Patents by Inventor Ryohei Satoh

Ryohei Satoh has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8655630
    Abstract: A design workflow construction apparatus is provided for supporting design of an object having a plurality of design elements. In constructing the design workflow, the apparatus uses input variables, design variables, and intermediate variables. The design workflow construction apparatus includes means for acquiring object design elements and means for determining an order of designing the object design elements. The apparatus also includes means for determining the important design variables.
    Type: Grant
    Filed: February 16, 2010
    Date of Patent: February 18, 2014
    Assignee: Osaka University
    Inventors: Yoshiharu Iwata, Ryohei Satoh, Keiji Kudo, Atsushi Taya, Kazuya Okamoto, Hidenori Murata, Koichiro Atsumi, Eiji Arai, Eiji Morinaga
  • Patent number: 8418359
    Abstract: A method for manufacturing a circuit pattern-provided substrate including forming a resist layer on a substrate, forming an opening corresponding to a circuit pattern and having an eaves cross-sectional shape in the resist layer, forming a thin film layer having a portion formed on the substrate in the opening and a portion formed on the resist layer, and removing the resist layer such that the resist layer and the portion of the thin film layer formed on the resist layer are removed from the substrate. The forming of the opening comprises exposing the resist layer with a mask device which changes an exposure amount of the resist layer such that the eaves cross-sectional shape has a space at a boundary between the resist layer and the substrate.
    Type: Grant
    Filed: February 2, 2009
    Date of Patent: April 16, 2013
    Assignee: Asahi Glass Company, Limited
    Inventors: Ryohei Satoh, Koji Nakagawa, Eiji Morinaga, Reo Usui, Kenji Tanaka, Satoru Takaki, Kenichi Ebata, Hiroshi Sakamoto
  • Publication number: 20120100774
    Abstract: An object of the invention is to provide a method for manufacturing a transparent substrate provided with a tin oxide thin film which can be satisfactorily patterned even by irradiation with a laser light having low energy because an ablation phenomenon occurs therewith. The invention relates to a method for manufacturing a transparent substrate bearing a circuit pattern, which comprises irradiating a thin-film-attached transparent substrate comprising a transparent substrate having thereon a transparent conductive film having a carrier concentration of 5×1019/cm3 or higher, with a laser light having a wavelength of 1,064 nm to form a circuit pattern on the transparent substrate.
    Type: Application
    Filed: January 3, 2012
    Publication date: April 26, 2012
    Applicant: ASAHI GLASS COMPANY, LIMITED
    Inventors: Ryohei SATOH, Koji Nakagawa, Eiji Morinaga, Reo Usui, Takamitsu Isono, Kenji Tanaka, Satoru Takaki, Kenichi Ebata, Hiroshi Sakamoto
  • Publication number: 20120053905
    Abstract: A design system (1) is provided with a function of acquiring a design specification of an object to be designed and an evaluation index for evaluating a value of the object to be designed in the design specification; a function of acquiring profile data of the object to be designed; a function (design order determining section (12)) of extracting entity design elements and important design variables from the profile data and prioritizing the entity design elements and the important design variables so as to construct a design workflow; a function (evaluation approach construction section (13)) of constructing an evaluation formula for performance/evaluation of a design result of each of the entity design elements in conformity with the design workflow; a function of finding an appropriate solution by performing automatic optimization while evaluating the design result with use of the evaluation index in accordance with the design workflow with which the evaluation formula is associated; and a function of outp
    Type: Application
    Filed: February 16, 2010
    Publication date: March 1, 2012
    Applicant: Osaka University
    Inventors: Yoshiharu Iwata, Ryohei Satoh, Keiji Kudo, Atsushi Taya, Kazuya Okamoto, Hidenori Murata, Koichiro Atsumi, Eiji Arai, Eiji Morinaga
  • Patent number: 7846641
    Abstract: A process for producing a glass substrate having a circuit pattern is disclosed. The process includes forming a thin film layer on a glass substrate and then irradiating the thin film layer with laser light to form a circuit pattern on the glass substrate; depositing a low-melting point glass having a softening point of from 450 to 630° C. on the glass substrate having the circuit pattern formed thereon; and sintering the low-melting point glass to form a low-melting point glass layer which includes the low-melting point glass sintered on the glass substrate having the circuit pattern formed thereon and which forms a compatible layer between the glass substrate and the low-melting point glass layer.
