Patents by Inventor Samir A. Nayfeh

Samir A. Nayfeh has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 12226813
    Abstract: Feeding stock used to form a tapered structure into a curving device such that each point on the stock undergoes rotational motion about a peak location of the tapered structure; and the stock meets a predecessor portion of stock along one or more adjacent edges.
    Type: Grant
    Filed: February 6, 2023
    Date of Patent: February 18, 2025
    Assignee: Keystone Tower Systems, Inc.
    Inventors: Eric D. Smith, Rosalind K. Takata, Alexander H. Slocum, Samir A. Nayfeh
  • Patent number: 12174552
    Abstract: Embodiments herein describe methods, devices, and systems for reducing an electric field at a clamp-reticle interface using an enhanced electrostatic clamp. In particular, the electrostatic clamp includes a clamp body, an electrode layer disposed on a top surface of the clamp body, and a plurality of burls that project from a bottom surface of the clamp body, wherein the electrode layer comprises a plurality of cutouts at predetermined locations that vertically correspond to locations of the plurality of burls at the bottom surface of the clamp body.
    Type: Grant
    Filed: October 5, 2020
    Date of Patent: December 24, 2024
    Assignee: ASML Holding N.V.
    Inventors: Victor Antonio Perez-Falcon, Marcus Adrianus Van De Kerkhof, Daniel Leslie Hall, Christopher John Mason, Arthur Winfried Eduardus Minnaert, Johannes Hubertus Josephina Moors, Samir A. Nayfeh
  • Publication number: 20230249236
    Abstract: Feeding stock used to form a tapered structure into a curving device such that each point on the stock undergoes rotational motion about a peak location of the tapered structure; and the stock meets a predecessor portion of stock along one or more adjacent edges.
    Type: Application
    Filed: February 6, 2023
    Publication date: August 10, 2023
    Inventors: Eric D. SMITH, Rosalind K. TAKATA, Alexander H. SLOCUM, Samir A. NAYFEH
  • Patent number: 11571727
    Abstract: Feeding stock used to form a tapered structure into a curving device such that each point on the stock undergoes rotational motion about a peak location of the tapered structure; and the stock meets a predecessor portion of stock along one or more adjacent edges.
    Type: Grant
    Filed: March 11, 2021
    Date of Patent: February 7, 2023
    Assignee: KEYSTONE TOWER SYSTEMS, INC.
    Inventors: Eric D. Smith, Rosalind K. Takata, Alexander H. Slocum, Samir A. Nayfeh
  • Publication number: 20230008474
    Abstract: Embodiments herein describe methods, devices, and systems for reducing an electric field at a clamp-reticle interface using an enhanced electrostatic clamp. In particular, the electrostatic clamp includes a clamp body, an electrode layer disposed on a top surface of the clamp body, and a plurality of burls that project from a bottom surface of the clamp body, wherein the electrode layer comprises a plurality of cutouts at predetermined locations that vertically correspond to locations of the plurality of burls at the bottom surface of the clamp body.
    Type: Application
    Filed: October 5, 2020
    Publication date: January 12, 2023
    Applicants: ASML Holding N.V., ASML Netherlands B.V.
    Inventors: Victor Antonio PEREZ-FALCON, Marcus Adrianus VAN DE KERKHOF, Daniel Leslie HALL, Christopher John MASON, Arthur Winfried Eduardus MINNAERT, Johannes Hubertus Josephina MOORS, Samir A. NAYFEH
  • Publication number: 20210213501
    Abstract: Feeding stock used to form a tapered structure into a curving device such that each point on the stock undergoes rotational motion about a peak location of the tapered structure; and the stock meets a predecessor portion of stock along one or more adjacent edges.
    Type: Application
    Filed: March 11, 2021
    Publication date: July 15, 2021
    Inventors: Eric D. SMITH, Rosalind K. TAKATA, Alexander H. SLOCUM, Samir A. NAYFEH
  • Patent number: 10974298
    Abstract: Feeding stock used to form a tapered structure into a curving device such that each point on the stock undergoes rotational motion about a peak location of the tapered structure; and the stock meets a predecessor portion of stock along one or more adjacent edges.
