Patents by Inventor Ronald Van Der Ham
Ronald Van Der Ham has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20170219939Abstract: An immersion lithographic apparatus includes a projection system. The projection system is configured to project a patterned radiation beam through an immersion liquid onto a target portion of a substrate. An external surface of the projection system includes a first surface. The first surface has a non-planar shape. An element is attached to the first surface and positioned so that at least a portion of the element contacts the immersion liquid in use. The element includes a closed loop of continuously integral material in a preformed state and conforms to the non-planar shape of the first surface.Type: ApplicationFiled: June 26, 2015Publication date: August 3, 2017Applicant: ASML Netherlands B.V.Inventors: Theodorus Wilhelmus POLET, Johannes Jacobus BASELMANS, Willem Jan BOUMAN, Han Henricus Aldegonda LEMPENS, Theodorus Marinus MODDERMAN, Cornelius Maria ROPS, Bart SMEETS, Koen STEFFENS, Ronald VAN DER HAM
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Patent number: 9645506Abstract: A liquid confinement system for use in immersion lithography is disclosed in which the meniscus of liquid between the liquid confinement system and the substrate is pinned substantially in place by a meniscus pinning feature. The meniscus pinning feature comprises a plurality of discrete outlets arranged in a polygonal shape.Type: GrantFiled: December 13, 2013Date of Patent: May 9, 2017Assignee: ASML NETHERLANDS B.V.Inventors: Michel Riepen, Christiaan Alexander Hoogendam, Paulus Martinus Maria Liebregts, Ronald Van Der Ham, Wilhelmus Franciscus Johannes Simons, Daniël Jozef Maria Direcks, Paul Petrus Joannes Berkvens, Eva Mondt, Gert-Jan Gerardus Johannes Thomas Brands, Koen Steffens, Han Henricus Aldegonda Lempens, Mathieus Anna Karel Van Lierop, Christophe De Metsenaere, Marcio Alexandre Cano Miranda, Patrick Johannes Wilhelmus Spruytenburg, Joris Johan Anne-Marie Verstraete, Franciscus Johannes Joseph Janssen
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Publication number: 20170108781Abstract: A lithographic apparatus includes a substrate table, a post-exposure handling module, a substrate handling robot and a drying station. The substrate table is configured to support a substrate for an exposure process. The post-exposure handling module is configured to handle the substrate post-exposure. The substrate handling robot is configured to transfer the substrate from the substrate table along a substrate unloading path into the post-exposure handling module. The drying station is configured to actively remove liquid from a surface of the substrate. The drying station is located in the substrate unloading path. The drying station is located in the post-exposure handling module. The post-exposure handling module may be a substrate handler.Type: ApplicationFiled: May 12, 2015Publication date: April 20, 2017Applicant: ASML NETHERLANDS B.V.Inventors: Aart Adrianus VAN BEUZEKOM, Jozef Augustinus Maria ALBERTI, Hubert Marie SEGERS, Ronald VAN DER HAM, Francis FAHRNI, Ruud OLIESLAGERS, Gerben PIETERSE, Cornelius Maria ROPS, Pepijn VAN DEN EIJNDEN, Paul VAN DONGEN, Bas WILLEMS
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Publication number: 20160179015Abstract: A lithographic apparatus having: a substrate table constructed to hold a substrate; a projection system configured to project a patterned radiation beam onto a target portion of the substrate; a substrate surface actuator including a fluid opening for fluid flow therethrough from/onto a facing surface facing the substrate surface actuator to generate a force between the substrate surface actuator and the facing surface, the facing surface being a top surface of the substrate or a surface substantially co-planar with the substrate; and a position controller to control the position and/or orientation of a part of the facing surface by varying fluid flow through the fluid opening to displace the part of the facing surface relative to the projection system.Type: ApplicationFiled: February 25, 2016Publication date: June 23, 2016Applicant: ASML NETHERLANDS B.V.Inventors: Theodorus Wilhelmus POLET, Henrikus Herman Marie COX, Ronald VAN DER HAM, Wilhelmus Franciscus Johannes SIMONS, Jimmy Matheus Wilhelmus VAN DE WINKEL, Gregory Martin Mason CORCORAN, Frank Johannes Jacobus VAN BOXTEL
