Patents by Inventor Ronald Van Der Ham
Ronald Van Der Ham has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Patent number: 8149379Abstract: The use of electro wetting to control the behavior of immersion liquid within an immersion lithographic apparatus is disclosed.Type: GrantFiled: December 1, 2008Date of Patent: April 3, 2012Assignee: ASML Netherlands B.V.Inventors: Sjoerd Nicolaas Lambertus Donders, Nicolaas Ten Kate, Lucas Henricus Johannes Stevens, Ronald Van Der Ham, Michel Riepen
-
Publication number: 20110292357Abstract: A fluid handling structure to confine immersion liquid in a space between a projection system and a facing surface of a substrate, of a table to support the substrate, or both, is disclosed. The fluid handling structure includes a transponder to dissolve at least some of the gas in a bubble in the immersion liquid or to control a bubble in the immersion liquid so that it avoids entering an optical path of a beam from the projection system.Type: ApplicationFiled: May 2, 2011Publication date: December 1, 2011Applicant: ASML NETHERLANDS B.V.Inventors: Ronald Van Der Ham, Martinus Hendrikus Antonius Leenders, Johannes Catharinus Hubertus Mulkens, Richard Moerman, Michel Riepen, Sergei Shulepov, Koen Steffens, Jan Willem Cromwijk, Johanna Antoinette Maria Sondag-Huethorst, Marco Baragona, Robertus Leonardus Maria In 'T Groen, Ralph Theodorus Hubertus Maessen, Jacob Marinus Jan Den Toonder, Milica Kovacevic-Milivojevic
-
Publication number: 20110188049Abstract: An assembly including a conditioning system and an object moveable into and/or out of an area to be conditioned is disclosed. The conditioning system has fluid outlet passages to supply conditioning fluid to the area to be conditioned and is configured to adjust outflow of the conditioning fluid from the fluid outlet passages depending on a position of the object.Type: ApplicationFiled: April 11, 2011Publication date: August 4, 2011Applicant: ASML Netherlands B.V.Inventors: Ronald VAN DER HAM, Tjarko Adriaan Rudolf Van Empel, Herman Vogel, Niek Jacobus Johannes Roset
-
Patent number: 7924399Abstract: An assembly including a conditioning system and an object movable into and/or out of an area to be conditioned is disclosed. The conditioning system has fluid outlet passages to supply conditioning fluid to the area to be conditioned and is configured to adjust outflow of the conditioning fluid from the fluid outlet passages depending on a position of the object.Type: GrantFiled: March 27, 2006Date of Patent: April 12, 2011Assignee: ASML Netherlands B.V.Inventors: Ronald Van Der Ham, Tjarko Adriaan Rudolf Van Empel, Herman Vogel, Niek Jacobus Johannes Roset
-
Publication number: 20110005603Abstract: A fluid handling structure configured to supply and confine immersion liquid to a space defined between a projection system and a facing surface facing the fluid handling structure is disclosed. The fluid handling structure includes a supply passage formed therein for the passage of fluid from outside the fluid handling structure to the space, and a thermal isolator positioned adjacent the supply passage at least partly to isolate fluid in the supply passage from a thermal load induced in the fluid handling structure.Type: ApplicationFiled: June 22, 2010Publication date: January 13, 2011Applicant: ASML Netherlands B.V.Inventors: Hrishikesh Patel, Johannes Henricus Wilhelmus Jacobs, Paulus Martinus Maria Liebregts, Ronald Van Der Ham, Wilhelmus Franciscus Johannes Simons, Daniel Jozef Maria Direcks, Franciscus Johannes Joseph Janssen, Paul Petrus Joannes Berkvens, Gert-Jan Gerardus Johannes Thomas Brands, Koen Steffens, Han Henricus Aldegonda Lempens, Matheus Anna Karel Van Lierop, Christophe De Metsenaere, Marcio Alexandre Cano Miranda, Patrick Johannes Wilhelmus Spruytenburg, Joris Johan Anne-Marie Verstraete, Ruud Hendricus Martinus Johannes Bloks
-