    Type: Grant
    Filed: December 21, 2017
    Date of Patent: April 13, 2021
    Assignee: KEYSTONE TOWER SYSTEMS, INC.
    Inventors: Eric D. Smith, Rosalind K. Takata, Alexander H. Slocum, Samir A. Nayfeh
  • Patent number: 10788763
    Abstract: A lithographic apparatus has a support structure configured to support a patterning device, the patterning device serving to pattern a radiation beam according to a desired pattern and having a planar main surface through which the radiation beam passes; an outlet opening configured to direct a flow of a gas onto the patterning device; and an inlet opening configured to extract the gas which has exited the outlet opening, wherein the outlet opening and inlet opening are in a facing surface facing the planar main surface of the patterning device.
    Type: Grant
    Filed: November 17, 2016
    Date of Patent: September 29, 2020
    Assignees: ASML NETHERLANDS B.V., ASML HOLDING N.V.
    Inventors: Jan Steven Christiaan Westerlaken, Ruud Hendrikus Martinus Johannes Bloks, Peter A. Delmastro, Thibault Simon Mathieu Laurent, Martinus Hendrikus Antonius Leenders, Mark Josef Schuster, Christopher Charles Ward, Frank Johannes Jacobus Van Boxtel, Justin Matthew Verdirame, Samir A. Nayfeh
  • Patent number: 10761435
    Abstract: Systems and methods are disclosed that provide a support system in the Z direction for patterning devices that can function under high acceleration and deceleration with minimal effect on travel and hysteresis in the X and Y directions. A reticle clamping system includes a support device and a holding device. The holding device is configured to releasably couple a reticle to the support device. The holding device includes a plurality of burls. The reticle clamping system further includes a metallic support system coupled to the support device. The metallic support system provides a vacuum path from a vacuum channel to the holding device.
    Type: Grant
    Filed: January 17, 2018
    Date of Patent: September 1, 2020
    Assignee: ASML Holding N.V.
    Inventors: Enrico Zordan, Brandon Adam Evans, Daniel Nathan Burbank, Ankur Ramesh Baheti, Samir A. Nayfeh
  • Publication number: 20190391501
    Abstract: Systems and methods are disclosed that provide a support system in the Z direction for patterning devices that can function under high acceleration and deceleration with minimal effect on travel and hysteresis in the X and Y directions. A reticle clamping system includes a support device and a holding device. The holding device is configured to releasably couple a reticle to the support device. The holding device includes a plurality of burls. The reticle clamping system further includes a metallic support system coupled to the support device. The metallic support system provides a vacuum path from a vacuum channel to the holding device.
    Type: Application
    Filed: January 17, 2018
    Publication date: December 26, 2019
    Applicant: ASML Holding N.V.
    Inventors: Enrico ZORDAN, Brandon Adam EVANS, Daniei Nathan BURBANK, Ankur Ramesh BAHET!, Samir A. NAYFEH
  • Patent number: 10195653
    Abstract: Feeding stock used to form a tapered structure into a curving device such that each point on the stock undergoes rotational motion about a peak location of the tapered structure; and the stock meets a predecessor portion of stock along one or more adjacent edges.
    Type: Grant
    Filed: December 22, 2015
    Date of Patent: February 5, 2019
    Assignee: Keystone Tower Systems, Inc.
    Inventors: Eric D. Smith, Rosalind K. Takata, Alexander H. Slocum, Samir A. Nayfeh
  • Patent number: 9977351
    Abstract: A patterning device support for controlling a temperature of a patterning device can include a movable component. The movable component can include a gas inlet for supplying a gas flow across a surface of the patterning device and a gas outlet for extracting the gas flow. The patterning device support can also include a gas flow generator coupled to a duct, for recirculating the gas flow from the gas outlet to the gas inlet.
