Patents by Inventor Ronald Van Der Ham
Ronald Van Der Ham has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11300890Abstract: A support table configured to support a substrate, the support table having a support section to support a substrate and a conditioning system to supply heat energy to and/or remove heat energy from the support section, wherein the conditioning system comprises a plurality of conditioning units that are independently controllable.Type: GrantFiled: December 20, 2019Date of Patent: April 12, 2022Assignee: ASML NETHERLANDS B.V.Inventors: Johan Gertrudis Cornelis Kunnen, Johannes Henricus Wilhelmus Jacobs, Coen Cornelis Wilhelmus Verspaget, Ronald Van Der Ham, Ivo Adam Johannes Thomas, Martijn Houben, Thibault Simon Mathieu Laurent, Gregory Martin Mason Corcoran, Ruud Hendrikus Martinus Johannes Bloks, Gerben Pieterse, Pieter Lein Joseph Gunter, Marinus Jan Remie, Sander Catharina Reinier Derks
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Publication number: 20210088912Abstract: A fluid handling structure for a lithographic apparatus configured to contain immersion fluid to a region, the fluid handling structure having, at a boundary of a space: at least one gas knife opening in a radially outward direction of the space; and at least one gas supply opening in the radially outward direction of the at least gas knife opening relative to the space. The gas knife opening and the gas supply opening both provide substantially pure CO2 gas so as to provide a substantially pure CO2 gas environment adjacent to, and radially outward of, the space.Type: ApplicationFiled: December 4, 2020Publication date: March 25, 2021Applicant: ASML Netherlands B.V.Inventors: Cornelius Maria ROPS, Walter Theodorus Matheus STALS, David BESSEMS, Giovanni Luca GATTOBIGIO, Victor Manuel BLANCO CARBALLO, Erik Henricus Egidius Catharina EUMMELEN, Ronald VAN DER HAM, Frederik Antonius VAN DER ZANDEN, Wilhelmus Antonius WERNAART
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Patent number: 10916453Abstract: A lithographic apparatus includes a substrate table, a post-exposure handling module, a substrate handling robot and a drying station. The substrate table is configured to support a substrate for an exposure process. The post-exposure handling module is configured to handle the substrate post-exposure. The substrate handling robot is configured to transfer the substrate from the substrate table along a substrate unloading path into the post-exposure handling module. The drying station is configured to actively remove liquid from a surface of the substrate. The drying station is located in the substrate unloading path. The drying station is located in the post-exposure handling module. The post-exposure handling module may be a substrate handler.Type: GrantFiled: September 9, 2019Date of Patent: February 9, 2021Assignee: ASML Netherlands B.V.Inventors: Aart Adrianus Van Beuzekom, Jozef Augustinus Maria Alberti, Hubert Marie Segers, Ronald Van Der Ham, Francis Fahrni, Ruud Olieslagers, Gerben Pieterse, Cornelius Maria Rops, Pepijn Van Den Eijnden, Paul Van Dongen, Bas Willems
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Patent number: 10859919Abstract: A fluid handling structure for a lithographic apparatus configured to contain immersion fluid to a region, the fluid handling structure having, at a boundary of a space: at least one gas knife opening in a radially outward direction of the space; and at least one gas supply opening in the radially outward direction of the at least gas knife opening relative to the space. The gas knife opening and the gas supply opening both provide substantially pure CO2 gas so as to provide a substantially pure CO2 gas environment adjacent to, and radially outward of, the space.Type: GrantFiled: January 31, 2020Date of Patent: December 8, 2020Assignee: ASML NETHERLANDS B.V.Inventors: Cornelius Maria Rops, Walter Theodorus Matheus Stals, David Bessems, Giovanni Luca Gattobigio, Victor Manuel Blanco Carballo, Erik Henricus Egidius Catharina Eummelen, Ronald Van Der Ham, Frederik Antonius Van Der Zanden, Wilhelmus Antonius Wernaart
