base; a fin extending away from the base, wherein the fin includes a quantum well layer; a gate above the fin; and a material on side faces of the fin; wherein the fin has a width between its side faces, and the fin is strained in the direction of the width.
    Type: Application
    Filed: March 6, 2018
    Publication date: February 7, 2019
    Applicant: Intel Corporation
    Inventors: Ravi Pillarisetty, Kanwaljit Singh, Patrick H. Keys, Roman Caudillo, Hubert C. George, Zachary R. Yoscovits, Nicole K. Thomas, James S. Clarke, Roza Kotlyar, Payam Amin, Jeanette M. Roberts
  • Publication number: 20190044047
    Abstract: An exemplary superconducting qubit device package includes a qubit die housing a superconducting qubit device that includes at least one resonator, and a package substrate, each having a first face and an opposing second face. The resonator is disposed on the first face of the qubit die. The first face of the qubit die faces and is attached to the second face of the package substrate by first level interconnects. The second face of the package substrate includes a superconductor facing at least portions of the resonator. Such a package architecture may advantageously allow reducing design complexity and undesired coupling, enable inclusion of larger numbers of qubit devices in the qubit die of the package, reduce potential negative impact of the materials used in the package substrate on resonator performance, and limit some sources of qubit decoherence.
    Type: Application
    Filed: February 20, 2018
    Publication date: February 7, 2019
    Applicant: Intel Corporation
    Inventors: Adel A. Elsherbini, Javier A. Falcon, Roman Caudillo, James S. Clarke
  • Publication number: 20190044046
    Abstract: Various embodiments of the present disclosure present quantum circuit assemblies implementing vertically-stacked parallel-plate capacitors. Such capacitors include first and second capacitor plates which are parallel to one another and separated from one another by a gap measured along a direction perpendicular to the qubit plane, i.e. measured vertically. Fabrication techniques for manufacturing such capacitors are also disclosed. Vertically-stacked parallel-plate capacitors may help increasing coherence times of qubits, facilitate use of three-dimensional and stacked designs for quantum circuit assemblies, and may be particularly advantageous for realizing device scalability and use of 300-millimeter fabrication processes.
    Type: Application
    Filed: June 19, 2018
    Publication date: February 7, 2019
    Applicant: Intel Corporation
    Inventors: Roman Caudillo, Zachary R. Yoscovits, Lester Lampert, David J. Michalak, Jeanette M. Roberts, Ravi Pillarisetty, Hubert C. George, Nicole K. Thomas, James S. Clarke
  • Publication number: 20190043989
    Abstract: Disclosed herein are quantum dot devices, as well as related computing devices and methods. For example, in some embodiments, a quantum dot device may include: a quantum well stack; a first gate above the quantum well stack, wherein the first gate includes a first gate metal and a first gate dielectric layer; and a second gate above the quantum well stack, wherein the second gate includes a second gate metal and a second gate dielectric layer, and the second gate dielectric layer extends over the first gate.
    Type: Application
    Filed: June 25, 2018
    Publication date: February 7, 2019
    Applicant: Intel Corporation
    Inventors: Nicole K. Thomas, Ravi Pillarisetty, Kanwaljit Singh, Hubert C. George, David J. Michalak, Lester Lampert, Zachary R. Yoscovits, Roman Caudillo, Jeanette M. Roberts, James S. Clarke
  • Publication number: 20190043951
    Abstract: Disclosed herein are quantum dot devices, as well as related computing devices and methods. For example, in some embodiments, a quantum dot device may include: a quantum well stack including a quantum well layer and a barrier layer; a first gate metal above the quantum well stack, wherein the barrier layer is between the first gate metal and the quantum well layer; and a second gate metal above the quantum well stack, wherein the barrier layer is between the second gate metal and the quantum well layer, and a material structure of the second gate metal is different from a material structure of the first gate metal.
    Type: Application
    Filed: June 21, 2018
    Publication date: February 7, 2019
    Applicant: Intel Corporation
    Inventors: Nicole K. Thomas, Ravi Pillarisetty, Payam Amin, Roza Kotlyar, Patrick H. Keys, Hubert C. George, Kanwaljit Singh, James S. Clarke, David J. Michalak, Lester Lampert, Zachary R. Yoscovits, Roman Caudillo, Jeanette M. Roberts
  • Publication number: 20190044049
    Abstract: Disclosed herein are quantum dot devices, as well as related computing devices and methods. For example, in some embodiments, a quantum dot device may include: a quantum well stack; a first gate and an adjacent second gate above the quantum well stack; and a gate wall between the first gate and the second gate, wherein the gate wall includes a first dielectric material and a second dielectric material different from the first dielectric material.
