Abstract: The present invention relates a transient voltage suppressor (TVS) for directional ESD protection. The TVS includes: a conductivity type substrate; a first type lightly doped region, having a first type heavily doped region arranged therein; a second type lightly doped region, having a second type heavily doped region and a third type heavily doped region arranged therein; a third type lightly doped region, having a fourth type heavily doped region arranged therein; a plurality of closed isolation trenches, arranged on the conductivity type substrate, wherein at least one of the plurality of closed isolation trenches is neighbored one of the type lightly doped regions; and a first pin. Accordingly, the TVS of present invention may adaptively provide effective ESD protection under positive and negative ESD stresses, improve the efficiency of ESD protection within the limited layout area.

Abstract: The present invention relates a transient voltage suppressor (TVS) for directional ESD protection. The TVS includes: a conductivity type substrate; a first type lightly doped region, having a first type heavily doped region arranged therein; a second type lightly doped region, having a second type heavily doped region and a third type heavily doped region arranged therein; a third type lightly doped region, having a fourth type heavily doped region arranged therein; a plurality of closed isolation trenches, arranged on the conductivity type substrate, wherein at least one of the plurality of closed isolation trenches is neighbored one of the type lightly doped regions; and a first pin. Accordingly, the TVS of present invention may adaptively provide effective ESD protection under positive and negative ESD stresses, improve the efficiency of ESD protection within the limited layout area.

Abstract: A new ESD protection device with an integrated-circuit vertical transistor structure is disclosed, which includes a heavily doped p-type substrate (P+ substrate), a n-type well (N well) in the P+ substrate, a heavily doped p-type diffusion (P+ diffusion) in the N well, a heavily doped n-type diffusion (N+ diffusion) in the N well, and a p-type well (P well) surrounding the N well in the P+ substrate. A bond pad is connected to both the P+ and N+ diffusions, and a ground is coupled to the P+ substrate. Another P+ diffusion is implanted in the N well or another N+ diffusion is implanted in the P well to form a Zener diode, which behaves as a trigger for the PNP transistor when a positive ESD zaps. A parasitic diode is formed at the junction between the P+ substrate and the N well, to bypass a negative ESD stress on the bond pad.

Abstract: A lateral transient voltage suppressor with ultra low capacitance is disclosed. The suppressor comprises a first conductivity type substrate and at least one diode cascade structure arranged in the first conductivity type substrate. The cascade structure further comprises at least one second conductivity type lightly doped well and at least one first conductivity type lightly doped well, wherein there are two heavily doped areas arranged in the second conductivity type lightly doped well and the first conductivity type lightly doped well. The cascade structure neighbors a second conductivity type well, wherein there are three heavily doped areas arranged in the second conductivity type well. The suppressor further comprises a plurality of deep isolation trenches arranged in the first conductivity type substrate and having a depth greater than depths of the second conductivity type lightly doped well, the second conductivity type well and the first conductivity type lightly doped well.

Abstract: The present invention relates a transient voltage suppressor (TVS) for directional ESD protection. The TVS includes: a conductivity type substrate; a first type lightly doped region, having a first type heavily doped region arranged therein; a second type lightly doped region, having a second type heavily doped region and a third type heavily doped region arranged therein; a third type lightly doped region, having a fourth type heavily doped region arranged therein; a plurality of closed isolation trenches, arranged on the conductivity type substrate, wherein at least one of the plurality of closed isolation trenches is neighbored one of the type lightly doped regions; and a first pin. Accordingly, the TVS of present invention may adaptively provide effective ESD protection under positive and negative ESD stresses, improve the efficiency of ESD protection within the limited layout area.

Abstract: A bidirectional silicon-controlled rectifier, wherein the conventional field oxide layer, which separates an anode structure from a cathode structure, is replaced by a field oxide layer having floating gates, a virtual gate or a virtual active region. Thus, the present invention can reduce or escape from the bird's beak effect of a field oxide layer, which results in crystalline defects, a concentrated current and a higher magnetic field and then causes abnormal operation of a rectifier. Thereby, the present invention can also reduce signal loss.

Abstract: A vertical transient voltage suppressor for protecting an electronic device is disclosed. The vertical transient voltage includes a conductivity type substrate having highly doping concentration; a first type lightly doped region is arranged on the conductivity type substrate, wherein the conductivity type substrate and the first type lightly doped region respectively belong to opposite types; a first type heavily doped region and a second type heavily doped region are arranged in the first type lightly doped region, wherein the first and second type heavily doped regions and the conductivity type substrate belong to same types; and a deep first type heavily doped region is arranged on the conductivity type substrate and neighbors the first type lightly doped region, wherein the deep first type heavily doped region and the first type lightly doped region respectively belong to opposite types, and wherein the deep first type heavily doped region is coupled to the first type heavily doped region.

