Patents by Inventor Samir A. Nayfeh
Samir A. Nayfeh has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 12226813Abstract: Feeding stock used to form a tapered structure into a curving device such that each point on the stock undergoes rotational motion about a peak location of the tapered structure; and the stock meets a predecessor portion of stock along one or more adjacent edges.Type: GrantFiled: February 6, 2023Date of Patent: February 18, 2025Assignee: Keystone Tower Systems, Inc.Inventors: Eric D. Smith, Rosalind K. Takata, Alexander H. Slocum, Samir A. Nayfeh
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Patent number: 12174552Abstract: Embodiments herein describe methods, devices, and systems for reducing an electric field at a clamp-reticle interface using an enhanced electrostatic clamp. In particular, the electrostatic clamp includes a clamp body, an electrode layer disposed on a top surface of the clamp body, and a plurality of burls that project from a bottom surface of the clamp body, wherein the electrode layer comprises a plurality of cutouts at predetermined locations that vertically correspond to locations of the plurality of burls at the bottom surface of the clamp body.Type: GrantFiled: October 5, 2020Date of Patent: December 24, 2024Assignee: ASML Holding N.V.Inventors: Victor Antonio Perez-Falcon, Marcus Adrianus Van De Kerkhof, Daniel Leslie Hall, Christopher John Mason, Arthur Winfried Eduardus Minnaert, Johannes Hubertus Josephina Moors, Samir A. Nayfeh
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Publication number: 20230249236Abstract: Feeding stock used to form a tapered structure into a curving device such that each point on the stock undergoes rotational motion about a peak location of the tapered structure; and the stock meets a predecessor portion of stock along one or more adjacent edges.Type: ApplicationFiled: February 6, 2023Publication date: August 10, 2023Inventors: Eric D. SMITH, Rosalind K. TAKATA, Alexander H. SLOCUM, Samir A. NAYFEH
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Patent number: 11571727Abstract: Feeding stock used to form a tapered structure into a curving device such that each point on the stock undergoes rotational motion about a peak location of the tapered structure; and the stock meets a predecessor portion of stock along one or more adjacent edges.Type: GrantFiled: March 11, 2021Date of Patent: February 7, 2023Assignee: KEYSTONE TOWER SYSTEMS, INC.Inventors: Eric D. Smith, Rosalind K. Takata, Alexander H. Slocum, Samir A. Nayfeh
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Publication number: 20230008474Abstract: Embodiments herein describe methods, devices, and systems for reducing an electric field at a clamp-reticle interface using an enhanced electrostatic clamp. In particular, the electrostatic clamp includes a clamp body, an electrode layer disposed on a top surface of the clamp body, and a plurality of burls that project from a bottom surface of the clamp body, wherein the electrode layer comprises a plurality of cutouts at predetermined locations that vertically correspond to locations of the plurality of burls at the bottom surface of the clamp body.Type: ApplicationFiled: October 5, 2020Publication date: January 12, 2023Applicants: ASML Holding N.V., ASML Netherlands B.V.Inventors: Victor Antonio PEREZ-FALCON, Marcus Adrianus VAN DE KERKHOF, Daniel Leslie HALL, Christopher John MASON, Arthur Winfried Eduardus MINNAERT, Johannes Hubertus Josephina MOORS, Samir A. NAYFEH
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Publication number: 20210213501Abstract: Feeding stock used to form a tapered structure into a curving device such that each point on the stock undergoes rotational motion about a peak location of the tapered structure; and the stock meets a predecessor portion of stock along one or more adjacent edges.Type: ApplicationFiled: March 11, 2021Publication date: July 15, 2021Inventors: Eric D. SMITH, Rosalind K. TAKATA, Alexander H. SLOCUM, Samir A. NAYFEH
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Patent number: 10974298Abstract: Feeding stock used to form a tapered structure into a curving device such that each point on the stock undergoes rotational motion about a peak location of the tapered structure; and the stock meets a predecessor portion of stock along one or more adjacent edges.Type: GrantFiled: December 21, 2017Date of Patent: April 13, 2021Assignee: KEYSTONE TOWER SYSTEMS, INC.Inventors: Eric D. Smith, Rosalind K. Takata, Alexander H. Slocum, Samir A. Nayfeh
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Patent number: 10788763Abstract: A lithographic apparatus has a support structure configured to support a patterning device, the patterning device serving to pattern a radiation beam according to a desired pattern and having a planar main surface through which the radiation beam passes; an outlet opening configured to direct a flow of a gas onto the patterning device; and an inlet opening configured to extract the gas which has exited the outlet opening, wherein the outlet opening and inlet opening are in a facing surface facing the planar main surface of the patterning device.Type: GrantFiled: November 17, 2016Date of Patent: September 29, 2020Assignees: ASML NETHERLANDS B.V., ASML HOLDING N.V.Inventors: Jan Steven Christiaan Westerlaken, Ruud Hendrikus Martinus Johannes Bloks, Peter A. Delmastro, Thibault Simon Mathieu Laurent, Martinus Hendrikus Antonius Leenders, Mark Josef Schuster, Christopher Charles Ward, Frank Johannes Jacobus Van Boxtel, Justin Matthew Verdirame, Samir A. Nayfeh
