Patents by Inventor Ryuichi Matsuda

Ryuichi Matsuda has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11063403
    Abstract: A solid-state laser device includes an inner container, an outer container, a cooling medium supply unit, and a cover section. The inner container in which a laser medium is accommodated includes an inner light-transmitting unit. An outer light-transmitting unit of the outer container is provided at a part that faces the inner light-transmitting unit and is vacuum-insulated from the inner light-transmitting unit. The cooling medium supply unit supplies a cooling medium so that the cooling medium comes in contact with a surface other than a light input and output surface in the laser medium. The cover section partitions a light-passing area from a cooling medium supply area to which the cooling medium is supplied.
    Type: Grant
    Filed: January 12, 2017
    Date of Patent: July 13, 2021
    Assignee: MITSUBISHI HEAVY INDUSTRIES, LTD.
    Inventors: Koichi Hamamoto, Ryuichi Matsuda
  • Patent number: 11017245
    Abstract: A parking assist apparatus includes: a setting unit that sets, within a captured image in which objects surrounding a moving vehicle have been imaged, a first search area for searching for a pair of partition lines disposed between parking spaces that are adjacent to each other; and a detecting unit that searches the first search area to detect a first partition line out of the pair of partition lines. When the detecting unit detects the first partition line, the setting unit sets a second search area for searching for a second partition line out of the pair of partition lines on the basis of the first partition line.
    Type: Grant
    Filed: February 23, 2018
    Date of Patent: May 25, 2021
    Assignee: AISIN SEIKI KABUSHIKI KAISHA
    Inventors: Masaki Furukawa, Keisuke Nose, Ryuichi Matsuda
  • Publication number: 20200380275
    Abstract: A parking assist apparatus includes: a setting unit that sets, within a captured image in which objects surrounding a moving vehicle have been imaged, a first search area for searching for a pair of partition lines disposed between parking spaces that are adjacent to each other; and a detecting unit that searches the first search area to detect a first partition line out of the pair of partition lines. When the detecting unit detects the first partition line, the setting unit sets a second search area for searching for a second partition line out of the pair of partition lines on the basis of the first partition line.
    Type: Application
    Filed: February 23, 2018
    Publication date: December 3, 2020
    Applicant: AISIN SEIKI KABUSHIKI KAISHA
    Inventors: Masaki FURUKAWA, Keisuke NOSE, Ryuichi MATSUDA
  • Publication number: 20200194956
    Abstract: A solid state laser apparatus (1) is provided with a plurality of cold heads (20), a cooling apparatus (10), laser media (30) and a seed light source (40). The cooling apparatus cools the plurality of cold heads. The plurality of laser media are arranged in contact to each of the plurality of cold heads, amplify an irradiated first laser beam and reflects the first laser beam. The seed light source irradiates a first laser medium (30-1) of the plurality of laser media with the first laser beam. In addition, the plurality of laser media reflects the first laser beam irradiated to the first laser medium to a laser medium arranged to a cold head different from the cold head where the relevant laser medium is arranged. In addition, the plurality of cold heads cools the plurality of laser media.
    Type: Application
    Filed: November 2, 2018
    Publication date: June 18, 2020
    Inventors: Koichi HAMAMOTO, Ryuichi MATSUDA
  • Patent number: 10616989
    Abstract: A plasma generation apparatus, and a plasma thruster configured to use the plasma generation apparatus are disclosed. The plasma generation apparatus includes a discharge vessel, a light-emitting monitor, a probe measuring instrument, a control device, and an optical axis driving unit. The discharge vessel is configured to ionize gas which is introduced to an inside thereof so as to generate plasma. The light-emitting monitor is configured to measure electron density of the plasma by emission spectra of the plasma. The probe measuring instrument is configured to measure the electron density of the plasma by a probe in the discharge vessel.
    Type: Grant
    Filed: April 10, 2015
    Date of Patent: April 7, 2020
    Assignee: MITSUBISHI HEAVY INDUSTRIES, LTD.