    Type: Grant
    Filed: July 13, 2017
    Date of Patent: May 22, 2018
    Assignees: ASML Holding N.V., ASML Netherlands B.V.
    Inventors: Earl William Ebert, Johannes Onvlee, Samir A. Nayfeh, Mark Josef Schuster, Peter A. Delmastro, Christopher Charles Ward, Frank Johannes Jacobus Van Boxtel, Abdullah Alikhan, Daniel Nathan Burbank, Daniel Nicholas Galburt, Justin Matthew Verdirame
  • Publication number: 20180133769
    Abstract: Feeding stock used to form a tapered structure into a curving device such that each point on the stock undergoes rotational motion about a peak location of the tapered structure; and the stock meets a predecessor portion of stock along one or more adjacent edges.
    Type: Application
    Filed: December 21, 2017
    Publication date: May 17, 2018
    Inventors: Eric D. Smith, Rosalind K. Takata, Alexander H. Slocum, Samir A. Nayfeh
  • Publication number: 20170307986
    Abstract: A patterning device support for controlling a temperature of a patterning device can include a movable component. The movable component can include a gas inlet for supplying a gas flow across a surface of the patterning device and a gas outlet for extracting the gas flow. The patterning device support can also include a gas flow generator coupled to a duct, for recirculating the gas flow from the gas outlet to the gas inlet.
    Type: Application
    Filed: July 13, 2017
    Publication date: October 26, 2017
    Applicants: ASML Holding N.V., ASML Netherlands B.V.
    Inventors: Earl William EBERT, Johannes ONVLEE, Samir A. NAYFEH, Mark Josef SCHUSTER, Peter A. DELMASTRO, Christopher Charles WARD, Frank Johannes Jacobus VAN BOXTEL, Abdullah ALIKHAN, Daniel Nathan BURBANK, Daniel Nicholas GALBURT, Justin Matthew VERDIRAME
  • Patent number: 9766557
    Abstract: A patterning device support for controlling a temperature of a patterning device can include a movable component. The movable component can include a gas inlet for supplying a gas flow across a surface of the patterning device and a gas outlet for extracting the gas flow. The patterning device support can also include a gas flow generator coupled to a duct, for recirculating the gas flow from the gas outlet to the gas inlet.
    Type: Grant
    Filed: February 21, 2017
    Date of Patent: September 19, 2017
    Assignees: ASML Holding N.V., ASML Netherlands B.V.
    Inventors: Earl William Ebert, Johannes Onvlee, Samir A. Nayfeh, Mark Josef Schuster, Peter A. Delmastro, Christopher Charles Ward, Frank Johannes Jacobus Van Boxtel, Abdullah Alikhan, Daniel Nathan Burbank, Daniel Nicholas Galburt, Justin Matthew Verdirame
  • Publication number: 20170160652
    Abstract: A patterning device support for controlling a temperature of a patterning device can include a movable component. The movable component can include a gas inlet for supplying a gas flow across a surface of the patterning device and a gas outlet for extracting the gas flow. The patterning device support can also include a gas flow generator coupled to a duct, for recirculating the gas flow from the gas outlet to the gas inlet.
    Type: Application
    Filed: February 21, 2017
    Publication date: June 8, 2017
    Applicants: ASML Holding N.V., ASML Netherlands B.V.
    Inventors: Earl William EBERT, Johannes ONVLEE, Samir A. NAYFEH, Mark Josef SCHUSTER, Peter A. DELMASTRO, Christopher Charles WARD, Frank Johannes Jacobus VAN BOXTEL, Abdullah ALIKHAN, Daniel Nathan BURBANK, Daniel Nicholas GALBURT, Justin Matthew VERDIRAME
  • Patent number: 9632433
    Abstract: A patterning device support (1100) for controlling a temperature of a patterning device (1102) can include a movable component (1104). The movable component can include a gas inlet (1108) for supplying a gas flow across a surface of the patterning device and a gas outlet (1110) for extracting the gas flow. The patterning device support can also include a gas flow generator (1118) coupled to a duct (1114, 1116) for recirculating the gas flow from the gas outlet to the gas inlet.
