Patents by Inventor Ryosuke Harada

Ryosuke Harada has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10940718
    Abstract: The present invention provides a composite that has good initial adhesion and good adhesion after high temperature and high humidity aging. Provided is a composite including: a topping rubber composition having a fatty acid content of 0.8% by mass or less; and an adherend plated with a copper-containing layer.
    Type: Grant
    Filed: March 22, 2018
    Date of Patent: March 9, 2021
    Assignee: SUMITOMO RUBBER INDUSTRIES, LTD.
    Inventors: Natsuki Maekawa, Koji Fujisawa, Hiroshi Ito, Ryosuke Harada, Daiko Fujimori
  • Publication number: 20200399413
    Abstract: The present invention provides vinyl-based resin particles capable of forming uniform pores in a thermosetting resin film when the particles are used as a pore-forming material for a thermosetting resin. Specifically, the present invention provides vinyl-based resin particles for use in making a thermosetting resin porous, the particles having a temperature of 300 to 350° C. at 10% mass loss when heated at a rate of 10° C./min in an air atmosphere, and the particles having a mass loss percentage of 85 to 100% after being heated at 350° C. for 5 hours in an air atmosphere.
    Type: Application
    Filed: March 22, 2019
    Publication date: December 24, 2020
    Applicant: SEKISUI KASEI CO., LTD.
    Inventors: Kengo NISHIUMI, Ryosuke HARADA
  • Patent number: 10815260
    Abstract: The present invention relates to a chemical vapor deposition raw material for producing a ruthenium thin film or a ruthenium compound thin film by a chemical deposition method, the chemical vapor deposition raw material including a dinuclear ruthenium complex in which carbonyl and a nitrogen-containing organic ligand (L) are coordinated to metallically bonded two rutheniums, the dinuclear ruthenium complex being represented by the following formula (1): A raw material according to the present invention is capable of producing a high-purity ruthenium thin film, and has a low melting point and moderate thermal stability. Thus, the raw material according to the present invention is suitable for use in electrodes of various kinds of devices.
    Type: Grant
    Filed: August 23, 2016
    Date of Patent: October 27, 2020
    Assignee: TANAKA KIKINZOKU KOGYO K.K.
    Inventors: Ryosuke Harada, Toshiyuki Shigetomi, Tasuku Ishizaka, Tatsutaka Aoyama
  • Publication number: 20200325283
    Abstract: The present invention provides non-spherical metal-coated irregularly-shaped resin particles that can improve characteristics, such as light diffusion characteristics and reflection characteristics, when used for optical applications, compared with spherical metal-coated resin particles. Specifically, the present invention provides metal-coated irregularly-shaped resin particles in which part of the surface of irregularly-shaped resin particles is coated with metal.
    Type: Application
    Filed: March 31, 2017
    Publication date: October 15, 2020
    Applicant: SEKISUI PLASTICS CO., LTD.
    Inventors: Ryosuke HARADA, Eiji TOKUNAGA, Sou AIZAWA, Keisuke SETO
  • Publication number: 20200148713
    Abstract: A raw material for vapor deposition for producing a platinum thin film or a platinum compound thin film by a vapor deposition method. The raw material for vapor deposition includes an organoplatinum compound represented by the following formula, in which a cyclopentene-amine ligand and an alkyl ligand are coordinated to divalent platinum. The organoplatinum compound of the present invention has moderate thermal stability and can respond flexibly to severe film formation conditions, including a wider film formation area, higher throughput, and the like. (In the formula, R1, R2, and R3 are each any one of a hydrogen atom, an alkyl group, an alkenyl group, an alkynyl group, an amino group, an imino group, a cyano group, and an isocyano group, each having 4 or less carbon atoms, and R4 and R5 are each an alkyl group having 1 or more and 3 or less carbon atoms.
    Type: Application
    Filed: July 12, 2018
    Publication date: May 14, 2020
    Applicant: TANAKA KIKINZOKU KOGYO K.K.