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Publication number: 20200166851Abstract: A fluid handling structure for a lithographic apparatus configured to contain immersion fluid to a region, the fluid handling structure having, at a boundary of a space: at least one gas knife opening in a radially outward direction of the space; and at least one gas supply opening in the radially outward direction of the at least gas knife opening relative to the space. The gas knife opening and the gas supply opening both provide substantially pure CO2 gas so as to provide a substantially pure CO2 gas environment adjacent to, and radially outward of, the space.Type: ApplicationFiled: January 31, 2020Publication date: May 28, 2020Applicant: ASML Netherlands B.V.Inventors: Cornelius Maria ROPS, Walter Theodorus Matheus STALS, David BESSEMS, Giovanni Luca GATTOBIGIO, Victor Manuel BLANCO CARBALLO, Erik Henricus Egidius Catharina EUMMELEN, Ronald VAN DER HAM, Frederik Antonius VAN DER ZANDEN, Wilhelmus Antonius WERNAART
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Publication number: 20200124993Abstract: A support table configured to support a substrate, the support table having a support section to support a substrate and a conditioning system to supply heat energy to and/or remove heat energy from the support section, wherein the conditioning system comprises a plurality of conditioning units that are independently controllable.Type: ApplicationFiled: December 20, 2019Publication date: April 23, 2020Applicant: AS ML NETHERLANDS B.V.Inventors: Johan Gertrudis Cornelis KUNNEN, Johannes Henricus Wilhelmus JACOBS, Coen Cornelis Wilhelmus VERSPAGET, Ronald VAN DER HAM, Ivo Adam Johannes THOMAS, Martijn HOUBEN, Thibault Simon Mathieu LAURENT, Gregory Martin Mason CORCORAN, Ruud Hendrikus Martinus Johannes BLOKS, Gerben PIETERSE, Pieter Lein Joseph GUNTER, Marinus Jan REMIE, Sander Catharina Reinier DERKS
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Patent number: 10551748Abstract: A fluid handling structure for a lithographic apparatus configured to contain immersion fluid to a region, the fluid handling structure having, at a boundary of a space: at least one gas knife opening in a radially outward direction of the space; and at least one gas supply opening in the radially outward direction of the at least gas knife opening relative to the space. The gas knife opening and the gas supply opening both provide substantially pure CO2 gas so as to provide a substantially pure CO2 gas environment adjacent to, and radially outward of, the space.Type: GrantFiled: December 7, 2015Date of Patent: February 4, 2020Assignee: ASML Netherlands B.V.Inventors: Cornelius Maria Rops, Walter Theodorus Matheus Stals, David Bessems, Giovanni Luca Gattobigio, Victor Manuel Blanco Carballo, Erik Henricus Egidius Catharina Eummelen, Ronald Van Der Ham, Frederik Antonius Van Der Zanden, Wilhelmus Antonius Wernaart
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Patent number: 10520837Abstract: A support table configured to support a substrate, the support table having a support section to support a substrate and a conditioning system to supply heat energy to and/or remove heat energy from the support section, wherein the conditioning system comprises a plurality of conditioning units that are independently controllable.Type: GrantFiled: February 16, 2018Date of Patent: December 31, 2019Assignee: ASML NETHERLANDS B.V.Inventors: Johan Gertrudis Cornelis Kunnen, Johannes Henricus Wilhelmus Jacobs, Coen Cornelis Wilhelmus Verspaget, Ronald Van Der Ham, Ivo Adam Johannes Thomas, Martijn Houben, Thibault Simon Mathieu Laurent, Gregory Martin Mason Corcoran, Ruud Hendrikus Martinus Johannes Bloks, Gerben Pieterse, Pieter Lein Joseph Gunter, Marinus Jan Remie, Sander Catharina Reinier Derks