    Inventors: Tatsufumi Aoi, Kengo Yamaguchi, Ryuichi Matsuda, Akio Ikeda, Hirofumi Shimizu, Takuya Yamazaki, Tatsuya Kimura
  • Patent number: 10292252
    Abstract: An input coupler for an accelerating cavity includes a cylindrical external conductor; a cylindrical internal conductor arranged coaxially with the external conductor, inside of which a heating medium circulates; a plate provided between the inner surface of the external conductor and the outer surface of the internal conductor; a cooling part for cooling the plate from the external conductor side to the freezing point of water or lower; and a heat insulating part provided on the part at which the internal conductor and the plate are connected, the heat insulating part having lower thermal conductivity than that of the internal conductor. The plate is connected to the internal conductor via the heat insulating part.
    Type: Grant
    Filed: February 2, 2017
    Date of Patent: May 14, 2019
    Assignee: MITSUBISHI HEAVY INDUSTRIES MACHINERY SYSTEMS, LTD.
    Inventors: Kazunori Okihira, Katsuya Sennyu, Ryuichi Matsuda
  • Publication number: 20190008028
    Abstract: An input coupler for an accelerating cavity includes a cylindrical external conductor; a cylindrical internal conductor arranged coaxially with the external conductor, inside of which a heating medium circulates; a plate provided between the inner surface of the external conductor and the outer surface of the internal conductor; a cooling part for cooling the plate from the external conductor side to the freezing point of water or lower; and a heat insulating part provided on the part at which the internal conductor and the plate are connected, the heat insulating part having lower thermal conductivity than that of the internal conductor. The plate is connected to the internal conductor via the heat insulating part.
    Type: Application
    Filed: February 2, 2017
    Publication date: January 3, 2019
    Inventors: Kazunori OKIHIRA, Katsuya SENNYU, Ryuichi MATSUDA
  • Patent number: 10164397
    Abstract: A laser oscillation device includes: a refrigerant container; at least one cartridge which is attached to the refrigerant container and which includes a laser gain medium and an incidence path section for guiding laser seed light to the laser gain medium; at least one nozzle for spraying a refrigerant to the laser gain medium, the at least one nozzle being disposed inside the refrigerant container, and a vacuum heat insulating container housing the refrigerant container inside and forming a vacuum insulation layer on an outer peripheral side of the refrigerant container. The cartridge is disposed so as to be insertable and removable with respect to the refrigerant container along a longitudinal direction of the laser gain medium.
    Type: Grant
    Filed: September 17, 2015
    Date of Patent: December 25, 2018
    Assignee: MITSUBISHI HEAVY INDUSTRIES, LTD.
    Inventors: Ryuichi Matsuda, Shingo Nishikata, Koichi Hamamoto
  • Publication number: 20180233874
    Abstract: A solid-state laser device includes an inner container, an outer container, a cooling medium supply unit, and a cover section. The inner container in which a laser medium is accommodated includes an inner light-transmitting unit. An outer light-transmitting unit of the outer container is provided at a part that faces the inner light-transmitting unit and is vacuum-insulated from the inner light-transmitting unit. The cooling medium supply unit supplies a cooling medium so that the cooling medium comes in contact with a surface other than a light input and output surface in the laser medium. The cover section partitions a light-passing area from a cooling medium supply area to which the cooling medium is supplied.
    Type: Application
    Filed: January 12, 2017
    Publication date: August 16, 2018
    Inventors: Koichi HAMAMOTO, Ryuichi MATSUDA
  • Publication number: 20180083408
    Abstract: A laser oscillation device includes: a refrigerant container; at least one cartridge which is attached to the refrigerant container and which includes a laser gain medium and an incidence path section for guiding laser seed light to the laser gain medium; at least one nozzle for spraying a refrigerant to the laser gain medium, the at least one nozzle being disposed inside the refrigerant container, and a vacuum heat insulating container housing the refrigerant container inside and forming a vacuum insulation layer on an outer peripheral side of the refrigerant container. The cartridge is disposed so as to be insertable and removable with respect to the refrigerant container along a longitudinal direction of the laser gain medium.