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Patent number: 10761435Abstract: Systems and methods are disclosed that provide a support system in the Z direction for patterning devices that can function under high acceleration and deceleration with minimal effect on travel and hysteresis in the X and Y directions. A reticle clamping system includes a support device and a holding device. The holding device is configured to releasably couple a reticle to the support device. The holding device includes a plurality of burls. The reticle clamping system further includes a metallic support system coupled to the support device. The metallic support system provides a vacuum path from a vacuum channel to the holding device.Type: GrantFiled: January 17, 2018Date of Patent: September 1, 2020Assignee: ASML Holding N.V.Inventors: Enrico Zordan, Brandon Adam Evans, Daniel Nathan Burbank, Ankur Ramesh Baheti, Samir A. Nayfeh
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Publication number: 20190391501Abstract: Systems and methods are disclosed that provide a support system in the Z direction for patterning devices that can function under high acceleration and deceleration with minimal effect on travel and hysteresis in the X and Y directions. A reticle clamping system includes a support device and a holding device. The holding device is configured to releasably couple a reticle to the support device. The holding device includes a plurality of burls. The reticle clamping system further includes a metallic support system coupled to the support device. The metallic support system provides a vacuum path from a vacuum channel to the holding device.Type: ApplicationFiled: January 17, 2018Publication date: December 26, 2019Applicant: ASML Holding N.V.Inventors: Enrico ZORDAN, Brandon Adam EVANS, Daniei Nathan BURBANK, Ankur Ramesh BAHET!, Samir A. NAYFEH
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Patent number: 10195653Abstract: Feeding stock used to form a tapered structure into a curving device such that each point on the stock undergoes rotational motion about a peak location of the tapered structure; and the stock meets a predecessor portion of stock along one or more adjacent edges.Type: GrantFiled: December 22, 2015Date of Patent: February 5, 2019Assignee: Keystone Tower Systems, Inc.Inventors: Eric D. Smith, Rosalind K. Takata, Alexander H. Slocum, Samir A. Nayfeh
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Patent number: 9977351Abstract: A patterning device support for controlling a temperature of a patterning device can include a movable component. The movable component can include a gas inlet for supplying a gas flow across a surface of the patterning device and a gas outlet for extracting the gas flow. The patterning device support can also include a gas flow generator coupled to a duct, for recirculating the gas flow from the gas outlet to the gas inlet.Type: GrantFiled: July 13, 2017Date of Patent: May 22, 2018Assignees: ASML Holding N.V., ASML Netherlands B.V.Inventors: Earl William Ebert, Johannes Onvlee, Samir A. Nayfeh, Mark Josef Schuster, Peter A. Delmastro, Christopher Charles Ward, Frank Johannes Jacobus Van Boxtel, Abdullah Alikhan, Daniel Nathan Burbank, Daniel Nicholas Galburt, Justin Matthew Verdirame
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Publication number: 20180133769Abstract: Feeding stock used to form a tapered structure into a curving device such that each point on the stock undergoes rotational motion about a peak location of the tapered structure; and the stock meets a predecessor portion of stock along one or more adjacent edges.Type: ApplicationFiled: December 21, 2017Publication date: May 17, 2018Inventors: Eric D. Smith, Rosalind K. Takata, Alexander H. Slocum, Samir A. Nayfeh
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Publication number: 20170307986Abstract: A patterning device support for controlling a temperature of a patterning device can include a movable component. The movable component can include a gas inlet for supplying a gas flow across a surface of the patterning device and a gas outlet for extracting the gas flow. The patterning device support can also include a gas flow generator coupled to a duct, for recirculating the gas flow from the gas outlet to the gas inlet.Type: ApplicationFiled: July 13, 2017Publication date: October 26, 2017Applicants: ASML Holding N.V., ASML Netherlands B.V.Inventors: Earl William EBERT, Johannes ONVLEE, Samir A. NAYFEH, Mark Josef SCHUSTER, Peter A. DELMASTRO, Christopher Charles WARD, Frank Johannes Jacobus VAN BOXTEL, Abdullah ALIKHAN, Daniel Nathan BURBANK, Daniel Nicholas GALBURT, Justin Matthew VERDIRAME
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Patent number: 9766557Abstract: A patterning device support for controlling a temperature of a patterning device can include a movable component. The movable component can include a gas inlet for supplying a gas flow across a surface of the patterning device and a gas outlet for extracting the gas flow. The patterning device support can also include a gas flow generator coupled to a duct, for recirculating the gas flow from the gas outlet to the gas inlet.Type: GrantFiled: February 21, 2017Date of Patent: September 19, 2017Assignees: ASML Holding N.V., ASML Netherlands B.V.Inventors: Earl William Ebert, Johannes Onvlee, Samir A. Nayfeh, Mark Josef Schuster, Peter A. Delmastro, Christopher Charles Ward, Frank Johannes Jacobus Van Boxtel, Abdullah Alikhan, Daniel Nathan Burbank, Daniel Nicholas Galburt, Justin Matthew Verdirame