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Publication number: 20190391499Abstract: A lithographic apparatus includes a substrate table, a post-exposure handling module, a substrate handling robot and a drying station. The substrate table is configured to support a substrate for an exposure process. The post-exposure handling module is configured to handle the substrate post-exposure. The substrate handling robot is configured to transfer the substrate from the substrate table along a substrate unloading path into the post-exposure handling module. The drying station is configured to actively remove liquid from a surface of the substrate. The drying station is located in the substrate unloading path. The drying station is located in the post-exposure handling module. The post-exposure handling module may be a substrate handler.Type: ApplicationFiled: September 9, 2019Publication date: December 26, 2019Applicant: ASML NETHERLANDS B.V.Inventors: Aart Adrianus VAN BEUZEKOM, Jozef Augustinus Maria Alberti, Hubert Marie Segers, Ronald Van Der Ham, Francis Fahrni, Ruud Olieslagers, Gerben Pieterse, Cornelius Maria Rops, Pepijn Van Den Eijnden, Paul Van Dongen, Bas Willems
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Patent number: 10409174Abstract: A lithographic apparatus includes a substrate table, a post-exposure handling module, a substrate handling robot and a drying station. The substrate table is configured to support a substrate for an exposure process. The post-exposure handling module is configured to handle the substrate post-exposure. The substrate handling robot is configured to transfer the substrate from the substrate table along a substrate unloading path into the post-exposure handling module. The drying station is configured to actively remove liquid from a surface of the substrate. The drying station is located in the substrate unloading path. The drying station is located in the post-exposure handling module. The post-exposure handling module may be a substrate handler.Type: GrantFiled: May 12, 2015Date of Patent: September 10, 2019Assignee: ASML NETHERLANDS B.V.Inventors: Aart Adrianus Van Beuzekom, Jozef Augustinus Maria Alberti, Hubert Marie Segers, Ronald Van Der Ham, Francis Fahrni, Ruud Olieslagers, Gerben Pieterse, Cornelius Maria Rops, Pepijn Van Den Eijnden, Paul Van Dongen, Bas Willems
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Patent number: 10324384Abstract: An immersion lithographic apparatus including: a liquid confinement structure configured to supply and confine immersion liquid to an immersion space between a final lens element of a projection system and a surface of the substrate and/or of a substrate table; and a passageway-former between the projection system and the liquid confinement structure, and a passageway between the passageway-former and an optically active part of the final lens element, the passageway being in liquid communication via an opening with the immersion space and extending radially outwardly, with respect to an optical axis of the projection system, at least to an edge of an exposed bottom surface of the final lens element and being constructed and configured such that in use it is filled with liquid from the immersion space by capillary action.Type: GrantFiled: June 4, 2015Date of Patent: June 18, 2019Assignee: ASML Netherlands B.V.Inventors: Gerben Pieterse, Theodorus Wilhelmus Polet, Johannes Jacobus Matheus Baselmans, Willem Jan Bouman, Theodorus Marinus Modderman, Cornelius Maria Rops, Bart Smeets, Koen Steffens, Ronald Van Der Ham
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Patent number: 10268127Abstract: A liquid confinement system for use in immersion lithography is disclosed in which the meniscus of liquid between the liquid confinement system and the substrate is pinned substantially in place by a meniscus pinning feature. The meniscus pinning feature comprises a plurality of discrete outlets arranged in a polygonal shape.Type: GrantFiled: May 8, 2017Date of Patent: April 23, 2019Assignee: ASML NETHERLANDS B.V.Inventors: Michel Riepen, Christiaan Alexander Hoogendam, Paulus Martinus Maria Liebregts, Ronald Van Der Ham, Wilhelmus Franciscus Johannes Simons, Daniël Jozef Maria Direcks, Paul Petrus Joannes Berkvens, Eva Mondt, Gert-Jan Gerardus Johannes Thomas Brands, Koen Steffens, Han Henricus Aldegonda Lempens, Mathieus Anna Karel Van Lierop, Christophe De Metsenaere, Marcio Alexandre Cano Miranda, Patrick Johannes Wilhelmus Spruytenburg, Joris Johan Anne-Marie Verstraete, Franciscus Johannes Joseph Janssen