    Type: Grant
    Filed: June 20, 2008
    Date of Patent: December 7, 2010
    Assignee: Asahi Glass Company, Limited
    Inventors: Ryohei Satoh, Koji Nakagawa, Reo Usui, Kenji Tanaka, Satoru Takaki, Kenichi Ebata, Yumiko Aoki
  • Patent number: 7790358
    Abstract: There is provided a method for forming a continuous thin film circuit pattern with good precision, at low cost and with low environmental burden; an electronic circuit fabricated by the same, and an electronic device including the same. There are a step for forming a mask layer 2 on a substrate 1; a step for forming an opening pattern in the mask layer 2; a step for forming a thin film 3 on the substrate 1 and on the mask layer 2; and a step for removing, from the substrate 1, the mask layer 2 and a portion of the thin film 3 formed on the mask layer 2; wherein the opening pattern is formed under a dry condition.
    Type: Grant
    Filed: May 11, 2006
    Date of Patent: September 7, 2010
    Assignee: Asahi Glass Company, Limited
    Inventors: Ryohei Satoh, Yoshinori Iwata, Koji Nakagawa, Reo Usui
  • Patent number: 7772778
    Abstract: To provide a method for forming electrodes and/or black stripes for a plasma display substrate, wherein display electrodes, bus electrodes and optionally black stripes for a plasma display panel are formed of the same material by the same dry step, whereby a clear image having reflection prevented, can be displayed on a PDP display device with a low load on the environment, at low costs, with low resistance, without erosion by a dielectric. A method for forming electrodes and/or black stripes for a plasma display substrate, which comprises applying a laser beam to a mask layer formed on a transparent substrate to form openings at areas corresponding to the respective patterns of display electrodes, bus electrodes and optionally black stripes, then continuously forming an antireflection layer to provide an antireflection effect over the entire surface and an electrode layer, and applying again a laser beam to peel off the mask layer and at the same time to remove an unnecessary thin film layer.
    Type: Grant
    Filed: March 27, 2007
    Date of Patent: August 10, 2010
    Assignee: Asahi Glass Company, Limited
    Inventors: Ryohei Satoh, Yoshinori Iwata, Koji Nakagawa, Kenji Tanaka, Satoru Takaki
  • Publication number: 20090205851
    Abstract: The present invention is to provide a method for manufacturing a circuit pattern-provided transparent substrate having a circuit pattern which is free from pattern peeling and remaining of resist and has good pattern precision and which does not cause disconnection when used as an electrode of an electron circuit or the like.
    Type: Application
    Filed: February 2, 2009
    Publication date: August 20, 2009
    Applicant: ASAHI GLASS COMPANY, LIMITED
    Inventors: Ryohei SATOH, Koji Nakagawa, Eiji Morinaga, Reo Usui, Kenji Tanaka, Satoru Takaki, Kenichi Ebata, Hiroshi Sakamoto
  • Publication number: 20080311359
    Abstract: The invention provides a process for producing a glass substrate (10) having a circuit pattern (26), which includes a circuit pattern formation step of forming a thin film layer (12) on a glass substrate and then irradiating the thin film layer with laser light (22) to form a circuit pattern on the glass substrate; a low-melting point glass deposition step of depositing a low-melting point glass (28) having a softening point of from 450 to 630° C. on the glass substrate having the circuit pattern formed thereon; and a sintering step of sintering the low-melting point glass to form a low-melting point glass layer (32) comprising the low-melting point glass sintered on the glass substrate having the circuit pattern formed thereon and to form a compatible layer (34) between the glass substrate and the low-melting point glass layer.
    Type: Application
    Filed: June 20, 2008
    Publication date: December 18, 2008
    Applicant: ASAHI GLASS COMPANY, LIMITED
    Inventors: Ryohei SATOH, Koji NAKAGAWA, Reo USUI, Kenji TANAKA, Satoru TAKAKI, Kenichi EBATA, Yumiko AOKI
  • Publication number: 20080202798
    Abstract: An object of the invention is to provide a method for manufacturing a transparent substrate provided with a tin oxide thin film which can be satisfactorily patterned even by irradiation with a laser light having low energy because an ablation phenomenon occurs therewith. The invention relates to a method for manufacturing a transparent substrate bearing a circuit pattern, which comprises irradiating a thin-film-attached transparent substrate comprising a transparent substrate having thereon a transparent conductive film having a carrier concentration of 5×1019/cm3 or higher, with a laser light having a wavelength of 1,064 nm to form a circuit pattern on the transparent substrate.