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Patent number: 9274436Abstract: A lithographic apparatus having: a substrate table constructed to hold a substrate; a projection system configured to project a patterned radiation beam onto a target portion of the substrate; a substrate surface actuator including a fluid opening for fluid flow therethrough from/onto a facing surface facing the substrate surface actuator to generate a force between the substrate surface actuator and the facing surface, the facing surface being a top surface of the substrate or a surface substantially co-planar with the substrate; and a position controller to control the position and/or orientation of a part of the facing surface by varying fluid flow through the fluid opening to displace the part of the facing surface relative to the projection system.Type: GrantFiled: December 4, 2012Date of Patent: March 1, 2016Assignee: ASML NETHERLANDS B.V.Inventors: Theodorus Wilhelmus Polet, Henrikus Herman Marie Cox, Ronald Van Der Ham, Wilhelmus Franciscus Johannes Simons, Jimmy Matheus Wilhelmus Van De Winkel, Gregory Martin Mason Corcoran, Frank Johannes Jacobus Van Boxtel
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Patent number: 9195147Abstract: A seal between a table and a component in a lithographic apparatus is disclosed. The seal bridges a gap between the component and the table when the component is in a position relative to the table. The component is moveable, in use, relative to the table and in an embodiment is attached to the table. The seal may be integral with the component or the table.Type: GrantFiled: October 27, 2009Date of Patent: November 24, 2015Assignee: ASML NETHERLANDS B.V.Inventors: Koen Steffens, Ronald Van Der Ham, Erik Henricus Egidius Catharina Eummelen
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Patent number: 8711326Abstract: A fluid handling structure to confine immersion liquid in a space between a projection system and a facing surface of a substrate, of a table to support the substrate, or both, is disclosed. The fluid handling structure includes a transponder to dissolve at least some of the gas in a bubble in the immersion liquid or to control a bubble in the immersion liquid so that it avoids entering an optical path of a beam from the projection system.Type: GrantFiled: May 2, 2011Date of Patent: April 29, 2014Assignee: ASML Netherlands B.V.Inventors: Ronald Van Der Ham, Martinus Hendrikus Antonius Leenders, Johannes Catharinus Hubertus Mulkens, Richard Moerman, Michel Riepen, Sergei Shulepov, Koen Steffens, Jan Willem Cromwijk, Johanna Antoinette Maria Sondag-Huethorst, Marco Baragona, Robertus Leonardus Maria In 'T Groen, Ralph Theodorus Hubertus Maessen, Jacob Marinus Jan Den Toonder, Milica Kovacevic-Milivojevic
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Publication number: 20140098353Abstract: A liquid confinement system for use in immersion lithography is disclosed in which the meniscus of liquid between the liquid confinement system and the substrate is pinned substantially in place by a meniscus pinning feature. The meniscus pinning feature comprises a plurality of discrete outlets arranged in a polygonal shape.Type: ApplicationFiled: December 13, 2013Publication date: April 10, 2014Applicant: ASML NETHERLANDS B.V.Inventors: Michel RIEPEN, Christiaan Alexander Hoogendam, Paulus Martinus Maria Liebregts, Ronald Van Der Ham, Wilhelmus Franciscus Johannes Simons, Daniël Jozef Maria Direcks, Paul Petrus Joannes Berkvens, Eva Mondt, Gert-Jan Gerardus Johannes Thomas Brands, Koen Steffens, Han Henricus Aldegonda Lempens, Mathieus Anna Karel Van Lierop, Christophe De Metsenaere, Marcio Alexandre Cano Miranda, Patrick Johannes Wilhelmus Spruytenburg, Joris Johan Anne-Marie Verstraete
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Patent number: 8681308Abstract: An immersion lithographic apparatus is disclosed that includes a fluid confinement system configured to confine fluid to a space between a projection system and a substrate. The fluid confinement system includes a fluid inlet to supply fluid, the fluid inlet connected to an inlet port and an outlet port. The immersion lithographic apparatus further includes a fluid supply system configured to control fluid flow through the fluid inlet by varying the flow rate of fluid provided to the inlet port and the flow rate of fluid removed from the outlet port.Type: GrantFiled: September 13, 2007Date of Patent: March 25, 2014Assignee: ASML Netherlands B.V.Inventors: Paul Petrus Joannes Berkvens, Roelof Frederik De Graaf, Paulus Martinus Maria Liebregts, Ronald Van Der Ham, Wilhelmus Franciscus Johannes Simons, Daniel Jozef Maria Direcks, Franciscus Johannes Joseph Janssen, Paul William Scholtes-Van Eijk, Gert-Jan Gerardus Johannes Thomas Brands, Koen Steffens, Han Henricus Aldegonda Lempens, Mathieus Anna Karel Van Lierop, Christophe De Metsenaere, Marcio Alexandre Cano Miranda, Patrick Johannes Wilhelmus Spruytenburg, Joris Johan Anne-Marie Verstraete