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Patent number: 10222707Abstract: A lithographic apparatus having: a substrate table constructed to hold a substrate; a projection system configured to project a patterned radiation beam onto a target portion of the substrate; a substrate surface actuator including a fluid opening for fluid flow therethrough from/onto a facing surface facing the substrate surface actuator to generate a force between the substrate surface actuator and the facing surface, the facing surface being a top surface of the substrate or a surface substantially co-planar with the substrate; and a position controller to control the position and/or orientation of a part of the facing surface by varying fluid flow through the fluid opening to displace the part of the facing surface relative to the projection system.Type: GrantFiled: February 25, 2016Date of Patent: March 5, 2019Assignee: ASML Netherlands B.V.Inventors: Theodorus Wilhelmus Polet, Henrikus Herman Marie Cox, Ronald Van Der Ham, Wilhelmus Franciscus Johannes Simons, Jimmy Matheus Wilhelmus Van De Winkel, Gregory Martin Mason Corcoran, Frank Johannes Jacobus Van Boxtel
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Publication number: 20180284627Abstract: A support table configured to support a substrate, the support table having a support section to support a substrate and a conditioning system to supply heat energy to and/or remove heat energy from the support section, wherein the conditioning system comprises a plurality of conditioning units that are independently controllable.Type: ApplicationFiled: February 16, 2018Publication date: October 4, 2018Applicant: ASML NETHERLANDS B.V.Inventors: Johan Gertrudis Cornelis Kunnen, Johannes Henricus Wilhelmus Jacobs, Coen Cornelis Wilhelmus Verspaget, Ronald Van Der Ham, Ivo Adam Johannes Thomas, Martijn Houben, Thibault Simon Mathieu Laurent, Gregory Martin Mason Corcoran, Ruud Hendrikus Martinus Johannes Bloks, Gerben Pieterse, Pieter Lein Joseph Gunter, Marinus Jan Remie, Sander Catharina Reinier Derks
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Publication number: 20180210350Abstract: An immersion lithographic apparatus including: a liquid confinement structure configured to supply and confine immersion liquid to an immersion space between a final lens element of a projection system and a surface of the substrate and/or of a substrate table; and a passageway-former between the projection system and the liquid confinement structure, and a passageway between the passageway-former and an optically active part of the final lens element, the passageway being in liquid communication via an opening with the immersion space and extending radially outwardly, with respect to an optical axis of the projection system, at least to an edge of an exposed bottom surface of the final lens element and being constructed and configured such that in use it is filled with liquid from the immersion space by capillary action.Type: ApplicationFiled: June 4, 2015Publication date: July 26, 2018Applicant: ASML NETHERLANDS B.V.Inventors: Gerben PIETERSE, Theodorus Wilhelmus POLET, Johannes Jacobus Matheus BASELMANS, Willem Jan BOUMAN, Theodorus Marinus MODDERMAN, Cornelius Maria ROPS, Bart SMEETS, Koen STEFFENS, Ronald VAN DER HAM
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Patent number: 10001712Abstract: An immersion lithographic apparatus includes a projection system. The projection system is configured to project a patterned radiation beam through an immersion liquid onto a target portion of a substrate. An external surface of the projection system includes a first surface. The first surface has a non-planar shape. An element is attached to the first surface and positioned so that at least a portion of the element contacts the immersion liquid in use. The element includes a closed loop of continuously integral material in a preformed state and conforms to the non-planar shape of the first surface.Type: GrantFiled: June 26, 2015Date of Patent: June 19, 2018Assignee: ASML NETHERLANDS B.V.Inventors: Theodorus Wilhelmus Polet, Johannes Jacobus Matheus Baselmans, Willem Jan Bouman, Han Henricus Aldegonda Lempens, Theodorus Marinus Modderman, Cornelius Maria Rops, Bart Smeets, Koen Steffens, Ronald Van Der Ham