    Inventors: Ryosuke HARADA, Shigeyuki OOTAKE, Toshiyuki SHIGETOMI, Kazuharu SUZUKI
  • Publication number: 20200131306
    Abstract: Spherical polyester-based resin particles characterized in that the spherical polyester-based resin particles contain a polyester-based resin and have a crystallinity of 20% or less and an average circularity of 0.96 or more. The spherical polyester-based resin particles according to the present invention can provide suitable resin particles as compounding agents for cosmetics such as foundation, antiperspirants, and skin scrubs; various agents such as matte coating agents for paints, rheology modifying agents, antiblocking agents, slipperiness-imparting agents, light diffusion agents, electroconductive agents, and diagnostic testing agents for medical use; and additives to molded articles such as automobile materials and construction materials.
    Type: Application
    Filed: March 20, 2018
    Publication date: April 30, 2020
    Applicant: SEKISUI PLASTICS CO., LTD.
    Inventor: Ryosuke HARADA
  • Patent number: 10533027
    Abstract: The present invention provides a method for producing a cyclometalated iridium complex by use of a non-chlorine iridium raw material. The method for producing a cyclometalated iridium complex includes producing a cyclometalated iridium complex by reacting a raw material including an iridium compound with an aromatic heterocyclic bidentate ligand capable of forming an iridium-carbon bond, the raw material being non-halogenated iridium having a conjugated base of a strong acid as a ligand. Here, the non-halogenated iridium is preferably one containing a conjugated base of a strong acid having a pKa of 3 or less as a ligand.
    Type: Grant
    Filed: December 22, 2016
    Date of Patent: January 14, 2020
    Assignees: TANAKA KIKINZOKU KOGYO K.K., NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY
    Inventors: Hideo Konno, Junichi Taniuchi, Ryosuke Harada, Toshiyuki Shigetomi, Rumi Kobayashi, Yasushi Masahiro
  • Patent number: 10526698
    Abstract: The present invention relates to a chemical deposition raw material including a heterogeneous polynuclear complex in which a cyclopentadienyl and a carbonyl are coordinated to a first transition metal and a second transition metal as central metals, the chemical deposition raw material being represented by the following formula. In the following formula, the first transition metal (M1) and the second transition metal (M2) are mutually different. The number of cyclopentadienyls (L) is 1 or more and 2 or less, and to the cyclopentadienyl is coordinated one of a hydrogen atom and an alkyl group with a carbon number of 1 or more and 5 or less as each of substituents R1 to R5. With the chemical deposition raw material of the present invention, a composite metal thin film or a composite metal compound thin film containing plural metals can be formed from a single raw material.
    Type: Grant
    Filed: February 15, 2019
    Date of Patent: January 7, 2020
    Assignee: TANAKA KIKINZOKU K.K.
    Inventors: Ryosuke Harada, Toshiyuki Shigetomi, Shunichi Nabeya, Kazuharu Suzuki, Akiko Kumakura, Tatsutaka Aoyama, Takayuki Sone
  • Patent number: 10501586
    Abstract: Polyester-based resin particles including a polyester-based resin as a base resin, in which the base resin exhibits a plurality of endothermic peaks corresponding to crystal melting temperatures by DSC measurement, at least one of the endothermic peaks exists in each region of a low temperature side region and a high temperature side region, a maximum endothermic peak of the low temperature side region and a maximum endothermic peak of the high temperature side region exhibit a crystal melting heat amount ratio (low temperature side crystal melting heat amount/high temperature side crystal melting heat amount) in a range of 0.1 to 1.5, and the polyester-based resin particles have a volume average particle diameter of 1 to 50 ?m.
    Type: Grant
    Filed: August 18, 2016
    Date of Patent: December 10, 2019
    Assignee: SEKISUI PLASTICS CO., LTD.
    Inventors: Akiyoshi Kusaka, Kaori Kuwagaki, Ryosuke Harada
  • Publication number: 20190367545
    Abstract: The present invention relates to a chemical deposition raw material for manufacturing an iridium thin film or an iridium compound thin film by a chemical deposition method, including an iridium complex in which cyclopropenyl or a derivative thereof and a carbonyl ligand are coordinated to iridium. The iridium complex that is applied in the present invention enables an iridium thin film to be manufactured even when a reducing gas such as hydrogen is applied. in which R1 to R3, which are substituents of the cyclopropenyl ligand, are each independently hydrogen, or a linear or branched alkyl group with a carbon number of 1 or more and 4 or less.
    Type: Application
    Filed: March 5, 2018
    Publication date: December 5, 2019
    Applicant: TANAKA KIKINZOKU KOGYO K.K.