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Publication number: 20170160652Abstract: A patterning device support for controlling a temperature of a patterning device can include a movable component. The movable component can include a gas inlet for supplying a gas flow across a surface of the patterning device and a gas outlet for extracting the gas flow. The patterning device support can also include a gas flow generator coupled to a duct, for recirculating the gas flow from the gas outlet to the gas inlet.Type: ApplicationFiled: February 21, 2017Publication date: June 8, 2017Applicants: ASML Holding N.V., ASML Netherlands B.V.Inventors: Earl William EBERT, Johannes ONVLEE, Samir A. NAYFEH, Mark Josef SCHUSTER, Peter A. DELMASTRO, Christopher Charles WARD, Frank Johannes Jacobus VAN BOXTEL, Abdullah ALIKHAN, Daniel Nathan BURBANK, Daniel Nicholas GALBURT, Justin Matthew VERDIRAME
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Patent number: 9632433Abstract: A patterning device support (1100) for controlling a temperature of a patterning device (1102) can include a movable component (1104). The movable component can include a gas inlet (1108) for supplying a gas flow across a surface of the patterning device and a gas outlet (1110) for extracting the gas flow. The patterning device support can also include a gas flow generator (1118) coupled to a duct (1114, 1116) for recirculating the gas flow from the gas outlet to the gas inlet.Type: GrantFiled: October 21, 2013Date of Patent: April 25, 2017Assignees: ASML Holding N.V., ASML Netherlands B.V.Inventors: Earl William Ebert, Jr., Johannes Onvlee, Samir A. Nayfeh, Mark Josef Schuster, Peter A. Delmastro, Christopher Charles Ward, Frank Johannes Jacobus Van Boxtel, Abdullah Alikhan, Daniel Nathan Burbank, Daniel Nicholas Galburt, Justin Matthew Verdirame
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Patent number: 9632434Abstract: A system for controlling temperature of a patterning device in a lithographic apparatus is discussed. The system includes a patterning device support configured to support a patterning device and a reticle cooling system configured to provide substantially uniform temperature distribution across the patterning device. The reticle cooling system includes a first and second array of gas inlets configured to provide a first and second gas flow along a first and second direction across a surface of the patterning device, respectively, where first and second directions are opposite to each other. The reticle cooling system further includes a switching control system configured to control operation of the first and second arrays of gas inlets.Type: GrantFiled: April 29, 2015Date of Patent: April 25, 2017Assignees: ASML Holding N.V., ASML Netherlands B.V.Inventors: Earl William Ebert, Jr., Johannes Onvlee, Samir A. Nayfeh, Mark Josef Schuster, Peter A. Delmastro, Christopher Charles Ward, Frank Johannes Jacobus Van Boxtel, Abdullah Alikhan, Daniel Nathan Burbank, Daniel Nicholas Galburt, Justin Matthew Verdirame, Thomas Venturino
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Publication number: 20170068175Abstract: A lithographic apparatus has a support structure configured to support a patterning device, the patterning device serving to pattern a radiation beam according to a desired pattern and having a planar main surface through which the radiation beam passes; an outlet opening configured to direct a flow of a gas onto the patterning device; and an inlet opening configured to extract the gas which has exited the outlet opening, wherein the outlet opening and inlet opening are in a facing surface facing the planar main surface of the patterning device.Type: ApplicationFiled: November 17, 2016Publication date: March 9, 2017Applicants: ASML NETHERLANDS B.V., ASML HOLDING N.V.Inventors: Jan Steven Christiaan WESTERLAKEN, Ruud Hendrikus Martinus Johannes BLOKS, Peter A. DELMASTRO, Thibault Simon Mathieu LAURENT, Martinus Hendrikus Antonius LEENDERS, Mark Josef SCHUSTER, Christopher Charles WARD, Frank Johannes Jacobus VAN BOXTEL, Justin Matthew VERDIRAME, Samir A. NAYFEH
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Patent number: 9513568Abstract: A lithographic apparatus has a support structure configured to support a patterning device, the patterning device serving to pattern a radiation beam according to a desired pattern and having a planar main surface through which the radiation beam passes; an outlet opening configured to direct a flow of a gas onto the patterning device; and an inlet opening configured to extract the gas which has exited the outlet opening, wherein the outlet opening and inlet opening are in a facing surface facing the planar main surface of the patterning device.Type: GrantFiled: June 5, 2013Date of Patent: December 6, 2016Assignees: ASML NETHERLANDS B.V., ASML HOLDING N.V.Inventors: Jan Steven Christiaan Westerlaken, Ruud Hendrikus Martinus Johannes Bloks, Peter A. Delmastro, Thibault Simon Mathieu Laurent, Martinus Hendrikus Antonius Leenders, Mark Josef Schuster, Christopher Charles Ward, Frank Johannes Jacobus Van Boxtel, Justin Matthew Verdirame, Samir A. Nayfeh