    Type: Application
    Filed: September 17, 2015
    Publication date: March 22, 2018
    Inventors: Ryuichi MATSUDA, Shingo NISHIKATA, Koichi HAMAMOTO
  • Publication number: 20170064806
    Abstract: Provided are a plasma generation apparatus including a measurement device and capable of controlling conditions of plasma properly and stably, and a plasma thruster using the plasma generation apparatus. A plasma generation apparatus including a measurement device of the present invention includes a discharge vessel, a light-emitting monitor, a probe measuring instrument, a control device, and an optical axis driving unit. The discharge vessel ionizes gas which is introduced to an inside thereof so as to generate plasma. The light-emitting monitor measures electron density of the plasma by emission spectra of the plasma. The probe measuring instrument measures the electron density of the plasma by a probe disposed in the discharge vessel.
    Type: Application
    Filed: April 10, 2015
    Publication date: March 2, 2017
    Inventors: Tatsufumi AOI, Kengo YAMAGUCHI, Ryuichi MATSUDA, Akio IKEDA, Hirofumi SHIMIZU, Takuya YAMAZAKI, Tatsuya KIMURA
  • Patent number: 9263848
    Abstract: A directed-energy irradiating apparatus includes a switch which selects one of an FEL apparatus and an HPM apparatus to be supplied with a microwave based on external environmental data. A target is destroyed even in a situation in which a destruction effect by an FEL beam cannot be expected, while maintaining a destruction ability for the target by the FEL beam.
    Type: Grant
    Filed: June 4, 2013
    Date of Patent: February 16, 2016
    Assignee: MITSUBISHI HEAVY INDUSTRIES, LTD.
    Inventors: Shingo Nishikata, Yuki Uchiyama, Hiroyuki Daigo, Ryuichi Matsuda, Shinya Ishii, Hiroki Uchida
  • Patent number: 9011634
    Abstract: Provided are a plasma processing apparatus and a plasma processing method, by which plasma damage is reduced during processing. At the time of performing desired plasma processing to a substrate (5), a process chamber (2) is supplied with an inert gas for carrying in and out the substrate (5), pressure fluctuation in the process chamber (2) is adjusted to be within a prescribed range, and plasma (20) of the inert gas supplied in the process chamber (2) is generated. The density of the plasma (20) in the transfer area of the substrate (5) is reduced by controlling plasma power to be in a prescribed range, and the substrate (5) is carried in and out to and from a supporting table (4).
    Type: Grant
    Filed: October 4, 2012
    Date of Patent: April 21, 2015
    Assignee: Mitsubishi Heavy Industries, Ltd.
    Inventors: Ryuichi Matsuda, Masahiko Inoue, Kazuto Yoshida, Tadashi Shimazu
  • Patent number: 8960124
    Abstract: Provided are a plasma processing apparatus and a plasma processing method wherein particles generated due to the inner potential of an inner cylinder disposed inside of a vacuum container are reduced. The plasma processing apparatus has, inside of a metal vacuum chamber (11), the inner cylinder (15) composed of a surface-alumited aluminum, disposes a substrate in a plasma diffusion region, and performs plasma processing. A plurality of protruding portions (15a) in point-contact with the vacuum chamber (11) are provided on the lower end portion of the inner cylinder (15), the alumite film (16) on the leading end portion (15b) of each of the protruding portion (15a) is removed, and the inner cylinder and the vacuum chamber (11) are electrically connected to each other.
    Type: Grant
    Filed: May 24, 2010
    Date of Patent: February 24, 2015
    Assignee: Mitsubishi Heavy Industries, Ltd.
    Inventors: Ryuichi Matsuda, Kazuto Yoshida, Yuichi Kawano
  • Publication number: 20150014123
    Abstract: A production system according to an embodiment includes a workpiece circulator, a robot, and a posture changer. The workpiece circulator circulates a workpiece along a certain path. The robot holds the workpiece circulated by the workpiece circulator in a holding region that is part of the certain path, to move the workpiece to a certain place. The posture changer is arranged in the workpiece circulator and changes a posture of the workpiece circulated by the workpiece circulator.