    Inventors: Ryosuke HARADA, Toshiyuki SHIGETOMI, Kazuharu SUZUKI
  • Patent number: 10465283
    Abstract: An organoplatinum compound with the following formula for use as a raw material in the chemical deposition of platinum compound thin films. In the formula, n is 1 or more and 5 or less. Each of substituents R1 to R5 on the alkenyl amine is a hydrogen atom, an alkyl group or the like and has a carbon number of 4 or less. Each of alkyl anions R6 and R7 is an alkyl group having a carbon number of 1 or more and 3 or less. The vapor pressure of the organoplatinum compound is high enough to allow for the manufacturing of a platinum thin film at low temperature. It also has moderate thermal stability.
    Type: Grant
    Filed: May 9, 2016
    Date of Patent: November 5, 2019
    Assignee: TANAKA KIKINZOKU KOGYO K.K.
    Inventors: Ryosuke Harada, Toshiyuki Shigetomi, Kazuharu Suzuki, Shunichi Nabeya, Akiko Kumakura, Rumi Kobayashi, Takayuki Sone
  • Publication number: 20190284320
    Abstract: Fluorescent resin particles which comprise a water-soluble fluorescent dye and a polymer made from a monomer mixture.
    Type: Application
    Filed: September 29, 2017
    Publication date: September 19, 2019
    Applicant: SEKISUI PLASTICS CO., LTD.
    Inventor: Ryosuke HARADA
  • Patent number: 10407450
    Abstract: A heterogeneous polynuclear complex for use as a raw material in the chemical deposition of composite metal or composite metal thin films with the below formula. In the formula, M1 and M2 are mutually different transition metals, x is an integer of 0 or more and 2 or less, y is in integer of 1 or more and 2 or less, z is an integer of 1 or more and 10 or less, R1 to R4 are each one of a hydrogen atom and an alkyl group with a carbon number of 1 or more and 5 or less, and R5 is a hydrogen atom, a carbonyl, an alkyl group with a carbon number of 1 or more and 7 or less, an allyl group or an allyl derivative. The heterogeneous polynuclear complex allows a composite metal thin film or a composite metal compound thin film containing a plurality of metals to be formed from a single raw material.
    Type: Grant
    Filed: May 9, 2016
    Date of Patent: September 10, 2019
    Assignee: TANAKA KIKINZOKU KOGYO K.K.
    Inventors: Ryosuke Harada, Toshiyuki Shigetomi, Shunichi Nabeya, Kazuharu Suzuki, Akiko Kumakura, Tatsutaka Aoyama, Takayuki Sone
  • Publication number: 20190177837
    Abstract: The present invention relates to a chemical deposition raw material including a heterogeneous polynuclear complex in which a cyclopentadienyl and a carbonyl are coordinated to a first transition metal and a second transition metal as central metals, the chemical deposition raw material being represented by the following formula. In the following formula, the first transition metal (M1) and the second transition metal (M2) are mutually different. The number of cyclopentadienyls (L) is 1 or more and 2 or less, and to the cyclopentadienyl is coordinated one of a hydrogen atom and an alkyl group with a carbon number of 1 or more and 5 or less as each of substituents R1 to R5. With the chemical deposition raw material of the present invention, a composite metal thin film or a composite metal compound thin film containing plural metals can be formed from a single raw material.
    Type: Application
    Filed: February 15, 2019
    Publication date: June 13, 2019
    Inventors: Ryosuke HARADA, Toshiyuki SHIGETOMI, Shunichi NABEYA, Kazuharu SUZUKI, Akiko KUMAKURA, Tatsutaka AOYAMA, Takayuki SONE
  • Patent number: 10227456
    Abstract: A high-recoverability resin particles having a mean particle size of 1 to 100 ?m containing a cross-linked (meth)acrylic acid ester-based resin, wherein the high-recoverability resin particles have a recovery rate of 22% or greater, and a 30% compression strength of 1.5 to 5.0 kgf/mm2.
    Type: Grant
    Filed: September 9, 2015
    Date of Patent: March 12, 2019
    Assignee: SEKISUI PLASTICS CO., LTD.