    Type: Application
    Filed: April 28, 2008
    Publication date: August 28, 2008
    Applicant: ASAHI GLASS COMPANY LIMITED
    Inventors: Ryohei SATOH, Koji Nakagawa, Eiji Morinaga, Reo Usui, Takamitsu Isono, Kenji Tanaka, Satoru Takaki, Kenichi Ebata, Hiroshi Sakamoto
  • Publication number: 20070190886
    Abstract: To provide a method for forming electrodes and/or black stripes for a plasma display substrate, wherein display electrodes, bus electrodes and optionally black stripes for a plasma display panel are formed of the same material by the same dry step, whereby a clear image having reflection prevented, can be displayed on a PDP display device with a low load on the environment, at low costs, with low resistance, without erosion by a dielectric. A method for forming electrodes and/or black stripes for a plasma display substrate, which comprises applying a laser beam to a mask layer formed on a transparent substrate to form openings at areas corresponding to the respective patterns of display electrodes, bus electrodes and optionally black stripes, then continuously forming an antireflection layer to provide an antireflection effect over the entire surface and an electrode layer, and applying again a laser beam to peel off the mask layer and at the same time to remove an unnecessary thin film layer.
    Type: Application
    Filed: March 27, 2007
    Publication date: August 16, 2007
    Applicant: ASAHI GLASS CO., LTD.
    Inventors: Ryohei Satoh, Yoshinori Iwata, Koji Nakagawa, Kenji Tanaka, Satoru Takaki
  • Publication number: 20060240338
    Abstract: There is provided a method for forming a continuous thin film circuit pattern with good precision, at low cost and with low environmental burden; an electronic circuit fabricated by the same, and an electronic device including the same. There are a step for forming a mask layer 2 on a substrate 1; a step for forming an opening pattern in the mask layer 2; a step for forming a thin film 3 on the substrate 1 and on the mask layer 2; and a step for removing, from the substrate 1, the mask layer 2 and a portion of the thin film 3 formed on the mask layer 2; wherein the opening pattern is formed under a dry condition.
    Type: Application
    Filed: May 11, 2006
    Publication date: October 26, 2006
    Applicant: ASAHI GLASS COMPANY, LIMITED
    Inventors: Ryohei Satoh, Yoshinori Iwata, Koji Nakagawa, Reo Usui
  • Patent number: 6919670
    Abstract: A rib structure for a display device includes a light-transmissive rib structure containing therein a material absorbent of visible light so that a visible light absorption distance is 40 to 1200 ?m (the visible light absorption distance L (?m) means a distance such that visible light decreases to exp(?T/L) times less in connection to the travel distance T (?m), that is, visible light is absorbed by 1-exp(?T/L)).
    Type: Grant
    Filed: November 21, 2001
    Date of Patent: July 19, 2005
    Assignee: Fujitsu Hitachi Plasma Display Limited
    Inventors: Yoshimi Kawanami, Yasuhiko Kunii, Tadashi Furukawa, Akihiro Fujinaga, Kazunori Ishizuka, Shoichi Iwanaga, Fumihiro Namiki, Ryohei Satoh
  • Patent number: 6652342
    Abstract: A gas discharge type display apparatus includes a front substrate having a plurality of first electrodes and a back substrate having a plurality of second electrodes and at least ones of the first and second electrodes are made of the photosensitive material containing silver exposed by using the laser thereby, making a mask unnecessary.
    Type: Grant
    Filed: April 27, 1999
    Date of Patent: November 25, 2003
    Assignee: Hitachi, Ltd.
    Inventors: Masashi Nishiki, Michifumi Kawai, Ryohei Satoh, Shigeaki Suzuki, Akira Yabushita, Masahito Ijuin
  • Patent number: 6624575
    Abstract: A gas discharge display device having a first substrate, a plurality of first electrodes having a substantially rectangular form being arranged on the first substrate, a plurality of second electrodes, respective ones of the plurality of second electrodes being formed on respective ones of the plurality of first electrodes, and each of the plurality of second electrodes having an extension extending beyond an end of a respective one of the plurality of first electrodes on which respective ones of the plurality of second electrodes are formed and in an oblique direction therefrom. The extension of the plurality of second electrodes extend beyond opposite ends of alternate ones of the plurality of first electrodes.