Publication number: 20100231875Abstract: An immersion lithographic apparatus is provided with an electrode set to remove unwanted droplets of an immersion fluid from a particular surface. Unwanted droplets of immersion fluid may form on any number of different surfaces of the immersion apparatus, such as on a liquid barrier member. If allowed to evaporate and/or dry, these droplets may cause a problem such as uncontrolled heat loading of the apparatus and/or staining of the surface. An electrode set is provided on a surface where the droplets are likely to be formed. A controlled voltage is applied to the electrodes within the electrode set in order to electrostatically remove the droplets from the surface.Type: ApplicationFiled: December 1, 2008Publication date: September 16, 2010Applicant: ASML Netherlands B.V.Inventors: Nicolaas TEN KATE, Willem VENEMA, Ronald VAN DER HAM
-
Patent number: 7728951Abstract: A lithographic apparatus is disclosed that includes a first gas shower configured to supply a first gas flow to an interior space of the apparatus, and a second gas shower configured to supply a second gas flow to the interior space of the apparatus, the gas showers configured to direct the first gas flow and the second gas flow at least partly towards each other. Also, a method for conditioning an interior space of a device manufacturing apparatus is provided that includes supplying a first conditioned gas flow and a second conditioned gas flow to the interior space, such that the first conditioned gas flow and the second conditioned gas flow are at least partly directed to each other.Type: GrantFiled: September 29, 2005Date of Patent: June 1, 2010Assignee: ASML Netherlands B.V.Inventors: Tjarko Adriaan Rudolf Van Empel, Ronald Van Der Ham, Niek Jacobus Johannes Roset
-
Publication number: 20100110410Abstract: A seal between a table and a component in a lithographic apparatus is disclosed. The seal bridges a gap between the component and the table when the component is in a position relative to the table. The component is moveable, in use, relative to the table and in an embodiment is attached to the table. The seal may be integral with the component or the table.Type: ApplicationFiled: October 27, 2009Publication date: May 6, 2010Applicant: ASML NETHERLANDS B.V.Inventors: KOEN STEFFENS, RONALD VAN DER HAM, ERIK HENRICUS EGIDIUS CATHARINA EUMMELEN
-
Publication number: 20090237632Abstract: An immersion lithographic apparatus is described in which a droplet removal device removes droplets from the substrate, e.g. during exposures, using an angled flow of gas from a gas knife.Type: ApplicationFiled: March 20, 2009Publication date: September 24, 2009Applicant: ASML NETHERLANDS B.V.Inventors: Daniel Jozef Maria Direcks, Nicolaas Rudolf Kemper, Paulus Martinus Maria Liebregts, Ronald Van Der Ham, Wilhelmus Franciscus Johannes Simons, Danny Maria Hubertus Philips, Gert-Jan Gerardus Johannes Thomas Brands, Koen Steffens, Han Henricus Aldegonda Lempens, Marcus Johannes Van Der Zanden, Pieter Mulder
-
Patent number: 7561250Abstract: A lithographic apparatus is disclosed having a removable adhesive film carrying a coating on at least a part of the apparatus. In an embodiment, a liquid supply system having a liquid confinement structure extending along at least part of a boundary of a space between a projection system and a substrate support is disclosed, wherein the film carrying the coating is on at least part of the liquid confinement structure.Type: GrantFiled: June 19, 2007Date of Patent: July 14, 2009Assignee: ASML Netherlands B.V.Inventors: Paulus Martinus Maria Liebregts, Menno Fien, Erik Roelof Loopstra, Ronald Van Der Ham, Wilhelmus Franciscus Johannes Simons, Daniel Jozef Maria Direcks, Franciscus Johannes Joseph Janssen, Gert-Jan Gerardus Johannes Thomas Brands, Koen Steffens
-