    Inventors: Akiyoshi Kusaka, Kaori Kuwagaki, Ryosuke Harada
  • Publication number: 20190053990
    Abstract: Silica-including microcapsule resin particles including an outer shell constituted of a crosslinked polymer and a cavity partitioned with the outer shell, in which the silica-including microcapsule resin particles contain inside the cavity a porous structure in which silica particles are mutually connected, and have a volume average particle diameter of 0.5 to 100 ?m.
    Type: Application
    Filed: February 27, 2017
    Publication date: February 21, 2019
    Applicant: SEKISUI PLASTICS CO., LTD.
    Inventors: Akiyoshi KUSAKA, Yoshinao YAMAJI, Ryosuke HARADA
  • Publication number: 20180362565
    Abstract: The present invention provides a method for producing a cyclometalated iridium complex by use of a non-chlorine iridium raw material. The method for producing a cyclometalated iridium complex includes producing a cyclometalated iridium complex by reacting a raw material including an iridium compound with an aromatic heterocyclic bidentate ligand capable of forming an iridium-carbon bond, the raw material being non-halogenated iridium having a conjugated base of a strong acid as a ligand. Here, the non-halogenated iridium is preferably one containing a conjugated base of a strong acid having a pKa of 3 or less as a ligand.
    Type: Application
    Filed: December 22, 2016
    Publication date: December 20, 2018
    Inventors: Hideo KONNO, Junichi TANIUCHI, Ryosuke HARADA, Toshiyuki SHIGETOMI, Rumi KOBAYASHI, Yasushi MASAHIRO
  • Patent number: 10131987
    Abstract: The invention provides a raw material for chemical deposition having properties required for a CVD compound, that is, which has a high vapor pressure, can be formed into a film at low temperatures (about 250° C. or less), and also has moderate thermal stability. The invention relates to a raw material for chemical deposition, for producing a ruthenium thin film or a ruthenium compound thin film by a chemical deposition method, the raw material for chemical deposition including an organoruthenium compound represented by the following formula, in which a cyclohexadienyl group or a derivative thereof and a pentadienyl group or a derivative thereof are coordinated to ruthenium: wherein the substituents R1 to R12 are each independently a hydrogen atom, a linear or cyclic hydrocarbon, an amine, an imine, an ether, a ketone, or an ester, and the substituents R1 to R12 each have 6 or less carbon atoms.
    Type: Grant
    Filed: September 24, 2015
    Date of Patent: November 20, 2018
    Assignee: TANAKA KIKINZOKU KOGYO K.K.
    Inventors: Ryosuke Harada, Toshiyuki Shigetomi, Kazuharu Suzuki, Shunichi Nabeya, Takayuki Sone, Akiko Kumakura
  • Patent number: 10125158
    Abstract: A method for manufacturing tris(?-diketonato)iridium by reacting ?-diketone with an iridium compound, in which an activation treatment including (a) an alkali treatment and (b) an acid treatment described below is applied to the iridium compound to activate the iridium compound, and to subsequently react the ?-diketone, (a) an alkali treatment: a treatment of adding alkali to a solution of the iridium compound to raise pH of the solution to a more alkaline side than that before the alkali addition and to not less than 10, and (b) an acid treatment: a treatment of adding acid to the solution subjected to the alkali treatment to lower pH of the solution to a more acidic side than that before the acid addition and to make the pH difference between solutions before and after the acid addition be not less than 0.1 and not more than 10. The present invention allows manufacture of tris(?-diketonato)iridium utilizing a wide variety of ?-diketones.
    Type: Grant
    Filed: August 28, 2015
    Date of Patent: November 13, 2018
    Assignee: TANAKA KIKINZOKU KOGYO K.K.
    Inventors: Yasushi Masahiro, Toshiyuki Shigetomi, Junichi Taniuchi, Ryosuke Harada
  • Publication number: 20180304687
    Abstract: The present invention provides a composite that has good initial adhesion and good adhesion after high temperature and high humidity aging. Provided is a composite including: a topping rubber composition having a fatty acid content of 0.8% by mass or less; and an adherend plated with a copper-containing layer.
    Type: Application
    Filed: March 22, 2018
    Publication date: October 25, 2018
    Applicant: SUMITOMO RUBBER INDUSTRIES, LTD.
    Inventors: Natsuki MAEKAWA, Koji FUJISAWA, Hiroshi ITO, Ryosuke HARADA, Daiko FUJIMORI