Abstract: A lithographic projection apparatus (1) includes a support configured to support a patterning device (MA), the patterning device configured to pattern the projection beam according to a desired pattern. The apparatus has a substrate (W) table configure to hold a substrate, a projection system configured to project the patterned beam onto a target portion of the substrate. The apparatus also has a purge gas supply system (100) configured to provide a purge gas near a surface of a component of the lithographic projection apparatus. The purge gas supply system (100) includes a purge gas mixture generator (120) configured to generate a purge gas mixture which includes at least one purging gas and moisture. The purge gas mixture generator has a moisturizer (150) configured to add the moisture to the purge gas and a purge gas mixture outlet (130) connected to the purge gas mixture generator (120) configured to supply the purge gas mixture near the surface.

Abstract: Plasmonic nanocavity arrays and methods for enhanced efficiency in organic photovoltaic cells are described. Plasmonic nanocavities offer a promising and highly tunable alternative to conventional transparent conductors for photovoltaic applications using both organic and inorganic materials systems.

Abstract: A transfer container for transferring an object between environments is described. The transfer container comprises an enclosure; a purifier comprising a purification material, the purifier attached to the enclosure, the purifier configured to purify fluid flowing into the enclosure; and a fluid propelling means, attached to the enclosure, for propelling fluid through the purifier and into the enclosure.

Abstract: A lithographic projection apparatus includes a support configured to support a patterning device, the patterning device configured to pattern a projection beam according to a desired pattern. The apparatus has a substrate table configured to hold a substrate, a projection system configured to project the patterned beam onto a target portion of the substrate. The apparatus also has a purge pas supply system configured to provide a purge gas near a surface of a component of the lithographic projection apparatus. The purge gas supply system includes a purge gas mixture generator configured to generate a purge gas mixture which includes at least one purging gas and moisture. The purge gas mixture generator has a moisturizer configured to add the moisture to the purge gas and a purge gas mixture outlet connected to the purge gas mixture generator configured to supply the purge gas mixture near the surface.

Abstract: The invention is a method for the decontamination of CO2 to a sufficient level of purity to allow it to be used in the semiconductor industry. The invention comprises the exposure of fluid CO2 to a combination metallic states of at least one metal under the appropriate conditions for removal of contaminants. The adsorbents are then decontaminated/activated to return the adsorbent to a mixed oxidation state and allow further rounds of decontamination. The adsorbents are selected to be complimentary to each other, preferentially adsorbing different contaminants. Additionally, the adsorbents are selected to undergo reduction differently such that upon regeneration only a portion of the metals are reduced and the adsorbent is returned essentially to its original state.

Abstract: The present invention relates to organic light emitting devices (OLEDs), and more specifically to efficient OLEDs having an emissive layer having host material with a wide energy gap. The present invention also relates to materials for use as a wide gap host material.

Abstract: A method for decontaminating fluid carbon dioxide for use in a product production process such as carbonated beverage production is disclosed. Contaminants, including those normally highly resistant to removal such as S, N, P and Si compounds (especially COS), are removed from the CO2 by contact with a metal oxide decontamination agent. The metal oxide is one or more oxides of transition metal elements including lanthanides, the iron oxides being preferred. Decontamination of the CO2 is interrupted at intervals for regeneration of the metal oxide agent by passage of CO2 containing an oxygen-containing contaminant over the metal oxide in a countercurrent flow direction at higher temperature for a short time. The metal oxide decontaminant may also be mixed with a high-silica content zeolite, preferably a Zeolite Y or zeolite ZSM-5. The contaminated CO2 and the CO2 containing an oxygen-containing contaminant are preferably from the same source.