Abstract: A new ESD protection device with an integrated-circuit vertical transistor structure is disclosed, which includes a heavily doped p-type substrate (P+ substrate), a n-type well (N well) in the P+ substrate, a heavily doped p-type diffusion (P+ diffusion) in the N well, a heavily doped n-type diffusion (N+ diffusion) in the N well, and a p-type well (P well) surrounding the N well in the P+ substrate. A bond pad is connected to both the P+ and N+ diffusions, and a ground is coupled to the P+ substrate. Another P+ diffusion is implanted in the N well or another N+ diffusion is implanted in the P well to form a Zener diode, which behaves as a trigger for the PNP transistor when a positive ESD zaps. A parasitic diode is formed at the junction between the P+ substrate and the N well, to bypass a negative ESD stress on the bond pad.

Abstract: A lateral transient voltage suppressor with ultra low capacitance is disclosed. The suppressor comprises a first type substrate and at least one diode cascade structure arranged in the first type substrate. The cascade structure further comprises at least one second type lightly doped well and at least one first type lightly doped well, wherein there are two heavily doped areas arranged in the second type lightly doped well and the first type lightly doped well. The cascade structure neighbors a second type well, wherein there are three heavily doped areas arranged in the second type well. The suppressor further comprises a plurality of deep isolation trenches arranged in the first type substrate and having a depth greater than depths of the second type lightly doped well, the second type well and the first type lightly doped well. Each doped well is isolated by trenches.

Abstract: A lateral transient voltage suppressor for low-voltage applications is disclosed. The suppressor comprises an N-type heavily doped substrate and at least two clamp diode structures horizontally arranged in the N-type heavily doped substrate. Each clamp diode structure further comprises a clamp well arranged in the N-type heavily doped substrate and having a first heavily doped area and a second heavily doped area. The first and second heavily doped areas respectively belong to opposite types. There is a plurality of deep isolation trenches arranged in the N-type heavily doped substrate and having a depth greater than depth of the clamp well. The deep isolation trenches can separate each clamp well. The present invention avoids the huge leakage current to be suitable for low-voltage application.

Abstract: A transient voltage suppressor (TVS) for multiple pin assignments is disclosed. The suppressor comprises at least two cascade-diode circuits in parallel to each other and an electrostatic-discharge clamp element in parallel to each cascade-diode circuit and connected with a low voltage. One cascade-diode circuit is connected with a high voltage, and the other cascade-diode circuits are respectively connected with I/O pins. Each cascade-diode circuit further comprises a first diode and a second diode cascaded to the first diode, wherein a node between the first diode and the second diode is connected with the high voltage or the one I/O pin. The design of the present invention can meet several bounding requirements. It is flexible different pin assignments of TVS parts.

Abstract: The present invention discloses an asymmetric bidirectional silicon-controlled rectifier, which comprises: a second conduction type substrate; a first conduction type undoped epitaxial layer formed on the substrate; a first well and a second well both formed inside the undoped epitaxial layer and separated by a portion of the undoped epitaxial layer; a first buried layer formed in a junction between the first well and the substrate; a second buried layer formed in a junction between the second well and the substrate; a first and a second semiconductor area with opposite conduction type both formed inside the first well; a third and a fourth semiconductor area with opposite conduction type both formed inside the second well, wherein the first and second semiconductor areas are connected to the anode of the silicon-controlled rectifier, and the third and fourth semiconductor areas are connected to the cathode of the silicon-controlled rectifier.

Abstract: The present invention discloses a symmetric bidirectional silicon-controlled rectifier, which comprises: a substrate; a buried layer formed on the substrate; a first well, a middle region and a second well, which are sequentially formed on the buried layer side-by-side; a first semiconductor area and a second semiconductor area both formed inside the first well; a third semiconductor area formed in a junction between the first well and the middle region, wherein a first gate is formed over a region between the second and third semiconductor areas; a fourth semiconductor area and a fifth semiconductor area both formed inside the second well; a sixth semiconductor area formed in a junction between the second well and the middle region, wherein a second gate is formed over a region between the fifth and sixth semiconductor areas.