    Type: Application
    Filed: October 2, 2014
    Publication date: January 15, 2015
    Applicant: KABUSHIKI KAISHA YASKAWA DENKI
    Inventors: Ryuichi MATSUDA, Toshiaki IKEDA, Keigo ISHIBASHI, Takahisa IKENAGA, Toshiyuki HARADA
  • Patent number: 8908720
    Abstract: A directed-energy irradiating apparatus includes an FEL apparatus and an HPM apparatus. The FEL apparatus accelerates free electrons by using a microwave supplied from a microwave source to irradiate an FEL beam and outputs a remaining microwave. The HPM apparatus irradiates an HPM beam generated based on the remaining microwave outputted from the FEL apparatus. It is possible to destroy a target even in a situation that a destruction effect by the FEL beam cannot expected, while maintaining the destruction ability of the FEL beam.
    Type: Grant
    Filed: June 3, 2013
    Date of Patent: December 9, 2014
    Assignee: Mitsubishi Heavy Industries, Ltd.
    Inventors: Shingo Nishikata, Yuki Uchiyama, Hiroyuki Daigo, Ryuichi Matsuda, Shinya Ishii, Hiroki Uchida
  • Publication number: 20140153592
    Abstract: A directed-energy irradiating apparatus includes an FEL apparatus 20 and an HPM apparatus 30. The FEL apparatus 20 accelerates free electrons by using microwave supplied from a microwave source to irradiate an FEL beam and outputs remaining microwave. The HPM apparatus irradiates an HPM beam generated based on the remaining microwave outputted from the FEL apparatus. It is possible to destroy a target even in a situation that a destruction effect by the FEL beam cannot expected, while maintaining the destruction ability of the FEL beam.
    Type: Application
    Filed: June 3, 2013
    Publication date: June 5, 2014
    Inventors: Shingo NISHIKATA, Yuki UCHIYAMA, Hiroyuki DAIGO, Ryuichi MATSUDA, Shinya ISHII, Hiroki UCHIDA
  • Publication number: 20140153593
    Abstract: A directed-energy irradiating apparatus invention includes a switch which selects one of an FEL apparatus and an HPM apparatus to be supplied with microwave based on external environmental data. A target is destroyed even in a situation that a destruction effect by a FEL beam cannot be expected, while maintaining the destruction ability for the target by the FEL beam.
    Type: Application
    Filed: June 4, 2013
    Publication date: June 5, 2014
    Inventors: Shingo NISHIKATA, Yuki UCHIYAMA, Hiroyuki DAIGO, Ryuichi MATSUDA, Shinya ISHII, Hiroki UCHIDA
  • Patent number: 8662010
    Abstract: A plasma film deposition apparatus (plasma processing apparatus) includes a second antenna 11b disposed around an antenna 11a and located outwardly of a ceiling surface. The second antenna 11b is supplied with an electric current flowing in a direction opposite to the direction of an electric current supplied to the antenna 11a by a power supply. Lines of magnetic force F2, heading in a direction opposite to the direction of lines of magnetic force F1 appearing at the site of the antenna 11a, are thereby generated at the site of the second antenna 11b. Thus, the magnetic flux density in the direction of the wall surface is lowered, even when a uniform plasma is generated over a wide range within a tubular container 2.
    Type: Grant
    Filed: May 4, 2007
    Date of Patent: March 4, 2014
    Assignee: Mitsubishi Heavy Industries, Ltd.
    Inventors: Ryuichi Matsuda, Tadashi Shimazu, Masahiko Inoue
  • Patent number: 8480912
    Abstract: Provided are a plasma processing apparatus and a plasma processing method, by which plasma damage is reduced during processing. At the time of performing desired plasma processing to a substrate (5), a process chamber (2) is supplied with an inert gas for carrying in and out the substrate (5), pressure fluctuation in the process chamber (2) is adjusted to be within a prescribed range, and plasma (20) of the inert gas supplied in the process chamber (2) is generated. The density of the plasma (20) in the transfer area of the substrate (5) is reduced by controlling plasma power to be in a prescribed range, and the substrate (5) is carried in and out to and from a supporting table (4).
    Type: Grant
    Filed: February 15, 2007
    Date of Patent: July 9, 2013
    Assignee: Mitsubishi Heavy Industries, Ltd.
    Inventors: Ryuichi Matsuda, Masahiko Inoue, Kazuto Yoshida, Tadashi Shimazu