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Patent number: 9904177Abstract: A fluid handling structure, lithographic apparatus and device manufacturing method are disclosed. According to a disclosed embodiment, the fluid handling structure is configured to confine an immersion fluid in a space between a final element of a projection system and a facing surface during movement of the facing surface relative to the structure, wherein the structure has at least one heater to heat a portion of the facing surface adjacent to the heater, the at least one heater having a fluid heater to heat fluid flow from the structure onto the facing surface, the heater thereby heating the portion.Type: GrantFiled: August 22, 2012Date of Patent: February 27, 2018Assignee: ASML NETHERLANDS B.V.Inventors: Ivo Adam Johannes Thomas, Coen Cornelis Wilhelmus Verspaget, Ronald Van Der Ham, Thibault Simon Mathieu Laurent, Gregory Martin Mason Corcoran, Ruud Hendrikus Martinus Johannes Bloks, Gerben Pieterse, Pieter Lein Joseph Gunter
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Patent number: 9897928Abstract: A support table configured to support a substrate, the support table having a support section to support a substrate and a conditioning system to supply heat energy to and/or remove heat energy from the support section, wherein the conditioning system comprises a plurality of conditioning units that are independently controllable.Type: GrantFiled: August 15, 2012Date of Patent: February 20, 2018Assignee: ASML Netherlands B.V.Inventors: Johan Gertrudis Cornelis Kunnen, Johannes Henricus Wilhelmus Jacobs, Coen Cornelis Wilhelmus Verspaget, Ronald Van Der Ham, Ivo Adam Johannes Thomas, Martijn Houben, Thibault Simon Mathieu Laurent, Gregory Martin Mason Corcoran, Ruud Hendrikus Martinus Johannes Bloks, Gerben Pieterse, Pieter Lein Joseph Gunter, Marinus Jan Remie, Sander Catharina Reinier Derks
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Publication number: 20170363948Abstract: A fluid handling structure for a lithographic apparatus configured to contain immersion fluid to a region, the fluid handling structure having, at a boundary of a space: at least one gas knife opening in a radially outward direction of the space; and at least one gas supply opening in the radially outward direction of the at least gas knife opening relative to the space. The gas knife opening and the gas supply opening both provide substantially pure CO2 gas so as to provide a substantially pure CO2 gas environment adjacent to, and radially outward of, the space.Type: ApplicationFiled: December 7, 2015Publication date: December 21, 2017Inventors: Cornelius Maria ROPS, Walter Theodorus Matheus STALS, David BESSEMS, Giovanni Luca GATTOBIGIO, Victor Manuel BLANCO CARBALLO, Erik Henricus Egidius Catharina EUMMELEN, Ronald VAN DER HAM, Frederik Antonius VAN DER ZANDEN, Wilhelmus Antonius WERNAART
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Publication number: 20170242348Abstract: A liquid confinement system for use in immersion lithography is disclosed in which the meniscus of liquid between the liquid confinement system and the substrate is pinned substantially in place by a meniscus pinning feature. The meniscus pinning feature comprises a plurality of discrete outlets arranged in a polygonal shape.Type: ApplicationFiled: May 8, 2017Publication date: August 24, 2017Applicant: ASML NETHERLANDS B.V.Inventors: Michel RIEPEN, Christiaan Alexander HOOGENDAM, Paulus Martinus Maria LIEBREGTS, Ronald VAN DER HAM, Wilhelmus Franciscus Johannes SIMONS, Daniël Jozef Maria DIRECKS, Paul Petrus Joannes BERKVENS, Eva MONDT, Gert-Jan Gerardus Johannes Thomas BRANDS, Koen STEFFENS, Han Henricus Aldegonda LEMPENS, Mathieus Anna Karel VAN LIEROP, Christophe DE METSENAERE, Marcio Alexandre Cano MIRANDA, Patrick Johannes Wilhelmus SPRUYTENBURG, Joris Johan Anne-Marie VERSTRAETE, Franciscus Johannes Joseph JANSSEN