Publication number: 20090168032Abstract: The use of electro wetting to control the behavior of immersion liquid within an immersion lithographic apparatus is disclosed.Type: ApplicationFiled: December 1, 2008Publication date: July 2, 2009Applicant: ASML NETHERLANDS B.V.Inventors: Nicolaas Ten Kate, Willem Jurrianus Venema, Ronald Van Der Ham
-
Publication number: 20090168037Abstract: An immersion lithographic projection apparatus is disclosed. The apparatus includes a substrate table for holding a substrate and a liquid supply system for supply liquid to the substrate. The apparatus is constructed and arranged to allow the liquid to flow off the substrate and over at least two edges of a top surface of the substrate table. The geometry of the edge may be optimized to reduce a static thickness of a layer of liquid on the top surface.Type: ApplicationFiled: December 1, 2008Publication date: July 2, 2009Applicant: ASML NETHERLANDS B.V.Inventors: Roger Johannes Maria Hubertus Kroonen, Sebastiaan Maria Johannes Cornelissen, Sjoerd Nicolaas Lambertus Donders, Nicolaas Ten Kate, Ronald Van Der Ham, Niek Jacobus Johannes Roset, Fransiscus Mathijs Jacobs, Michel Riepen, Gerardus Arnoldus Hendricus Fanciscus Janssen, Reinder Wietse Roos, Mattijs Hogeland
-
Publication number: 20090161083Abstract: The use of electro wetting to control the behavior of immersion liquid within an immersion lithographic apparatus is disclosed.Type: ApplicationFiled: December 1, 2008Publication date: June 25, 2009Applicant: ASML NETHERLANDS B.V.Inventors: Sjoerd Nicolaas Lambertus Donders, Nicolaas Ten Kate, Lucas Henricus Johannes Stevens, Ronald Van Der Ham, Michel Riepen
-
Publication number: 20090147227Abstract: A liquid handling system is disclosed in which an extractor to contain liquid in a space between the projection system of a lithographic apparatus and a substrate has, in plan, a shape with a single corner. The extractor is provided in a rotatable part of a liquid handling system. The rotatable part is rotated under the control of a controller.Type: ApplicationFiled: December 2, 2008Publication date: June 11, 2009Applicant: ASML NETHERLANDS B.V.Inventors: Koen Steffens, Paulus Martinus Maria Liebregts, Ronald Van Der Ham, Daniel Jozef Maria Direcks, Gert-Jan Gerardus Johannes Thomas Brands
-
Publication number: 20090073395Abstract: An immersion lithographic apparatus is disclosed that includes a fluid confinement system configured to confine fluid to a space between a projection system and a substrate. The fluid confinement system includes a fluid inlet to supply fluid, the fluid inlet connected to an inlet port and an outlet port. The immersion lithographic apparatus further includes a fluid supply system configured to control fluid flow through the fluid inlet by varying the flow rate of fluid provided to the inlet port and the flow rate of fluid removed from the outlet port.Type: ApplicationFiled: September 13, 2007Publication date: March 19, 2009Applicant: ASML NETHERLANDS B.V.Inventors: Paul Petrus Joannes Berkvens, Roelof Frederik De Graaf, Paulus Martinus Maria Liebregts, Ronald Van Der Ham, Wilhelmus Franciscus Simons, Daniel Jozef Maria Direcks, Franciscus Johannes Joseph Janssen, Paul William Scholtes-Van Eijk, Gert-Jan Gerardus Brands, Koen Steffens, Han Henricus Aldegonda Lempens, Mathieus Anna Karel Van Lierop, Christophe De Metsenaere, Marcio Alexandre Cano Miranda, Patrick Johannes Spruytenburg, Joris Johan Verstraete
-
Publication number: 20080316441Abstract: A lithographic apparatus is disclosed having a removable adhesive film carrying a coating on at least a part of the apparatus. In an embodiment, a liquid supply system having a liquid confinement structure extending along at least part of a boundary of a space between a projection system and a substrate support is disclosed, wherein the film carrying the coating is on at least part of the liquid confinement structure.Type: ApplicationFiled: June 19, 2007Publication date: December 25, 2008Applicant: ASML NETHERLAND B.V.Inventors: Paulus Martinus Maria Liebregts, Menno Fien, Erik Roelof Loopstra, Ronald Van Der Ham, Wilhelmus Franciscus Johannes Simons, Daniel Jozef Maria Direcks, Franciscus Johannes Joseph Janssen, Gert-Jan Gerardus Johannes Thomas Brands, Koen Steffens