    Type: Grant
    Filed: October 21, 2013
    Date of Patent: April 25, 2017
    Assignees: ASML Holding N.V., ASML Netherlands B.V.
    Inventors: Earl William Ebert, Jr., Johannes Onvlee, Samir A. Nayfeh, Mark Josef Schuster, Peter A. Delmastro, Christopher Charles Ward, Frank Johannes Jacobus Van Boxtel, Abdullah Alikhan, Daniel Nathan Burbank, Daniel Nicholas Galburt, Justin Matthew Verdirame
  • Patent number: 9632434
    Abstract: A system for controlling temperature of a patterning device in a lithographic apparatus is discussed. The system includes a patterning device support configured to support a patterning device and a reticle cooling system configured to provide substantially uniform temperature distribution across the patterning device. The reticle cooling system includes a first and second array of gas inlets configured to provide a first and second gas flow along a first and second direction across a surface of the patterning device, respectively, where first and second directions are opposite to each other. The reticle cooling system further includes a switching control system configured to control operation of the first and second arrays of gas inlets.
    Type: Grant
    Filed: April 29, 2015
    Date of Patent: April 25, 2017
    Assignees: ASML Holding N.V., ASML Netherlands B.V.
    Inventors: Earl William Ebert, Jr., Johannes Onvlee, Samir A. Nayfeh, Mark Josef Schuster, Peter A. Delmastro, Christopher Charles Ward, Frank Johannes Jacobus Van Boxtel, Abdullah Alikhan, Daniel Nathan Burbank, Daniel Nicholas Galburt, Justin Matthew Verdirame, Thomas Venturino
  • Publication number: 20170068175
    Abstract: A lithographic apparatus has a support structure configured to support a patterning device, the patterning device serving to pattern a radiation beam according to a desired pattern and having a planar main surface through which the radiation beam passes; an outlet opening configured to direct a flow of a gas onto the patterning device; and an inlet opening configured to extract the gas which has exited the outlet opening, wherein the outlet opening and inlet opening are in a facing surface facing the planar main surface of the patterning device.
    Type: Application
    Filed: November 17, 2016
    Publication date: March 9, 2017
    Applicants: ASML NETHERLANDS B.V., ASML HOLDING N.V.
    Inventors: Jan Steven Christiaan WESTERLAKEN, Ruud Hendrikus Martinus Johannes BLOKS, Peter A. DELMASTRO, Thibault Simon Mathieu LAURENT, Martinus Hendrikus Antonius LEENDERS, Mark Josef SCHUSTER, Christopher Charles WARD, Frank Johannes Jacobus VAN BOXTEL, Justin Matthew VERDIRAME, Samir A. NAYFEH
  • Patent number: 9513568
    Abstract: A lithographic apparatus has a support structure configured to support a patterning device, the patterning device serving to pattern a radiation beam according to a desired pattern and having a planar main surface through which the radiation beam passes; an outlet opening configured to direct a flow of a gas onto the patterning device; and an inlet opening configured to extract the gas which has exited the outlet opening, wherein the outlet opening and inlet opening are in a facing surface facing the planar main surface of the patterning device.
    Type: Grant
    Filed: June 5, 2013
    Date of Patent: December 6, 2016
    Assignees: ASML NETHERLANDS B.V., ASML HOLDING N.V.
    Inventors: Jan Steven Christiaan Westerlaken, Ruud Hendrikus Martinus Johannes Bloks, Peter A. Delmastro, Thibault Simon Mathieu Laurent, Martinus Hendrikus Antonius Leenders, Mark Josef Schuster, Christopher Charles Ward, Frank Johannes Jacobus Van Boxtel, Justin Matthew Verdirame, Samir A. Nayfeh