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Patent number: 8675169Abstract: A gas manifold to direct a gas flow between two plates of an optical component of a lithographic apparatus, the gas manifold having an inlet, a diffuser downstream of the inlet, a flow straightener downstream of the inlet, a contractor downstream of the flow straightener, and an outlet downstream of the contractor.Type: GrantFiled: October 14, 2011Date of Patent: March 18, 2014Assignee: ASML Netherlands B.V.Inventors: Frank Johannes Jacobus Van Boxtel, Marinus Johannes Maria Van Dam, Johannes Christiaan Maria Jasper, Ronald Van Der Ham, Sergei Yurievich Shulepov, Gerben Pieterse, Marco Baragona, Pieter Debrauwer, Antonius Arnoldus Henricus Van Der Steen
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Patent number: 8634053Abstract: A liquid confinement system for use in immersion lithography is disclosed in which the meniscus of liquid between the liquid confinement system and the substrate is pinned substantially in place by a meniscus pinning feature. The meniscus pinning feature comprises a plurality of discrete outlets arranged in a polygonal shape.Type: GrantFiled: November 30, 2007Date of Patent: January 21, 2014Assignee: ASML Netherlands B.V.Inventors: Michel Riepen, Christiaan Alexander Hoogendam, Paulus Martinus Maria Liebregts, Ronald Van Der Ham, Wilhelmus Franciscus Johannes Simons, Daniel Jozef Maria Direcks, Paul Petrus Joannes Berkvens, Eva Mondt, Gert-Jan Gerardus Johannes Thomas Brands, Koen Steffens, Han Henricus Aldegonda Lempens, Mathieus Anna Karel Van Lierop, Christophe De Metsenaere, Marcio Alexandre Cano Miranda, Patrick Johannes Wilhelmus Spruytenburg, Joris Johan Anne-Marie Verstraete
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Patent number: 8472003Abstract: A fluid handling structure configured to supply and confine immersion liquid to a space defined between a projection system and a facing surface facing the fluid handling structure is disclosed. The fluid handling structure includes a supply passage formed therein for the passage of fluid from outside the fluid handling structure to the space, and a thermal isolator positioned adjacent the supply passage at least partly to isolate fluid in the supply passage from a thermal load induced in the fluid handling structure.Type: GrantFiled: June 22, 2010Date of Patent: June 25, 2013Assignee: ASML Netherlands B.V.Inventors: Hrishikesh Patel, Johannes Henricus Wilhelmus Jacobs, Paulus Martinus Maria Liebregts, Ronald Van Der Ham, Wilhelmus Franciscus Johannes Simons, Daniel Jozef Maria Direcks, Franciscus Johannes Joseph Janssen, Paul Petrus Joannes Berkvens, Gert-Jan Geradus Johannes Thomas Brands, Koen Steffens, Han Henricus Aldegonda Lempens, Matheus Anna Karel Van Lierop, Christophe De Metsenaere, Marcio Alexandre Cano Miranda, Patrick Johannes Wilhelmus Spruytenburg, Joris Johan Anne-Marie Verstraete, Ruud Hendrikus Martinus Johannes Bloks
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Publication number: 20130149649Abstract: A lithographic apparatus having: a substrate table constructed to hold a substrate; a projection system configured to project a patterned radiation beam onto a target portion of the substrate; a substrate surface actuator including a fluid opening for fluid flow therethrough from/onto a facing surface facing the substrate surface actuator to generate a force between the substrate surface actuator and the facing surface, the facing surface being a top surface of the substrate or a surface substantially co-planar with the substrate; and a position controller to control the position and/or orientation of a part of the facing surface by varying fluid flow through the fluid opening to displace the part of the facing surface relative to the projection system.Type: ApplicationFiled: December 4, 2012Publication date: June 13, 2013Applicant: ASML Netherlands B.V.Inventors: Theodorus Wilhelmus POLET, Henrikus Herman Marie Cox, Ronald Van Der Ham, Wilhelmus Franciscus Johannes Simons, Jimmy Matheus Wilhelmus Van De Winkel, Gregory Martin Mason Corcoran, Frank Johannes Jacobus Van Boxtel
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Patent number: 8441610Abstract: An assembly including a conditioning system and an object moveable into and/or out of an area to be conditioned is disclosed. The conditioning system has fluid outlet passages to supply conditioning fluid to the area to be conditioned and is configured to adjust outflow of the conditioning fluid from the fluid outlet passages depending on a position of the object.Type: GrantFiled: April 11, 2011Date of Patent: May 14, 2013Assignee: ASML Netherlands B.V.Inventors: Ronald Van Der Ham, Tjarko Adriaan Rudolf Van Empel, Herman Vogel, Niek Jacobus Johannes Roset