    Type: Application
    Filed: February 20, 2018
    Publication date: February 7, 2019
    Applicant: Intel Corporation
    Inventors: Nicole K. Thomas, Ravi Pillarisetty, Hubert C. George, Kanwaljit Singh, Jeanette M. Roberts, David J. Michalak, Roman Caudillo, Zachary R. Yoscovits, Lester Lampert, James S. Clarke, Willy Rachmady
  • Publication number: 20190044044
    Abstract: Embodiments of the present disclosure describe two approaches to providing flux bias line structures for superconducting qubit devices. The first approach, applicable to flux bias line structures that include at least one portion that terminates with a ground connection, resides in terminating such a portion with a ground connection that is electrically isolated from the common ground plane of a quantum circuit assembly. The second approach resides in providing a SQUID loop of a superconducting qubit device and a portion of the flux bias line structure over a portion of a substrate that is elevated with respect to other portions of the substrate. These approaches may be used or alone or in combination, and may improve grounding of and reduce crosstalk caused by flux bias lines in quantum circuit assemblies.
    Type: Application
    Filed: February 15, 2018
    Publication date: February 7, 2019
    Applicant: Intel Corporation
    Inventors: Lester Lampert, Adel A. Elsherbini, James S. Clarke, Jeanette M. Roberts, Ravi Pillarisetty, David J. Michalak, Kanwaljit Singh, Roman Caudillo, Zachary R. Yoscovits, Nicole K. Thomas, Hubert C. George, Stefano Pellerano
  • Publication number: 20190043953
    Abstract: Disclosed herein are quantum dot devices, as well as related computing devices and methods. For example, in some embodiments, a quantum dot device may include: a quantum well stack; a first gate and an adjacent second gate above the quantum well stack; and a multi-spacer between the first gate and the second gate, wherein the multi-spacer includes a first spacer and a second spacer different from the first spacer, and the first spacer is at least partially between the quantum well stack and the second spacer.
    Type: Application
    Filed: September 27, 2018
    Publication date: February 7, 2019
    Applicant: Intel Corporation
    Inventors: Hubert C. George, Ravi Pillarisetty, Lester Lampert, James S. Clarke, Nicole K. Thomas, Roman Caudillo, David J. Michalak, Jeanette M. Roberts
  • Publication number: 20190042968
    Abstract: Embodiments of the present disclosure describe quantum circuit assemblies utilizing triaxial cables to communicate signals to/from quantum circuit components. One assembly includes a cooling apparatus for cooling a quantum circuit component that includes at least one qubit device. The cooling apparatus includes at least one triaxial connector for providing signals to and/or receiving signals from the quantum circuit component using one or more triaxial cables. Other assemblies include quantum circuit components and various electronic components (e.g. attenuators, filters, or amplifiers) for use within the cooling apparatus, adapted to be used with triaxial cables by incorporating triaxial connectors as well.
    Type: Application
    Filed: June 20, 2018
    Publication date: February 7, 2019
    Applicant: Intel Corporation
    Inventors: Lester Lampert, Ravi Pillarisetty, Nicole K. Thomas, Hubert C. George, Jeanette M. Roberts, David J. Michalak, Roman Caudillo, Zachary R. Yoscovits, James S. Clarke
  • Publication number: 20190043974
    Abstract: Disclosed herein are quantum dot devices, as well as related computing devices and methods. For example, in some embodiments, a quantum dot device may include: a quantum well stack; a layer of gate dielectric above the quantum well stack; a first gate metal and a second gate metal above the layer of gate dielectric; and a gate wall between the first gate metal and the second gate metal, wherein the gate wall is above the layer of gate dielectric, and the gate wall includes a first dielectric material and a second dielectric material different from the first dielectric material.
    Type: Application
    Filed: February 20, 2018
    Publication date: February 7, 2019
    Applicant: Intel Corporation
    Inventors: Nicole K. Thomas, Ravi Pillarisetty, Kanwaljit Singh, Hubert C. George, Jeanette M. Roberts, David J. Michalak, Roman Caudillo, Zachary R. Yoscovits, Lester Lampert, James S. Clarke, Willy Rachmady