Abstract: An ESD protection circuit is provided. The circuit includes a discharging component, a diode, and an ESD detection circuit. The discharging component is coupled between an input/output pad and a first power line of an IC. The diode is coupled between the input/output pad and a second power line of the IC in a forward direction toward the second power line. The ESD detection circuit includes a capacitor, a resistor, and a triggering component. The capacitor and the resistor are formed in series and coupled between the first power line and the second power line. The triggering component has a positive power end coupled to the input/output pad and a negative power end coupled to the first power line. An input of the triggering component is coupled to a node between the capacitor and the resistor.

Abstract: An ESD protection circuit including a clamping module and a detecting module is provided. The clamping module is coupled between a positive power line and a negative power line. The detecting module includes a triggering unit, a resistor, and a MOS capacitor. An output terminal of the triggering unit is used for triggering the clamping module. The resistor is coupled between the negative power line and an input terminal of the triggering unit. The MOS capacitor is coupled between the positive power line and an input terminal of the triggering unit for ESD protection. During a normal power operation, a switching terminal of the triggering unit enables the MOS capacitor to be coupled between the negative power line and an input terminal of the triggering unit. Thereby, the gate tunneling leakage is eliminated and the problem of mistriggering is prevented.

Abstract: An ESD protection circuit suitable for applying in an integrated circuit with separated power domains is provided. The circuit includes a P-type MOSFET coupled between a first circuit in a first power domain and a second circuit in a second power domain. A source terminal of the P-type MOSFET is coupled to a connection node for connecting the first circuit and the second circuit. A gate terminal of the P-type MOSFET is coupled to a positive power line of the second power domain. A drain terminal of the P-type MOSFET is coupled to a negative power line of the second power domain. A body terminal of the P-type MOSFET is also coupled to the connection node.

Abstract: The present invention discloses a bidirectional PNPN silicon-controlled rectifier comprising: a p-type substrate; a N-type epitaxial layer; a P-type well and two N-type wells all formed inside the N-type epitaxial layer with the two N-type wells respectively arranged at two sides of the P-type well; a first semiconductor area, a second semiconductor area and a third semiconductor area all formed inside the P-type well and all coupled to an anode, wherein the second semiconductor area and the third semiconductor area are respectively arranged at two sides of the first semiconductor area, and wherein the first semiconductor area is of first conduction type, and the second semiconductor area and the third semiconductor area are of second conduction type; and two P-type doped areas respectively formed inside the N-type wells, wherein each P-type doped area has a fourth semiconductor area neighboring the P-type well and a fifth semiconductor area, and wherein both the fourth semiconductor area and the fifth semico

Abstract: An ESD protection circuit including a clamping module and a detecting module is provided. The clamping module is coupled between a positive power line and a negative power line. The detecting module includes a triggering unit, a resistor, and a MOS capacitor. An output terminal of the triggering unit is used for triggering the clamping module. The resistor is coupled between the positive power line and an input terminal of the triggering unit. The MOS capacitor has a first end and a second end. The first end is coupled to the input terminal of the triggering unit. During a normal power operation, a switching terminal of the triggering unit enables the second end of the MOS capacitor to be coupled with the positive power line. Thereby, the gate tunneling leakage is eliminated and the problem of mistriggering is prevented.

Abstract: An ESD protection circuit is provided. The circuit includes a discharging component, a diode, and an ESD detection circuit. The discharging component is coupled between an input/output pad and a first power line of an IC. The diode is coupled between the input/output pad and a second power line of the IC in a forward direction toward the second power line. The ESD detection circuit includes a capacitor, a resistor, and a triggering component. The capacitor and the resistor are formed in series and coupled between the first power line and the second power line. The triggering component has a positive power end coupled to the input/output pad and a negative power end coupled to the first power line. An input of the triggering component is coupled to a node between the capacitor and the resistor.

Abstract: An electrostatic discharge (ESD) protection device and a layout thereof are provided. A bias conducting wire is mainly used to couple each base of a plurality of parasitic transistors inside ESD elements together, in order to simultaneously trigger all the parasitic transistors to bypass the ESD current, avoid the elements of a core circuit being damaged, and solve the non-uniform problem of bypassing the ESD current when ESD occurs. Furthermore, in the ESD protection layout, it only needs to add another doped region on a substrate neighboring to, but not contacting, doped regions of the ESD protection elements and use contacts to connect the added doped region, so as to couple each base of the parasitic transistors together without requiring for additional layout area.