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Publication number: 20130050665Abstract: A fluid handling structure, lithographic apparatus and device manufacturing method are disclosed. According to a disclosed embodiment, the fluid handling structure is configured to confine an immersion fluid in a space between a final element of a projection system and a facing surface during movement of the facing surface relative to the structure, wherein the structure has at least one heater to heat a portion of the facing surface adjacent to the heater, the at least one heater having a fluid heater to heat fluid flow from the structure onto the facing surface, the heater thereby heating the portion.Type: ApplicationFiled: August 22, 2012Publication date: February 28, 2013Applicant: ASML NETHERLANDS B.V.Inventors: Ivo Adam Johannes Thomas, Coen Cornelis Wilhelmus Verspaget, Ronald Van Der Ham, Thibault Simon Mathieu Laurent, Gregory Martin Mason Corcoran, Ruud Hendrikus Martinus Johannes Bloks, Gerben Pieterse, Pieter Lein Joseph Gunter
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Publication number: 20130045447Abstract: A support table configured to support a substrate, the support table having a support section to support a substrate and a conditioning system to supply heat energy to and/or remove heat energy from the support section, wherein the conditioning system comprises a plurality of conditioning units that are independently controllable.Type: ApplicationFiled: August 15, 2012Publication date: February 21, 2013Applicant: ASML NETHERLANDS B.V.Inventors: Johan Gertrudis Cornelis Kunnen, Johannes Henricus Wilhelmus Jacobs, Coen Cornelis Wilhelmus Verspaget, Ronald Van Der Ham, Ivo Adam Johannes Thomas, Martijn Houben, Thibault Simon Mathieu Laurent, Gregory Martin Mason Corcoran, Ruud Hendrikus Martinus Johannes Bloks, Gerben Pieterse, Pieter Lein Joseph Gunter, Marinus Jan Remie, Sander Catharina Reinier Derks
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Patent number: 8279396Abstract: An immersion lithographic apparatus is provided with an electrode set to remove unwanted droplets of an immersion fluid from a particular surface. Unwanted droplets of immersion fluid may form on any number of different surfaces of the immersion apparatus, such as on a liquid barrier member. If allowed to evaporate and/or dry, these droplets may cause a problem such as uncontrolled heat loading of the apparatus and/or staining of the surface. An electrode set is provided on a surface where the droplets are likely to be formed. A controlled voltage is applied to the electrodes within the electrode set in order to electrostatically remove the droplets from the surface.Type: GrantFiled: December 1, 2008Date of Patent: October 2, 2012Assignee: ASML Netherlands B.V.Inventors: Nicolaas Ten Kate, Willem Jurrianus Venema, Ronald Van Der Ham
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Patent number: 8259283Abstract: An immersion lithographic apparatus is described in which a droplet removal device removes droplets from the substrate, e.g. during exposures, using an angled flow of gas from a gas knife.Type: GrantFiled: March 20, 2009Date of Patent: September 4, 2012Assignee: ASML Netherlands B.V.Inventors: Daniël Jozef Maria Direcks, Nicolaas Rudolf Kemper, Paulus Martinus Maria Liebregts, Ronald Van Der Ham, Wilhelmus Franciscus Johannes Simons, Danny Maria Hubertus Philips, Gert-Jan Gerardus Johannes Thomas Brands, Koen Steffens, Han Henricus Aldegonda Lempens, Marcus Johannes Van Der Zanden, Pieter Mulder
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Patent number: 8218126Abstract: A liquid handling system is disclosed in which an extractor to contain liquid in a space between the projection system of a lithographic apparatus and a substrate has, in plan, a shape with a single corner. The extractor is provided in a rotatable part of a liquid handling system. The rotatable part is rotated under the control of a controller.Type: GrantFiled: December 2, 2008Date of Patent: July 10, 2012Assignee: ASML Netherlands B.V.Inventors: Koen Steffens, Paulus Martinus Maria Liebregts, Ronald Van Der Ham, Daniël Jozef Maria Direcks, Gert-Jan Gerardus Johannes Thomas Brands
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Publication number: 20120092631Abstract: A gas manifold to direct a gas flow between two plates of an optical component of a lithographic apparatus, the gas manifold having an inlet, a diffuser downstream of the inlet, a flow straightener downstream of the inlet, a contractor downstream of the flow straightener, and an outlet downstream of the contractor.Type: ApplicationFiled: October 14, 2011Publication date: April 19, 2012Applicant: ASML NETHERLANDS B.V.Inventors: Frank Johannes Jacobus VAN BOXTEL, Marinus Johannes Maria Van Dam, Johannes Christiaan Maria Jasper, Ronald Van Der Ham, Sergei Yurievich Shulepov, Gerben Pieterse, Marco Baragona, Pieter Debrauwer, Antonius Arnoldus Henricus Van Der Steen