    Type: Grant
    Filed: February 4, 2002
    Date of Patent: September 23, 2003
    Assignee: Hitachi, Ltd.
    Inventors: Masashi Nishiki, Ryohei Satoh, Yuzo Taniguchi, Shigeaki Suzuki, Michifumi Kawai, Masahito Ijuin, Akira Yabushita, Tomohiro Murase
  • Patent number: 6621217
    Abstract: A gas discharge display device comprising a front side substrate having a plurality of first electrodes and a back side substrate having a plurality of second electrodes, wherein at least said first electrodes or second electrodes are formed by wet etching using a resist made of an inorganic material, is excellent in the ability to suppress the breakage of wiring in electrodes.
    Type: Grant
    Filed: February 11, 2002
    Date of Patent: September 16, 2003
    Assignee: Hitachi, Ltd.
    Inventors: Masashi Nishiki, Ryohei Satoh, Yuzo Taniguchi, Shigeaki Suzuki, Michifumi Kawai, Masahito Ijuin, Akira Yabushita, Makoto Fukushima, Tomohiko Murase
  • Publication number: 20020190650
    Abstract: A rib structure for a display device includes a light-transmissive rib structure containing therein a material absorbent of visible light so that a visible light absorption distance is 40 to 1200 &mgr;m (the visible light absorption distance L (&mgr;m) means a distance such that visible light decreases to exp(−T/L) times less in connection to the travel distance T (&mgr;m), that is, visible light is absorbed by 1-exp(−T/L)).
    Type: Application
    Filed: November 21, 2001
    Publication date: December 19, 2002
    Applicant: Fujitsu Hitachi Plasma Display Limited
    Inventors: Yoshimi Kawanami, Yasuhiko Kunii, Tadashi Furukawa, Akihiro Fujinaga, Kazunori Ishizuka, Shoichi Iwanaga, Fumihiro Namiki, Ryohei Satoh
  • Patent number: 6429586
    Abstract: A method of making a gas discharge display panel and a gas discharge display device using laser processing so that the manufacturing time to form wiring on a substrate thereof is significantly reduced. In order to achieve this, the gas discharge display panel is provided with a first substrate having a plurality of first electrodes and a plurality of second electrodes, and the first electrodes are laser processed to have a substantially rectangular shape. The second electrodes are formed on the first electrodes, and a second substrate having a plurality of third electrodes which is opposed to the first substrate is provided.
    Type: Grant
    Filed: January 5, 1999
    Date of Patent: August 6, 2002
    Assignee: Hitachi, Ltd.
    Inventors: Masashi Nishiki, Ryohei Satoh, Yuzo Taniguchi, Shigeaki Suzuki, Michifumi Kawai, Masahito Ijuin, Akira Yabushita, Tomohiro Murase
  • Publication number: 20020089285
    Abstract: A gas discharge display device having a first substrate, a plurality of first electrodes having a substantially rectangular form being arranged on the first substrate, a plurality of second electrodes, respective ones of the plurality of second electrodes being formed on respective ones of the plurality of first electrodes, and each of the plurality of second electrodes having an extension extending beyond an end of a respective one of the plurality of first electrodes on which respective ones of the plurality of second electrodes are formed and in an oblique direction therefrom. The extension of the plurality of second electrodes extend beyond opposite ends of alternate ones of the plurality of first electrodes.
    Type: Application
    Filed: February 4, 2002
    Publication date: July 11, 2002
    Inventors: Masashi Nishiki, Ryohei Satoh, Yuzo Taniguchi, Shigeaki Suzuki, Michifumi Kawat, Masahito Tjuin, Akira Yabushita, Tomohiro Murase
  • Publication number: 20020070665
    Abstract: A gas discharge display device comprising a front side substrate having a plurality of first electrodes and a back side substrate having a plurality of second electrodes, wherein at least said first electrodes or second electrodes are formed by wet etching using a resist made of an inorganic material, is excellent in the ability to suppress the breakage of wiring in electrodes.
    Type: Application
    Filed: February 11, 2002
    Publication date: June 13, 2002
    Inventors: Masashi Nishiki, Ryohei Satoh, Yuzo Taniguchi, Shigeaki Suzuki, Michifumi Kawai, Masahito Ijuin, Akira Yabushita, Makoto Fukushima, Tomohiko Murase