-
Patent number: 7432513Abstract: A gas shower to condition at least one optical path in an optical apparatus, wherein the gas shower includes a gas distribution chamber having a shower outlet side to supply gas to the optical path, the gas distribution chamber being configured to distribute the gas to the optical path, wherein the gas distribution chamber includes a substantially sharp tapered tip.Type: GrantFiled: October 21, 2005Date of Patent: October 7, 2008Assignee: ASML Netherlands B.V.Inventors: Tjarko Adriaan Rudolf Van Empel, Ronald Van Der Ham, Niek Jacobus Johannes Roset
-
Publication number: 20080212046Abstract: A liquid confinement system for use in immersion lithography is disclosed in which the meniscus of liquid between the liquid confinement system and the substrate is pinned substantially in place by a meniscus pinning feature. The meniscus pinning feature comprises a plurality of discrete outlets arranged in a polygonal shape.Type: ApplicationFiled: November 30, 2007Publication date: September 4, 2008Applicant: ASML NETHERLANDS B.V.Inventors: Michel Riepen, Christiaan Alexander Hoogendam, Paulus Martinus Maria Liebregts, Ronald Van Der Ham, Wilhelmus Franciscus Johannes Simons, Daniel Josef Maria Direcks, Paul Petrus Joannes Berkvens, Eva Mondt, Gert-Jan Gerardus Johannes Thomas Brands, Koen Steffens, Han Henricus Aldegonda Lempens, Mathieus Anna Karel Van Lierop, Christophe De Metsenaere, Marcio Alexandre Cano Miranda, Patrick Johannes Wilhelmus Spruytenburg, Joris Johan Anne-Marie Verstraete
-
Patent number: 7253875Abstract: A lithographic apparatus includes a measurement system to measure the position and/or movement of a substrate support relative to a reference frame. The measurement system includes a target mounted to one of the substrate support and the reference frame, a radiation source mounted to the other one of the substrate support and the reference frame and a sensor configured to detect a pattern of radiation propagating from the target, indicating the position or movement of the substrate support. The substrate support includes one or more gas outlets configured to provide a flow of gas that encapsulates the volume of space through which the beam of radiation propagates to the target.Type: GrantFiled: March 3, 2006Date of Patent: August 7, 2007Assignee: ASML Netherlands B.V.Inventors: Bernardus Antonius Johannes Luttikhuis, Engelbertus Antonius Fransiscus Van Der Pasch, Ronald Van Der Ham, Niek Jacobus Johannes Roset
-
Patent number: 7227612Abstract: A lithographic apparatus includes a support constructed to support a patterning device that is capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate table constructed to hold a substrate, a projection system configured to project the patterned radiation beam onto a target portion of the substrate, an interior space through which an interferometer beam propagates, and a first gas supply for supplying a purge gas to inhibit contamination of the projection system. The purge gas has a predetermined refractive index. The apparatus also includes a second gas supply for supplying a conditioning gas to the interior space for conditioning the interior space, and a refractive index matching system arranged to match the refractive index of the conditioning gas to the predetermined refractive index of the purge gas.Type: GrantFiled: September 10, 2004Date of Patent: June 5, 2007Assignee: ASML Netherlands B.V.Inventors: Antonius Johannes Van Der Net, Tjarko Adriaan Rudolf Van Empel, Ronald Van Der Ham